CN1262888C - 基片处理装置、液处理装置和液处理方法 - Google Patents

基片处理装置、液处理装置和液处理方法 Download PDF

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Publication number
CN1262888C
CN1262888C CNB02141002XA CN02141002A CN1262888C CN 1262888 C CN1262888 C CN 1262888C CN B02141002X A CNB02141002X A CN B02141002XA CN 02141002 A CN02141002 A CN 02141002A CN 1262888 C CN1262888 C CN 1262888C
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CN
China
Prior art keywords
substrate
treating fluid
liquid
transmission
developer solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB02141002XA
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English (en)
Chinese (zh)
Other versions
CN1392454A (zh
Inventor
立山清久
元田公男
佐田彻也
宫崎一仁
筱木武虎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2001184717A external-priority patent/JP3916891B2/ja
Priority claimed from JP2001204170A external-priority patent/JP3704064B2/ja
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of CN1392454A publication Critical patent/CN1392454A/zh
Application granted granted Critical
Publication of CN1262888C publication Critical patent/CN1262888C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
CNB02141002XA 2001-06-19 2002-06-19 基片处理装置、液处理装置和液处理方法 Expired - Fee Related CN1262888C (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2001184717A JP3916891B2 (ja) 2001-06-19 2001-06-19 基板処理装置及び現像処理装置
JP184717/2001 2001-06-19
JP184717/01 2001-06-19
JP2001204170A JP3704064B2 (ja) 2001-07-05 2001-07-05 液処理装置および液処理方法
JP204170/2001 2001-07-05
JP204170/01 2001-07-05

Publications (2)

Publication Number Publication Date
CN1392454A CN1392454A (zh) 2003-01-22
CN1262888C true CN1262888C (zh) 2006-07-05

Family

ID=26617183

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB02141002XA Expired - Fee Related CN1262888C (zh) 2001-06-19 2002-06-19 基片处理装置、液处理装置和液处理方法

Country Status (3)

Country Link
KR (1) KR100869553B1 (ko)
CN (1) CN1262888C (ko)
TW (1) TW569288B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103534787A (zh) * 2011-05-13 2014-01-22 株式会社尼康 基板的更换装置
TWI453848B (zh) * 2006-07-24 2014-09-21 Shibaura Mechatronics Corp 基板處理裝置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2264534B1 (en) * 2003-07-28 2013-07-17 Nikon Corporation Exposure apparatus, method for producing device, and method for controlling exposure apparatus
JP2006019525A (ja) * 2004-07-01 2006-01-19 Future Vision:Kk 基板処理装置
JP4410063B2 (ja) * 2004-09-06 2010-02-03 東京エレクトロン株式会社 基板処理装置
JP4634265B2 (ja) * 2005-09-27 2011-02-16 東京エレクトロン株式会社 塗布方法及び塗布装置
JP2007134487A (ja) * 2005-11-10 2007-05-31 Tokyo Ohka Kogyo Co Ltd 塗布装置
KR100701082B1 (ko) * 2005-12-02 2007-03-29 세메스 주식회사 기판 처리 장치 및 방법
KR101335302B1 (ko) * 2006-11-10 2013-12-03 엘아이지에이디피 주식회사 리프트 핀 구동장치 및 이를 구비한 평판표시소자 제조장치
TWI462215B (zh) * 2010-03-29 2014-11-21 Dainippon Screen Mfg 基板處理裝置、轉換方法、及轉移方法
CN103206591B (zh) * 2012-01-11 2016-10-05 昆山允升吉光电科技有限公司 电动载物台定位方法
CN103324038A (zh) 2013-06-25 2013-09-25 京东方科技集团股份有限公司 一种显影装置及显影方法
TWI479166B (zh) * 2013-07-19 2015-04-01 Hon Hai Prec Ind Co Ltd 產品斷差檢測系統、裝置及方法
CN104347352B (zh) * 2013-07-31 2018-05-29 细美事有限公司 一种基板处理装置及基板处理方法
CN111897192B (zh) * 2020-08-25 2024-05-31 武汉市天胤机电设备有限公司 一种新型冲版机传动系统

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4022288B2 (ja) * 1997-09-02 2007-12-12 大日本スクリーン製造株式会社 基板処理装置
JPH11145109A (ja) * 1997-11-07 1999-05-28 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3586552B2 (ja) * 1998-01-29 2004-11-10 大日本スクリーン製造株式会社 基板処理装置
JP3865978B2 (ja) * 1999-09-28 2007-01-10 大日本スクリーン製造株式会社 基板処理装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI453848B (zh) * 2006-07-24 2014-09-21 Shibaura Mechatronics Corp 基板處理裝置
CN103534787A (zh) * 2011-05-13 2014-01-22 株式会社尼康 基板的更换装置
CN103534787B (zh) * 2011-05-13 2018-02-06 株式会社尼康 基板的更换装置

Also Published As

Publication number Publication date
TW569288B (en) 2004-01-01
KR20020097004A (ko) 2002-12-31
KR100869553B1 (ko) 2008-11-19
CN1392454A (zh) 2003-01-22

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Granted publication date: 20060705

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