DE1007773B - Verfahren zur Herstellung von N-abietylsubstituierten o-Chinondiaziden von Naphthalin- und Benzolsulfonsaeureamiden - Google Patents

Verfahren zur Herstellung von N-abietylsubstituierten o-Chinondiaziden von Naphthalin- und Benzolsulfonsaeureamiden

Info

Publication number
DE1007773B
DE1007773B DEG17709A DEG0017709A DE1007773B DE 1007773 B DE1007773 B DE 1007773B DE G17709 A DEG17709 A DE G17709A DE G0017709 A DEG0017709 A DE G0017709A DE 1007773 B DE1007773 B DE 1007773B
Authority
DE
Germany
Prior art keywords
diazo
oxo
abietyl
radical
dehydroabietyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DEG17709A
Other languages
German (de)
English (en)
Inventor
Ralph Gower Davies Moore
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Chemicals Corp
Original Assignee
General Aniline and Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Aniline and Film Corp filed Critical General Aniline and Film Corp
Publication of DE1007773B publication Critical patent/DE1007773B/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/26—Phenanthrenes; Hydrogenated phenanthrenes
DEG17709A 1954-08-20 1955-08-02 Verfahren zur Herstellung von N-abietylsubstituierten o-Chinondiaziden von Naphthalin- und Benzolsulfonsaeureamiden Pending DE1007773B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451294A US2797213A (en) 1954-08-20 1954-08-20 Rosin derivatives of diazonaphthol-and diazophenol-sulfonamides

Publications (1)

Publication Number Publication Date
DE1007773B true DE1007773B (de) 1957-05-09

Family

ID=23791634

Family Applications (1)

Application Number Title Priority Date Filing Date
DEG17709A Pending DE1007773B (de) 1954-08-20 1955-08-02 Verfahren zur Herstellung von N-abietylsubstituierten o-Chinondiaziden von Naphthalin- und Benzolsulfonsaeureamiden

Country Status (6)

Country Link
US (1) US2797213A (US08124317-20120228-C00026.png)
BE (1) BE539175A (US08124317-20120228-C00026.png)
CH (1) CH341071A (US08124317-20120228-C00026.png)
DE (1) DE1007773B (US08124317-20120228-C00026.png)
GB (1) GB787360A (US08124317-20120228-C00026.png)
NL (2) NL199484A (US08124317-20120228-C00026.png)

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CN101073036B (zh) 2004-12-09 2013-01-23 可隆株式会社 正型干膜光致抗蚀剂
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP5034269B2 (ja) 2005-03-31 2012-09-26 大日本印刷株式会社 パターン形成材料、及びポリイミド前駆体樹脂組成物
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KR101498315B1 (ko) 2007-08-10 2015-03-03 스미또모 베이크라이트 가부시키가이샤 포지티브형 감광성 수지 조성물, 경화막, 보호막, 절연막 및 반도체 장치
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KR101023089B1 (ko) * 2008-09-29 2011-03-24 제일모직주식회사 포지티브형 감광성 수지 조성물
JP5410918B2 (ja) * 2008-10-20 2014-02-05 チェイル インダストリーズ インコーポレイテッド ポジティブ型感光性樹脂組成物
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KR101400192B1 (ko) 2010-12-31 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101400186B1 (ko) 2010-12-31 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
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KR101423176B1 (ko) 2011-11-29 2014-07-25 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101413076B1 (ko) 2011-12-23 2014-06-30 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101432603B1 (ko) 2011-12-29 2014-08-21 제일모직주식회사 감광성 노볼락 수지, 이를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 이를 포함하는 반도체 소자
KR101413078B1 (ko) 2011-12-30 2014-07-02 제일모직 주식회사 포지티브형 감광성 수지 조성물
KR101423177B1 (ko) 2011-12-30 2014-07-29 제일모직 주식회사 포지티브형 감광성 수지 조성물
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法
KR20140086724A (ko) 2012-12-28 2014-07-08 제일모직주식회사 표시장치 절연막용 감광성 수지 조성물, 및 이를 이용한 표시장치 절연막 및 표시장치
KR101667787B1 (ko) 2013-08-13 2016-10-19 제일모직 주식회사 포지티브형 감광성 수지 조성물, 및 이를 이용한 감광성 수지막 및 표시 소자
KR101750463B1 (ko) 2013-11-26 2017-06-23 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자
KR101728820B1 (ko) 2013-12-12 2017-04-20 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자
JP6271105B1 (ja) 2016-03-31 2018-01-31 旭化成株式会社 感光性樹脂組成物、硬化レリーフパターンの製造方法及び半導体装置
CN113341651B (zh) * 2021-06-25 2023-08-25 北京北旭电子材料有限公司 一种光刻胶及图案化方法

Citations (3)

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Publication number Priority date Publication date Assignee Title
DE865410C (de) * 1943-07-10 1953-02-02 Kalle & Co Ag Lichtempfindliche Verbindungen fuer die Diazotypie
DE872154C (de) * 1950-12-23 1953-03-30 Kalle & Co Ag Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen
DE888204C (de) * 1949-07-23 1953-08-31 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen, und dafuer verwendbares lichtempfindliches Material

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
DE865410C (de) * 1943-07-10 1953-02-02 Kalle & Co Ag Lichtempfindliche Verbindungen fuer die Diazotypie
DE888204C (de) * 1949-07-23 1953-08-31 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen, und dafuer verwendbares lichtempfindliches Material
DE872154C (de) * 1950-12-23 1953-03-30 Kalle & Co Ag Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen

Also Published As

Publication number Publication date
NL199484A (US08124317-20120228-C00026.png)
NL95406C (US08124317-20120228-C00026.png)
BE539175A (US08124317-20120228-C00026.png)
CH341071A (de) 1959-09-15
GB787360A (en) 1957-12-04
US2797213A (en) 1957-06-25

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