DE102018004630A1 - 1Heizeinrichtung unter Verwendung eines Hyperhitzebeschleunigers und Verfahren zu deren Herstellung - Google Patents

1Heizeinrichtung unter Verwendung eines Hyperhitzebeschleunigers und Verfahren zu deren Herstellung Download PDF

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Publication number
DE102018004630A1
DE102018004630A1 DE102018004630.4A DE102018004630A DE102018004630A1 DE 102018004630 A1 DE102018004630 A1 DE 102018004630A1 DE 102018004630 A DE102018004630 A DE 102018004630A DE 102018004630 A1 DE102018004630 A1 DE 102018004630A1
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Germany
Prior art keywords
accelerator
metal oxide
hyperheat
points
substrate
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Withdrawn
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DE102018004630.4A
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German (de)
English (en)
Inventor
Ji Hun Park
Seung Yeon Lee
Seong Hwan Lim
Hye Jin Kim
Yeo Jo YOON
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IM Co Ltd
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IM Co Ltd
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
    • H05B3/86—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields the heating conductors being embedded in the transparent or reflecting material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
    • C09K5/02—Materials undergoing a change of physical state when used
    • C09K5/04—Materials undergoing a change of physical state when used the change of state being from liquid to vapour or vice versa
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/50—Constructional details
    • H04N23/52—Elements optimising image sensor operation, e.g. for electromagnetic interference [EMI] protection or temperature control by heat transfer or cooling elements
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/50—Constructional details
    • H04N23/55—Optical parts specially adapted for electronic image sensors; Mounting thereof
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/57—Mechanical or electrical details of cameras or camera modules specially adapted for being embedded in other devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
    • H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/16—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being mounted on an insulating base
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/009—Heaters using conductive material in contact with opposing surfaces of the resistive element or resistive layer
    • H05B2203/01—Heaters comprising a particular structure with multiple layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2214/00—Aspects relating to resistive heating, induction heating and heating using microwaves, covered by groups H05B3/00, H05B6/00
    • H05B2214/02—Heaters specially designed for de-icing or protection against icing
DE102018004630.4A 2018-04-12 2018-06-11 1Heizeinrichtung unter Verwendung eines Hyperhitzebeschleunigers und Verfahren zu deren Herstellung Withdrawn DE102018004630A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2018-0042904 2018-04-12
KR1020180042904A KR102058865B1 (ko) 2018-04-12 2018-04-12 초가속 열소재를 이용한 발열 디바이스 및 이의 제조방법

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DE102018004630A1 true DE102018004630A1 (de) 2019-10-17

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Country Status (7)

Country Link
US (1) US11647568B2 (zh)
EP (1) EP3554191B1 (zh)
JP (1) JP6698749B2 (zh)
KR (1) KR102058865B1 (zh)
CN (1) CN110381617B (zh)
DE (1) DE102018004630A1 (zh)
RU (1) RU2700975C1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102293252B1 (ko) * 2019-12-09 2021-08-25 주식회사 아이엠첨단소재 선박용 항해등 및 이를 위한 제어보드

Citations (2)

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Publication number Priority date Publication date Assignee Title
KR20170021088A (ko) 2015-08-17 2017-02-27 엘지이노텍 주식회사 카메라 모듈
KR20180042904A (ko) 2016-10-19 2018-04-27 삼성전자주식회사 방사 부재를 포함하는 전자 장치

Family Cites Families (99)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710074A (en) * 1970-10-08 1973-01-09 Ppg Industries Inc Electrically heated multiple glazed window having an iridescence masking film
GB2061075B (en) * 1979-10-11 1983-08-10 Tdk Electronics Co Ltd Ptc heating apparatus
US5780313A (en) * 1985-02-14 1998-07-14 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating semiconductor device
JPS61111939A (ja) * 1984-11-02 1986-05-30 Nippon Sheet Glass Co Ltd 板ガラス
JPS6289873A (ja) * 1985-10-14 1987-04-24 Semiconductor Energy Lab Co Ltd 透明導電膜形成方法
ATE78718T1 (de) 1987-12-17 1992-08-15 Uop Inc Dehydrierungskatalysatorteilchen mit schichtstruktur.
US4908330A (en) * 1988-02-01 1990-03-13 Canon Kabushiki Kaisha Process for the formation of a functional deposited film containing group IV atoms or silicon atoms and group IV atoms by microwave plasma chemical vapor deposition process
US4920254A (en) * 1988-02-22 1990-04-24 Sierracin Corporation Electrically conductive window and a method for its manufacture
US4922024A (en) * 1988-04-14 1990-05-01 The Dow Chemical Company Amination process employing group vib metal catalysts
US4941929A (en) * 1989-08-24 1990-07-17 E. I. Du Pont De Nemours And Company Solder paste formulation containing stannous fluoride
US5506037A (en) * 1989-12-09 1996-04-09 Saint Gobain Vitrage International Heat-reflecting and/or electrically heatable laminated glass pane
US5229205A (en) * 1990-12-20 1993-07-20 Ford Motor Company Laminated glazing unit having improved interfacial adhesion
US5069968A (en) * 1990-12-20 1991-12-03 Ford Motor Company Laminated glazing unit having improved interfacial adhesion
JPH07295409A (ja) * 1994-04-25 1995-11-10 Canon Inc 加熱定着装置及びその製造方法
US5582770A (en) * 1994-06-08 1996-12-10 Raychem Corporation Conductive polymer composition
KR0150721B1 (ko) * 1995-04-07 1998-12-15 이진주 고전기저항 투명 발열 도전막의 제조방법 및 장치
DE69635908T2 (de) * 1995-08-03 2006-11-23 Ngk Insulators, Ltd., Nagoya Gesinterte Aluminiumnitridkörper und deren Verwendung als Subtrat in einer Vorrichtung zur Herstellung von Halbleitern
JP3220635B2 (ja) * 1996-02-09 2001-10-22 松下電器産業株式会社 はんだ合金及びクリームはんだ
US5935340A (en) * 1996-11-13 1999-08-10 Applied Materials, Inc. Method and apparatus for gettering fluorine from chamber material surfaces
AU751092B2 (en) 1997-06-18 2002-08-08 Massachusetts Institute Of Technology Controlled conversion of metal oxyfluorides into superconducting oxides
DE19844046C2 (de) * 1998-09-25 2001-08-23 Schott Glas Mehrscheibenisolierglas
US6512203B2 (en) * 1999-05-06 2003-01-28 Polymore Circuit Technologies Polymer thick film heating element on a glass substrate
US6204480B1 (en) * 2000-02-01 2001-03-20 Southwall Technologies, Inc. Vacuum deposition of bus bars onto conductive transparent films
JP2001242726A (ja) * 2000-02-25 2001-09-07 Toshiba Lighting & Technology Corp 定着ヒータおよび画像形成装置
US6625875B2 (en) * 2001-03-26 2003-09-30 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) Method of attaching bus bars to a conductive coating for a heatable vehicle window
US20070111094A1 (en) * 2001-08-31 2007-05-17 Thackeray Michael M Synthesis of intermetallic negative electrodes for lithium cells and batteries
US7514654B2 (en) * 2002-03-11 2009-04-07 Nippon Sheet Glass Company, Limited Glass article with metal member joined thereto, and junction structure using the same
AU2003290791A1 (en) 2002-11-14 2004-06-15 Donnelly Corporation Imaging system for vehicle
JP4441211B2 (ja) * 2003-08-13 2010-03-31 シチズン電子株式会社 小型撮像モジュール
JP2007504615A (ja) 2003-09-05 2007-03-01 キタイ，エイドリアン 球支持薄膜蛍光体エレクトロルミネセンス素子
US20050067681A1 (en) * 2003-09-26 2005-03-31 Tessera, Inc. Package having integral lens and wafer-scale fabrication method therefor
KR101100625B1 (ko) * 2003-10-02 2012-01-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 배선 기판 및 그 제조방법, 및 박막트랜지스터 및 그제조방법
JP2005281726A (ja) 2004-03-26 2005-10-13 Ntt Afty Corp プラズマ成膜方法及びその装置
US7632713B2 (en) * 2004-04-27 2009-12-15 Aptina Imaging Corporation Methods of packaging microelectronic imaging devices
US20060042076A1 (en) 2004-08-24 2006-03-02 Fry's Metals, Inc. Bus bar system for heatable glass
FR2875669B1 (fr) 2004-09-17 2007-07-06 Saint Gobain Structure chauffante electrique
US20060154425A1 (en) * 2005-01-10 2006-07-13 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device and method for fabricating the same
US20070272827A1 (en) * 2005-04-27 2007-11-29 Amkor Technology, Inc. Image sensor package having mount holder attached to image sensor die
WO2007000981A1 (ja) * 2005-06-29 2007-01-04 Matsushita Electric Industrial Co., Ltd. 便座装置およびそれを備えるトイレ装置
KR20070096303A (ko) * 2006-03-23 2007-10-02 엘지이노텍 주식회사 카메라 모듈용 인쇄회로기판 및 그 제조 방법
US8658309B2 (en) * 2006-08-11 2014-02-25 California Institute Of Technology Dissociating agents, formulations and methods providing enhanced solubility of fluorides
JP2008141037A (ja) 2006-12-04 2008-06-19 Fujifilm Corp 固体撮像装置
JP5405729B2 (ja) * 2007-03-12 2014-02-05 パナソニック株式会社 便座装置
CN101286520A (zh) * 2007-04-10 2008-10-15 鸿富锦精密工业（深圳）有限公司 影像感测晶片封装结构及其封装方法
CN101285921A (zh) * 2007-04-13 2008-10-15 鸿富锦精密工业（深圳）有限公司 成像模组
KR100909970B1 (ko) * 2007-11-01 2009-07-29 삼성전자주식회사 카메라 모듈
KR100959922B1 (ko) * 2007-11-20 2010-05-26 삼성전자주식회사 카메라 모듈 및 그 제조방법
US8110884B2 (en) * 2007-12-18 2012-02-07 Micron Technology, Inc. Methods of packaging imager devices and optics modules, and resulting assemblies
DE202008017848U1 (de) * 2008-04-10 2010-09-23 Saint-Gobain Sekurit Deutschland Gmbh & Co. Kg Transparente Scheibe mit einer beheizbaren Beschichtung und niederohmigen leitenden Schichten
JP5425459B2 (ja) * 2008-05-19 2014-02-26 富士フイルム株式会社 導電性フイルム及び透明発熱体
KR20090129927A (ko) * 2008-06-13 2009-12-17 주식회사 엘지화학 발열체 및 이의 제조방법
US10412788B2 (en) * 2008-06-13 2019-09-10 Lg Chem, Ltd. Heating element and manufacturing method thereof
JP5021842B2 (ja) * 2008-06-13 2012-09-12 エルジー・ケム・リミテッド 発熱体およびその製造方法
JP5478126B2 (ja) * 2008-06-25 2014-04-23 富士フイルム株式会社 導電膜形成用感光材料、導電性材料及びエレクトロルミネッセンス素子
US8048708B2 (en) * 2008-06-25 2011-11-01 Micron Technology, Inc. Method and apparatus providing an imager module with a permanent carrier
US9012073B2 (en) * 2008-11-11 2015-04-21 Envia Systems, Inc. Composite compositions, negative electrodes with composite compositions and corresponding batteries
TWI386970B (zh) * 2008-11-18 2013-02-21 Ind Tech Res Inst 應用氣態硫化物之發光裝置
JP2010153963A (ja) 2008-12-24 2010-07-08 Nikon Corp 冷却カメラ
DE102009012003A1 (de) * 2009-02-26 2010-09-02 Basf Se Schutzbeschichtung für metallische Oberflächen und ihre Herstellung
JP5375219B2 (ja) * 2009-03-11 2013-12-25 富士通セミコンダクター株式会社 撮像装置
TWI372558B (en) * 2009-04-08 2012-09-11 Flexible thin image-sensing module with anti-emi function and flexible thin pcb module with anti-emi function
EP2278851B1 (de) * 2009-07-24 2013-05-29 THERM-IC Products GmbH Nfg. & Co. KG Elektrisch beheizbare Glasscheibe, Verfahren zu deren Herstellung sowie Fenster
JP2011066560A (ja) 2009-09-15 2011-03-31 Sharp Corp カメラモジュールおよび電子情報機器
JP2012049493A (ja) * 2010-01-29 2012-03-08 Nitto Denko Corp 撮像部品
FR2956556B1 (fr) 2010-02-17 2012-02-03 Saint Gobain Procede d'obtention d'un vitrage chauffant
US9085051B2 (en) * 2010-03-29 2015-07-21 Gaurdian Industries Corp. Fluorinated silver paste for forming electrical connections in highly dielectric films, and related products and methods
JP2013527561A (ja) * 2010-04-01 2013-06-27 エルジー・ケム・リミテッド 発熱体およびその製造方法
US9302451B2 (en) * 2010-05-10 2016-04-05 Saint-Gobain Glass France Transparent panel having heatable coating and production method therefor
KR20110127913A (ko) * 2010-05-20 2011-11-28 삼성전자주식회사 카메라 모듈
TW201210326A (en) * 2010-08-19 2012-03-01 Hon Hai Prec Ind Co Ltd Camera module and manufacturing method of the same
KR101605235B1 (ko) * 2010-09-09 2016-03-21 쌩-고벵 글래스 프랑스 가열가능 코팅을 갖는 투명 창유리
CN103098541B (zh) * 2010-09-14 2015-06-17 Lg化学株式会社 加热元件及其制造方法
US8492737B2 (en) * 2010-11-18 2013-07-23 The Arizona Board Of Regents On Behalf Of The University Of Arizona Tunable infrared emitter
WO2012096540A2 (ko) * 2011-01-13 2012-07-19 주식회사 엘지화학 발열체 및 이의 제조방법
WO2012096541A2 (ko) * 2011-01-13 2012-07-19 주식회사 엘지화학 발열체 및 이의 제조방법
JP5372986B2 (ja) * 2011-03-11 2013-12-18 シャープ株式会社 カメラモジュールおよびその製造方法
US8605211B2 (en) * 2011-04-28 2013-12-10 Apple Inc. Low rise camera module
US9755229B2 (en) * 2011-06-14 2017-09-05 Brookhaven Science Associates, Llc Intermetallic M—Sn5 (M=Fe, Cu, Co, Ni) compound and a method of synthesis thereof
TR201910764T4 (tr) * 2011-08-09 2019-08-21 Saint Gobain Elektrikli kontaklama bileşimleri, elektrikli kontaklama bileşimlerinin üretimine yönelik yöntem.
JP5529820B2 (ja) * 2011-09-22 2014-06-25 富士フイルム株式会社 暖房便座
JP5993725B2 (ja) 2012-05-18 2016-09-14 協立化学産業株式会社 光学部品の製造方法、接着組成物キット及びコーティング組成物
JPWO2014097943A1 (ja) 2012-12-18 2017-01-12 東レ株式会社 金属ドット基板および金属ドット基板の製造方法
KR20140105408A (ko) * 2013-02-22 2014-09-01 주식회사 엘지화학 발열체 및 이의 제조방법
US20160041312A1 (en) 2013-04-05 2016-02-11 Mitsubishi Rayon Co., Ltd. Optical film and surface light emitting body
JP6415111B2 (ja) * 2013-06-20 2018-10-31 キヤノン株式会社 プリント回路板、半導体装置の接合構造及びプリント回路板の製造方法
WO2015021177A1 (en) * 2013-08-06 2015-02-12 Massachusetts Institute Of Technology Production of non-sintered transition metal carbide nanoparticles
WO2015037182A1 (ja) 2013-09-10 2015-03-19 ロック技研工業株式会社 透明導電性基材及び透明導電性基材の製造方法
JP2015135932A (ja) 2014-01-20 2015-07-27 アイアールスペック株式会社 ペルチェ冷却型ｉｃパッケージ
JP5590259B1 (ja) 2014-01-28 2014-09-17 千住金属工業株式会社 Ｃｕ核ボール、はんだペーストおよびはんだ継手
JP2015182334A (ja) 2014-03-25 2015-10-22 東レ株式会社 金属ドット基板およびその製造方法
EP2950525B1 (en) 2014-05-28 2020-08-12 ams AG Semiconductor image sensor with integrated pixel heating and method of operating a semiconductor image sensor
KR101865441B1 (ko) * 2014-09-29 2018-06-07 주식회사 엘지화학 발열체 및 이의 제조방법
WO2016080406A1 (ja) * 2014-11-17 2016-05-26 大日本印刷株式会社 発熱板、導電性パターンシート、乗り物、及び、発熱板の製造方法
US10912155B2 (en) * 2014-11-17 2021-02-02 Dai Nippon Printing Co., Ltd. Heating plate, conductive pattern sheet, vehicle, and method of manufacturing heating plate
JP2018504749A (ja) * 2014-12-31 2018-02-15 コーロン インダストリーズ インク 透明面状発熱体
CN104822187A (zh) 2015-03-10 2015-08-05 宁波华尔克应用材料有限公司 一种挡风玻璃高效除霜雾镀膜及其制备方法和装置
WO2017205658A1 (en) 2016-05-25 2017-11-30 The Regents Of The University Of Colorado, A Body Corporate Atomic layer etching on microdevices and nanodevices
US10645760B2 (en) * 2017-05-16 2020-05-05 Murata Manufacturing Co., Ltd. Heater device and method for producing the same
WO2019108954A1 (en) * 2017-12-01 2019-06-06 Arizona Board Of Regents On Behalf Of Arizona State University Materials and methods relating to single molecule arrays

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170021088A (ko) 2015-08-17 2017-02-27 엘지이노텍 주식회사 카메라 모듈
KR20180042904A (ko) 2016-10-19 2018-04-27 삼성전자주식회사 방사 부재를 포함하는 전자 장치

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