CH341071A - Verfahren zur Herstellung von Diazooxosulfonamiden - Google Patents

Verfahren zur Herstellung von Diazooxosulfonamiden

Info

Publication number
CH341071A
CH341071A CH341071DA CH341071A CH 341071 A CH341071 A CH 341071A CH 341071D A CH341071D A CH 341071DA CH 341071 A CH341071 A CH 341071A
Authority
CH
Switzerland
Prior art keywords
diazooxosulfonamides
Prior art date
Application number
Other languages
English (en)
Inventor
Davies Moore Ralph Gower
Original Assignee
Gen Aniline & Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US451294A priority Critical patent/US2797213A/en
Application filed by Gen Aniline & Film Corp filed Critical Gen Aniline & Film Corp
Publication of CH341071A publication Critical patent/CH341071A/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/02Ortho- or ortho- and peri-condensed systems
    • C07C2603/04Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/26Phenanthrenes; Hydrogenated phenanthrenes
CH341071D 1954-08-20 1955-08-17 Verfahren zur Herstellung von Diazooxosulfonamiden CH341071A (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US451294A US2797213A (en) 1954-08-20 1954-08-20 Rosin derivatives of diazonaphthol-and diazophenol-sulfonamides

Publications (1)

Publication Number Publication Date
CH341071A true CH341071A (de) 1959-09-15

Family

ID=23791634

Family Applications (1)

Application Number Title Priority Date Filing Date
CH341071D CH341071A (de) 1954-08-20 1955-08-17 Verfahren zur Herstellung von Diazooxosulfonamiden

Country Status (6)

Country Link
US (1) US2797213A (de)
BE (1) BE539175A (de)
CH (1) CH341071A (de)
DE (1) DE1007773B (de)
GB (1) GB787360A (de)
NL (2) NL95406C (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0369219A1 (de) * 1988-11-04 1990-05-23 Hoechst Aktiengesellschaft Neue, strahlungsempfindliche Verbindungen, hiermit hergestelltes strahlungsempfindliches Gemisch und Aufzeichnungsmaterial

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GB1116674A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Naphthoquinone diazide sulphofluoride
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US4024122A (en) * 1973-02-12 1977-05-17 Rca Corporation Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone)
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
US5853947A (en) * 1995-12-21 1998-12-29 Clariant Finance (Bvi) Limited Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
TW502135B (en) * 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
EP0852341B1 (de) 1997-01-03 2001-08-29 Sumitomo Bakelite Company Limited Verfahren zur Bebilderung einer photoempfindlichen Harzzusammensetzung
US7285422B1 (en) 1997-01-23 2007-10-23 Sequenom, Inc. Systems and methods for preparing and analyzing low volume analyte array elements
US6454789B1 (en) * 1999-01-15 2002-09-24 Light Science Corporation Patient portable device for photodynamic therapy
US6602274B1 (en) * 1999-01-15 2003-08-05 Light Sciences Corporation Targeted transcutaneous cancer therapy
US6511790B2 (en) 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
WO2002055199A2 (en) 2000-10-30 2002-07-18 Sequenom Inc Method and apparatus for delivery of submicroliter volumes onto a substrate
EP1331517B1 (de) * 2000-10-31 2010-08-18 Sumitomo Bakelite Co., Ltd. Positive lichtempfindliche harzzusammensetzung, prozess zu ihrer herstellung und halbleiterbauelemente
AT497882T (de) 2000-11-30 2011-02-15 Fujifilm Corp Flachdruckplattenvorläufer
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
EP2354854B2 (de) 2002-09-20 2016-04-06 FUJIFILM Corporation Verfahren zur Herstellung einer Flachdruckplatte
US6852465B2 (en) * 2003-03-21 2005-02-08 Clariant International Ltd. Photoresist composition for imaging thick films
EP2381308B1 (de) 2003-06-23 2015-07-29 Sumitomo Bakelite Co., Ltd. Positiv arbeitende lichtempfindliche Harzzusammensetzung, Verfahren zur Herstellung einer strukturgebildeten Harzschicht, Halbleiterbauelement, Anzeigevorrichtung und Verfahren zur Herstellung des Halbleiterbauelements und der Anzeigevorrichtung
US7416822B2 (en) * 2004-01-20 2008-08-26 Asahi Kasei Emd Corporation Resin and resin composition
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
CN101073036B (zh) 2004-12-09 2013-01-23 可隆株式会社 正型干膜光致抗蚀剂
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP5034269B2 (ja) 2005-03-31 2012-09-26 大日本印刷株式会社 パターン形成材料、及びポリイミド前駆体樹脂組成物
US20070105040A1 (en) * 2005-11-10 2007-05-10 Toukhy Medhat A Developable undercoating composition for thick photoresist layers
CN101322073B (zh) 2005-11-30 2011-12-28 住友电木株式会社 正型感光性树脂组合物及使用该组合物的半导体器件和显示器
JP5171628B2 (ja) 2006-08-15 2013-03-27 旭化成イーマテリアルズ株式会社 ポジ型感光性樹脂組成物
EP2196850B1 (de) 2007-08-10 2014-10-08 Sumitomo Bakelite Co., Ltd. Aus einer positiv arbeitenden lichtempfindlichen zusammensetzung erhaltener gehärteter film
WO2009039122A2 (en) 2007-09-17 2009-03-26 Sequenom, Inc. Integrated robotic sample transfer device
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
CN101855026A (zh) 2007-11-14 2010-10-06 富士胶片株式会社 干燥涂布膜的方法和制造平版印刷版前体的方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
KR101023089B1 (ko) * 2008-09-29 2011-03-24 제일모직주식회사 포지티브형 감광성 수지 조성물
JP5410918B2 (ja) * 2008-10-20 2014-02-05 チェイル インダストリーズ インコーポレイテッド ポジティブ型感光性樹脂組成物
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
WO2011037005A1 (ja) 2009-09-24 2011-03-31 富士フイルム株式会社 平版印刷版原版
KR101333698B1 (ko) * 2009-11-10 2013-11-27 제일모직주식회사 포지티브형 감광성 수지 조성물
KR101333704B1 (ko) * 2009-12-29 2013-11-27 제일모직주식회사 포지티브형 감광성 수지 조성물
KR20120066923A (ko) 2010-12-15 2012-06-25 삼성전자주식회사 신규 페놀 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물
KR101423539B1 (ko) 2010-12-20 2014-07-25 삼성전자 주식회사 포지티브형 감광성 수지 조성물
KR101400187B1 (ko) 2010-12-30 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101400192B1 (ko) 2010-12-31 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101400186B1 (ko) 2010-12-31 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
US20130108956A1 (en) 2011-11-01 2013-05-02 Az Electronic Materials Usa Corp. Nanocomposite positive photosensitive composition and use thereof
KR101423176B1 (ko) 2011-11-29 2014-07-25 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101413076B1 (ko) 2011-12-23 2014-06-30 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101432603B1 (ko) 2011-12-29 2014-08-21 제일모직주식회사 감광성 노볼락 수지, 이를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 이를 포함하는 반도체 소자
KR101413078B1 (ko) 2011-12-30 2014-07-02 제일모직 주식회사 포지티브형 감광성 수지 조성물
KR101423177B1 (ko) 2011-12-30 2014-07-29 제일모직 주식회사 포지티브형 감광성 수지 조성물
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法
KR20140086724A (ko) 2012-12-28 2014-07-08 제일모직주식회사 표시장치 절연막용 감광성 수지 조성물, 및 이를 이용한 표시장치 절연막 및 표시장치
KR101667787B1 (ko) 2013-08-13 2016-10-19 제일모직 주식회사 포지티브형 감광성 수지 조성물, 및 이를 이용한 감광성 수지막 및 표시 소자
KR101750463B1 (ko) 2013-11-26 2017-06-23 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자
KR101728820B1 (ko) 2013-12-12 2017-04-20 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자
WO2017170600A1 (ja) 2016-03-31 2017-10-05 旭化成株式会社 感光性樹脂組成物、硬化レリーフパターンの製造方法及び半導体装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE865410C (de) * 1943-07-10 1953-02-02 Kalle & Co Ag Lichtempfindliche Verbindungen fuer die Diazotypie
BE510151A (de) * 1949-07-23
DE872154C (de) * 1950-12-23 1953-03-30 Kalle & Co Ag Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0369219A1 (de) * 1988-11-04 1990-05-23 Hoechst Aktiengesellschaft Neue, strahlungsempfindliche Verbindungen, hiermit hergestelltes strahlungsempfindliches Gemisch und Aufzeichnungsmaterial
US5114816A (en) * 1988-11-04 1992-05-19 Hoechst Aktiengesellschaft Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material

Also Published As

Publication number Publication date
GB787360A (en) 1957-12-04
NL199484A (de)
US2797213A (en) 1957-06-25
BE539175A (de)
NL95406C (de)
DE1007773B (de) 1957-05-09

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