DE69706396T2 - Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung - Google Patents

Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung

Info

Publication number
DE69706396T2
DE69706396T2 DE1997606396 DE69706396T DE69706396T2 DE 69706396 T2 DE69706396 T2 DE 69706396T2 DE 1997606396 DE1997606396 DE 1997606396 DE 69706396 T DE69706396 T DE 69706396T DE 69706396 T2 DE69706396 T2 DE 69706396T2
Authority
DE
Germany
Prior art keywords
imaging
resin composition
photosensitive resin
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1997606396
Other languages
English (en)
Other versions
DE69706396D1 (de
Inventor
Toshio Banba
Toshiro Takeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Application granted granted Critical
Publication of DE69706396D1 publication Critical patent/DE69706396D1/de
Publication of DE69706396T2 publication Critical patent/DE69706396T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
DE1997606396 1997-01-03 1997-01-03 Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung Expired - Fee Related DE69706396T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP19970100069 EP0852341B1 (de) 1997-01-03 1997-01-03 Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung

Publications (2)

Publication Number Publication Date
DE69706396D1 DE69706396D1 (de) 2001-10-04
DE69706396T2 true DE69706396T2 (de) 2002-04-18

Family

ID=8226350

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1997606396 Expired - Fee Related DE69706396T2 (de) 1997-01-03 1997-01-03 Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung

Country Status (2)

Country Link
EP (1) EP0852341B1 (de)
DE (1) DE69706396T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3190967B2 (ja) * 1996-12-16 2001-07-23 住友ベークライト株式会社 アルカリ性水溶液及び感光性樹脂組成物のパターン形成方法
TW200307856A (en) * 2002-05-07 2003-12-16 Shipley Co Llc Residue reducing stable concentrate
JP2019038192A (ja) * 2017-08-25 2019-03-14 花王株式会社 三次元物体前駆体処理剤組成物

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL95407C (de) 1954-08-20
BE539175A (de) 1954-08-20
US3669658A (en) 1969-06-11 1972-06-13 Fuji Photo Film Co Ltd Photosensitive printing plate
DE2931297A1 (de) 1979-08-01 1981-02-19 Siemens Ag Waermebestaendige positivresists und verfahren zur herstellung waermebestaendiger reliefstrukturen
EP0291779B1 (de) * 1987-05-18 1994-07-27 Siemens Aktiengesellschaft Wärmebeständige Positivresists und Verfahren zur Herstellung wärmebeständiger Reliefstrukturen
US4927736A (en) 1987-07-21 1990-05-22 Hoechst Celanese Corporation Hydroxy polyimides and high temperature positive photoresists therefrom
US5246818A (en) * 1989-08-16 1993-09-21 Hoechst Celanese Corporation Developer composition for positive working color proofing films
EP0459395B1 (de) * 1990-05-29 1999-08-18 Sumitomo Bakelite Company Limited Positiv arbeitende lichtempfindliche Harzzusammensetzung
US5260162A (en) * 1990-12-17 1993-11-09 Khanna Dinesh N Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers
JPH08123034A (ja) * 1994-10-19 1996-05-17 Sumitomo Bakelite Co Ltd ポジ型感光性樹脂組成物

Also Published As

Publication number Publication date
EP0852341A1 (de) 1998-07-08
EP0852341B1 (de) 2001-08-29
DE69706396D1 (de) 2001-10-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee