BR0205767B1 - Sais de sulfônio, composições curáveis por radiação, formulações líquidas, e, método para a preparação dos sais de sulfônio - Google Patents
Sais de sulfônio, composições curáveis por radiação, formulações líquidas, e, método para a preparação dos sais de sulfônioInfo
- Publication number
- BR0205767B1 BR0205767B1 BRPI0205767-0B1A BR0205767A BR0205767B1 BR 0205767 B1 BR0205767 B1 BR 0205767B1 BR 0205767 A BR0205767 A BR 0205767A BR 0205767 B1 BR0205767 B1 BR 0205767B1
- Authority
- BR
- Brazil
- Prior art keywords
- sulfonium salts
- preparation
- radiation curable
- curable compositions
- liquid formulations
- Prior art date
Links
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 239000000203 mixture Substances 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 title abstract 2
- 239000012669 liquid formulation Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
- C07D339/08—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/76—Dibenzothiophenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
- C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
- C07D335/16—Oxygen atoms, e.g. thioxanthones
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerization Catalysts (AREA)
- Polymerisation Methods In General (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT2001MI001543A ITMI20011543A1 (it) | 2001-07-19 | 2001-07-19 | Sali di solfonio processo di preparazione e loro impiego come fotoiniziatori di composizioni polimerizzabili mediante radizioni elettromagne |
| IT2001MI001544A ITMI20011544A1 (it) | 2001-07-19 | 2001-07-19 | Sali di solfonio processo di preparazione e loro impiego come fotoinziatori di composizioni polimerizzabili meidante radiazioni elettromagne |
| PCT/EP2002/007415 WO2003008404A2 (en) | 2001-07-19 | 2002-07-04 | Sulfonium salts as phtoinitiators for radiation curable systems |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR0205767A BR0205767A (pt) | 2003-08-12 |
| BR0205767B1 true BR0205767B1 (pt) | 2013-10-15 |
Family
ID=26332781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0205767-0B1A BR0205767B1 (pt) | 2001-07-19 | 2002-07-04 | Sais de sulfônio, composições curáveis por radiação, formulações líquidas, e, método para a preparação dos sais de sulfônio |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US7230121B2 (enExample) |
| EP (1) | EP1417198B1 (enExample) |
| JP (1) | JP4480393B2 (enExample) |
| KR (1) | KR100918556B1 (enExample) |
| CN (1) | CN1269812C (enExample) |
| AT (1) | ATE438638T1 (enExample) |
| AU (1) | AU2002331332A1 (enExample) |
| BR (1) | BR0205767B1 (enExample) |
| CA (1) | CA2452566C (enExample) |
| DE (1) | DE60233234D1 (enExample) |
| ES (1) | ES2329345T3 (enExample) |
| WO (1) | WO2003008404A2 (enExample) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4701231B2 (ja) * | 2002-02-13 | 2011-06-15 | 富士フイルム株式会社 | 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法 |
| GB0204467D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
| GB0204468D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel thioxanthone derivatives, and their use as cationic photoinitiators |
| CA2485516A1 (en) * | 2002-05-16 | 2003-11-27 | Rensselaer Polytechnic Institute | Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators |
| US7230122B2 (en) | 2003-11-04 | 2007-06-12 | National Starch And Chemical Investment Holding Corporation | Sulfonium salt photinitiators and use thereof |
| KR101197539B1 (ko) | 2003-11-04 | 2012-11-12 | 헨켈 아게 운트 코. 카게아아 | 술포늄염 광개시제 및 그의 용도 |
| JP2005263897A (ja) * | 2004-03-17 | 2005-09-29 | Konica Minolta Medical & Graphic Inc | インクジェット用インク組成物及び画像形成方法 |
| EP1789188A2 (en) * | 2004-07-21 | 2007-05-30 | CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| JP4439409B2 (ja) * | 2005-02-02 | 2010-03-24 | 富士フイルム株式会社 | レジスト組成物及びそれを用いたパターン形成方法 |
| JP4677353B2 (ja) * | 2005-02-18 | 2011-04-27 | 富士フイルム株式会社 | レジスト組成物、該レジスト組成物に用いる化合物及び該レジスト組成物を用いたパターン形成方法 |
| US7541131B2 (en) * | 2005-02-18 | 2009-06-02 | Fujifilm Corporation | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition |
| JP4505357B2 (ja) * | 2005-03-16 | 2010-07-21 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| ATE473209T1 (de) * | 2005-07-01 | 2010-07-15 | Basf Se | Sulfoniumsalzinitiatoren |
| JP4792299B2 (ja) | 2006-02-07 | 2011-10-12 | 富士フイルム株式会社 | 新規なスルホニウム化合物、該化合物を含有する感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| JP2007254454A (ja) * | 2006-02-23 | 2007-10-04 | Fujifilm Corp | スルホニウム塩、硬化性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版 |
| JP5313873B2 (ja) * | 2006-04-13 | 2013-10-09 | チバ ホールディング インコーポレーテッド | スルホニウム塩開始剤 |
| US8012672B2 (en) | 2006-10-04 | 2011-09-06 | Basf Se | Sulphonium salt photoinitiators |
| JP4936848B2 (ja) * | 2006-10-16 | 2012-05-23 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物およびその積層体 |
| CN101558110B (zh) | 2006-10-24 | 2012-06-13 | 西巴控股有限公司 | 热稳定的可阳离子光固化组合物 |
| RU2330033C1 (ru) * | 2007-01-09 | 2008-07-27 | Новосибирский институт органической химии им. Н.Н. Ворожцова СО РАН (НИОХ СО РАН) | Гексафторфосфат 2-(2-тозил-2-метилпропионил)-9-оксо-10-(4-гептилоксифенил)-9н-тиоксантения как инициатор фотополимеризации непредельных соединений |
| US7488568B2 (en) * | 2007-04-09 | 2009-02-10 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound and acid generator |
| JP4866790B2 (ja) * | 2007-05-23 | 2012-02-01 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
| JP5066405B2 (ja) * | 2007-08-02 | 2012-11-07 | 富士フイルム株式会社 | 電子線、ｘ線又はｅｕｖ用レジスト組成物及び該組成物を用いたパターン形成方法 |
| WO2009047105A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| CN102026967B (zh) | 2007-10-10 | 2013-09-18 | 巴斯夫欧洲公司 | 锍盐引发剂 |
| WO2009047151A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| WO2010046240A1 (en) | 2008-10-20 | 2010-04-29 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
| JP2010235911A (ja) | 2009-03-11 | 2010-10-21 | Konica Minolta Ij Technologies Inc | 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物 |
| JP5964007B2 (ja) | 2009-04-02 | 2016-08-03 | コニカミノルタ株式会社 | 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物 |
| DE102016111590A1 (de) | 2016-06-24 | 2017-12-28 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse |
| DE102017126215A1 (de) | 2017-11-09 | 2019-05-09 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren |
| DE102018127854A1 (de) | 2018-11-08 | 2020-05-14 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse |
| DE102018131513A1 (de) | 2018-12-10 | 2020-06-10 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Kationisch härtbare Masse und Verfahren zum Fügen, Vergießen und Beschichten von Substraten unter Verwendung der Masse |
| CN118271281A (zh) * | 2022-12-30 | 2024-07-02 | 常州强力电子新材料股份有限公司 | 一种噻吨硫鎓盐光引发剂及其制备方法和应用 |
| GB2640960A (en) | 2024-05-10 | 2025-11-12 | Henkel Ag & Co Kgaa | Debonding of a cured composition |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4161478A (en) * | 1974-05-02 | 1979-07-17 | General Electric Company | Photoinitiators |
| JPS61190524A (ja) | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
| JPH04161478A (ja) * | 1990-10-26 | 1992-06-04 | Matsushita Electric Works Ltd | 蓄熱体 |
| TW237466B (enExample) | 1992-07-21 | 1995-01-01 | Giba Gerigy Ag | |
| US5731364A (en) * | 1996-01-24 | 1998-03-24 | Shipley Company, L.L.C. | Photoimageable compositions comprising multiple arylsulfonium photoactive compounds |
| EP0869393B1 (en) | 1997-03-31 | 2000-05-31 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| GB0204467D0 (en) * | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
-
2002
- 2002-07-04 AT AT02767172T patent/ATE438638T1/de not_active IP Right Cessation
- 2002-07-04 AU AU2002331332A patent/AU2002331332A1/en not_active Abandoned
- 2002-07-04 WO PCT/EP2002/007415 patent/WO2003008404A2/en not_active Ceased
- 2002-07-04 US US10/484,358 patent/US7230121B2/en not_active Expired - Lifetime
- 2002-07-04 DE DE60233234T patent/DE60233234D1/de not_active Expired - Lifetime
- 2002-07-04 CN CNB028145038A patent/CN1269812C/zh not_active Expired - Fee Related
- 2002-07-04 BR BRPI0205767-0B1A patent/BR0205767B1/pt not_active IP Right Cessation
- 2002-07-04 JP JP2003513963A patent/JP4480393B2/ja not_active Expired - Lifetime
- 2002-07-04 KR KR1020037003928A patent/KR100918556B1/ko not_active Expired - Fee Related
- 2002-07-04 ES ES02767172T patent/ES2329345T3/es not_active Expired - Lifetime
- 2002-07-04 EP EP02767172A patent/EP1417198B1/en not_active Expired - Lifetime
- 2002-07-04 CA CA2452566A patent/CA2452566C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| BR0205767A (pt) | 2003-08-12 |
| CN1533386A (zh) | 2004-09-29 |
| JP4480393B2 (ja) | 2010-06-16 |
| US7230121B2 (en) | 2007-06-12 |
| EP1417198A2 (en) | 2004-05-12 |
| EP1417198B1 (en) | 2009-08-05 |
| AU2002331332A1 (en) | 2003-03-03 |
| WO2003008404A2 (en) | 2003-01-30 |
| JP2005501040A (ja) | 2005-01-13 |
| US20040242901A1 (en) | 2004-12-02 |
| CN1269812C (zh) | 2006-08-16 |
| KR20040015008A (ko) | 2004-02-18 |
| KR100918556B1 (ko) | 2009-09-21 |
| DE60233234D1 (en) | 2009-09-17 |
| CA2452566C (en) | 2011-08-23 |
| WO2003008404A3 (en) | 2003-08-28 |
| ES2329345T3 (es) | 2009-11-25 |
| ATE438638T1 (de) | 2009-08-15 |
| CA2452566A1 (en) | 2003-01-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 15/10/2013, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time | ||
| B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |