CN1773674A - 基板处理装置以及基板处理方法 - Google Patents
基板处理装置以及基板处理方法 Download PDFInfo
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- CN1773674A CN1773674A CNA2005101204473A CN200510120447A CN1773674A CN 1773674 A CN1773674 A CN 1773674A CN A2005101204473 A CNA2005101204473 A CN A2005101204473A CN 200510120447 A CN200510120447 A CN 200510120447A CN 1773674 A CN1773674 A CN 1773674A
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Networks & Wireless Communication (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
Description
Claims (28)
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004326308 | 2004-11-10 | ||
JP2004326308 | 2004-11-10 | ||
JP2004-326308 | 2004-11-10 | ||
JP2005095786 | 2005-03-29 | ||
JP2005-095786 | 2005-03-29 | ||
JP2005095786 | 2005-03-29 | ||
JP2005216160 | 2005-07-26 | ||
JP2005216160A JP2006310724A (ja) | 2004-11-10 | 2005-07-26 | 基板処理装置および基板処理方法 |
JP2005-216160 | 2005-07-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1773674A true CN1773674A (zh) | 2006-05-17 |
CN1773674B CN1773674B (zh) | 2010-04-14 |
Family
ID=36459874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005101204473A Active CN1773674B (zh) | 2004-11-10 | 2005-11-10 | 基板处理装置以及基板处理方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7497633B2 (zh) |
JP (1) | JP2006310724A (zh) |
KR (1) | KR100758623B1 (zh) |
CN (1) | CN1773674B (zh) |
TW (1) | TWI299512B (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102160168B (zh) * | 2008-09-19 | 2013-11-13 | 细美事有限公司 | 衬底传输装置、具有其的衬底处理设备及使用该衬底传输装置的传输衬底的方法 |
CN104051562A (zh) * | 2013-03-13 | 2014-09-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 硅片表面处理装置 |
CN104425321A (zh) * | 2013-08-30 | 2015-03-18 | 细美事有限公司 | 基板处理装置以及方法、包括该装置的基板处理系统 |
CN108941061A (zh) * | 2018-05-18 | 2018-12-07 | 中国人民解放军国防科技大学 | 光学元件的定量化清洁装置及方法 |
CN109037103A (zh) * | 2018-07-23 | 2018-12-18 | 华进半导体封装先导技术研发中心有限公司 | 一种应用雾化法清洗晶圆表面的半导体设备与工艺 |
CN109037104A (zh) * | 2018-07-23 | 2018-12-18 | 华进半导体封装先导技术研发中心有限公司 | 半导体清洗设备及利用该设备清洗通孔的方法 |
CN109037105A (zh) * | 2018-07-23 | 2018-12-18 | 华进半导体封装先导技术研发中心有限公司 | 半导体清洗设备及利用该设备清洗助焊剂的方法 |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5008280B2 (ja) * | 2004-11-10 | 2012-08-22 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP5154008B2 (ja) * | 2004-11-10 | 2013-02-27 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP5154007B2 (ja) * | 2004-12-06 | 2013-02-27 | 株式会社Sokudo | 基板処理装置 |
JP5008268B2 (ja) * | 2004-12-06 | 2012-08-22 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP4794232B2 (ja) * | 2004-12-06 | 2011-10-19 | 株式会社Sokudo | 基板処理装置 |
JP4926433B2 (ja) * | 2004-12-06 | 2012-05-09 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP4514657B2 (ja) * | 2005-06-24 | 2010-07-28 | 株式会社Sokudo | 基板処理装置 |
US7766565B2 (en) * | 2005-07-01 | 2010-08-03 | Sokudo Co., Ltd. | Substrate drying apparatus, substrate cleaning apparatus and substrate processing system |
JP4761907B2 (ja) * | 2005-09-28 | 2011-08-31 | 株式会社Sokudo | 基板処理装置 |
JP2007173732A (ja) * | 2005-12-26 | 2007-07-05 | Sokudo:Kk | 基板処理装置 |
JP2007201078A (ja) * | 2006-01-25 | 2007-08-09 | Sokudo:Kk | 基板処理装置 |
JP5132108B2 (ja) | 2006-02-02 | 2013-01-30 | 株式会社Sokudo | 基板処理装置 |
JP4781834B2 (ja) * | 2006-02-07 | 2011-09-28 | 大日本スクリーン製造株式会社 | 現像装置および現像方法 |
JP4832201B2 (ja) * | 2006-07-24 | 2011-12-07 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP2008060302A (ja) * | 2006-08-31 | 2008-03-13 | Sokudo:Kk | 基板処理装置 |
JP5006122B2 (ja) | 2007-06-29 | 2012-08-22 | 株式会社Sokudo | 基板処理装置 |
JP5166802B2 (ja) * | 2007-09-13 | 2013-03-21 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP5128918B2 (ja) | 2007-11-30 | 2013-01-23 | 株式会社Sokudo | 基板処理装置 |
JP5318403B2 (ja) | 2007-11-30 | 2013-10-16 | 株式会社Sokudo | 基板処理装置 |
JP5160204B2 (ja) * | 2007-11-30 | 2013-03-13 | 株式会社Sokudo | 基板処理装置 |
KR100892756B1 (ko) * | 2007-12-27 | 2009-04-15 | 세메스 주식회사 | 기판 처리 장치 및 이를 이용한 기판 이송 방법 |
JP5001828B2 (ja) * | 2007-12-28 | 2012-08-15 | 株式会社Sokudo | 基板処理装置 |
JP5179170B2 (ja) * | 2007-12-28 | 2013-04-10 | 株式会社Sokudo | 基板処理装置 |
CN102050330B (zh) * | 2010-11-05 | 2013-02-06 | 深圳市华星光电技术有限公司 | 机械手臂及具有该机械手臂的搬运装置 |
SG11201609642QA (en) | 2014-06-16 | 2016-12-29 | Asml Netherlands Bv | Lithographic apparatus, method of transferring a substrate and device manufacturing method |
JP2021093396A (ja) * | 2019-12-06 | 2021-06-17 | 東京エレクトロン株式会社 | 基板処理装置、および基板処理方法 |
Family Cites Families (17)
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JPH06124873A (ja) * | 1992-10-09 | 1994-05-06 | Canon Inc | 液浸式投影露光装置 |
JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
TW385488B (en) * | 1997-08-15 | 2000-03-21 | Tokyo Electron Ltd | substrate processing device |
JPH11260686A (ja) * | 1998-03-11 | 1999-09-24 | Toshiba Corp | 露光方法 |
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
JP3625755B2 (ja) * | 2000-09-13 | 2005-03-02 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP4114737B2 (ja) | 2001-03-09 | 2008-07-09 | 東京エレクトロン株式会社 | 処理装置 |
JP3967618B2 (ja) * | 2001-04-17 | 2007-08-29 | 東京エレクトロン株式会社 | 基板の処理方法及び基板の処理システム |
JP3725809B2 (ja) * | 2001-09-19 | 2005-12-14 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP2003093943A (ja) * | 2001-09-26 | 2003-04-02 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
JP4342147B2 (ja) * | 2002-05-01 | 2009-10-14 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP4170864B2 (ja) * | 2003-02-03 | 2008-10-22 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理装置における基板搬送方法および基板処理方法 |
JP4397646B2 (ja) * | 2003-07-30 | 2010-01-13 | 東京エレクトロン株式会社 | 基板処理装置および基板処理方法 |
JP4194495B2 (ja) | 2004-01-07 | 2008-12-10 | 東京エレクトロン株式会社 | 塗布・現像装置 |
JP4220423B2 (ja) * | 2004-03-24 | 2009-02-04 | 株式会社東芝 | レジストパターン形成方法 |
JP4535489B2 (ja) | 2004-03-31 | 2010-09-01 | 東京エレクトロン株式会社 | 塗布・現像装置 |
KR20060039549A (ko) * | 2004-11-03 | 2006-05-09 | 삼성전자주식회사 | 반도체 제조용 인라인 설비 |
-
2005
- 2005-07-26 JP JP2005216160A patent/JP2006310724A/ja active Pending
- 2005-11-07 KR KR1020050106058A patent/KR100758623B1/ko active IP Right Grant
- 2005-11-08 TW TW094139080A patent/TWI299512B/zh active
- 2005-11-10 CN CN2005101204473A patent/CN1773674B/zh active Active
- 2005-11-10 US US11/273,440 patent/US7497633B2/en active Active
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102160168B (zh) * | 2008-09-19 | 2013-11-13 | 细美事有限公司 | 衬底传输装置、具有其的衬底处理设备及使用该衬底传输装置的传输衬底的方法 |
CN104051562A (zh) * | 2013-03-13 | 2014-09-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 硅片表面处理装置 |
CN104051562B (zh) * | 2013-03-13 | 2017-02-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 硅片表面处理装置 |
CN104425321A (zh) * | 2013-08-30 | 2015-03-18 | 细美事有限公司 | 基板处理装置以及方法、包括该装置的基板处理系统 |
CN104425321B (zh) * | 2013-08-30 | 2017-09-29 | 细美事有限公司 | 基板处理装置以及方法、包括该装置的基板处理系统 |
CN108941061A (zh) * | 2018-05-18 | 2018-12-07 | 中国人民解放军国防科技大学 | 光学元件的定量化清洁装置及方法 |
CN109037103A (zh) * | 2018-07-23 | 2018-12-18 | 华进半导体封装先导技术研发中心有限公司 | 一种应用雾化法清洗晶圆表面的半导体设备与工艺 |
CN109037104A (zh) * | 2018-07-23 | 2018-12-18 | 华进半导体封装先导技术研发中心有限公司 | 半导体清洗设备及利用该设备清洗通孔的方法 |
CN109037105A (zh) * | 2018-07-23 | 2018-12-18 | 华进半导体封装先导技术研发中心有限公司 | 半导体清洗设备及利用该设备清洗助焊剂的方法 |
WO2020019639A1 (zh) * | 2018-07-23 | 2020-01-30 | 华进半导体封装先导技术研发中心有限公司 | 半导体清洗设备及利用该设备清洗通孔的方法 |
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US20060108068A1 (en) | 2006-05-25 |
TW200625394A (en) | 2006-07-16 |
KR20060052515A (ko) | 2006-05-19 |
JP2006310724A (ja) | 2006-11-09 |
US7497633B2 (en) | 2009-03-03 |
TWI299512B (en) | 2008-08-01 |
KR100758623B1 (ko) | 2007-09-13 |
CN1773674B (zh) | 2010-04-14 |
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