DE2239425C3 - Verfahren zur elektrolytischen Behandlung von Nioboberflächen für Wechselstromanwendungen - Google Patents
Verfahren zur elektrolytischen Behandlung von Nioboberflächen für WechselstromanwendungenInfo
- Publication number
- DE2239425C3 DE2239425C3 DE2239425A DE2239425A DE2239425C3 DE 2239425 C3 DE2239425 C3 DE 2239425C3 DE 2239425 A DE2239425 A DE 2239425A DE 2239425 A DE2239425 A DE 2239425A DE 2239425 C3 DE2239425 C3 DE 2239425C3
- Authority
- DE
- Germany
- Prior art keywords
- niobium
- niobium pentoxide
- resonator
- hydrofluoric acid
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 title claims description 59
- 229910052758 niobium Inorganic materials 0.000 title claims description 53
- 239000010955 niobium Substances 0.000 title claims description 53
- 238000000034 method Methods 0.000 title claims description 29
- 230000008569 process Effects 0.000 title claims description 4
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 59
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 56
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 54
- 230000003647 oxidation Effects 0.000 claims description 35
- 238000007254 oxidation reaction Methods 0.000 claims description 35
- 238000002604 ultrasonography Methods 0.000 claims description 16
- 239000003792 electrolyte Substances 0.000 claims description 13
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 230000009972 noncorrosive effect Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 58
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 8
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 8
- 235000011114 ammonium hydroxide Nutrition 0.000 description 8
- 238000004090 dissolution Methods 0.000 description 8
- 230000008878 coupling Effects 0.000 description 7
- 238000010168 coupling process Methods 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 229910021529 ammonia Inorganic materials 0.000 description 6
- 229910000484 niobium oxide Inorganic materials 0.000 description 6
- 239000002887 superconductor Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 239000012153 distilled water Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 238000007872 degassing Methods 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 101100117236 Drosophila melanogaster speck gene Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002471 indium Chemical class 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002821 niobium Chemical class 0.000 description 1
- -1 niobium pentoxide compound Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/14—Vacuum chambers
- H05H7/18—Cavities; Resonators
- H05H7/20—Cavities; Resonators with superconductive walls
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P7/00—Resonators of the waveguide type
- H01P7/06—Cavity resonators
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma & Fusion (AREA)
- Electrochemistry (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- ing And Chemical Polishing (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Electrochemical Coating By Surface Reaction (AREA)
- Electrolytic Production Of Metals (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2239425A DE2239425C3 (de) | 1972-08-10 | 1972-08-10 | Verfahren zur elektrolytischen Behandlung von Nioboberflächen für Wechselstromanwendungen |
| CH1006673A CH577037A5 (Direct) | 1972-08-10 | 1973-07-10 | |
| US386423A US3902975A (en) | 1972-08-10 | 1973-08-07 | Method for treating niobium surfaces used in AC circuit applications |
| SE7310871A SE402133B (sv) | 1972-08-10 | 1973-08-08 | Sett att behandla niobytor for vexelstromstillempningar, serskilt ytor hos niobresonatorer |
| GB3766873A GB1405730A (en) | 1972-08-10 | 1973-08-08 | Method of treating niobium surfaces to improve their super conductive properties |
| NL7311022A NL7311022A (Direct) | 1972-08-10 | 1973-08-09 | |
| CA178,395A CA1018473A (en) | 1972-08-10 | 1973-08-09 | Method for treating niobium surfaces used in ac circuit applications |
| FR7329211A FR2328053A1 (fr) | 1972-08-10 | 1973-08-09 | Procede pour le traitement de surfaces de niobium pour des utilisations en courant alternatif |
| JP9047273A JPS5722993B2 (Direct) | 1972-08-10 | 1973-08-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2239425A DE2239425C3 (de) | 1972-08-10 | 1972-08-10 | Verfahren zur elektrolytischen Behandlung von Nioboberflächen für Wechselstromanwendungen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2239425A1 DE2239425A1 (de) | 1974-02-21 |
| DE2239425B2 DE2239425B2 (de) | 1977-09-01 |
| DE2239425C3 true DE2239425C3 (de) | 1978-04-20 |
Family
ID=5853260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2239425A Expired DE2239425C3 (de) | 1972-08-10 | 1972-08-10 | Verfahren zur elektrolytischen Behandlung von Nioboberflächen für Wechselstromanwendungen |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3902975A (Direct) |
| JP (1) | JPS5722993B2 (Direct) |
| CA (1) | CA1018473A (Direct) |
| CH (1) | CH577037A5 (Direct) |
| DE (1) | DE2239425C3 (Direct) |
| FR (1) | FR2328053A1 (Direct) |
| GB (1) | GB1405730A (Direct) |
| NL (1) | NL7311022A (Direct) |
| SE (1) | SE402133B (Direct) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2608089C3 (de) * | 1976-02-27 | 1979-03-15 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Herstellen einer supraleitfähigen Nb3 Sn-Schicht auf einer Nioboberfläche für Hochfrequenzanwendungen |
| DE2635741C2 (de) * | 1976-08-09 | 1978-10-19 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Herstellen einer supraleitfähigen Nb3 Sn-Schicht auf einer Nioboberfläche für Hochfrequenzanwendungen |
| DE2965863D1 (en) * | 1978-10-16 | 1983-08-18 | Imi Marston Ltd | Use of treated niobium or tantalum as a connector, such a connector and a cathodic protection system using such a connector |
| US4514254A (en) * | 1983-09-26 | 1985-04-30 | International Business Machines Corporation | Groundplane post-etch anodization |
| FR2601968B1 (fr) * | 1986-07-25 | 1989-04-14 | Interox Sa | Bains decapants et procede pour eliminer un revetement comprenant du niobium sur un substrat. |
| IT1311147B1 (it) * | 1999-11-04 | 2002-03-04 | Edk Res Ag | Macchina per pulizia localizzata con cella, elettrolitica e/o adultrasuoni, di decapaggio e/o lucidatura |
| DE10035949A1 (de) * | 2000-07-21 | 2002-02-07 | Knn Systemtechnik Gmbh | Verfahren und Vorrichtung zum Erzeugen elektromagnetischer Felder hoher Feldstärke und Feldstärkehomogenität |
| JP4947384B2 (ja) * | 2008-08-07 | 2012-06-06 | 大学共同利用機関法人 高エネルギー加速器研究機構 | 超伝導高周波加速空洞の製造方法 |
| CN103276433B (zh) * | 2013-04-10 | 2015-10-14 | 西南交通大学 | 一种纯金属铌片着全色的方法 |
| US11202362B1 (en) | 2018-02-15 | 2021-12-14 | Christopher Mark Rey | Superconducting resonant frequency cavities, related components, and fabrication methods thereof |
| US11464102B2 (en) | 2018-10-06 | 2022-10-04 | Fermi Research Alliance, Llc | Methods and systems for treatment of superconducting materials to improve low field performance |
| US11266005B2 (en) | 2019-02-07 | 2022-03-01 | Fermi Research Alliance, Llc | Methods for treating superconducting cavities |
| US11920253B2 (en) * | 2021-05-17 | 2024-03-05 | Jefferson Science Associates, Llc | Methods of controllable interstitial oxygen doping in niobium |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2744860A (en) * | 1951-11-13 | 1956-05-08 | Robert H Rines | Electroplating method |
| DE2106628C3 (de) * | 1971-02-12 | 1974-02-14 | Siemens Ag, 1000 Berlin U. 8000 Muenchen | Verfahren zur Oberflächenbehandlung von supraleitenden Niob-Hohlraumresonatoren |
-
1972
- 1972-08-10 DE DE2239425A patent/DE2239425C3/de not_active Expired
-
1973
- 1973-07-10 CH CH1006673A patent/CH577037A5/xx not_active IP Right Cessation
- 1973-08-07 US US386423A patent/US3902975A/en not_active Expired - Lifetime
- 1973-08-08 SE SE7310871A patent/SE402133B/xx unknown
- 1973-08-08 GB GB3766873A patent/GB1405730A/en not_active Expired
- 1973-08-09 NL NL7311022A patent/NL7311022A/xx not_active Application Discontinuation
- 1973-08-09 FR FR7329211A patent/FR2328053A1/fr active Granted
- 1973-08-09 CA CA178,395A patent/CA1018473A/en not_active Expired
- 1973-08-10 JP JP9047273A patent/JPS5722993B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL7311022A (Direct) | 1974-02-12 |
| US3902975A (en) | 1975-09-02 |
| JPS5722993B2 (Direct) | 1982-05-15 |
| CH577037A5 (Direct) | 1976-06-30 |
| FR2328053A1 (fr) | 1977-05-13 |
| SE402133B (sv) | 1978-06-19 |
| GB1405730A (en) | 1975-09-10 |
| DE2239425A1 (de) | 1974-02-21 |
| DE2239425B2 (de) | 1977-09-01 |
| CA1018473A (en) | 1977-10-04 |
| FR2328053B1 (Direct) | 1978-07-07 |
| JPS4986230A (Direct) | 1974-08-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8339 | Ceased/non-payment of the annual fee |