CN1269812C - 锍盐及其制法和其作为辐射可固化体系的光引发剂的应用 - Google Patents

锍盐及其制法和其作为辐射可固化体系的光引发剂的应用 Download PDF

Info

Publication number
CN1269812C
CN1269812C CNB028145038A CN02814503A CN1269812C CN 1269812 C CN1269812 C CN 1269812C CN B028145038 A CNB028145038 A CN B028145038A CN 02814503 A CN02814503 A CN 02814503A CN 1269812 C CN1269812 C CN 1269812C
Authority
CN
China
Prior art keywords
ether
radiation curable
salt
thianthrene
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB028145038A
Other languages
English (en)
Chinese (zh)
Other versions
CN1533386A (zh
Inventor
G·诺西尼
A·卡沙拉西
M·维斯康蒂
G·里巴西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lamberti SpA
Original Assignee
Lamberti SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IT2001MI001543A external-priority patent/ITMI20011543A1/it
Priority claimed from IT2001MI001544A external-priority patent/ITMI20011544A1/it
Application filed by Lamberti SpA filed Critical Lamberti SpA
Publication of CN1533386A publication Critical patent/CN1533386A/zh
Application granted granted Critical
Publication of CN1269812C publication Critical patent/CN1269812C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/08—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16—Oxygen atoms, e.g. thioxanthones
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Epoxy Resins (AREA)
CNB028145038A 2001-07-19 2002-07-04 锍盐及其制法和其作为辐射可固化体系的光引发剂的应用 Expired - Fee Related CN1269812C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
IT2001MI001543A ITMI20011543A1 (it) 2001-07-19 2001-07-19 Sali di solfonio processo di preparazione e loro impiego come fotoiniziatori di composizioni polimerizzabili mediante radizioni elettromagne
ITMI01A001543 2001-07-19
IT2001MI001544A ITMI20011544A1 (it) 2001-07-19 2001-07-19 Sali di solfonio processo di preparazione e loro impiego come fotoinziatori di composizioni polimerizzabili meidante radiazioni elettromagne
ITMI01A001544 2001-07-19

Publications (2)

Publication Number Publication Date
CN1533386A CN1533386A (zh) 2004-09-29
CN1269812C true CN1269812C (zh) 2006-08-16

Family

ID=26332781

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB028145038A Expired - Fee Related CN1269812C (zh) 2001-07-19 2002-07-04 锍盐及其制法和其作为辐射可固化体系的光引发剂的应用

Country Status (12)

Country Link
US (1) US7230121B2 (enExample)
EP (1) EP1417198B1 (enExample)
JP (1) JP4480393B2 (enExample)
KR (1) KR100918556B1 (enExample)
CN (1) CN1269812C (enExample)
AT (1) ATE438638T1 (enExample)
AU (1) AU2002331332A1 (enExample)
BR (1) BR0205767B1 (enExample)
CA (1) CA2452566C (enExample)
DE (1) DE60233234D1 (enExample)
ES (1) ES2329345T3 (enExample)
WO (1) WO2003008404A2 (enExample)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4701231B2 (ja) * 2002-02-13 2011-06-15 富士フイルム株式会社 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
GB0204468D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel thioxanthone derivatives, and their use as cationic photoinitiators
GB0204467D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
EP1504306A1 (en) * 2002-05-16 2005-02-09 Rensselaer Polytechnic Institute Photopolymerizable compositions comprising thianthrenium salts as cationic photoinitiators
KR101197539B1 (ko) * 2003-11-04 2012-11-12 헨켈 아게 운트 코. 카게아아 술포늄염 광개시제 및 그의 용도
US7230122B2 (en) 2003-11-04 2007-06-12 National Starch And Chemical Investment Holding Corporation Sulfonium salt photinitiators and use thereof
JP2005263897A (ja) * 2004-03-17 2005-09-29 Konica Minolta Medical & Graphic Inc インクジェット用インク組成物及び画像形成方法
JP2008506826A (ja) * 2004-07-21 2008-03-06 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 光活性化方法及び逆転した２段階工程による触媒の使用
JP4439409B2 (ja) * 2005-02-02 2010-03-24 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP4677353B2 (ja) * 2005-02-18 2011-04-27 富士フイルム株式会社 レジスト組成物、該レジスト組成物に用いる化合物及び該レジスト組成物を用いたパターン形成方法
US7541131B2 (en) * 2005-02-18 2009-06-02 Fujifilm Corporation Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
JP4505357B2 (ja) * 2005-03-16 2010-07-21 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
DE602006015319D1 (de) * 2005-07-01 2010-08-19 Basf Se Sulfoniumsalzinitiatoren
JP4792299B2 (ja) * 2006-02-07 2011-10-12 富士フイルム株式会社 新規なスルホニウム化合物、該化合物を含有する感光性組成物及び該感光性組成物を用いたパターン形成方法
JP2007254454A (ja) * 2006-02-23 2007-10-04 Fujifilm Corp スルホニウム塩、硬化性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP5313873B2 (ja) 2006-04-13 2013-10-09 チバ ホールディング インコーポレーテッド スルホニウム塩開始剤
EP2125713B1 (en) 2006-10-04 2012-04-18 Basf Se Sulphonium salt photoinitiators
JP4936848B2 (ja) * 2006-10-16 2012-05-23 旭化成イーマテリアルズ株式会社 感光性樹脂組成物およびその積層体
CN101558110B (zh) * 2006-10-24 2012-06-13 西巴控股有限公司 热稳定的可阳离子光固化组合物
RU2330033C1 (ru) * 2007-01-09 2008-07-27 Новосибирский институт органической химии им. Н.Н. Ворожцова СО РАН (НИОХ СО РАН) Гексафторфосфат 2-(2-тозил-2-метилпропионил)-9-оксо-10-(4-гептилоксифенил)-9н-тиоксантения как инициатор фотополимеризации непредельных соединений
US7488568B2 (en) * 2007-04-09 2009-02-10 Tokyo Ohka Kogyo Co., Ltd. Resist composition, method of forming resist pattern, compound and acid generator
JP4866790B2 (ja) * 2007-05-23 2012-02-01 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
JP5066405B2 (ja) * 2007-08-02 2012-11-07 富士フイルム株式会社 電子線、ｘ線又はｅｕｖ用レジスト組成物及び該組成物を用いたパターン形成方法
EP2197839B1 (en) 2007-10-10 2013-01-02 Basf Se Sulphonium salt initiators
JP5473921B2 (ja) 2007-10-10 2014-04-16 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
JP5570424B2 (ja) 2007-10-10 2014-08-13 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
US9005871B2 (en) 2008-10-20 2015-04-14 Basf Se Sulfonium derivatives and the use therof as latent acids
JP2010235911A (ja) 2009-03-11 2010-10-21 Konica Minolta Ij Technologies Inc 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物
JP5964007B2 (ja) 2009-04-02 2016-08-03 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
DE102018131513A1 (de) 2018-12-10 2020-06-10 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Kationisch härtbare Masse und Verfahren zum Fügen, Vergießen und Beschichten von Substraten unter Verwendung der Masse
CN118271281A (zh) * 2022-12-30 2024-07-02 常州强力电子新材料股份有限公司 一种噻吨硫鎓盐光引发剂及其制备方法和应用
GB2640960A (en) 2024-05-10 2025-11-12 Henkel Ag & Co Kgaa Debonding of a cured composition

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4161478A (en) * 1974-05-02 1979-07-17 General Electric Company Photoinitiators
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
JPH04161478A (ja) * 1990-10-26 1992-06-04 Matsushita Electric Works Ltd 蓄熱体
TW237466B (enExample) 1992-07-21 1995-01-01 Giba Gerigy Ag
US5731364A (en) * 1996-01-24 1998-03-24 Shipley Company, L.L.C. Photoimageable compositions comprising multiple arylsulfonium photoactive compounds
DE69800164T2 (de) 1997-03-31 2000-10-05 Fuji Photo Film Co., Ltd. Positiv-arbeitende photoempfindliche Zusammensetzung
GB0204467D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators

Also Published As

Publication number Publication date
AU2002331332A1 (en) 2003-03-03
US7230121B2 (en) 2007-06-12
ES2329345T3 (es) 2009-11-25
WO2003008404A2 (en) 2003-01-30
KR100918556B1 (ko) 2009-09-21
BR0205767A (pt) 2003-08-12
CA2452566A1 (en) 2003-01-30
CA2452566C (en) 2011-08-23
EP1417198A2 (en) 2004-05-12
JP2005501040A (ja) 2005-01-13
KR20040015008A (ko) 2004-02-18
CN1533386A (zh) 2004-09-29
ATE438638T1 (de) 2009-08-15
BR0205767B1 (pt) 2013-10-15
DE60233234D1 (en) 2009-09-17
US20040242901A1 (en) 2004-12-02
JP4480393B2 (ja) 2010-06-16
EP1417198B1 (en) 2009-08-05
WO2003008404A3 (en) 2003-08-28

Similar Documents

Publication Publication Date Title
CN1269812C (zh) 锍盐及其制法和其作为辐射可固化体系的光引发剂的应用
CN1177346A (zh) 含有碳氟化合物阴离子的可用能量活化的盐
CN1157359C (zh) 非挥发性苯基乙醛酸酯
CN1086399C (zh) 由α-氨基苯乙酮光致生成胺
CN1198831C (zh) 有机金属单酰基烷基膦化合物
CN1622943A (zh) 含杂环鎓盐
CN101065388A (zh) 制备酰基磷烷及其衍生物的方法
CN1211439C (zh) 采用表面活性的光致引发剂的涂料的制备方法
CN1656127A (zh) 硫醇化合物、光聚合引发剂组合物和光敏组合物
CN1914560A (zh) 功能化学引发剂
CN1708488A (zh) 光引发剂的贮存稳定性的改善
CN1302799A (zh) 锍盐化合物
CN1859893A (zh) 具有三芳基锍离子和芳基亚磺酸盐离子的光敏引发剂
CN1701067A (zh) 新型噻吨酮衍生物及其作为阳离子光固引发剂的应用
CN1788045A (zh) 光固化且稳定的涂层
CN1177818C (zh) 生产鎓盐衍生物的方法、和新的鎓盐衍生物
CN1642992A (zh) 光引发剂,新型化合物的光固化性组合物
CN1045795A (zh) 聚合反应引发剂
CN1860134A (zh) 聚合反应用的引发剂体系中的芳基亚磺酸盐
CN1324037C (zh) 单酰基和二酰基氧化膦的多聚体形式
CN1578766A (zh) 杂化鎓盐
CN1832912A (zh) 用于制备高厚度涂层的透明的光可聚合体系
CN1637052A (zh) 铳盐光敏引发剂及其用途
CN1133631C (zh) 环氧丙烯酸酯及其制备方法和用途
CN1934098A (zh) 高纯度脂环式环氧化合物、其制备方法、可固化环氧树脂组合物、其固化产物及其应用

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060816

Termination date: 20210704