BR0205767A - Sais de sulfÈnio, composições curáveis por radiação, formulaçães lìquidas, e, método para a preparação dos sais de sulfÈnio - Google Patents

Sais de sulfÈnio, composições curáveis por radiação, formulaçães lìquidas, e, método para a preparação dos sais de sulfÈnio

Info

Publication number
BR0205767A
BR0205767A BR0205767-0A BR0205767A BR0205767A BR 0205767 A BR0205767 A BR 0205767A BR 0205767 A BR0205767 A BR 0205767A BR 0205767 A BR0205767 A BR 0205767A
Authority
BR
Brazil
Prior art keywords
sulfur salts
preparation
radiation curable
curable compositions
liquid formulations
Prior art date
Application number
BR0205767-0A
Other languages
English (en)
Other versions
BR0205767B1 (pt
Inventor
Gabriele Norcini
Angelo Casiraghi
Marco Visconti
Giuseppe Li Bassi
Original Assignee
Lamberti Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IT2001MI001544A external-priority patent/ITMI20011544A1/it
Priority claimed from IT2001MI001543A external-priority patent/ITMI20011543A1/it
Application filed by Lamberti Spa filed Critical Lamberti Spa
Publication of BR0205767A publication Critical patent/BR0205767A/pt
Publication of BR0205767B1 publication Critical patent/BR0205767B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/08—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16—Oxygen atoms, e.g. thioxanthones
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Epoxy Resins (AREA)

Abstract

"SAIS DE SULFÈNIO, COMPOSIçõES CURáVEIS POR RADIAçãO, FORMULAçõES LìQUIDAS, E, MéTODO PARA A PREPARAçãO DOS SAIS DE SULFÈNIO". A presente invenção refere-se a sais de sulfónio, a métodos para sua preparação e a composições curáveis por radiação contendo-os como fotoiniciadores.
BRPI0205767-0B1A 2001-07-19 2002-07-04 Sais de sulfônio, composições curáveis por radiação, formulações líquidas, e, método para a preparação dos sais de sulfônio BR0205767B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IT2001MI001544A ITMI20011544A1 (it) 2001-07-19 2001-07-19 Sali di solfonio processo di preparazione e loro impiego come fotoinziatori di composizioni polimerizzabili meidante radiazioni elettromagne
IT2001MI001543A ITMI20011543A1 (it) 2001-07-19 2001-07-19 Sali di solfonio processo di preparazione e loro impiego come fotoiniziatori di composizioni polimerizzabili mediante radizioni elettromagne
PCT/EP2002/007415 WO2003008404A2 (en) 2001-07-19 2002-07-04 Sulfonium salts as phtoinitiators for radiation curable systems

Publications (2)

Publication Number Publication Date
BR0205767A true BR0205767A (pt) 2003-08-12
BR0205767B1 BR0205767B1 (pt) 2013-10-15

Family

ID=26332781

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0205767-0B1A BR0205767B1 (pt) 2001-07-19 2002-07-04 Sais de sulfônio, composições curáveis por radiação, formulações líquidas, e, método para a preparação dos sais de sulfônio

Country Status (12)

Country Link
US (1) US7230121B2 (pt)
EP (1) EP1417198B1 (pt)
JP (1) JP4480393B2 (pt)
KR (1) KR100918556B1 (pt)
CN (1) CN1269812C (pt)
AT (1) ATE438638T1 (pt)
AU (1) AU2002331332A1 (pt)
BR (1) BR0205767B1 (pt)
CA (1) CA2452566C (pt)
DE (1) DE60233234D1 (pt)
ES (1) ES2329345T3 (pt)
WO (1) WO2003008404A2 (pt)

Families Citing this family (32)

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JP4701231B2 (ja) * 2002-02-13 2011-06-15 富士フイルム株式会社 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
GB0204468D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel thioxanthone derivatives, and their use as cationic photoinitiators
GB0204467D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
WO2003098347A1 (en) * 2002-05-16 2003-11-27 Rensselaer Polytechnic Institute Photopolymerizable compositions comprising thianthrenium salt cationic photoinitiators
US7230122B2 (en) 2003-11-04 2007-06-12 National Starch And Chemical Investment Holding Corporation Sulfonium salt photinitiators and use thereof
KR101197539B1 (ko) 2003-11-04 2012-11-12 헨켈 아게 운트 코. 카게아아 술포늄염 광개시제 및 그의 용도
JP2005263897A (ja) * 2004-03-17 2005-09-29 Konica Minolta Medical & Graphic Inc インクジェット用インク組成物及び画像形成方法
CN1988956B (zh) * 2004-07-21 2012-10-03 西巴特殊化学品控股有限公司 通过倒置的两阶段工序光活化催化剂的方法及其应用
JP4439409B2 (ja) * 2005-02-02 2010-03-24 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP4677353B2 (ja) * 2005-02-18 2011-04-27 富士フイルム株式会社 レジスト組成物、該レジスト組成物に用いる化合物及び該レジスト組成物を用いたパターン形成方法
US7541131B2 (en) * 2005-02-18 2009-06-02 Fujifilm Corporation Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
JP4505357B2 (ja) * 2005-03-16 2010-07-21 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
ATE473209T1 (de) 2005-07-01 2010-07-15 Basf Se Sulfoniumsalzinitiatoren
JP4792299B2 (ja) 2006-02-07 2011-10-12 富士フイルム株式会社 新規なスルホニウム化合物、該化合物を含有する感光性組成物及び該感光性組成物を用いたパターン形成方法
JP2007254454A (ja) * 2006-02-23 2007-10-04 Fujifilm Corp スルホニウム塩、硬化性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
WO2007118794A1 (en) 2006-04-13 2007-10-25 Ciba Holding Inc. Sulphonium salt initiators
EP2125713B1 (en) 2006-10-04 2012-04-18 Basf Se Sulphonium salt photoinitiators
JP4936848B2 (ja) * 2006-10-16 2012-05-23 旭化成イーマテリアルズ株式会社 感光性樹脂組成物およびその積層体
ES2603838T3 (es) * 2006-10-24 2017-03-01 Basf Se Composiciones fotocurables catiónicas térmicamente estables
US7488568B2 (en) * 2007-04-09 2009-02-10 Tokyo Ohka Kogyo Co., Ltd. Resist composition, method of forming resist pattern, compound and acid generator
JP4866790B2 (ja) * 2007-05-23 2012-02-01 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
JP5066405B2 (ja) * 2007-08-02 2012-11-07 富士フイルム株式会社 電子線、ｘ線又はｅｕｖ用レジスト組成物及び該組成物を用いたパターン形成方法
WO2009047152A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
JP5570424B2 (ja) 2007-10-10 2014-08-13 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
EP2197840B1 (en) 2007-10-10 2013-11-06 Basf Se Sulphonium salt initiators
KR101653427B1 (ko) 2008-10-20 2016-09-01 바스프 에스이 술포늄 유도체 및 잠재성 산으로서의 그의 용도
JP2010235911A (ja) 2009-03-11 2010-10-21 Konica Minolta Ij Technologies Inc 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物
JP5964007B2 (ja) 2009-04-02 2016-08-03 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
US20220064367A1 (en) 2018-12-10 2022-03-03 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Cationically curable composition and method for the joining, casting and coating of substrates using the composition

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4161478A (en) * 1974-05-02 1979-07-17 General Electric Company Photoinitiators
JPS61190524A (ja) 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
JPH04161478A (ja) * 1990-10-26 1992-06-04 Matsushita Electric Works Ltd 蓄熱体
TW237466B (pt) 1992-07-21 1995-01-01 Giba Gerigy Ag
US5731364A (en) 1996-01-24 1998-03-24 Shipley Company, L.L.C. Photoimageable compositions comprising multiple arylsulfonium photoactive compounds
EP0869393B1 (en) 1997-03-31 2000-05-31 Fuji Photo Film Co., Ltd. Positive photosensitive composition
GB0204467D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators

Also Published As

Publication number Publication date
JP2005501040A (ja) 2005-01-13
CA2452566A1 (en) 2003-01-30
CN1533386A (zh) 2004-09-29
CN1269812C (zh) 2006-08-16
AU2002331332A1 (en) 2003-03-03
KR20040015008A (ko) 2004-02-18
US7230121B2 (en) 2007-06-12
KR100918556B1 (ko) 2009-09-21
EP1417198B1 (en) 2009-08-05
BR0205767B1 (pt) 2013-10-15
JP4480393B2 (ja) 2010-06-16
WO2003008404A3 (en) 2003-08-28
ES2329345T3 (es) 2009-11-25
CA2452566C (en) 2011-08-23
US20040242901A1 (en) 2004-12-02
WO2003008404A2 (en) 2003-01-30
DE60233234D1 (en) 2009-09-17
ATE438638T1 (de) 2009-08-15
EP1417198A2 (en) 2004-05-12

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 15/10/2013, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time
B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)