BR7704527A - Composicoes curaveis e processo para cura das mesmas - Google Patents
Composicoes curaveis e processo para cura das mesmasInfo
- Publication number
- BR7704527A BR7704527A BR7704527A BR7704527A BR7704527A BR 7704527 A BR7704527 A BR 7704527A BR 7704527 A BR7704527 A BR 7704527A BR 7704527 A BR7704527 A BR 7704527A BR 7704527 A BR7704527 A BR 7704527A
- Authority
- BR
- Brazil
- Prior art keywords
- cureable
- cureing
- composites
- same
- cureable composites
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
- C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US70386076A | 1976-07-09 | 1976-07-09 | |
US73242176A | 1976-10-14 | 1976-10-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR7704527A true BR7704527A (pt) | 1978-04-25 |
Family
ID=27107218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR7704527A BR7704527A (pt) | 1976-07-09 | 1977-07-08 | Composicoes curaveis e processo para cura das mesmas |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS6035930B2 (pt) |
AU (1) | AU517415B2 (pt) |
BR (1) | BR7704527A (pt) |
DE (1) | DE2730725A1 (pt) |
FR (1) | FR2357931A1 (pt) |
GB (1) | GB1554389A (pt) |
MX (2) | MX145409A (pt) |
NL (1) | NL183948C (pt) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4299938A (en) | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
JPS6076735A (ja) * | 1983-10-04 | 1985-05-01 | Agency Of Ind Science & Technol | 光硬化樹脂組成物 |
JPS6078442A (ja) * | 1983-10-04 | 1985-05-04 | Agency Of Ind Science & Technol | 光硬化性樹脂組成物 |
JPS6078443A (ja) * | 1983-10-05 | 1985-05-04 | Agency Of Ind Science & Technol | 光不溶性樹脂組成物 |
EP0153904B1 (de) * | 1984-02-10 | 1988-09-14 | Ciba-Geigy Ag | Verfahren zur Herstellung einer Schutzschicht oder einer Reliefabbildung |
EP1470191B1 (en) * | 2002-02-01 | 2012-11-21 | Saint-Gobain Glass France S.A. | Barrier layer made of a curable resin containing polymeric polyol |
WO2011040531A1 (ja) | 2009-10-01 | 2011-04-07 | 日立化成工業株式会社 | 有機エレクトロニクス用材料、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、及びそれを用いた表示素子、照明装置、表示装置 |
CN102859740B (zh) | 2010-04-22 | 2016-06-15 | 日立化成株式会社 | 有机电子材料、聚合引发剂及热聚合引发剂、油墨组合物、有机薄膜及其制造方法、有机电子元件、有机电致发光元件、照明装置、显示元件以及显示装置 |
CN110003447A (zh) | 2013-03-08 | 2019-07-12 | 日立化成株式会社 | 处理液、有机电子元件、发光元件、显示元件、照明装置、显示装置和有机光电转换元件 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1077246A (fr) * | 1952-04-14 | 1954-11-05 | Bataafsche Petroleum | Composition contenant du glycidyléther et une résine de polyvinyl acétal |
BE522162A (pt) * | 1952-08-19 | |||
US3552963A (en) * | 1964-10-13 | 1971-01-05 | Kalvar Corp | Photographic vesicular materials and imaging process therefor |
FR1456922A (fr) * | 1965-09-17 | 1966-07-08 | Porte de foyer à réchauffage d'air | |
AU497960B2 (en) * | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
GB1512981A (en) * | 1974-05-02 | 1978-06-01 | Gen Electric | Curable epoxide compositions |
GB1516351A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Curable epoxide compositions |
GB1516512A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Chalcogenium salts |
DE2551347A1 (de) * | 1975-08-14 | 1977-02-24 | Alusuisse | Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse |
-
1977
- 1977-05-26 AU AU25531/77A patent/AU517415B2/en not_active Expired
- 1977-05-27 GB GB22440/77A patent/GB1554389A/en not_active Expired
- 1977-07-07 DE DE19772730725 patent/DE2730725A1/de active Granted
- 1977-07-08 FR FR7721089A patent/FR2357931A1/fr active Granted
- 1977-07-08 MX MX169783A patent/MX145409A/es unknown
- 1977-07-08 BR BR7704527A patent/BR7704527A/pt unknown
- 1977-07-08 JP JP52081097A patent/JPS6035930B2/ja not_active Expired
- 1977-07-08 MX MX189147A patent/MX159499A/es unknown
- 1977-07-08 NL NLAANVRAGE7707609,A patent/NL183948C/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU517415B2 (en) | 1981-07-30 |
DE2730725C2 (pt) | 1990-08-16 |
MX145409A (es) | 1982-02-04 |
NL7707609A (nl) | 1978-01-11 |
NL183948C (nl) | 1989-03-01 |
NL183948B (nl) | 1988-10-03 |
DE2730725A1 (de) | 1978-01-12 |
MX159499A (es) | 1989-06-20 |
GB1554389A (en) | 1979-10-17 |
FR2357931B1 (pt) | 1983-11-25 |
JPS6035930B2 (ja) | 1985-08-17 |
JPS5322597A (en) | 1978-03-02 |
AU2553177A (en) | 1978-11-30 |
FR2357931A1 (fr) | 1978-02-03 |
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