CN1929108A - 搬送室、基板处理装置和基板异常的检测方法 - Google Patents

搬送室、基板处理装置和基板异常的检测方法 Download PDF

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Publication number
CN1929108A
CN1929108A CNA2006101289601A CN200610128960A CN1929108A CN 1929108 A CN1929108 A CN 1929108A CN A2006101289601 A CNA2006101289601 A CN A2006101289601A CN 200610128960 A CN200610128960 A CN 200610128960A CN 1929108 A CN1929108 A CN 1929108A
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China
Prior art keywords
substrate
conveyance
room
carrying
carrying device
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Pending
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CNA2006101289601A
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English (en)
Chinese (zh)
Inventor
冈部星儿
末木英人
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication of CN1929108A publication Critical patent/CN1929108A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
CNA2006101289601A 2005-09-05 2006-09-05 搬送室、基板处理装置和基板异常的检测方法 Pending CN1929108A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005256468A JP4767632B2 (ja) 2005-09-05 2005-09-05 基板の異常検出方法
JP2005256468 2005-09-05

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201110201338XA Division CN102270594A (zh) 2005-09-05 2006-09-05 搬送室、基板处理装置和基板异常的检测方法

Publications (1)

Publication Number Publication Date
CN1929108A true CN1929108A (zh) 2007-03-14

Family

ID=37859000

Family Applications (2)

Application Number Title Priority Date Filing Date
CNA2006101289601A Pending CN1929108A (zh) 2005-09-05 2006-09-05 搬送室、基板处理装置和基板异常的检测方法
CN201110201338XA Pending CN102270594A (zh) 2005-09-05 2006-09-05 搬送室、基板处理装置和基板异常的检测方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201110201338XA Pending CN102270594A (zh) 2005-09-05 2006-09-05 搬送室、基板处理装置和基板异常的检测方法

Country Status (4)

Country Link
JP (1) JP4767632B2 (ko)
KR (1) KR100835022B1 (ko)
CN (2) CN1929108A (ko)
TW (1) TWI417986B (ko)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101826478A (zh) * 2010-03-30 2010-09-08 东莞宏威数码机械有限公司 缓冲传输装置
CN101447404B (zh) * 2007-11-30 2011-03-23 东京毅力科创株式会社 半导体制造装置中的地震受害扩散减轻方法和系统
CN101417747B (zh) * 2008-12-11 2011-11-23 友达光电股份有限公司 传送台机构
CN102347224A (zh) * 2010-08-02 2012-02-08 北京中科信电子装备有限公司 一种注入机用晶片缺口定位装置
CN101633441B (zh) * 2009-08-19 2012-05-23 友达光电股份有限公司 基板处理系统及其基板搬运装置
CN104272057A (zh) * 2012-02-13 2015-01-07 第一太阳能有限公司 使用红外探测的用于处理系统的原位基板探测
CN107942553A (zh) * 2018-01-02 2018-04-20 京东方科技集团股份有限公司 一种稳定装置及其工作方法、机械臂、显示面板生产设备
CN110267893A (zh) * 2017-02-09 2019-09-20 玻璃技术公司 用于在线测量玻璃板的光学特性的系统及相关方法
CN110767563A (zh) * 2019-10-25 2020-02-07 上海华力集成电路制造有限公司 检测晶圆完整性的方法、rtp机台
CN117096067A (zh) * 2023-10-17 2023-11-21 广州市艾佛光通科技有限公司 干法刻蚀机台及干法刻蚀方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007084124A1 (en) * 2006-01-18 2007-07-26 Applied Materials, Inc. Sensors for dynamically detecting substrate breakage and misalignment of a moving substrate
JP5013987B2 (ja) * 2007-06-22 2012-08-29 東京エレクトロン株式会社 基板処理装置および基板搬送装置
JP2010016340A (ja) * 2008-07-02 2010-01-21 Advanced Display Process Engineering Co Ltd 基板感知方法、基板処理装置及び基板処理方法
JP5185054B2 (ja) * 2008-10-10 2013-04-17 東京エレクトロン株式会社 基板搬送方法、制御プログラム及び記憶媒体
JP2011139074A (ja) * 2011-01-07 2011-07-14 Applied Materials Inc 基板の破損及び移動中の基板のずれを動的に検出するセンサ
JP2012238762A (ja) * 2011-05-12 2012-12-06 Tokyo Electron Ltd 基板搬送装置、これを備える塗布現像装置、及び基板搬送方法
JP5248662B2 (ja) * 2011-07-15 2013-07-31 シャープ株式会社 基板処理装置、および薄膜太陽電池の製造装置
KR101269856B1 (ko) * 2012-06-04 2013-06-07 엘아이지에이디피 주식회사 평판표시소자 제조장비의 기판 감지장치
CN102854301A (zh) * 2012-08-10 2013-01-02 江阴沐祥节能装饰工程有限公司 一种透明度检测装置
JP7263225B2 (ja) * 2019-12-12 2023-04-24 東京エレクトロン株式会社 搬送するシステム及び方法
KR102297045B1 (ko) * 2020-03-03 2021-09-02 주식회사 로스코 플립 유닛
CN114441556A (zh) * 2021-12-28 2022-05-06 蚌埠中光电科技有限公司 一种用于基板玻璃传输过程在线无损检知报警系统

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002093882A (ja) * 2000-09-20 2002-03-29 Olympus Optical Co Ltd 基板搬送装置及び基板検査システム
JP4060098B2 (ja) * 2002-03-14 2008-03-12 株式会社アルバック 真空処理装置およびゲートバルブ
JP4228634B2 (ja) * 2002-09-03 2009-02-25 東京エレクトロン株式会社 回転駆動機構及び被処理体の搬送装置
KR100510720B1 (ko) * 2002-10-25 2005-08-30 엘지.필립스 엘시디 주식회사 유리기판 파손감지 수단을 구비한 기판 이송장치

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101447404B (zh) * 2007-11-30 2011-03-23 东京毅力科创株式会社 半导体制造装置中的地震受害扩散减轻方法和系统
CN101417747B (zh) * 2008-12-11 2011-11-23 友达光电股份有限公司 传送台机构
CN101633441B (zh) * 2009-08-19 2012-05-23 友达光电股份有限公司 基板处理系统及其基板搬运装置
CN101826478A (zh) * 2010-03-30 2010-09-08 东莞宏威数码机械有限公司 缓冲传输装置
CN101826478B (zh) * 2010-03-30 2012-06-20 东莞宏威数码机械有限公司 缓冲传输装置
CN102347224A (zh) * 2010-08-02 2012-02-08 北京中科信电子装备有限公司 一种注入机用晶片缺口定位装置
CN102347224B (zh) * 2010-08-02 2015-08-26 北京中科信电子装备有限公司 一种注入机用晶片缺口定位装置
CN104272057A (zh) * 2012-02-13 2015-01-07 第一太阳能有限公司 使用红外探测的用于处理系统的原位基板探测
CN110267893B (zh) * 2017-02-09 2022-05-13 玻璃技术公司 用于在线测量玻璃板的光学特性的系统及相关方法
CN110267893A (zh) * 2017-02-09 2019-09-20 玻璃技术公司 用于在线测量玻璃板的光学特性的系统及相关方法
CN107942553B (zh) * 2018-01-02 2020-05-22 京东方科技集团股份有限公司 一种稳定装置及其工作方法、机械臂、显示面板生产设备
CN107942553A (zh) * 2018-01-02 2018-04-20 京东方科技集团股份有限公司 一种稳定装置及其工作方法、机械臂、显示面板生产设备
CN110767563A (zh) * 2019-10-25 2020-02-07 上海华力集成电路制造有限公司 检测晶圆完整性的方法、rtp机台
CN110767563B (zh) * 2019-10-25 2022-05-27 上海华力集成电路制造有限公司 检测晶圆完整性的方法、rtp机台
CN117096067A (zh) * 2023-10-17 2023-11-21 广州市艾佛光通科技有限公司 干法刻蚀机台及干法刻蚀方法
CN117096067B (zh) * 2023-10-17 2024-03-01 广州市艾佛光通科技有限公司 干法刻蚀机台及干法刻蚀方法

Also Published As

Publication number Publication date
KR100835022B1 (ko) 2008-06-03
CN102270594A (zh) 2011-12-07
KR20070026263A (ko) 2007-03-08
TW200715460A (en) 2007-04-16
JP4767632B2 (ja) 2011-09-07
JP2007073599A (ja) 2007-03-22
TWI417986B (zh) 2013-12-01

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Application publication date: 20070314