CN103119082A - 包括具有由立体有择多环2,3-二醇单体衍生的重复单元的聚碳酸酯的牺牲聚合物组合物 - Google Patents

包括具有由立体有择多环2,3-二醇单体衍生的重复单元的聚碳酸酯的牺牲聚合物组合物 Download PDF

Info

Publication number
CN103119082A
CN103119082A CN2011800459816A CN201180045981A CN103119082A CN 103119082 A CN103119082 A CN 103119082A CN 2011800459816 A CN2011800459816 A CN 2011800459816A CN 201180045981 A CN201180045981 A CN 201180045981A CN 103119082 A CN103119082 A CN 103119082A
Authority
CN
China
Prior art keywords
polymeric compositions
sacrificial polymeric
polymer
alkyl
sacrificial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011800459816A
Other languages
English (en)
Chinese (zh)
Inventor
A·拜尔
R·A·希克
L·兰斯朵夫
K·塞托
W·C·P·桑
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Promerus LLC
Original Assignee
Promerus LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Promerus LLC filed Critical Promerus LLC
Publication of CN103119082A publication Critical patent/CN103119082A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G64/00Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
    • C08G64/02Aliphatic polycarbonates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • B23K35/362Selection of compositions of fluxes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • B23K35/3612Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
    • B23K35/3613Polymers, e.g. resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G64/00Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
    • C08G64/02Aliphatic polycarbonates
    • C08G64/0208Aliphatic polycarbonates saturated
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/07Aldehydes; Ketones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/09Carboxylic acids; Metal salts thereof; Anhydrides thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/15Heterocyclic compounds having oxygen in the ring
    • C08K5/151Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
    • C08K5/1535Five-membered rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/36Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41Compounds containing sulfur bound to oxygen
    • C08K5/42Sulfonic acids; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/55Boron-containing compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J169/00Adhesives based on polycarbonates; Adhesives based on derivatives of polycarbonates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0033Additives activating the degradation of the macromolecular compound

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Polyethers (AREA)
CN2011800459816A 2010-08-06 2011-08-05 包括具有由立体有择多环2,3-二醇单体衍生的重复单元的聚碳酸酯的牺牲聚合物组合物 Pending CN103119082A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US37121110P 2010-08-06 2010-08-06
US37148910P 2010-08-06 2010-08-06
US61/371,211 2010-08-06
US61/371,489 2010-08-06
PCT/US2011/046729 WO2012019091A1 (en) 2010-08-06 2011-08-05 Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers

Publications (1)

Publication Number Publication Date
CN103119082A true CN103119082A (zh) 2013-05-22

Family

ID=45555212

Family Applications (2)

Application Number Title Priority Date Filing Date
CN2011800459816A Pending CN103119082A (zh) 2010-08-06 2011-08-05 包括具有由立体有择多环2,3-二醇单体衍生的重复单元的聚碳酸酯的牺牲聚合物组合物
CN201180045991.XA Expired - Fee Related CN103154081B (zh) 2010-08-06 2011-08-05 用于微电子组装件的聚合物组合物

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201180045991.XA Expired - Fee Related CN103154081B (zh) 2010-08-06 2011-08-05 用于微电子组装件的聚合物组合物

Country Status (6)

Country Link
US (4) US8575248B2 (enExample)
EP (2) EP2601239A1 (enExample)
JP (2) JP5837069B2 (enExample)
KR (2) KR101650893B1 (enExample)
CN (2) CN103119082A (enExample)
WO (2) WO2012019091A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111848933A (zh) * 2020-06-28 2020-10-30 吴君宇 一种可降解共聚酯的制备方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5837069B2 (ja) 2010-08-06 2015-12-24 プロメラス, エルエルシー 立体特異性多環式2,3−ジオールモノマーから誘導される繰り返し単位を有するポリカーボネートを含む犠牲ポリマー組成物
US8535454B2 (en) * 2010-11-23 2013-09-17 Promerus, Llc Polymer composition for microelectronic assembly
WO2014007231A1 (ja) * 2012-07-04 2014-01-09 株式会社カネカ ポジ型感光性組成物、薄膜トランジスタ及び化合物
US9505948B2 (en) * 2012-12-17 2016-11-29 Promerus, Llc Thermally decomposable polymer compositions for forming microelectronic assemblies
TW201446876A (zh) * 2013-02-28 2014-12-16 Promerus Llc 具有聚環官能側基之高玻璃轉換溫度之光可成像聚碳酸酯類聚合物
JP6612533B2 (ja) * 2015-06-12 2019-11-27 三菱瓦斯化学株式会社 反応現像画像形成法、反応現像画像形成法に用いられる感光性樹脂組成物、および反応現像画像形成方法により製造された基板ならびに構造物
JP6807226B2 (ja) * 2016-12-09 2021-01-06 東京応化工業株式会社 基材上に平坦化膜又はマイクロレンズを形成するために用いられるエネルギー感受性組成物、硬化体の製造方法、硬化体、マイクロレンズの製造方法、及びcmosイメージセンサ
KR101880151B1 (ko) * 2017-07-12 2018-07-20 주식회사 삼양사 폴리노보넨-폴리카보네이트 공중합체 및 그 제조방법
CN114161031A (zh) * 2021-12-30 2022-03-11 广东芯聚能半导体有限公司 助焊剂、助焊膜、预制焊片及其应用
JP2023135288A (ja) * 2022-03-15 2023-09-28 旭化成株式会社 メチレン鎖を含む脂環式ポリカーボネート樹脂
JPWO2024042951A1 (enExample) * 2022-08-23 2024-02-29
JP2023052255A (ja) * 2022-08-23 2023-04-11 サンアプロ株式会社 酸発生剤、前記酸発生剤を含む硬化性組成物、及びその硬化物
WO2025203788A1 (ja) * 2024-03-26 2025-10-02 リンテック株式会社 分解性フィルムの使用方法およびレジストパターンの作製方法
JP7745814B1 (ja) * 2024-03-26 2025-09-29 リンテック株式会社 分解性フィルムの使用方法およびレジストパターンの作製方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950736A (en) * 1988-09-02 1990-08-21 Kuraray Company, Ltd. Polycarbonate or polyestercarbonate resin from bicyclol polycyclo dimethanol
JPH05339355A (ja) * 1992-06-09 1993-12-21 Kuraray Co Ltd ポリカーボネート系樹脂のフィルムまたはシート
US20040146803A1 (en) * 2002-11-01 2004-07-29 Kohl Paul A. Sacrificial compositions, methods of use thereof, and methods of decomposition thereof
CN101360849A (zh) * 2005-11-18 2009-02-04 莱里斯奥鲁斯技术公司 一种形成多层结构的方法
US20090294515A1 (en) * 2008-05-30 2009-12-03 Prack Edward R Mounting integrated circuit components on substrates

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3492330A (en) * 1965-12-09 1970-01-27 Union Carbide Corp Norbornane diisocyanates
UST896033I4 (en) * 1971-05-07 1972-03-14 Defensive publication
JPH0269519A (ja) * 1988-09-02 1990-03-08 Kuraray Co Ltd ポリカーボネート系樹脂
US5004508A (en) 1989-12-12 1991-04-02 International Business Machines Corporation Thermally dissipated soldering flux
US5004509A (en) 1990-05-04 1991-04-02 Delco Electronics Corporation Low residue soldering flux
US4994119A (en) 1990-05-09 1991-02-19 International Business Machines Corporation Water soluble soldering flux
US5122200A (en) 1990-09-17 1992-06-16 Motorola, Inc. Method of cleaning printed circuit boards using formic acid
US5177134A (en) * 1990-12-03 1993-01-05 Motorola, Inc. Tacking agent
JP2957777B2 (ja) * 1991-09-11 1999-10-06 株式会社クラレ 縮合環含有化合物
US5129962A (en) 1991-10-22 1992-07-14 International Business Machines Corporation Tacky, no-clean thermally dissipated soldering flux
DE4338225A1 (de) 1993-11-09 1995-05-11 Linde Ag Verfahren zum Wellenlöten mit bleifreien Lotmaterialien
US5615827A (en) 1994-05-31 1997-04-01 International Business Machines Corporation Flux composition and corresponding soldering method
JP3989088B2 (ja) * 1998-05-25 2007-10-10 住友ベークライト株式会社 フォトレジスト用被膜形成材料、フォトレジスト組成物及びパターン形成方法
US6217671B1 (en) 1999-12-14 2001-04-17 International Business Machines Corporation Composition for increasing activity of a no-clean flux
TWI250968B (en) * 2000-04-04 2006-03-11 Asahi Kasei Corp Coating composition for use in producing a silica insulating thin film and method for producing a silica insulating thin film
KR100812891B1 (ko) * 2000-04-28 2008-03-11 메르크 파텐트 게엠베하 무기물 표면용 에칭 페이스트
EP1330327B1 (de) 2000-10-06 2010-03-17 Pac Tech - Packaging Technologies GmbH Verfahren zum flussmittelfreien aufbringen eines lötmittels auf ein substrat oder einen chip
GB2380964B (en) 2001-09-04 2005-01-12 Multicore Solders Ltd Lead-free solder paste
US6592090B1 (en) 2002-08-23 2003-07-15 Chin-Chu Li Object supporting structure
US7799516B2 (en) * 2002-10-16 2010-09-21 Georgia Tech Research Corporation Polymers, methods of use thereof, and methods of decomposition thereof
US7157025B2 (en) * 2003-03-27 2007-01-02 Toda Kogyo Corporation Transparent coloring composition and color filter
EP1758814A4 (en) * 2004-03-15 2010-12-15 Georgia Tech Res Inst CAPACITY FOR ELECTRO-MECHANICAL MICROSYSTEMS AND MANUFACTURING METHOD THEREFOR
WO2006066026A1 (en) * 2004-12-15 2006-06-22 E. I. Du Pont De Nemours And Company Durable coating compositions containing novel aspartic amine compounds
EP1893355A1 (en) * 2005-06-16 2008-03-05 Advanced Technology Materials, Inc. Dense fluid compositions for removal of hardened photoresist, post-etch residue and/or bottom anti-reflective coating layers
US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US8110015B2 (en) 2007-05-30 2012-02-07 Illinois Tool Works, Inc. Method and apparatus for removing contaminants from a reflow apparatus
JP5433945B2 (ja) * 2007-12-12 2014-03-05 三菱化学株式会社 ポリカーボネートからなる車両用ランプレンズ
US7971347B2 (en) 2008-06-27 2011-07-05 Intel Corporation Method of interconnecting workpieces
US8575245B2 (en) 2008-12-23 2013-11-05 Novomer, Inc. Tunable polymer compositions
JP5339355B2 (ja) 2009-03-31 2013-11-13 Ykk Ap株式会社
TWI479259B (zh) * 2009-06-15 2015-04-01 Sumitomo Bakelite Co A temporary fixing agent for a semiconductor wafer, and a method of manufacturing the semiconductor device using the same
KR101071401B1 (ko) * 2010-07-07 2011-10-07 주식회사 엘지화학 광반응성 노보넨계 공중합체, 이의 제조 방법 및 이를 포함하는 배향막
JP5837069B2 (ja) * 2010-08-06 2015-12-24 プロメラス, エルエルシー 立体特異性多環式2,3−ジオールモノマーから誘導される繰り返し単位を有するポリカーボネートを含む犠牲ポリマー組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950736A (en) * 1988-09-02 1990-08-21 Kuraray Company, Ltd. Polycarbonate or polyestercarbonate resin from bicyclol polycyclo dimethanol
JPH05339355A (ja) * 1992-06-09 1993-12-21 Kuraray Co Ltd ポリカーボネート系樹脂のフィルムまたはシート
US20040146803A1 (en) * 2002-11-01 2004-07-29 Kohl Paul A. Sacrificial compositions, methods of use thereof, and methods of decomposition thereof
CN101360849A (zh) * 2005-11-18 2009-02-04 莱里斯奥鲁斯技术公司 一种形成多层结构的方法
US20090294515A1 (en) * 2008-05-30 2009-12-03 Prack Edward R Mounting integrated circuit components on substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111848933A (zh) * 2020-06-28 2020-10-30 吴君宇 一种可降解共聚酯的制备方法
CN111848933B (zh) * 2020-06-28 2022-08-23 吴君宇 一种可降解共聚酯的制备方法

Also Published As

Publication number Publication date
EP2601238A1 (en) 2013-06-12
KR20130139234A (ko) 2013-12-20
WO2012019091A1 (en) 2012-02-09
JP5837069B2 (ja) 2015-12-24
JP2013540837A (ja) 2013-11-07
US8729166B2 (en) 2014-05-20
US20120031556A1 (en) 2012-02-09
CN103154081A (zh) 2013-06-12
JP5704495B2 (ja) 2015-04-22
US20140024750A1 (en) 2014-01-23
WO2012019092A1 (en) 2012-02-09
KR20130138192A (ko) 2013-12-18
EP2601238B1 (en) 2015-10-07
US20140024799A1 (en) 2014-01-23
KR101650893B1 (ko) 2016-08-25
JP2013535562A (ja) 2013-09-12
CN103154081B (zh) 2015-11-25
US8729215B2 (en) 2014-05-20
EP2601239A1 (en) 2013-06-12
KR101729065B1 (ko) 2017-04-21
US20120034387A1 (en) 2012-02-09
US8575297B2 (en) 2013-11-05
US8575248B2 (en) 2013-11-05

Similar Documents

Publication Publication Date Title
CN103119082A (zh) 包括具有由立体有择多环2,3-二醇单体衍生的重复单元的聚碳酸酯的牺牲聚合物组合物
TW201131668A (en) Method for manufacturing electronic device, electronic device, method for manufacturing electronic device package and electronic device package
TWI832024B (zh) 樹脂組成物、樹脂片、多層印刷電路板、以及半導體裝置
TWI363773B (en) Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
JP5969018B2 (ja) 熱活性化塩基発生剤を包含する熱分解性ポリマー組成物
JP2019085533A (ja) 硬化性組成物及びそれを用いた光学素子
TW201446876A (zh) 具有聚環官能側基之高玻璃轉換溫度之光可成像聚碳酸酯類聚合物
TW201406806A (zh) 二環氧化合物及其製造方法
TWI491667B (zh) 包含具有衍生自立體特異性聚環2,3-二醇單體之重複單元的聚碳酸酯類的犧牲性聚合物組成物
CN103221482B (zh) 用于微电子组装体的聚合物组合物
JP6853608B2 (ja) 高ガラス転移温度を有するアダマンタンエポキシドに由来するポリカーボネート
JP2009067724A (ja) 環状化合物、フォトレジスト基材及びフォトレジスト組成物
TWI585152B (zh) 用於形成微電子裝配之熱可分解聚合物組成物
JP2010059110A (ja) フラーレン誘導体並びにその溶液、及びその膜
JP5690043B2 (ja) フラーレン誘導体溶液、フラーレン誘導体膜及びフラーレン誘導体
JP5895602B2 (ja) 架橋性フラーレン組成物
KR20250017166A (ko) 적층체, 및 전자 부품의 제조 방법
TW200304455A (en) Polyether and its production method
JP2023087510A (ja) 分離層形成用組成物、分離層付き支持基体、積層体及びその製造方法、並びに電子部品の製造方法
TWI491666B (zh) 微電子組件用聚合物組成物
JP2013103928A (ja) フラーレン誘導体及びその製造方法、並びにフラーレン誘導体組成物、フラーレン誘導体溶液及びフラーレン誘導体膜

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C12 Rejection of a patent application after its publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20130522