CN101826478B - 缓冲传输装置 - Google Patents
缓冲传输装置 Download PDFInfo
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- CN101826478B CN101826478B CN2010101393762A CN201010139376A CN101826478B CN 101826478 B CN101826478 B CN 101826478B CN 2010101393762 A CN2010101393762 A CN 2010101393762A CN 201010139376 A CN201010139376 A CN 201010139376A CN 101826478 B CN101826478 B CN 101826478B
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- 230000005540 biological transmission Effects 0.000 title claims abstract description 31
- 230000003139 buffering effect Effects 0.000 title claims abstract description 24
- 238000005259 measurement Methods 0.000 claims abstract description 6
- 230000008676 import Effects 0.000 claims description 9
- 238000012958 reprocessing Methods 0.000 claims description 7
- 238000002203 pretreatment Methods 0.000 claims description 6
- 230000009467 reduction Effects 0.000 abstract description 3
- 238000010924 continuous production Methods 0.000 abstract 1
- 238000012864 cross contamination Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
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Application Number | Priority Date | Filing Date | Title |
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CN2010101393762A CN101826478B (zh) | 2010-03-30 | 2010-03-30 | 缓冲传输装置 |
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Application Number | Priority Date | Filing Date | Title |
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CN2010101393762A CN101826478B (zh) | 2010-03-30 | 2010-03-30 | 缓冲传输装置 |
Publications (2)
Publication Number | Publication Date |
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CN101826478A CN101826478A (zh) | 2010-09-08 |
CN101826478B true CN101826478B (zh) | 2012-06-20 |
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CN2010101393762A Expired - Fee Related CN101826478B (zh) | 2010-03-30 | 2010-03-30 | 缓冲传输装置 |
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Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101988191B (zh) * | 2010-12-01 | 2012-05-16 | 东莞宏威数码机械有限公司 | 基板卸载装置及卸载方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004299850A (ja) * | 2003-03-31 | 2004-10-28 | Dainippon Printing Co Ltd | 処理方法及び処理装置 |
CN1929108A (zh) * | 2005-09-05 | 2007-03-14 | 东京毅力科创株式会社 | 搬送室、基板处理装置和基板异常的检测方法 |
CN201638797U (zh) * | 2010-03-30 | 2010-11-17 | 东莞宏威数码机械有限公司 | 缓冲装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4298025B2 (ja) * | 1998-03-25 | 2009-07-15 | シーケーディ株式会社 | 真空圧力制御システム |
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2010
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004299850A (ja) * | 2003-03-31 | 2004-10-28 | Dainippon Printing Co Ltd | 処理方法及び処理装置 |
CN1929108A (zh) * | 2005-09-05 | 2007-03-14 | 东京毅力科创株式会社 | 搬送室、基板处理装置和基板异常的检测方法 |
CN201638797U (zh) * | 2010-03-30 | 2010-11-17 | 东莞宏威数码机械有限公司 | 缓冲装置 |
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CN101826478A (zh) | 2010-09-08 |
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