ATE438638T1 - Sulfoniumsalze als photoinitiatoren für strahlungshärtbare systeme - Google Patents

Sulfoniumsalze als photoinitiatoren für strahlungshärtbare systeme

Info

Publication number
ATE438638T1
ATE438638T1 AT02767172T AT02767172T ATE438638T1 AT E438638 T1 ATE438638 T1 AT E438638T1 AT 02767172 T AT02767172 T AT 02767172T AT 02767172 T AT02767172 T AT 02767172T AT E438638 T1 ATE438638 T1 AT E438638T1
Authority
AT
Austria
Prior art keywords
photoinitiators
sulfonium salts
radiation curing
curing systems
systems
Prior art date
Application number
AT02767172T
Other languages
German (de)
English (en)
Inventor
Gabriele Norcini
Angelo Casiraghi
Marco Visconti
Bassi Giuseppe Li
Original Assignee
Lamberti Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IT2001MI001543A external-priority patent/ITMI20011543A1/it
Priority claimed from IT2001MI001544A external-priority patent/ITMI20011544A1/it
Application filed by Lamberti Spa filed Critical Lamberti Spa
Application granted granted Critical
Publication of ATE438638T1 publication Critical patent/ATE438638T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/08—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76—Dibenzothiophenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16—Oxygen atoms, e.g. thioxanthones
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Epoxy Resins (AREA)
AT02767172T 2001-07-19 2002-07-04 Sulfoniumsalze als photoinitiatoren für strahlungshärtbare systeme ATE438638T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IT2001MI001543A ITMI20011543A1 (it) 2001-07-19 2001-07-19 Sali di solfonio processo di preparazione e loro impiego come fotoiniziatori di composizioni polimerizzabili mediante radizioni elettromagne
IT2001MI001544A ITMI20011544A1 (it) 2001-07-19 2001-07-19 Sali di solfonio processo di preparazione e loro impiego come fotoinziatori di composizioni polimerizzabili meidante radiazioni elettromagne
PCT/EP2002/007415 WO2003008404A2 (en) 2001-07-19 2002-07-04 Sulfonium salts as phtoinitiators for radiation curable systems

Publications (1)

Publication Number Publication Date
ATE438638T1 true ATE438638T1 (de) 2009-08-15

Family

ID=26332781

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02767172T ATE438638T1 (de) 2001-07-19 2002-07-04 Sulfoniumsalze als photoinitiatoren für strahlungshärtbare systeme

Country Status (12)

Country Link
US (1) US7230121B2 (enExample)
EP (1) EP1417198B1 (enExample)
JP (1) JP4480393B2 (enExample)
KR (1) KR100918556B1 (enExample)
CN (1) CN1269812C (enExample)
AT (1) ATE438638T1 (enExample)
AU (1) AU2002331332A1 (enExample)
BR (1) BR0205767B1 (enExample)
CA (1) CA2452566C (enExample)
DE (1) DE60233234D1 (enExample)
ES (1) ES2329345T3 (enExample)
WO (1) WO2003008404A2 (enExample)

Families Citing this family (35)

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JP4701231B2 (ja) * 2002-02-13 2011-06-15 富士フイルム株式会社 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
GB0204468D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel thioxanthone derivatives, and their use as cationic photoinitiators
GB0204467D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
EP1504306A1 (en) * 2002-05-16 2005-02-09 Rensselaer Polytechnic Institute Photopolymerizable compositions comprising thianthrenium salts as cationic photoinitiators
KR101197539B1 (ko) * 2003-11-04 2012-11-12 헨켈 아게 운트 코. 카게아아 술포늄염 광개시제 및 그의 용도
US7230122B2 (en) 2003-11-04 2007-06-12 National Starch And Chemical Investment Holding Corporation Sulfonium salt photinitiators and use thereof
JP2005263897A (ja) * 2004-03-17 2005-09-29 Konica Minolta Medical & Graphic Inc インクジェット用インク組成物及び画像形成方法
JP2008506826A (ja) * 2004-07-21 2008-03-06 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 光活性化方法及び逆転した２段階工程による触媒の使用
JP4439409B2 (ja) * 2005-02-02 2010-03-24 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP4677353B2 (ja) * 2005-02-18 2011-04-27 富士フイルム株式会社 レジスト組成物、該レジスト組成物に用いる化合物及び該レジスト組成物を用いたパターン形成方法
US7541131B2 (en) * 2005-02-18 2009-06-02 Fujifilm Corporation Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
JP4505357B2 (ja) * 2005-03-16 2010-07-21 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
DE602006015319D1 (de) * 2005-07-01 2010-08-19 Basf Se Sulfoniumsalzinitiatoren
JP4792299B2 (ja) * 2006-02-07 2011-10-12 富士フイルム株式会社 新規なスルホニウム化合物、該化合物を含有する感光性組成物及び該感光性組成物を用いたパターン形成方法
JP2007254454A (ja) * 2006-02-23 2007-10-04 Fujifilm Corp スルホニウム塩、硬化性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP5313873B2 (ja) 2006-04-13 2013-10-09 チバ ホールディング インコーポレーテッド スルホニウム塩開始剤
EP2125713B1 (en) 2006-10-04 2012-04-18 Basf Se Sulphonium salt photoinitiators
JP4936848B2 (ja) * 2006-10-16 2012-05-23 旭化成イーマテリアルズ株式会社 感光性樹脂組成物およびその積層体
CN101558110B (zh) * 2006-10-24 2012-06-13 西巴控股有限公司 热稳定的可阳离子光固化组合物
RU2330033C1 (ru) * 2007-01-09 2008-07-27 Новосибирский институт органической химии им. Н.Н. Ворожцова СО РАН (НИОХ СО РАН) Гексафторфосфат 2-(2-тозил-2-метилпропионил)-9-оксо-10-(4-гептилоксифенил)-9н-тиоксантения как инициатор фотополимеризации непредельных соединений
US7488568B2 (en) * 2007-04-09 2009-02-10 Tokyo Ohka Kogyo Co., Ltd. Resist composition, method of forming resist pattern, compound and acid generator
JP4866790B2 (ja) * 2007-05-23 2012-02-01 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
JP5066405B2 (ja) * 2007-08-02 2012-11-07 富士フイルム株式会社 電子線、ｘ線又はｅｕｖ用レジスト組成物及び該組成物を用いたパターン形成方法
EP2197839B1 (en) 2007-10-10 2013-01-02 Basf Se Sulphonium salt initiators
JP5473921B2 (ja) 2007-10-10 2014-04-16 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
JP5570424B2 (ja) 2007-10-10 2014-08-13 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
US9005871B2 (en) 2008-10-20 2015-04-14 Basf Se Sulfonium derivatives and the use therof as latent acids
JP2010235911A (ja) 2009-03-11 2010-10-21 Konica Minolta Ij Technologies Inc 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物
JP5964007B2 (ja) 2009-04-02 2016-08-03 コニカミノルタ株式会社 活性エネルギー線硬化型インクジェットインク、インクジェット記録方法及び印刷物
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
DE102018131513A1 (de) 2018-12-10 2020-06-10 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Kationisch härtbare Masse und Verfahren zum Fügen, Vergießen und Beschichten von Substraten unter Verwendung der Masse
CN118271281A (zh) * 2022-12-30 2024-07-02 常州强力电子新材料股份有限公司 一种噻吨硫鎓盐光引发剂及其制备方法和应用
GB2640960A (en) 2024-05-10 2025-11-12 Henkel Ag & Co Kgaa Debonding of a cured composition

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4161478A (en) * 1974-05-02 1979-07-17 General Electric Company Photoinitiators
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
JPH04161478A (ja) * 1990-10-26 1992-06-04 Matsushita Electric Works Ltd 蓄熱体
TW237466B (enExample) 1992-07-21 1995-01-01 Giba Gerigy Ag
US5731364A (en) * 1996-01-24 1998-03-24 Shipley Company, L.L.C. Photoimageable compositions comprising multiple arylsulfonium photoactive compounds
DE69800164T2 (de) 1997-03-31 2000-10-05 Fuji Photo Film Co., Ltd. Positiv-arbeitende photoempfindliche Zusammensetzung
GB0204467D0 (en) * 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators

Also Published As

Publication number Publication date
AU2002331332A1 (en) 2003-03-03
US7230121B2 (en) 2007-06-12
ES2329345T3 (es) 2009-11-25
WO2003008404A2 (en) 2003-01-30
KR100918556B1 (ko) 2009-09-21
BR0205767A (pt) 2003-08-12
CA2452566A1 (en) 2003-01-30
CA2452566C (en) 2011-08-23
EP1417198A2 (en) 2004-05-12
JP2005501040A (ja) 2005-01-13
KR20040015008A (ko) 2004-02-18
CN1533386A (zh) 2004-09-29
BR0205767B1 (pt) 2013-10-15
DE60233234D1 (en) 2009-09-17
CN1269812C (zh) 2006-08-16
US20040242901A1 (en) 2004-12-02
JP4480393B2 (ja) 2010-06-16
EP1417198B1 (en) 2009-08-05
WO2003008404A3 (en) 2003-08-28

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