DE2212489C3 - Verfahren zur Herstellung eines Feldeffekttransistors - Google Patents

Verfahren zur Herstellung eines Feldeffekttransistors

Info

Publication number
DE2212489C3
DE2212489C3 DE2212489A DE2212489A DE2212489C3 DE 2212489 C3 DE2212489 C3 DE 2212489C3 DE 2212489 A DE2212489 A DE 2212489A DE 2212489 A DE2212489 A DE 2212489A DE 2212489 C3 DE2212489 C3 DE 2212489C3
Authority
DE
Germany
Prior art keywords
layer
semiconductor layer
control electrode
source
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2212489A
Other languages
German (de)
English (en)
Other versions
DE2212489A1 (de
DE2212489B2 (de
Inventor
James Clayton North
Bernard Roger Pruniaux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of DE2212489A1 publication Critical patent/DE2212489A1/de
Publication of DE2212489B2 publication Critical patent/DE2212489B2/de
Application granted granted Critical
Publication of DE2212489C3 publication Critical patent/DE2212489C3/de
Expired legal-status Critical Current

Links

Classifications

    • H10P34/40—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/68—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
    • H10P30/206—
    • H10P30/208—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/126—Power FETs

Landscapes

  • Junction Field-Effect Transistors (AREA)
DE2212489A 1971-03-18 1972-03-15 Verfahren zur Herstellung eines Feldeffekttransistors Expired DE2212489C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12552871A 1971-03-18 1971-03-18

Publications (3)

Publication Number Publication Date
DE2212489A1 DE2212489A1 (de) 1972-10-05
DE2212489B2 DE2212489B2 (de) 1974-01-17
DE2212489C3 true DE2212489C3 (de) 1974-08-15

Family

ID=22420128

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2212489A Expired DE2212489C3 (de) 1971-03-18 1972-03-15 Verfahren zur Herstellung eines Feldeffekttransistors

Country Status (8)

Country Link
US (1) US3700978A (enExample)
JP (1) JPS5225076B1 (enExample)
BE (1) BE780695A (enExample)
DE (1) DE2212489C3 (enExample)
FR (1) FR2130424B1 (enExample)
GB (1) GB1376492A (enExample)
IT (1) IT953974B (enExample)
NL (1) NL155399B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3971057A (en) * 1973-08-21 1976-07-20 The United States Of America As Represented By The Secretary Of The Navy Lateral photodetector of improved sensitivity
CA1049127A (en) * 1974-03-05 1979-02-20 Kunio Itoh Semiconductor devices with improved heat radiation and current concentration
US4252580A (en) * 1977-10-27 1981-02-24 Messick Louis J Method of producing a microwave InP/SiO2 insulated gate field effect transistor
US4194021A (en) * 1977-10-27 1980-03-18 The United States Of America As Represented By The Secretary Of The Navy Microwave InP/SiO2 insulated gate field effect transistor
US4161739A (en) * 1977-10-27 1979-07-17 The United States Of America As Represented By The Secretary Of The Navy Microwave InP/SiO2 insulated gate field effect transistor
US4160984A (en) * 1977-11-14 1979-07-10 Hughes Aircraft Company Schottky-gate field-effect transistor and fabrication process therefor
US4244097A (en) * 1979-03-15 1981-01-13 Hughes Aircraft Company Schottky-gate field-effect transistor and fabrication process therefor
NL8003336A (nl) * 1979-06-12 1980-12-16 Dearnaley G Werkwijze voor de vervaardiging van een halfgeleider- inrichting.
US5247349A (en) * 1982-11-16 1993-09-21 Stauffer Chemical Company Passivation and insulation of III-V devices with pnictides, particularly amorphous pnictides having a layer-like structure
US4567503A (en) * 1983-06-29 1986-01-28 Stauffer Chemical Company MIS Device employing elemental pnictide or polyphosphide insulating layers
JPH07118484B2 (ja) * 1987-10-09 1995-12-18 沖電気工業株式会社 ショットキーゲート電界効果トランジスタの製造方法
JPH05299433A (ja) * 1992-04-24 1993-11-12 Toshiba Corp ヘテロ接合バイポーラトランジスタ

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484662A (en) * 1965-01-15 1969-12-16 North American Rockwell Thin film transistor on an insulating substrate
GB1140579A (en) * 1966-08-19 1969-01-22 Standard Telephones Cables Ltd Method of making semiconductor devices and devices made thereby
DE1564177A1 (de) * 1966-09-03 1969-12-18 Ibm Deutschland Verfahren zur Herstellung von Halbleiterbauelementen
FR1563533A (enExample) * 1967-05-20 1969-04-11
GB1233545A (enExample) * 1967-08-18 1971-05-26
US3483443A (en) * 1967-09-28 1969-12-09 Hughes Aircraft Co Diode having large capacitance change related to minimal applied voltage
US3563809A (en) * 1968-08-05 1971-02-16 Hughes Aircraft Co Method of making semiconductor devices with ion beams

Also Published As

Publication number Publication date
JPS5225076B1 (enExample) 1977-07-05
FR2130424B1 (enExample) 1974-09-13
GB1376492A (en) 1974-12-04
FR2130424A1 (enExample) 1972-11-03
IT953974B (it) 1973-08-10
BE780695A (fr) 1972-07-03
NL155399B (nl) 1977-12-15
DE2212489A1 (de) 1972-10-05
US3700978A (en) 1972-10-24
DE2212489B2 (de) 1974-01-17
NL7203614A (enExample) 1972-09-20

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E77 Valid patent as to the heymanns-index 1977
EHJ Ceased/non-payment of the annual fee