CN107068623B - 放大器 - Google Patents

放大器 Download PDF

Info

Publication number
CN107068623B
CN107068623B CN201610827446.0A CN201610827446A CN107068623B CN 107068623 B CN107068623 B CN 107068623B CN 201610827446 A CN201610827446 A CN 201610827446A CN 107068623 B CN107068623 B CN 107068623B
Authority
CN
China
Prior art keywords
bonding line
outermost
line
drain pad
drain electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610827446.0A
Other languages
English (en)
Other versions
CN107068623A (zh
Inventor
小坂尚希
今井翔平
冈村笃司
三轮真一
长明健一郎
佐佐木善伸
堀口健一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Corp
Original Assignee
Mitsubishi Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Corp filed Critical Mitsubishi Corp
Publication of CN107068623A publication Critical patent/CN107068623A/zh
Application granted granted Critical
Publication of CN107068623B publication Critical patent/CN107068623B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49517Additional leads
    • H01L23/4952Additional leads the additional leads being a bump or a wire
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/60Amplifiers in which coupling networks have distributed constants, e.g. with waveguide resonators
    • H03F3/602Combinations of several amplifiers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/49Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions wire-like arrangements or pins or rods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49541Geometry of the lead-frame
    • H01L23/49562Geometry of the lead-frame for devices being provided for in H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • H01L25/072Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/04Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/04Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only
    • H03F3/16Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only with field-effect devices
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189High-frequency amplifiers, e.g. radio frequency amplifiers
    • H03F3/19High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
    • H03F3/195High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/68Combinations of amplifiers, e.g. multi-channel amplifiers for stereophonics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6611Wire connections
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6644Packaging aspects of high-frequency amplifiers
    • H01L2223/6655Matching arrangements, e.g. arrangement of inductive and capacitive components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/0601Structure
    • H01L2224/0603Bonding areas having different sizes, e.g. different heights or widths
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/0605Shape
    • H01L2224/06051Bonding areas having different shapes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/4501Shape
    • H01L2224/45012Cross-sectional shape
    • H01L2224/45015Cross-sectional shape being circular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48153Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate
    • H01L2224/48155Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48157Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being arranged next to each other, e.g. on a common substrate the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/4905Shape
    • H01L2224/49051Connectors having different shapes
    • H01L2224/49052Different loop heights
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/4905Shape
    • H01L2224/4909Loop shape arrangement
    • H01L2224/49095Loop shape arrangement parallel in plane
    • H01L2224/49096Loop shape arrangement parallel in plane horizontal
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49111Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/4917Crossed wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F2200/00Indexing scheme relating to amplifiers
    • H03F2200/543A transmission line being used as coupling element between two amplifying stages

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)
  • Amplifiers (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

本发明的目的在于提供一种能够抑制键合线的熔断的放大器。具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;以及多条漏极键合线,其与该漏极焊盘连接,该多条漏极键合线具有:第1最外键合线,其与该漏极焊盘的一个末端部分连接;第2最外键合线,其与该漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在该第1最外键合线和该第2最外键合线之间,该多条漏极键合线比1mm长,该第1最外键合线和该第2最外键合线的线环高度比该中间键合线的线环高度高。

Description

放大器
技术领域
本发明涉及一种对信号进行放大的放大器。
背景技术
在专利文献1中公开了一种放大器,该放大器在封装件内设置FET芯片和匹配基板,由键合线实现电连接。
专利文献1:日本特开2001-148616号公报
近年来,放大器存在高输出化的趋势。如果使晶体管高输出化,则存在下述问题,即,在与晶体管的漏极焊盘连接的键合线中流过大电流,该键合线熔断。
发明内容
本发明就是为了解决上述课题而提出的,其目的在于提供一种能够抑制键合线的熔断的放大器。
本发明所涉及的放大器具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;以及多条漏极键合线,其与该漏极焊盘连接;该多条漏极键合线具有:第1最外键合线,其与该漏极焊盘的一个末端部分连接;第2最外键合线,其与该漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在该第1最外键合线和该第2最外键合线之间,该多条漏极键合线比1mm长,该第1最外键合线和该第2最外键合线的线环高度比该中间键合线的线环高度高。
本发明所涉及的其他放大器的特征在于,具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;以及多条漏极键合线,其与该漏极焊盘连接,该多条漏极键合线具有:第1最外键合线,其与该漏极焊盘的一个末端部分连接;第2最外键合线,其与该漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在该第1最外键合线和该第2最外键合线之间,该第1最外键合线和该第2最外键合线比该中间键合线粗。
本发明所涉及的其他放大器的特征在于,具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;以及多条漏极键合线,其与该漏极焊盘连接,该多条漏极键合线具有:多条第1最外键合线,其以落地点接触的方式与该漏极焊盘的一个末端部分连接;多条第2最外键合线,其以落地点接触的方式与该漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在该多条第1最外键合线和该多条第2最外键合线之间,该多条第1最外键合线的线环高度不同,该多条第2最外键合线的线环高度不同。
本发明所涉及的其他放大器的特征在于,具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;以及多条漏极键合线,其与该漏极焊盘连接,以与位于该漏极焊盘的一个末端部分和另一个末端部分之间的中间部分相比,在该漏极焊盘的该一个末端部分和该另一个末端部分,漏极键合线的密度较高的方式,设置该多条漏极键合线。
本发明所涉及的其他放大器的特征在于,具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;以及多条漏极键合线,其与该漏极焊盘连接,该多条漏极键合线具有:2条第1最外键合线,其与该漏极焊盘的一个末端部分连接;2条第2最外键合线,其与该漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在该2条第1最外键合线和该2条第2最外键合线之间,该2条第1最外键合线在俯视观察时相交叉,该2条第2最外键合线在俯视观察时相交叉。
本发明所涉及的其他放大器的特征在于,具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;以及多条漏极键合线,其与该漏极焊盘连接,该多条漏极键合线具有:第1最外键合线,其与该漏极焊盘的一个末端部分连接;第2最外键合线,其与该漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在该第1最外键合线和该第2最外键合线之间,该第1最外键合线和该第2最外键合线比该中间键合线短。
本发明所涉及的其他放大器的特征在于,具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;多条漏极键合线,其与该漏极焊盘连接;基板,其设置于该封装件中;以及金属图案,其形成于该基板,该多条漏极键合线具有:第1最外键合线,其与该漏极焊盘的一个末端部分连接;第2最外键合线,其与该漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在所述第1最外键合线和该第2最外键合线之间,通过在该金属图案形成狭缝,从而使经过该第1最外键合线的电流的路径长度和经过该第2最外键合线的电流的路径长度比经过该中间键合线的电流的路径长度长,与该金属图案中的连接有该第1最外键合线和该第2最外键合线的两端部相比,该金属图案中的连接有该中间键合线的中央部位于更靠近该晶体管芯片的位置。
本发明所涉及的其他放大器的特征在于,具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;以及多条漏极键合线,其与该漏极焊盘连接,对于该多条漏极键合线,越是与靠近该漏极焊盘的末端的部位连接的漏极键合线,则线环高度越高。
本发明所涉及的其他放大器的特征在于,具有:封装件;晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于该封装件中;多条漏极键合线,其与该漏极焊盘连接;以及封装件键合线,其两端与该封装件连接,该多条漏极键合线具有:第1最外键合线,其与该漏极焊盘的一个末端部分连接;第2最外键合线,其与该漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在该第1最外键合线和该第2最外键合线之间,该封装件键合线位于该中间键合线和该封装件之间。
发明的效果
根据本发明,由于在将例如与漏极焊盘连接的多条漏极键合线的长度设为比1mm长的基础上,使该多条漏极键合线中的位于两端的最外键合线比其他键合线长,因此能够抑制键合线的熔断。
附图说明
图1是实施方式1所涉及的放大器的俯视图。
图2是放大器的侧视图。
图3是对比例的放大器的俯视图。
图4是对比例的放大器的侧视图。
图5是沿图3的V-V线的放大器的剖视图。
图6是表示计算结果的图。
图7是图1的VII-VII线处的剖视图。
图8是表示计算结果的图。
图9是表示线环高度(loop height)差对键合线电流施加的影响的图。
图10是表示键合线长度和键合线熔断电流之间的关系的图。
图11是实施方式2所涉及的放大器的俯视图。
图12是表示漏极键合线的键合线直径和键合线熔断电流之间的关系的图。
图13是实施方式3所涉及的放大器的俯视图。
图14是实施方式4所涉及的放大器的俯视图。
图15是实施方式5所涉及的放大器的俯视图。
图16是实施方式6所涉及的放大器的俯视图。
图17是实施方式7所涉及的放大器的俯视图。
图18是实施方式8所涉及的放大器的俯视图。
图19是实施方式9所涉及的放大器的俯视图。
图20是实施方式10所涉及的放大器的俯视图。
图21是实施方式11所涉及的放大器的俯视图。
图22是实施方式12所涉及的放大器的俯视图。
图23是实施方式13所涉及的放大器的俯视图。
图24是图23的XXIV-XXIV线处的剖视图。
图25是实施方式14所涉及的放大器的俯视图。
图26是图25的XXVI-XXVI线处的剖视图。
图27是实施方式15所涉及的放大器的俯视图。
标号的说明
10 封装件、18 金属图案、22 晶体管芯片、22b 漏极焊盘、30 金属图案、24a 第1最外键合线、24b 第2最外键合线、26 中间键合线
具体实施方式
参照附图,对本发明的实施方式所涉及的放大器进行说明。对相同或者相对应的结构要素标注相同的标号,有时省略重复的说明。
实施方式1
图1是实施方式1所涉及的放大器的俯视图。放大器具有封装件10。封装件10由金属形成。封装件10是覆盖内容物的部件,但在图1等中,为了便于说明而示出封装件10的内部结构。在封装件10固定有输入端子12和输出端子34。在封装件10中设置有输入匹配基板16。在输入匹配基板16形成有金属图案18。
在封装件10中设置有晶体管芯片22。晶体管芯片22例如是FET芯片。晶体管芯片22具有栅极焊盘22a、和细长地形成的漏极焊盘22b。晶体管芯片22具有多个晶体管单元。在封装件10中设置有输出匹配基板28。在输出匹配基板28形成有金属图案30。输入匹配基板16、晶体管芯片22以及输出匹配基板28与封装件10进行了芯片键合。
为了将封装件10中的各部件电连接而在封装件10中设置有多条键合线。键合线14将输入端子12和金属图案18连接。键合线20将金属图案18和栅极焊盘22a连接。
在漏极焊盘22b的一个末端部分连接有第1最外键合线24a。并且,在漏极焊盘22b的另一个末端部分连接有第2最外键合线24b。在漏极焊盘22b的中央部分连接有中间键合线26。中间键合线26位于夹在第1最外键合线24a和第2最外键合线24b之间的位置。对中间键合线26的个数不特别地限定。第1最外键合线24a、第2最外键合线24b以及中间键合线26构成与漏极焊盘22b连接的“多条漏极键合线”。构成多条漏极键合线的键合线均比1mm长。第1最外键合线24a、第2最外键合线24b以及中间键合线26是将漏极焊盘22b和金属图案30连接的键合线。
第1最外键合线24a、第2最外键合线24b以及中间键合线26与漏极焊盘22b的连接点沿漏极焊盘22b的长度方向排列。第1最外键合线24a和第2最外键合线24b的线环高度比中间键合线26的线环高度高。所谓线环高度,是指从弯曲的键合线的最高位置起直至键合线连接点为止的高度。中间键合线26的线环高度是均等的。
键合线32将金属图案30和输出端子34连接。优选全部键合线都通过键合线键合而形成。具有上述结构的放大器是作为独立部件而形成的分立型放大器。
图2是放大器的侧视图。在图2中,省略了封装件10的一部分以能够表现出封装件10的内部。第1最外键合线24a和第2最外键合线24b的线环高度比中间键合线26的线环高度高。第1最外键合线24a和中间键合线26的线环高度差小于或等于0.8mm,第2最外键合线24b和中间键合线26的线环高度差小于或等于0.8mm。
在这里,为了容易理解本发明的实施方式1所涉及的放大器的意义而说明对比例。图3是对比例的放大器的俯视图。多条漏极键合线具有最外键合线35a、35b以及中间键合线36。多条漏极键合线的长度是均等的。图4是对比例的放大器的侧视图。多条漏极键合线的线环高度是均等的。
对比例的放大器例如具有:GaN晶体管芯片22,其总栅极宽度为50mm左右;以及金键合线,其是作为多条漏极键合线设置的,直径为25μm,长度为2mm左右。多条漏极键合线的间隔例如为0.1mm。通过实验可知,如果使上述对比例的放大器进行高输出动作,则两端的漏极键合线熔断。
对在两端的漏极键合线中流过较多的电流的主要原因进行叙述。图5是沿图3的V-V线的放大器的剖视图。由多条漏极键合线构成的面和封装件10被视作平行平板。对于最外键合线35a、35b,由于将磁场抵消的键合线仅存在于单侧,因此不会将在最外键合线35a的左侧及最外键合线35b的右侧产生的磁场抵消。因此,电场集中,与中间键合线36相比,在最外键合线35a、35b中流过更大的电流。此外,图5的磁场和电场是为了容易进行说明而简单地示出的,实际上键合线整体的合成磁场不是直线,另外,磁场、电场以在键合线周边扩散的方式分布。
图6是表示在漏极键合线中流动的电流的输出功率依赖性的计算结果的图形。越是使放大器的输出功率变大,则在漏极键合线中流动的电流就变得越大。另外,如参照图5说明所述,由于向最外键合线35a、35b的电场集中,因此在最外键合线35a、35b中流动的电流变得比在中间键合线36中流动的电流大。在该计算例中,在某个输出功率Ps时,在最外键合线35a、35b中流动的电流为0.7A,在中间键合线36中流动的电流为0.3A。与中间键合线36相比,在最外键合线35a、35b中流过2.3倍大的电流。
根据本发明的实施方式1所涉及的放大器,能够缓和向多条漏极键合线中的位于两端的漏极键合线的电流集中。图7是图1的VII-VII线处的剖视图。该VII-VII线是与晶体管芯片22的长边平行地延伸的线。中间键合线26的高度是恒定的,但第1最外键合线24a和第2最外键合线24b位于比中间键合线26更高的位置。中间键合线26具有中间键合线26a、26b、26c、26d。有时将与第1最外键合线24a相邻的中间键合线26a、和与第2最外键合线24b相邻的中间键合线26d称为相邻键合线。
如果电流在多条漏极键合线中流动,则在键合线的周围产生磁场,但键合线间的磁场的方向相反而抵消。因此,就多条漏极键合线整体而言,磁场如单点划线所示。如图中虚线所示那样在键合线和封装件10之间与磁场垂直地产生电场(电力线)。
与对比例相比,第1最外键合线24a和封装件10之间的电力线、以及第2最外键合线24b和封装件10之间的电力线沿高度方向(向上方)延伸。因此,与对比例相比,多条漏极键合线的两端处的电力线的密度变小。因此,第1最外键合线24a和第2最外键合线24b周边的电场得到缓和,能够降低在上述键合线中流动的电流。
图8是表示多条漏极键合线的键合线电流和输出功率之间的关系的计算结果的图。计算是在第1最外键合线24a和第2最外键合线24b的线环高度比中间键合线26的线环高度高0.2mm的假定下进行的。在某个输出功率Ps时,在第1最外键合线24a和第2最外键合线24b中流动的电流为0.55A。另一方面,在对比例的放大器中,在两端的漏极键合线中流过0.7A的电流(参照图6)。因此,通过将第1最外键合线24a和第2最外键合线24b的线环高度设为比中间键合线26的线环高度高,从而与全部漏极键合线的高度均等的情况相比,能够将在两端的键合线中流动的电流降低20%左右。
由于增加第1最外键合线24a和第2最外键合线24b的线环高度,因此中间键合线26的电流变得不再一致。在功率Ps时,在相邻键合线(中间键合线26a、中间键合线26d)中流过0.5A的电流。另一方面,在中间键合线26b、26c中流过0.3A的电流。如上所述,如果增加多条漏极键合线中的两端的键合线的线环高度,则从两端的键合线起内侧第1条键合线的电流增加。
图9是表示第1最外键合线及第2最外键合线的线环高度与中间键合线的线环高度之差对键合线电流施加的影响的图。在图9中示出第1最外键合线24a和第2最外键合线24b的电流、相邻键合线(中间键合线26a、26b)的键合线电流。横轴设为第1最外键合线24a和第2最外键合线24b的线环高度与中间键合线26的线环高度之差。此外,将多条中间键合线26的线环高度设得一致。因此,中间键合线26的线环高度和相邻键合线的线环高度代表相同的线环高度。
在第1最外键合线24a及第2最外键合线24b的线环高度与中间键合线26的线环高度相同时,键合线高度差为0。此时,在第1最外键合线24a和第2最外键合线24b中流过0.7A的电流。如果使第1最外键合线24a和第2最外键合线24b的线环高度比中间键合线26的线环高度高,则第1最外键合线24a和第2最外键合线24b的键合线电流变小。但是,相邻键合线(中间键合线26a、26d)的键合线电流为增加趋势。
如果键合线高度差为0.8mm左右,则相邻键合线的键合线电流变得与键合线高度差为0mm时的第1最外键合线24a和第2最外键合线24b的键合线电流(0.7A)相等。如果键合线高度差继续变大,则在相邻键合线中流过过大的电流,因此优选将键合线高度差设为小于或等于0.8mm。
图10是表示键合线长度和键合线熔断电流之间的关系的图。在图10中示出频率为3.0GHz、且键合线的直径为25μm的情况下的键合线熔断电流的键合线长度依赖性。如果流过超过键合线熔断电流的电流,则键合线熔断。根据图10可知,键合线长度越长,则键合线熔断电流越低。例如,在内部匹配型的放大器中,由于在封装件中铺满晶体管和匹配基板,所以键合线长度大致为0.3mm左右、键合线熔断电流为6A左右,因此几乎不担心键合线熔断。
另一方面,在分立型的放大器中,键合线长度大致比1mm长,键合线熔断电流小于或等于2A。在键合线长度短于1mm的情况下,键合线长度的变化使键合线熔断电流大幅地变化。但是,在键合线长度比1mm长的情况下,即使键合线长度变化,键合线熔断电流也不会大幅地变化。
在本发明的实施方式1中,多条漏极键合线均设为比1mm长。因此,即使将第1最外键合线24a和第2最外键合线24b设为比中间键合线26长,键合线熔断电流的下降也是轻微的,能够防止键合线熔断电流大幅地下降。
另外,已知以确保从各晶体管单元观察电路侧时的阻抗的均等性为目的而使第1最外键合线和第2最外键合线变长的技术,但如图10记载所示,如果仅使键合线变长,则键合线的熔断电流下降,不能防止键合线的熔断。特别地,对于内部匹配型的放大器等所使用的长度小于或等于1mm的键合线,越是使键合线变长,则键合线熔断电流的下降越显著。即,在漏极键合线的长度比1mm长的放大器中,通过使第1最外键合线24a和第2最外键合线24b比中间键合线26高,从而能够防止键合线的熔断。
如上所述,在本发明的实施方式1所涉及的放大器中,设置比1mm长的多条漏极键合线,使多条漏极键合线中的第1最外键合线24a和第2最外键合线24b的线环高度比中间键合线26的线环高度高。由此,能够缓和第1最外键合线24a和第2最外键合线24b的电流集中,并且抑制键合线熔断电流的下降。
本发明的实施方式1所涉及的放大器能够在不丧失其特征的范围进行各种变形。例如,也可以不使用输入匹配基板16和输出匹配基板28而利用键合线直接将晶体管芯片22和封装件10连接。在该情况下,多条漏极键合线将漏极焊盘和封装件(端子)连接。此外,晶体管芯片22也可以由GaN、GaAs、LDMOS等构成。
上述变形还能够适当地应用于以下实施方式所涉及的放大器。另外,由于以下实施方式所涉及的放大器与实施方式1的共同点多,因此以与实施方式1的不同点为中心进行说明。
实施方式2
图11是实施方式2所涉及的放大器的俯视图。第1最外键合线40a和第2最外键合线40b比中间键合线26粗。放大器所使用的通常的键合线的键合线直径为25μm。第1最外键合线40a和第2最外键合线40b的粗细设为大于或等于25μm。另外,与实施方式1同样地,第1最外键合线40a和第2最外键合线40b的线环高度比中间键合线26的线环高度高。
图12是表示漏极键合线的键合线直径和键合线熔断电流之间的关系的图。图12的图形是以频率为3.0GHz、键合线长度为2mm为前提而创建的。可知,如果使键合线的直径变粗,则键合线的熔断电流变大。因此,通过将可能熔断的第1最外键合线和第2最外键合线形成得粗,从而能够避免这些键合线的熔断。另外,通过使第1最外键合线40a和第2最外键合线40b的线环高度比中间键合线26的线环高度高,从而能够抑制向第1最外键合线40a和第2最外键合线40b的电流集中。此外,只要第1最外键合线40a和第2最外键合线40b比中间键合线26粗即可,不需要一定设为大于或等于25μm的直径。
实施方式3
图13是实施方式3所涉及的放大器的俯视图。第1最外键合线42a和第2最外键合线42b比中间键合线26粗。多条漏极键合线的长度相等。第1最外键合线42a和第2最外键合线42b的直径例如大于25μm。通过使可能熔断的第1最外键合线42a和第2最外键合线42b形成得粗,从而能够避免这些键合线的熔断。
实施方式4
图14是实施方式4所涉及的放大器的俯视图。多条漏极键合线具有第1最外键合线44a、44b、第2最外键合线44c、44d以及中间键合线26。第1最外键合线有2条,第2最外键合线也有2条。2条第1最外键合线44a、44b以落地点接触的方式与漏极焊盘22b的一个末端部分连接。2条第2最外键合线44c、44d以落地点接触的方式与漏极焊盘22b的另一个末端部分连接。
第1最外键合线44a和第1最外键合线44b的线环高度不同。即,第1最外键合线44a的线环高度比第1最外键合线44b的线环高度高。另外,第2最外键合线44c和第2最外键合线44d的线环高度不同。即,第2最外键合线44c的线环高度比第2最外键合线44d的线环高度高。中间键合线26位于夹在多条第1最外键合线和多条第2最外键合线之间的位置。
如前所述,存在下述趋势,即,在与漏极焊盘22b的两端部分连接的键合线中流过大电流。根据本发明的实施方式4所涉及的放大器,由2条第1最外键合线44a、44b来分担上述大电流,由2条第2最外键合线44c、44d来分担上述大电流。由此,由于能够降低每一条键合线的电流,因此能够抑制键合线的熔断。
在本发明的实施方式4中,设置2条第1最外键合线和2条第2最外键合线。但是,只要第1最外键合线为多条、第2最外键合线为多条,就能够得到使电流分散这一效果。由此,例如也可以设置3条第1最外键合线和3条第2最外键合线。
实施方式5
图15是实施方式5所涉及的放大器的俯视图。漏极键合线46a、46b、46c、46d、46e、46f构成多条漏极键合线。多条漏极键合线46a、46b、46c、46d、46e、46f设置为,与位于漏极焊盘22b的一个末端部分和另一个末端部分之间的中间部分相比,在漏极焊盘22b的一个末端部分和另一个末端部分,漏极键合线的密度较高。在图15中没有中间键合线,但也可以设置中间键合线。设为在漏极焊盘22b的一个末端部分和另一个末端部分,漏极键合线的间隔按照键合线的中心间距离来算为0.03~1mm。
在本发明的实施方式5所涉及的放大器中,漏极键合线46b、46c位于与漏极焊盘22b的一个末端部分连接的漏极键合线46a的附近,漏极键合线46e、46f位于与漏极焊盘22b的另一个末端部分连接的漏极键合线46d的附近。因此,能够由3条漏极键合线(44a、44b、44c)来分担大电流,由3条漏极键合线(44d、44e、44f)来分担大电流。由此,能够抑制在漏极键合线(46a、46d)中流动的电流。
如参照图6说明所述,对于键合线直径为25μm、且长度为2mm左右的金键合线,在某个功率Ps时,将键合线间隔按照键合线的中心间距离来算设定为0.1mm而计算出的键合线电流为0.7A。但是,在某个功率Ps时,将键合线间隔按照键合线的中心间距离来算设定为键合线不接触的最低限度的0.03mm而计算出的键合线电流为0.5A。即,能够使键合线电流降低30%左右。
因此,通过与位于漏极焊盘22b的一个末端部分和另一个末端部分之间的中间部分相比,在漏极焊盘22b的一个末端部分和另一个末端部分使漏极键合线的密度变高,从而能够避免多条漏极键合线中的位于两端的漏极键合线的熔断。
实施方式6
图16是实施方式6所涉及的放大器的俯视图。由于该放大器与实施方式5的放大器的类似点多,因此以与实施方式5的不同点为中心进行说明。漏极键合线46a是第1最外键合线,漏极键合线46d是第2最外键合线。与一个末端部分连接的第1最外键合线(46a)、和与另一个末端部分连接的第2最外键合线46d的线环高度比与中间部分连接的多条中间键合线的线环高度高。由此,能够抑制第1最外键合线(46a)和第2最外键合线(46d)的电流,防止这些键合线的熔断。
实施方式7
图17是实施方式7所涉及的放大器的俯视图。由于该放大器与实施方式5的放大器的类似点多,因此以与实施方式5的不同点为中心进行说明。与漏极焊盘的一个末端部分连接的多条第1最外键合线(48a、48b、48c)、和与漏极焊盘22b的另一个末端部分连接的多条第2最外键合线48d、48e、48f在俯视观察时交错状(锯齿形)地连接至漏极焊盘22b。
在多条漏极键合线向漏极焊盘22b的连接点在俯视观察时直线地形成的情况下,由于键合线键合装置的制约,有时以狭小的间隔设置键合线是困难的。但是,在本发明的实施方式7中,通过将多条漏极键合线向漏极焊盘的落地点(连接点)设为交错状,从而能够使键合线间隔变窄。在漏极焊盘的一个端部以及另一个端部,通过使键合线间隔变窄,从而能够降低键合线的电流。
实施方式8
图18是实施方式8所涉及的放大器的俯视图。由于该放大器与实施方式7的放大器的类似点多,因此以与实施方式7的不同点为中心进行说明。多条漏极键合线中的位于两端的漏极键合线48a、48d比其他漏极键合线的线环高度高。而且,漏极键合线48a、48b、48c、48d、48e、48f在俯视观察时与漏极焊盘22b交错状地连接。
因此,对于多条漏极键合线中的位于两端的漏极键合线,能够防止电场集中。另外,在漏极焊盘22b的一个端部以及另一个端部,通过使键合线间隔变窄,从而能够降低键合线的电流。
实施方式9
图19是实施方式9所涉及的放大器的俯视图。多条漏极键合线将漏极焊盘22b和金属图案30连接。多条漏极键合线具有:2条第1最外键合线50a、50b,其与漏极焊盘22b的一个末端部分连接;2条第2最外键合线50c、50d,其与漏极焊盘22b的另一个末端部分连接;以及中间键合线26,其夹在2条第1最外键合线50a、50b和2条第2最外键合线50c、50d之间。并且,2条第1最外键合线50a、50b在俯视观察时相交叉,2条第2最外键合线50c、50d在俯视观察时相交叉。
以上述方式,使与漏极焊盘22b的两端连接的键合线、和从该键合线起内侧第1条键合线在俯视观察时相交叉。例如,第1最外键合线50a随着朝向输出匹配基板28侧而朝向输出匹配基板28的内侧,第1最外键合线50b随着朝向输出匹配基板28侧而朝向输出匹配基板28的外侧。能够由第1最外键合线50a、50b来负担在漏极焊盘22b的一个端部流动的电流。由此,不会使大电流集中于一条键合线。
第2最外键合线50c随着朝向输出匹配基板28侧而朝向输出匹配基板28的内侧,第2最外键合线50d随着朝向输出匹配基板28侧而朝向输出匹配基板28的外侧。能够由第2最外键合线50c、50d来负担在漏极焊盘22b的另一个端部流动的电流。由此,不会使大电流集中于一条键合线。
实施方式10
图20是实施方式10所涉及的放大器的俯视图。多条漏极键合线具有:第1最外键合线52a,其与漏极焊盘22b的一个末端部分连接;第2最外键合线52d,其与漏极焊盘22b的另一个末端部分连接;以及中间键合线52b、52c,其夹在第1最外键合线52a和第2最外键合线52d之间。第1最外键合线52a和第2最外键合线52d比中间键合线52b、52c短。中间键合线52b、52c将漏极焊盘22b中的夹在一个末端部分和另一个末端部分之间的部分即中间部分与金属图案60连接。
在输出匹配基板28之上形成的金属图案60具有:第1部分60a,其与漏极焊盘22b的一个末端部分相对;第2部分60b,其与漏极焊盘22b的中间部分相对;以及第3部分60c,其与漏极焊盘22b的另一个末端部分相对。漏极焊盘22b的一个末端部分和第1部分60a之间的距离、以及漏极焊盘22b的另一个末端部分和第3部分60c之间的距离比漏极焊盘22b的中间部分和第2部分60b之间的距离小。即,与第2部分60b相比,第1部分60a和第3部分60c向晶体管芯片22侧伸出得较长。
第1最外键合线52a与第1部分60a连接,中间键合线52b、52c与第2部分60b连接,第2最外键合线52d与第3部分60c连接。
如图10所示,由于键合线长度越短,则键合线熔断电流变得越高,因此键合线不容易熔断。在本发明的实施方式10中,由于使多条漏极键合线中的第1最外键合线52a和第2最外键合线52d比中间键合线短,因此能够使它们不容易熔断。
此外,在分立型的放大器中,将与漏极焊盘连接的长键合线积极地使用于匹配。因此,如果使全部漏极键合线与两端的漏极键合线同样地变短,则变得不能得到匹配,放大器的特性窄频带化,或者输出或效率下降。因此,仅使两端的漏极键合线变短。
实施方式11
图21是实施方式11所涉及的放大器的俯视图。由于该放大器与实施方式10的放大器的类似点多,因此以与实施方式10的不同点为中心进行说明。第1最外键合线52a和第2最外键合线52d的线环高度比中间键合线52b、52c的线环高度高。另外,第1最外键合线52a和第2最外键合线52d比中间键合线52b、52c短。
根据本发明的实施方式11所涉及的放大器,如实施方式1说明所述,通过使第1最外键合线和第2最外键合线的线环高度比中间键合线的线环高度高,从而能够降低在第1最外键合线和第2最外键合线中流动的电流。另外,由于使第1最外键合线52a和第2最外键合线52d比中间键合线52b、52c短,因此能够使第1最外键合线52a和第2最外键合线52d不容易熔断。
实施方式12
图22是实施方式12所涉及的放大器的俯视图。多条漏极键合线具有:第1最外键合线62a,其与漏极焊盘22b的一个末端部分连接;第2最外键合线62b,其与漏极焊盘的另一个末端部分连接;以及中间键合线26,其夹在第1最外键合线62a和第2最外键合线62b之间。第1最外键合线62a、第2最外键合线62b以及中间键合线26是相同的长度。
在输出匹配基板28之上形成有金属图案70。金属图案70具有:接近部70a,其设置于晶体管芯片22侧;中间部70b,其与接近部70a接触,宽度由于狭缝而变窄;以及后方部分70c,其与中间部70b接触,与键合线32连接。接近部70a具有两端部71、73、和夹在两端部71、73之间的中央部72。在两端部71、73分别连接有第1最外键合线62a和第2最外键合线62b。在中央部72连接有中间键合线26。与两端部71、73相比,中央部72位于靠近晶体管芯片22的位置。
另外,通过在金属图案70形成狭缝,从而能够使经过第1最外键合线62a的电流的路径长度和经过第2最外键合线62b的电流的路径长度比经过中间键合线26的电流的路径长度长,而不改变第1最外键合线62a和第2最外键合线62b的长度。狭缝设置为与漏极焊盘22b的长度方向平行。
与两端部71、73相比,中央部72位于靠近晶体管芯片22的位置。因此,中央部72的面积比两端部71的面积及两端部73的面积大。因此,第1最外键合线62a向金属图案70的落地点的图案电容、以及第2最外键合线62b向金属图案70的落地点的图案电容比中间键合线26的该电容小。由此,能够使经由第1最外键合线62a和第2最外键合线62b的信号的阻抗变高,降低在这些键合线中流动的电流。
实施方式13
图23是实施方式13所涉及的放大器的俯视图。对于多条漏极键合线80a、80b、80c、80d、80e、80f,越是与靠近漏极焊盘22b的末端的部位连接的漏极键合线,则线环高度越高。图24是图23的XXIV-XXIV线处的剖视图。多条漏极键合线设置为,最外侧的漏极键合线的线环高度最高,越内侧的漏极键合线的线环高度越低。
在实施方式1的放大器中,仅使多条漏极键合线中的最外侧的漏极键合线的线环高度变高,而将其他键合线即中间键合线的线环高度设为相同。在该情况下,与最外侧的漏极键合线相邻的相邻键合线的电流变大。
但是,在实施方式13所涉及的放大器中,通过使多条漏极键合线的线环高度如图24所示那样逐渐地变化,从而能够防止电流集中于包含相邻键合线在内的特定的键合线。由此,能够使在多条漏极键合线中流动的电流均等化。
实施方式14
图25是实施方式14所涉及的放大器的俯视图。设置有两端与封装件10连接的封装件键合线90、92。封装件键合线90位于中间键合线26a和封装件10之间,封装件键合线92位于中间键合线26b和封装件10之间。封装件键合线90、92成为接地电位。
图26是图25的XXVI-XXVI线处的剖视图。通过使封装件键合线90、92位于中间键合线26a、26b附近,从而能够使电场集中于中间键合线26a、26b的附近。其结果,能够降低第1最外键合线24a和第2最外键合线24b的电流。
另外,上述封装件键合线能够与图23、24所说明的使线环高度逐渐地变化的技术并用。
实施方式15
图27是实施方式15所涉及的放大器的俯视图。对于该放大器,以与实施方式1的不同点为中心进行说明。在金属图案30,与信号的前进方向成直角地形成有狭缝。狭缝设置为与漏极焊盘22b的长度方向平行。
金属图案30具有:接近部30a,其设置于晶体管芯片22侧;中间部30b,其与接近部30a接触,宽度由于狭缝而变窄;以及后方部分30c,其与中间部30b接触,与键合线32连接。
通过使第1最外键合线24a和第2最外键合线24b的线环高度比中间键合线26的线环高度高,从而与全部漏极键合线的高度均等的情况相比,能够降低在两端的键合线中流动的电流。
由于使第1最外键合线24a和第2最外键合线24b的线环高度比中间键合线26的线环高度高,因此经过第1最外键合线24a的电流的路径长度和经过第2最外键合线24b的电流的路径长度比经过中间键合线26的电流的路径长度长。在此基础上,通过在金属图案30形成狭缝,从而使经过第1最外键合线24a的电流的在金属图案30处的路径长度和经过第2最外键合线24b的电流的在金属图案30处的路径长度比经过中间键合线26的电流的在金属图案30处的路径长度长。
因此,与经过中间键合线26的电流路径相比,经过第1最外键合线24a和第2最外键合线24b的电流路径高阻抗化,能够降低第1最外键合线24a的电流和第2最外键合线24b的电流。
在实施方式15所涉及的放大器中,如上所述,由于使第1最外键合线24a和第2最外键合线24b的线环高度比中间键合线26的线环高度高,而且在金属图案30设置狭缝,从而能够充分地降低第1最外键合线24a的电流和第2最外键合线24b的电流。
在到此为止的全部实施方式中,优选将与漏极焊盘22b连接的键合线的长度设为小于或等于6mm。此外,到此为止所说明的各实施方式所涉及的放大器的特征也可以适当地组合使用。

Claims (3)

1.一种放大器,其特征在于,具有:
封装件;
晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于所述封装件中;
多条漏极键合线,其与所述漏极焊盘连接;
基板,其设置于所述封装件中;以及
金属图案,其形成于所述基板,
所述多条漏极键合线具有:第1最外键合线,其与所述漏极焊盘的一个末端部分连接;第2最外键合线,其与所述漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在所述第1最外键合线和所述第2最外键合线之间,
通过在所述金属图案形成狭缝,从而使经过所述第1最外键合线的电流的路径长度和经过所述第2最外键合线的电流的路径长度比经过所述中间键合线的电流的路径长度长,
与所述金属图案中的连接有所述第1最外键合线和所述第2最外键合线的两端部相比,所述金属图案中的连接有所述中间键合线的中央部位于更靠近所述晶体管芯片的位置。
2.根据权利要求1所述的放大器,其特征在于,
所述狭缝设置为与所述漏极焊盘的长度方向平行。
3.一种放大器,其特征在于,具有:
封装件;
晶体管芯片,其具有栅极焊盘、和细长地形成的漏极焊盘,该晶体管芯片设置于所述封装件中;
多条漏极键合线,其与所述漏极焊盘连接;以及
封装件键合线,其两端与所述封装件连接,
所述多条漏极键合线具有:第1最外键合线,其与所述漏极焊盘的一个末端部分连接;第2最外键合线,其与所述漏极焊盘的另一个末端部分连接;以及中间键合线,其夹在所述第1最外键合线和所述第2最外键合线之间,
所述封装件键合线位于所述中间键合线和所述封装件之间,成为接地电位。
CN201610827446.0A 2015-09-16 2016-09-14 放大器 Active CN107068623B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-182446 2015-09-16
JP2015182446A JP6569417B2 (ja) 2015-09-16 2015-09-16 増幅器

Publications (2)

Publication Number Publication Date
CN107068623A CN107068623A (zh) 2017-08-18
CN107068623B true CN107068623B (zh) 2019-11-08

Family

ID=58160677

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610827446.0A Active CN107068623B (zh) 2015-09-16 2016-09-14 放大器

Country Status (5)

Country Link
US (1) US9627300B2 (zh)
JP (1) JP6569417B2 (zh)
KR (1) KR101878557B1 (zh)
CN (1) CN107068623B (zh)
DE (1) DE102016216702B4 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017157604A (ja) * 2016-02-29 2017-09-07 株式会社三社電機製作所 半導体装置
WO2018211643A1 (ja) * 2017-05-17 2018-11-22 三菱電機株式会社 増幅器
JP7050487B2 (ja) * 2017-12-28 2022-04-08 新電元工業株式会社 電子デバイス
JP2019169504A (ja) * 2018-03-22 2019-10-03 日本電信電話株式会社 ワイヤボンディング構造
US11303254B2 (en) 2018-05-28 2022-04-12 Mitsubishi Electric Corporation Amplifier
JP2020004784A (ja) * 2018-06-26 2020-01-09 三菱電機株式会社 パワーモジュールおよび電力変換装置
JP6971952B2 (ja) * 2018-11-07 2021-11-24 三菱電機株式会社 半導体装置
US11749578B2 (en) 2019-02-22 2023-09-05 Panasonic Intellectual Property Management Co., Ltd. Semiconductor module, power semiconductor module, and power electronic equipment using the semiconductor module or the power semiconductor module
JP7149886B2 (ja) * 2019-03-22 2022-10-07 三菱電機株式会社 半導体装置
JP7209615B2 (ja) * 2019-11-13 2023-01-20 三菱電機株式会社 半導体装置

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61210646A (ja) * 1985-03-15 1986-09-18 Nec Corp 半導体装置
JPS63203001A (ja) * 1987-02-18 1988-08-22 Mitsubishi Electric Corp 半導体装置
JPH04147635A (ja) * 1990-10-09 1992-05-21 Mitsubishi Electric Corp 高周波高出力トランジスタ
JPH0653715A (ja) 1992-07-30 1994-02-25 Mitsubishi Electric Corp マイクロ波増幅器
JPH07307626A (ja) 1994-05-12 1995-11-21 Mitsubishi Electric Corp マイクロ波高出力増幅器
JP3364404B2 (ja) * 1997-02-12 2003-01-08 株式会社東芝 半導体の入出力接続構造
JPH11238851A (ja) 1998-02-23 1999-08-31 Hitachi Ltd 集積回路装置およびそれを用いた通信機
JP2001148616A (ja) 1999-11-19 2001-05-29 Nec Corp 高周波増幅器
JP2003110382A (ja) * 2001-09-27 2003-04-11 Mitsubishi Electric Corp マイクロ波半導体増幅器
DE10204157B4 (de) * 2002-02-01 2005-03-03 Semikron Elektronik Gmbh Drahtbondverbindung für Leistungshalbleiterbauelemente
EP1474864A2 (en) * 2002-02-01 2004-11-10 Koninklijke Philips Electronics N.V. Output circuit for a semiconductor amplifier element
JP2004039657A (ja) * 2002-06-28 2004-02-05 Renesas Technology Corp 半導体装置
JP2005064248A (ja) * 2003-08-12 2005-03-10 Renesas Technology Corp 半導体装置およびその製造方法
KR100586278B1 (ko) * 2004-12-07 2006-06-08 삼성전자주식회사 본딩 와이어 차폐 구조를 가지는 고속 반도체 패키지용인쇄 회로 기판
JP2010183100A (ja) * 2005-01-06 2010-08-19 Mitsubishi Electric Corp 半導体増幅器
US7235422B2 (en) * 2005-02-02 2007-06-26 Agere Systems Inc. Device packages
US20080246547A1 (en) * 2005-03-18 2008-10-09 Nxp B.V. Method And System for Output Matching of Rf Transistors
EP1941546A2 (en) * 2005-10-19 2008-07-09 Nxp B.V. Device comprising an element with electrodes coupled to connections
US7777353B2 (en) * 2006-08-15 2010-08-17 Yamaha Corporation Semiconductor device and wire bonding method therefor
US8125060B2 (en) * 2006-12-08 2012-02-28 Infineon Technologies Ag Electronic component with layered frame
JP2008300685A (ja) * 2007-05-31 2008-12-11 Toshiba Corp 半導体装置及び増幅器
US20090273074A1 (en) * 2008-04-30 2009-11-05 Xiaoming Li Bond wire loop for high speed noise isolation
US8431973B2 (en) * 2008-12-10 2013-04-30 Kabushiki Kaisha Toshiba High frequency semiconductor device
DE102009029040A1 (de) * 2009-08-31 2011-03-03 Robert Bosch Gmbh Vorrichtung und Verfahren zur Herstellung einer Vorrichtung
EP2665181B1 (en) * 2012-05-17 2014-12-17 Nxp B.V. Amplifier circuit
EP2667409A1 (en) * 2012-05-21 2013-11-27 Nxp B.V. Amplifier circuit with a low inductance bond wire arrangement
WO2014073134A1 (ja) * 2012-11-09 2014-05-15 パナソニック株式会社 半導体装置
JP6164721B2 (ja) * 2012-11-09 2017-07-19 住友電工デバイス・イノベーション株式会社 半導体装置
JP6164722B2 (ja) * 2012-12-14 2017-07-19 住友電工デバイス・イノベーション株式会社 半導体装置
JP2014138305A (ja) * 2013-01-17 2014-07-28 Mitsubishi Electric Corp 高周波電力増幅器
JP2015146393A (ja) * 2014-02-03 2015-08-13 カルソニックカンセイ株式会社 超音波ウェッジボンディング構造
EP2933835A1 (en) * 2014-04-15 2015-10-21 Nxp B.V. RF power transistor

Also Published As

Publication number Publication date
KR101878557B1 (ko) 2018-07-13
US9627300B2 (en) 2017-04-18
CN107068623A (zh) 2017-08-18
KR20170033239A (ko) 2017-03-24
US20170077012A1 (en) 2017-03-16
JP2017059650A (ja) 2017-03-23
JP6569417B2 (ja) 2019-09-04
DE102016216702A1 (de) 2017-03-16
DE102016216702B4 (de) 2022-03-03

Similar Documents

Publication Publication Date Title
CN107068623B (zh) 放大器
US7256488B2 (en) Semiconductor package with crossing conductor assembly and method of manufacture
US7683480B2 (en) Methods and apparatus for a reduced inductance wirebond array
JP2716005B2 (ja) ワイヤボンド型半導体装置
US6781220B2 (en) Printed circuit board for semiconductor memory device
JP2961673B2 (ja) 直接式マイクロ回路の減結合装置
CN107123637A (zh) 具有隔离壁的半导体封装
JPH0712050B2 (ja) 半導体チップパッケージ及びその形成方法
US20180158765A1 (en) Integrated circuit package comprising lead frame
US6975024B2 (en) Hybrid integrated circuit device and manufacturing method thereof
WO2008042932A2 (en) Interdigitated leadfingers
US10574198B2 (en) Integrated circuit devices with selectively arranged through substrate vias and method of manufacture thereof
CN103985768B (zh) 半导体光接收装置
US11152288B2 (en) Lead frames for semiconductor packages
WO2007102886A2 (en) Electronic assembly having graded wire bonding
CN102487025A (zh) 用于长结合导线的支撑体
US20200402896A1 (en) Isolated component design
JPH03263334A (ja) 樹脂封止型半導体装置
JP3985016B2 (ja) 半導体装置
EP2509105A1 (en) Semiconductor device having improved performance for high RF output powers
CN114122134B (zh) 一种射频ldmos集成器件
US20040060724A1 (en) Current-carrying electronic component and method of manufacturing same
NL2025182B1 (en) Electronic package and electronic device comprising the same
CN110622286A (zh) 放大器
US20080185740A1 (en) Semiconductor and Method For Producing the Same

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant