CN104718622B - 半导体装置、固体摄像装置和电子设备 - Google Patents

半导体装置、固体摄像装置和电子设备 Download PDF

Info

Publication number
CN104718622B
CN104718622B CN201380053203.0A CN201380053203A CN104718622B CN 104718622 B CN104718622 B CN 104718622B CN 201380053203 A CN201380053203 A CN 201380053203A CN 104718622 B CN104718622 B CN 104718622B
Authority
CN
China
Prior art keywords
wiring layer
semiconductor portion
semiconductor substrate
semiconductor
conductive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380053203.0A
Other languages
English (en)
Chinese (zh)
Other versions
CN104718622A (zh
Inventor
梅林拓
田谷圭司
井上肇
金村龙
金村龙一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to CN201611216307.0A priority Critical patent/CN107425021B/zh
Priority to CN201710220017.1A priority patent/CN107482024B/zh
Priority to CN201910189180.5A priority patent/CN110265414B/zh
Priority to CN201910188795.6A priority patent/CN110246854B/zh
Priority to CN201910196678.4A priority patent/CN110233157B/zh
Publication of CN104718622A publication Critical patent/CN104718622A/zh
Application granted granted Critical
Publication of CN104718622B publication Critical patent/CN104718622B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/182—Colour image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/811—Interconnections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/018—Manufacture or treatment of image sensors covered by group H10F39/12 of hybrid image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/199—Back-illuminated image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/803—Pixels having integrated switching, control, storage or amplification elements
    • H10F39/8037—Pixels having integrated switching, control, storage or amplification elements the integrated elements comprising a transistor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8057—Optical shielding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H10F39/8063—Microlenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/809—Constructional details of image sensors of hybrid image sensors

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
CN201380053203.0A 2012-10-18 2013-10-10 半导体装置、固体摄像装置和电子设备 Active CN104718622B (zh)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CN201611216307.0A CN107425021B (zh) 2012-10-18 2013-10-10 半导体装置、固体摄像装置和电子设备
CN201710220017.1A CN107482024B (zh) 2012-10-18 2013-10-10 固体摄像装置和电子设备
CN201910189180.5A CN110265414B (zh) 2012-10-18 2013-10-10 摄像装置
CN201910188795.6A CN110246854B (zh) 2012-10-18 2013-10-10 光检测装置和电子设备
CN201910196678.4A CN110233157B (zh) 2012-10-18 2013-10-10 光检测装置和电子设备

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2012-230805 2012-10-18
JP2012230805 2012-10-18
JP2013-089580 2013-04-22
JP2013089580A JP2014099582A (ja) 2012-10-18 2013-04-22 固体撮像装置
PCT/JP2013/006055 WO2014061240A1 (en) 2012-10-18 2013-10-10 Semiconductor device, solid-state imaging device and electronic apparatus

Related Child Applications (5)

Application Number Title Priority Date Filing Date
CN201611216307.0A Division CN107425021B (zh) 2012-10-18 2013-10-10 半导体装置、固体摄像装置和电子设备
CN201910196678.4A Division CN110233157B (zh) 2012-10-18 2013-10-10 光检测装置和电子设备
CN201910188795.6A Division CN110246854B (zh) 2012-10-18 2013-10-10 光检测装置和电子设备
CN201910189180.5A Division CN110265414B (zh) 2012-10-18 2013-10-10 摄像装置
CN201710220017.1A Division CN107482024B (zh) 2012-10-18 2013-10-10 固体摄像装置和电子设备

Publications (2)

Publication Number Publication Date
CN104718622A CN104718622A (zh) 2015-06-17
CN104718622B true CN104718622B (zh) 2019-04-05

Family

ID=49474660

Family Applications (6)

Application Number Title Priority Date Filing Date
CN201380053203.0A Active CN104718622B (zh) 2012-10-18 2013-10-10 半导体装置、固体摄像装置和电子设备
CN201710220017.1A Active CN107482024B (zh) 2012-10-18 2013-10-10 固体摄像装置和电子设备
CN201910188795.6A Active CN110246854B (zh) 2012-10-18 2013-10-10 光检测装置和电子设备
CN201611216307.0A Active CN107425021B (zh) 2012-10-18 2013-10-10 半导体装置、固体摄像装置和电子设备
CN201910196678.4A Active CN110233157B (zh) 2012-10-18 2013-10-10 光检测装置和电子设备
CN201910189180.5A Active CN110265414B (zh) 2012-10-18 2013-10-10 摄像装置

Family Applications After (5)

Application Number Title Priority Date Filing Date
CN201710220017.1A Active CN107482024B (zh) 2012-10-18 2013-10-10 固体摄像装置和电子设备
CN201910188795.6A Active CN110246854B (zh) 2012-10-18 2013-10-10 光检测装置和电子设备
CN201611216307.0A Active CN107425021B (zh) 2012-10-18 2013-10-10 半导体装置、固体摄像装置和电子设备
CN201910196678.4A Active CN110233157B (zh) 2012-10-18 2013-10-10 光检测装置和电子设备
CN201910189180.5A Active CN110265414B (zh) 2012-10-18 2013-10-10 摄像装置

Country Status (7)

Country Link
US (10) US9431450B2 (enExample)
EP (3) EP3605611B1 (enExample)
JP (1) JP2014099582A (enExample)
KR (4) KR102278755B1 (enExample)
CN (6) CN104718622B (enExample)
TW (1) TWI595638B (enExample)
WO (1) WO2014061240A1 (enExample)

Families Citing this family (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014099582A (ja) 2012-10-18 2014-05-29 Sony Corp 固体撮像装置
US9129956B2 (en) * 2013-12-11 2015-09-08 Taiwan Semiconductor Manufacturing Company, Ltd. Device having multiple-layer pins in memory MUX1 layout
TWI676280B (zh) * 2014-04-18 2019-11-01 日商新力股份有限公司 固體攝像裝置及具備其之電子機器
JP6598436B2 (ja) * 2014-08-08 2019-10-30 キヤノン株式会社 光電変換装置、撮像システム、及び光電変換装置の製造方法
TWI721960B (zh) 2014-12-18 2021-03-21 日商新力股份有限公司 半導體裝置、製造方法及電子機器
JP2016134587A (ja) * 2015-01-22 2016-07-25 ソニー株式会社 固体撮像装置、及び、電子機器
JP2016208402A (ja) * 2015-04-27 2016-12-08 ソニー株式会社 固体撮像素子およびその駆動方法、並びに電子機器
TWI692859B (zh) * 2015-05-15 2020-05-01 日商新力股份有限公司 固體攝像裝置及其製造方法、以及電子機器
JP6651720B2 (ja) * 2015-07-10 2020-02-19 株式会社ニコン 撮像素子および撮像装置
JP6743035B2 (ja) 2015-10-05 2020-08-19 ソニーセミコンダクタソリューションズ株式会社 撮像装置、製造方法
JP6725231B2 (ja) 2015-10-06 2020-07-15 ソニーセミコンダクタソリューションズ株式会社 固体撮像素子、および電子装置
KR102467033B1 (ko) * 2015-10-29 2022-11-14 삼성전자주식회사 적층형 반도체 소자
JP7020783B2 (ja) * 2016-02-03 2022-02-16 株式会社半導体エネルギー研究所 撮像装置
CN109196647B (zh) * 2016-03-31 2023-08-22 株式会社尼康 摄像元件以及摄像装置
KR102544782B1 (ko) 2016-08-04 2023-06-20 삼성전자주식회사 반도체 패키지 및 그 제조 방법
JP2018129412A (ja) * 2017-02-09 2018-08-16 ソニーセミコンダクタソリューションズ株式会社 半導体装置、および半導体装置の製造方法
US11024663B2 (en) 2017-03-30 2021-06-01 Sony Semiconductor Solutions Corporation Solid-state imaging element, electronic apparatus, and semiconductor device
JP6779825B2 (ja) * 2017-03-30 2020-11-04 キヤノン株式会社 半導体装置および機器
US11329077B2 (en) * 2017-03-31 2022-05-10 Sony Semiconductor Solutions Corporation Semiconductor device with a through electrode reception part wider than a through electrode, solid-state imaging device, and electronic equipment
WO2018186196A1 (ja) * 2017-04-04 2018-10-11 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、及び電子機器
US11201185B2 (en) 2017-04-04 2021-12-14 Sony Semiconductor Solutions Corporation Solid-state imaging device and electronic apparatus
WO2018186026A1 (ja) 2017-04-04 2018-10-11 ソニーセミコンダクタソリューションズ株式会社 半導体装置、半導体装置の製造方法、及び電子機器
CN110476228B (zh) 2017-04-04 2024-01-16 索尼半导体解决方案公司 半导体装置、制造半导体装置的方法和电子设备
CN117558738A (zh) 2017-04-04 2024-02-13 索尼半导体解决方案公司 固态摄像装置和电子设备
WO2018186191A1 (ja) 2017-04-04 2018-10-11 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、及び電子機器
US11594567B2 (en) 2017-04-04 2023-02-28 Sony Group Corporation Solid-state imaging device and electronic apparatus
US10998369B2 (en) 2017-04-04 2021-05-04 Sony Semiconductor Solutions Corporation Solid-state imaging device having an electric coupling structure
US11411036B2 (en) 2017-04-04 2022-08-09 Sony Semiconductor Solutions Corporation Solid-state imaging device and electronic apparatus
DE112018001842T5 (de) * 2017-04-04 2019-12-24 Sony Semiconductor Solutions Corporation Festkörper-bildaufnahmevorrichtung und elektronisches gerät
KR102275684B1 (ko) 2017-04-18 2021-07-13 삼성전자주식회사 반도체 패키지
JP2018185749A (ja) * 2017-04-27 2018-11-22 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置および固体撮像装置の制御方法
US10763242B2 (en) 2017-06-23 2020-09-01 Samsung Electronics Co., Ltd. Semiconductor package and method of manufacturing the same
US20200144322A1 (en) * 2017-07-18 2020-05-07 Sony Semiconductor Solutions Corporation Imaging apparatus and method of manufacturing imaging apparatus
CN110914993B (zh) 2017-07-25 2023-08-15 索尼半导体解决方案公司 固态摄像装置
KR102430496B1 (ko) 2017-09-29 2022-08-08 삼성전자주식회사 이미지 센싱 장치 및 그 제조 방법
TWI905469B (zh) * 2017-10-30 2025-11-21 日商索尼半導體解決方案公司 固體攝像裝置及電子機器
KR102483548B1 (ko) * 2017-10-31 2023-01-02 삼성전자주식회사 이미지 센싱 장치
JP7136800B2 (ja) * 2017-11-14 2022-09-13 ソニーセミコンダクタソリューションズ株式会社 半導体装置および半導体装置の製造方法、並びに撮像装置
WO2019130702A1 (ja) * 2017-12-27 2019-07-04 ソニーセミコンダクタソリューションズ株式会社 撮像装置
JP2019134074A (ja) * 2018-01-31 2019-08-08 ソニーセミコンダクタソリューションズ株式会社 半導体装置及び半導体装置の製造方法
KR102917614B1 (ko) 2018-02-01 2026-01-26 소니 세미컨덕터 솔루션즈 가부시키가이샤 고체 촬상 장치 및 그 제조 방법, 및 전자 기기
JP2019165312A (ja) * 2018-03-19 2019-09-26 ソニーセミコンダクタソリューションズ株式会社 撮像装置および電子機器
WO2019188026A1 (ja) * 2018-03-30 2019-10-03 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、固体撮像装置の製造方法、及び固体撮像装置を搭載した電子機器
WO2019198385A1 (ja) 2018-04-09 2019-10-17 ソニーセミコンダクタソリューションズ株式会社 撮像装置およびその製造方法、電子機器
JP2019192769A (ja) * 2018-04-25 2019-10-31 株式会社東芝 固体撮像素子
KR102719696B1 (ko) * 2018-07-24 2024-10-21 소니 세미컨덕터 솔루션즈 가부시키가이샤 반도체 장치
JP2020053654A (ja) * 2018-09-28 2020-04-02 ソニーセミコンダクタソリューションズ株式会社 固体撮像素子および製造方法、並びに、電子機器
KR102582669B1 (ko) * 2018-10-02 2023-09-25 삼성전자주식회사 이미지 센서
TWI825178B (zh) 2018-10-29 2023-12-11 日商索尼半導體解決方案公司 攝像裝置
TWI866935B (zh) 2018-12-20 2024-12-21 日商索尼半導體解決方案公司 背面照射型固體攝像裝置、背面照射型固體攝像裝置之製造方法、攝像裝置及電子機器
TWI710820B (zh) 2019-03-28 2020-11-21 友達光電股份有限公司 顯示裝置
TWI878310B (zh) 2019-06-26 2025-04-01 日商索尼半導體解決方案公司 半導體裝置
JP2021005656A (ja) 2019-06-26 2021-01-14 ソニーセミコンダクタソリューションズ株式会社 半導体装置及びその製造方法
TWI888385B (zh) * 2019-06-26 2025-07-01 日商索尼半導體解決方案公司 攝像裝置
TWI890682B (zh) 2019-06-26 2025-07-21 日商索尼半導體解決方案公司 半導體裝置及其製造方法
WO2021014731A1 (ja) 2019-07-23 2021-01-28 ソニーセミコンダクタソリューションズ株式会社 半導体パッケージ
TW202118280A (zh) 2019-09-10 2021-05-01 日商索尼半導體解決方案公司 攝像裝置、電子機𠾖及製造方法
KR102771906B1 (ko) 2019-11-06 2025-02-28 삼성전자주식회사 이미지 센서 및 그 제조 방법
JP7603382B2 (ja) * 2019-11-18 2024-12-20 ソニーセミコンダクタソリューションズ株式会社 撮像素子および撮像素子の製造方法
JP2020074484A (ja) * 2020-02-10 2020-05-14 株式会社ニコン 半導体装置
US20230282618A1 (en) * 2020-07-16 2023-09-07 Ultramemory Inc. Semiconductor device and method for manufacturing same
JP2022040579A (ja) * 2020-08-31 2022-03-11 ソニーセミコンダクタソリューションズ株式会社 半導体装置、および、半導体装置の製造方法
CN116057687A (zh) * 2020-10-16 2023-05-02 索尼半导体解决方案公司 成像装置和电子设备
CN116438644A (zh) * 2020-11-17 2023-07-14 索尼半导体解决方案公司 光接收装置及距离测量装置
JP2022089275A (ja) 2020-12-04 2022-06-16 ソニーセミコンダクタソリューションズ株式会社 撮像装置、電子機器、製造方法
CN113076567B (zh) * 2021-04-13 2023-07-25 浪潮电子信息产业股份有限公司 一种通信管理方法、装置及设备
KR102897593B1 (ko) 2021-06-03 2025-12-10 삼성전자주식회사 이미지 센서 및 이미지 센서의 제조 방법
EP4358144A4 (en) 2021-06-16 2025-03-19 Sony Semiconductor Solutions Corporation LIGHT DETECTION DEVICE, METHOD FOR MANUFACTURING LIGHT DETECTION DEVICE, AND ELECTRONIC DEVICE
KR102945810B1 (ko) * 2021-07-22 2026-03-30 에스케이하이닉스 주식회사 이미지 센싱 장치
KR20240035449A (ko) * 2021-07-27 2024-03-15 소니 세미컨덕터 솔루션즈 가부시키가이샤 고체 촬상 소자, 촬상 장치 및 전자 기기
KR102967345B1 (ko) 2021-09-13 2026-05-19 삼성전자주식회사 이미지 센서
KR20230073031A (ko) 2021-11-18 2023-05-25 삼성전자주식회사 3차원 집적 회로 구조체 및 그의 제조 방법
US12684888B2 (en) 2022-09-06 2026-07-14 Taiwan Semiconductor Manufacturing Company, Ltd. Bonding structures for stacked image sensor
US20260150426A1 (en) * 2022-10-19 2026-05-28 Sony Semiconductor Solutions Corporation Semiconductor device
JP2024092692A (ja) * 2022-12-26 2024-07-08 キヤノン株式会社 半導体装置および機器
US12653030B2 (en) 2023-06-30 2026-06-09 International Business Machines Corporation Double-sided integrated circuit with electrostatic guard ring
US12585149B2 (en) 2023-12-26 2026-03-24 Omnivision Technologies, Inc. Liquid crystal on silicon display device having stacked integrated circuit substrates
CN122556194A (zh) * 2024-01-31 2026-08-11 松下知识产权经营株式会社 摄像装置及其制造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200803484A (en) * 2006-02-27 2008-01-01 Mitsumasa Koyanagi Stack-type semiconductor device with integrated sensors
US20110049336A1 (en) * 2009-08-28 2011-03-03 Sony Corporation Solid-state imaging device, manufacturing method therefor, and electronic device
CN102386196A (zh) * 2010-09-02 2012-03-21 索尼公司 半导体器件、其制造方法和电子装置
US20120241981A1 (en) * 2011-03-24 2012-09-27 Sony Corporation Semiconductor device and method for manufacturing same

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4126747B2 (ja) * 1998-02-27 2008-07-30 セイコーエプソン株式会社 3次元デバイスの製造方法
JP3713418B2 (ja) * 2000-05-30 2005-11-09 光正 小柳 3次元画像処理装置の製造方法
JP4483542B2 (ja) * 2004-11-18 2010-06-16 パナソニック株式会社 受光素子の製造方法
TWI429066B (zh) * 2005-06-02 2014-03-01 新力股份有限公司 Semiconductor image sensor module and manufacturing method thereof
KR100801447B1 (ko) * 2006-06-19 2008-02-11 (주)실리콘화일 배면 광 포토다이오드를 이용한 이미지센서 및 그 제조방법
KR101185886B1 (ko) * 2007-07-23 2012-09-25 삼성전자주식회사 유니버설 배선 라인들을 포함하는 반도체 칩, 반도체패키지, 카드 및 시스템
JP4609497B2 (ja) * 2008-01-21 2011-01-12 ソニー株式会社 固体撮像装置とその製造方法、及びカメラ
US7897431B2 (en) * 2008-02-01 2011-03-01 Promos Technologies, Inc. Stacked semiconductor device and method
JP5374941B2 (ja) * 2008-07-02 2013-12-25 ソニー株式会社 固体撮像装置及び電子機器
US8471939B2 (en) * 2008-08-01 2013-06-25 Omnivision Technologies, Inc. Image sensor having multiple sensing layers
JP4798232B2 (ja) * 2009-02-10 2011-10-19 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
JP5985136B2 (ja) 2009-03-19 2016-09-06 ソニー株式会社 半導体装置とその製造方法、及び電子機器
KR101648200B1 (ko) * 2009-10-22 2016-08-12 삼성전자주식회사 이미지 센서 및 그 제조 방법
JP5442394B2 (ja) * 2009-10-29 2014-03-12 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
JP5568969B2 (ja) * 2009-11-30 2014-08-13 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
TWI515885B (zh) * 2009-12-25 2016-01-01 新力股份有限公司 半導體元件及其製造方法,及電子裝置
JP5489705B2 (ja) * 2009-12-26 2014-05-14 キヤノン株式会社 固体撮像装置および撮像システム
US8841777B2 (en) * 2010-01-12 2014-09-23 International Business Machines Corporation Bonded structure employing metal semiconductor alloy bonding
JP5693060B2 (ja) * 2010-06-30 2015-04-01 キヤノン株式会社 固体撮像装置、及び撮像システム
JP5553693B2 (ja) * 2010-06-30 2014-07-16 キヤノン株式会社 固体撮像装置及び撮像システム
JP2012033894A (ja) 2010-06-30 2012-02-16 Canon Inc 固体撮像装置
US8267552B2 (en) 2010-07-19 2012-09-18 Wen-Sung Hu Light-transmissive shell capable of intensifying illuminant and wide-angle light transmission
JP5810493B2 (ja) * 2010-09-03 2015-11-11 ソニー株式会社 半導体集積回路、電子機器、固体撮像装置、撮像装置
JP5500007B2 (ja) * 2010-09-03 2014-05-21 ソニー株式会社 固体撮像素子およびカメラシステム
JP2012064709A (ja) * 2010-09-15 2012-03-29 Sony Corp 固体撮像装置及び電子機器
JP5696513B2 (ja) * 2011-02-08 2015-04-08 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
JP2012230805A (ja) 2011-04-26 2012-11-22 Shin Etsu Polymer Co Ltd 防水・防塵キーシート及びその製造方法
JP6031765B2 (ja) 2011-07-05 2016-11-24 ソニー株式会社 半導体装置、電子機器、及び、半導体装置の製造方法
JP5901222B2 (ja) 2011-10-24 2016-04-06 株式会社アイ・ライティング・システム 光源ユニット
JP6214132B2 (ja) * 2012-02-29 2017-10-18 キヤノン株式会社 光電変換装置、撮像システムおよび光電変換装置の製造方法
JP2013219319A (ja) * 2012-03-16 2013-10-24 Sony Corp 半導体装置、半導体装置の製造方法、半導体ウエハ、及び、電子機器
US8766387B2 (en) * 2012-05-18 2014-07-01 Taiwan Semiconductor Manufacturing Company, Ltd. Vertically integrated image sensor chips and methods for forming the same
JP6012262B2 (ja) * 2012-05-31 2016-10-25 キヤノン株式会社 半導体装置の製造方法
JP6156861B2 (ja) 2012-09-11 2017-07-05 株式会社アカリネ 照明装置
TWI595637B (zh) * 2012-09-28 2017-08-11 新力股份有限公司 半導體裝置及電子機器
JP2014099582A (ja) * 2012-10-18 2014-05-29 Sony Corp 固体撮像装置
US9165829B2 (en) * 2013-10-02 2015-10-20 Taiwan Semiconductor Manufacturing Company, Ltd. Double sided NMOS/PMOS structure and methods of forming the same
JPWO2017126024A1 (ja) * 2016-01-19 2018-11-08 オリンパス株式会社 固体撮像装置および撮像装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200803484A (en) * 2006-02-27 2008-01-01 Mitsumasa Koyanagi Stack-type semiconductor device with integrated sensors
US20110049336A1 (en) * 2009-08-28 2011-03-03 Sony Corporation Solid-state imaging device, manufacturing method therefor, and electronic device
CN102386196A (zh) * 2010-09-02 2012-03-21 索尼公司 半导体器件、其制造方法和电子装置
US20120241981A1 (en) * 2011-03-24 2012-09-27 Sony Corporation Semiconductor device and method for manufacturing same

Also Published As

Publication number Publication date
CN110265414B (zh) 2023-05-12
US20220246668A1 (en) 2022-08-04
TWI595638B (zh) 2017-08-11
US20200035744A1 (en) 2020-01-30
US9917131B2 (en) 2018-03-13
US20210043676A1 (en) 2021-02-11
EP3605611B1 (en) 2023-11-29
US20190229145A1 (en) 2019-07-25
CN110246854B (zh) 2023-05-12
US20160218135A1 (en) 2016-07-28
US20170148839A1 (en) 2017-05-25
KR20210016645A (ko) 2021-02-16
US10840290B2 (en) 2020-11-17
US20240096925A1 (en) 2024-03-21
US9431450B2 (en) 2016-08-30
CN110246854A (zh) 2019-09-17
US11374049B2 (en) 2022-06-28
US10475845B2 (en) 2019-11-12
US12408451B2 (en) 2025-09-02
EP4293723A2 (en) 2023-12-20
KR102153762B1 (ko) 2020-09-08
CN110265414A (zh) 2019-09-20
CN107425021B (zh) 2019-01-29
WO2014061240A1 (en) 2014-04-24
KR102278755B1 (ko) 2021-07-20
CN110233157B (zh) 2023-05-12
EP2909862B1 (en) 2022-12-14
CN110233157A (zh) 2019-09-13
EP4293723A3 (en) 2024-03-13
US20150270307A1 (en) 2015-09-24
US10535700B2 (en) 2020-01-14
CN104718622A (zh) 2015-06-17
KR20150066527A (ko) 2015-06-16
JP2014099582A (ja) 2014-05-29
CN107425021A (zh) 2017-12-01
EP2909862A1 (en) 2015-08-26
KR102224120B1 (ko) 2021-03-05
CN107482024B (zh) 2020-10-27
US20180122850A1 (en) 2018-05-03
US9570499B2 (en) 2017-02-14
US11875989B2 (en) 2024-01-16
KR20210083382A (ko) 2021-07-06
EP3605611A1 (en) 2020-02-05
KR20200106219A (ko) 2020-09-11
US20180350867A1 (en) 2018-12-06
KR102679748B1 (ko) 2024-07-01
US10128301B2 (en) 2018-11-13
TW201417255A (zh) 2014-05-01
CN107482024A (zh) 2017-12-15

Similar Documents

Publication Publication Date Title
CN107425021B (zh) 半导体装置、固体摄像装置和电子设备
JP6376245B2 (ja) 固体撮像装置、および電子機器

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant