CN102414848B - 半导体元件及制作半导体元件的方法 - Google Patents
半导体元件及制作半导体元件的方法 Download PDFInfo
- Publication number
- CN102414848B CN102414848B CN201080018398.1A CN201080018398A CN102414848B CN 102414848 B CN102414848 B CN 102414848B CN 201080018398 A CN201080018398 A CN 201080018398A CN 102414848 B CN102414848 B CN 102414848B
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- CN
- China
- Prior art keywords
- mentioned
- type semiconductor
- semiconductor regions
- interarea
- degree
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
Landscapes
- Electrodes Of Semiconductors (AREA)
- Led Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010008189A JP5749888B2 (ja) | 2010-01-18 | 2010-01-18 | 半導体素子及び半導体素子を作製する方法 |
| JP2010-008189 | 2010-01-18 | ||
| PCT/JP2010/070308 WO2011086755A1 (ja) | 2010-01-18 | 2010-11-15 | 半導体素子及び半導体素子を作製する方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102414848A CN102414848A (zh) | 2012-04-11 |
| CN102414848B true CN102414848B (zh) | 2014-07-09 |
Family
ID=44276930
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201080018398.1A Expired - Fee Related CN102414848B (zh) | 2010-01-18 | 2010-11-15 | 半导体元件及制作半导体元件的方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8227898B2 (https=) |
| EP (1) | EP2528118A4 (https=) |
| JP (1) | JP5749888B2 (https=) |
| KR (1) | KR20110110803A (https=) |
| CN (1) | CN102414848B (https=) |
| TW (1) | TW201131810A (https=) |
| WO (1) | WO2011086755A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5573856B2 (ja) * | 2012-01-26 | 2014-08-20 | 住友電気工業株式会社 | Iii族窒化物半導体レーザ、及びiii族窒化物半導体レーザを作製する方法 |
| JP5828568B1 (ja) * | 2014-08-29 | 2015-12-09 | 株式会社タムラ製作所 | 半導体素子及びその製造方法 |
| KR101636625B1 (ko) * | 2014-12-18 | 2016-07-05 | 고려대학교 산학협력단 | p형 반도체 박막 구조물의 형성 방법 및 이를 이용한 p형 오믹 전극의 제조 방법 |
| KR102331337B1 (ko) * | 2015-02-16 | 2021-11-26 | 서울바이오시스 주식회사 | 발광 소자 |
| KR102544673B1 (ko) * | 2020-10-29 | 2023-06-20 | 웨이브로드 주식회사 | 반도체 발광소자 및 이를 제조하는 방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007258375A (ja) * | 2006-03-22 | 2007-10-04 | Rohm Co Ltd | 半導体素子の製造方法 |
| CN101099223A (zh) * | 2005-01-11 | 2008-01-02 | 美商旭明国际股份有限公司 | 具有导电性金属衬底的发光二极管 |
| JP4375497B1 (ja) * | 2009-03-11 | 2009-12-02 | 住友電気工業株式会社 | Iii族窒化物半導体素子、エピタキシャル基板、及びiii族窒化物半導体素子を作製する方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2778349B2 (ja) | 1992-04-10 | 1998-07-23 | 日亜化学工業株式会社 | 窒化ガリウム系化合物半導体の電極 |
| JP3620926B2 (ja) | 1995-06-16 | 2005-02-16 | 豊田合成株式会社 | p伝導形3族窒化物半導体の電極及び電極形成方法及び素子 |
| JP3555419B2 (ja) | 1997-12-18 | 2004-08-18 | 豊田合成株式会社 | 窒化ガリウム系化合物半導体の電極形成方法及び素子の製造方法 |
| JP4063050B2 (ja) | 2002-10-31 | 2008-03-19 | 豊田合成株式会社 | p型III族窒化物系化合物半導体の電極およびその製造方法 |
| JP2006013474A (ja) * | 2004-05-26 | 2006-01-12 | Showa Denko Kk | 窒化ガリウム系化合物半導体発光素子 |
| US8049243B2 (en) | 2004-05-26 | 2011-11-01 | Showa Denko K.K. | Gallium nitride-based compound semiconductor light emitting device |
| FI20045482A0 (fi) * | 2004-12-14 | 2004-12-14 | Optogan Oy | Matalamman dislokaatiotiheyden omaava puolijohdesubstraatti, ja menetelmä sen valmistamiseksi |
| JP2008109021A (ja) * | 2006-10-27 | 2008-05-08 | Rohm Co Ltd | 半導体発光素子 |
| JP2009081374A (ja) * | 2007-09-27 | 2009-04-16 | Rohm Co Ltd | 半導体発光素子 |
| JP4390007B2 (ja) * | 2008-04-07 | 2009-12-24 | 住友電気工業株式会社 | Iii族窒化物半導体素子及びエピタキシャルウエハ |
| CN101874309B (zh) * | 2008-09-11 | 2013-01-30 | 住友电气工业株式会社 | 氮化物类半导体光元件、用于氮化物类半导体光元件的外延晶片及制造半导体发光元件的方法 |
| JP4475357B1 (ja) * | 2009-06-17 | 2010-06-09 | 住友電気工業株式会社 | Iii族窒化物半導体レーザ素子、及びiii族窒化物半導体レーザ素子を作製する方法 |
-
2010
- 2010-01-18 JP JP2010008189A patent/JP5749888B2/ja not_active Expired - Fee Related
- 2010-07-14 US US12/836,222 patent/US8227898B2/en not_active Expired - Fee Related
- 2010-11-15 KR KR1020117018941A patent/KR20110110803A/ko not_active Ceased
- 2010-11-15 EP EP10843110.7A patent/EP2528118A4/en not_active Withdrawn
- 2010-11-15 CN CN201080018398.1A patent/CN102414848B/zh not_active Expired - Fee Related
- 2010-11-15 WO PCT/JP2010/070308 patent/WO2011086755A1/ja not_active Ceased
- 2010-11-30 TW TW099141600A patent/TW201131810A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101099223A (zh) * | 2005-01-11 | 2008-01-02 | 美商旭明国际股份有限公司 | 具有导电性金属衬底的发光二极管 |
| JP2007258375A (ja) * | 2006-03-22 | 2007-10-04 | Rohm Co Ltd | 半導体素子の製造方法 |
| JP4375497B1 (ja) * | 2009-03-11 | 2009-12-02 | 住友電気工業株式会社 | Iii族窒化物半導体素子、エピタキシャル基板、及びiii族窒化物半導体素子を作製する方法 |
Non-Patent Citations (1)
| Title |
|---|
| JP特开2007-258375A 2007.10.04 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2011146636A (ja) | 2011-07-28 |
| JP5749888B2 (ja) | 2015-07-15 |
| EP2528118A4 (en) | 2015-04-22 |
| KR20110110803A (ko) | 2011-10-07 |
| US8227898B2 (en) | 2012-07-24 |
| WO2011086755A1 (ja) | 2011-07-21 |
| CN102414848A (zh) | 2012-04-11 |
| US20110175103A1 (en) | 2011-07-21 |
| EP2528118A1 (en) | 2012-11-28 |
| TW201131810A (en) | 2011-09-16 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140709 Termination date: 20151115 |
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| EXPY | Termination of patent right or utility model |