CN107406978B - 用于碳掺杂含硅膜的组合物以及使用所述组合物的方法 - Google Patents

用于碳掺杂含硅膜的组合物以及使用所述组合物的方法 Download PDF

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CN107406978B
CN107406978B CN201680019197.0A CN201680019197A CN107406978B CN 107406978 B CN107406978 B CN 107406978B CN 201680019197 A CN201680019197 A CN 201680019197A CN 107406978 B CN107406978 B CN 107406978B
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disilacyclobutane
carbon
film
cyclic
doped silicon
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CN107406978A (zh
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H·钱德拉
K·S·卡西尔
A·马利卡朱南
雷新建
M·R·麦克唐纳
萧满超
M·B·拉奥
李建恒
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Versum Materials US LLC
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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    • C23C16/45523—Pulsed gas flow or change of composition over time
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CN201680019197.0A 2015-02-06 2016-02-04 用于碳掺杂含硅膜的组合物以及使用所述组合物的方法 Active CN107406978B (zh)

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US201562113024P 2015-02-06 2015-02-06
US62/113,024 2015-02-06
US201562142546P 2015-04-03 2015-04-03
US62/142,546 2015-04-03
PCT/US2016/016514 WO2016126911A2 (en) 2015-02-06 2016-02-04 Compositions and methods using same for carbon doped silicon containing films

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