CH620181A5 - Process for the preparation of synthetic quartz glass, apparatus to carry out the process, and the use of the synthetic quartz glass - Google Patents
Process for the preparation of synthetic quartz glass, apparatus to carry out the process, and the use of the synthetic quartz glass Download PDFInfo
- Publication number
- CH620181A5 CH620181A5 CH698276A CH698276A CH620181A5 CH 620181 A5 CH620181 A5 CH 620181A5 CH 698276 A CH698276 A CH 698276A CH 698276 A CH698276 A CH 698276A CH 620181 A5 CH620181 A5 CH 620181A5
- Authority
- CH
- Switzerland
- Prior art keywords
- quartz glass
- free
- synthetic quartz
- refractive index
- plasma torch
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 40
- 238000000034 method Methods 0.000 title claims description 20
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 150000002222 fluorine compounds Chemical class 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000013307 optical fiber Substances 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 238000005253 cladding Methods 0.000 claims description 5
- 230000006698 induction Effects 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 150000003377 silicon compounds Chemical class 0.000 claims description 4
- 239000004338 Dichlorodifluoromethane Substances 0.000 claims description 3
- 230000007423 decrease Effects 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 238000005137 deposition process Methods 0.000 claims description 3
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 claims description 3
- 235000019404 dichlorodifluoromethane Nutrition 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910021645 metal ion Inorganic materials 0.000 claims description 3
- 230000003247 decreasing effect Effects 0.000 claims description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000000047 product Substances 0.000 description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 239000011162 core material Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
- C03B37/01426—Plasma deposition burners or torches
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19752536457 DE2536457C3 (de) | 1975-08-16 | Verfahren zur Herstellung von synthetischem, OH-Ionen-freiem Quarzglas, Vorrichtung zur Durchführung des Verfahrens und Verwendung des synthetischen Quarzglases |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH620181A5 true CH620181A5 (en) | 1980-11-14 |
Family
ID=5954072
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH698276A CH620181A5 (en) | 1975-08-16 | 1976-06-02 | Process for the preparation of synthetic quartz glass, apparatus to carry out the process, and the use of the synthetic quartz glass |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | USRE30883E (enExample) |
| JP (1) | JPS5224217A (enExample) |
| CH (1) | CH620181A5 (enExample) |
| FR (1) | FR2321459A1 (enExample) |
| GB (1) | GB1492920A (enExample) |
| NL (1) | NL176662C (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1029993A (en) * | 1975-09-11 | 1978-04-25 | Frederick D. King | Optical fibre transmission line |
| IT1091498B (it) * | 1977-11-25 | 1985-07-06 | Cselt Centro Studi Lab Telecom | Procedimento ed apparecchiatura per la produzione continua di fibre ottiche |
| FR2428618A1 (fr) * | 1978-06-16 | 1980-01-11 | Telecommunications Sa | Procede de fabrication d'une ebauche en vue de la realisation d'un guide de lumiere et ebauche obtenue selon le procede |
| FR2432478B1 (enExample) * | 1978-07-31 | 1982-03-12 | Quartz & Silice | |
| JPS5537465A (en) * | 1978-09-09 | 1980-03-15 | Nippon Telegr & Teleph Corp <Ntt> | Production of glass fiber base material |
| JPS5852935B2 (ja) * | 1978-11-20 | 1983-11-26 | 三菱マテリアル株式会社 | 光伝送用素材の製造方法 |
| FR2447890B1 (fr) * | 1979-02-05 | 1985-06-28 | Lyonnaise Transmiss Optiques | Procede de fabrication de preformes de fibres optiques a gradient d'indice, et dispositif de mise en oeuvre de ce procede |
| DE3036915C2 (de) * | 1979-10-09 | 1987-01-22 | Nippon Telegraph And Telephone Corp., Tokio/Tokyo | Verfahren und Vorrichtung zur Herstellung von Lichtleitfaserausgangsformen sowie deren Verwendung zum Ziehen von Lichtleitfasern |
| FR2476058A1 (fr) | 1980-02-15 | 1981-08-21 | Quartz Silice Sa | Semi-produit pour la production de fibres optiques, procede de preparation du semi-produit et fibres optiques obtenues a partir du semi-produit |
| DE3031147A1 (de) | 1980-08-18 | 1982-03-18 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von glas mit einem vorbestimmten brechzahlprofil und alkalifreies glas aus einem oxis eines grundstoffes, das mit einem oder mehreren weiteren stoffen dotiert ist |
| JPS57100928A (en) * | 1980-12-12 | 1982-06-23 | Nippon Telegr & Teleph Corp <Ntt> | Burner for preparing base material for optical fiber |
| DE3206177A1 (de) * | 1982-02-20 | 1983-08-25 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zur herstellung einer vorform, aus der optische fasern ziehbar sind |
| US4440558A (en) * | 1982-06-14 | 1984-04-03 | International Telephone And Telegraph Corporation | Fabrication of optical preforms by axial chemical vapor deposition |
| US4440556A (en) | 1982-06-23 | 1984-04-03 | International Telephone And Telegraph Corporation | Optical fiber drawing using plasma torch |
| DE3304721A1 (de) * | 1983-02-11 | 1984-08-16 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zur herstellung einer vorform fuer lichtwellenleiter |
| FR2540997B1 (fr) * | 1983-02-14 | 1987-02-27 | Western Electric Co | Procede de fabrication de fibres optiques |
| JPS60260430A (ja) | 1984-06-04 | 1985-12-23 | Sumitomo Electric Ind Ltd | フツ素をクラツド部に含有する光フアイバ用母材の製造方法 |
| JPS6117435A (ja) * | 1984-07-05 | 1986-01-25 | Hitachi Cable Ltd | 光フアイバ母材の製造方法 |
| GB2162168B (en) | 1984-07-25 | 1988-06-29 | Stc Plc | Optical fibre manufacture |
| US4733939A (en) * | 1984-08-18 | 1988-03-29 | Mitsubishi Metal Co., | Radiation-resistant optical conductor |
| DE3446286A1 (de) | 1984-12-19 | 1986-06-19 | Sigri GmbH, 8901 Meitingen | Verfahren zum beschichten von kohlenstoff- und graphitkoerpern |
| US4689212A (en) | 1986-05-14 | 1987-08-25 | Polaroid Corporation | Method for forming doped optical preforms |
| JP3206916B2 (ja) * | 1990-11-28 | 2001-09-10 | 住友電気工業株式会社 | 欠陥濃度低減方法、紫外線透過用光学ガラスの製造方法及び紫外線透過用光学ガラス |
| FR2714371B1 (fr) * | 1993-12-24 | 1996-02-16 | Cabloptic Sa | Procédé de recharge d'une préforme de fibre optique, dispositif pour la mise en Óoeuvre de ce procédé et fibre optique par ce procédé. |
| US20020005051A1 (en) * | 2000-04-28 | 2002-01-17 | Brown John T. | Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
| JP4763877B2 (ja) * | 2000-05-29 | 2011-08-31 | 信越石英株式会社 | Ｆ２エキシマレーザー用合成石英ガラス光学材料及び光学部材 |
| US7797966B2 (en) * | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
| US20020117625A1 (en) * | 2001-02-26 | 2002-08-29 | Pandelisev Kiril A. | Fiber optic enhanced scintillator detector |
| US20050120752A1 (en) * | 2001-04-11 | 2005-06-09 | Brown John T. | Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same |
| DE10125152A1 (de) * | 2001-05-22 | 2002-12-12 | Schott Glas | Lichtwellenleiter |
| JP4093553B2 (ja) * | 2002-08-07 | 2008-06-04 | 信越化学工業株式会社 | 光ファイバプリフォームとその製造方法、及びこれを線引きして得られる光ファイバ |
| US20040187525A1 (en) * | 2003-03-31 | 2004-09-30 | Coffey Calvin T. | Method and apparatus for making soot |
| EP3807215A1 (de) | 2018-06-15 | 2021-04-21 | Solar Silicon GmbH | Verfahren zur herstellung von elementarem silizium |
| CN111320177B (zh) * | 2020-04-13 | 2023-09-15 | 黄冈师范学院 | 一种去除石英砂粉中羟基的方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1380371A (fr) * | 1963-01-29 | 1964-11-27 | Thermal Syndicate Ltd | Procédé de fabrication de silice vitreuse pure |
| NL128054C (enExample) * | 1963-01-29 | |||
| US3659915A (en) * | 1970-05-11 | 1972-05-02 | Corning Glass Works | Fused silica optical waveguide |
| GB1368868A (en) * | 1971-11-25 | 1974-10-02 | Siemens Ag | Optical wave guides |
| DE2247307C3 (de) * | 1972-09-27 | 1982-01-21 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Herstellung eines Ausgangsstabes zum Ziehen einer aus einem dotierten Kern und einem undotierten Mantel bestehenden Lichtleitfaser |
| US3778132A (en) * | 1972-10-06 | 1973-12-11 | Bell Telephone Labor Inc | Optical transmission line |
| GB1368093A (en) * | 1972-10-17 | 1974-09-25 | Post Office | Silica-based vitreous material |
| JPS5515682B2 (enExample) * | 1972-11-25 | 1980-04-25 | ||
| FR2208127B1 (enExample) * | 1972-11-25 | 1976-11-19 | Sumitomo Electric Industries | |
| GB1450123A (en) * | 1973-11-27 | 1976-09-22 | Post Office | Doped vitreous silica |
| FR2253723A1 (en) * | 1973-12-07 | 1975-07-04 | Passaret Michel | Preform for optical waveguide mfr. - by plasma arc spraying a lower RI glass around or inside a higher RI glass |
| JPS50102610A (enExample) * | 1974-01-17 | 1975-08-14 | ||
| JPS5156641A (ja) * | 1974-11-13 | 1976-05-18 | Sumitomo Electric Industries | Hikaridensoyofuaibaano seizohoho |
| US3981707A (en) * | 1975-04-23 | 1976-09-21 | Corning Glass Works | Method of making fluorine out-diffused optical device |
-
1976
- 1976-06-02 CH CH698276A patent/CH620181A5/de not_active IP Right Cessation
- 1976-06-22 JP JP51072842A patent/JPS5224217A/ja active Pending
- 1976-08-12 GB GB33667/76A patent/GB1492920A/en not_active Expired
- 1976-08-16 FR FR7624905A patent/FR2321459A1/fr active Granted
- 1976-08-16 NL NLAANVRAGE7609083,A patent/NL176662C/xx not_active IP Right Cessation
-
1980
- 1980-02-13 US US06/121,078 patent/USRE30883E/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5224217A (en) | 1977-02-23 |
| NL176662C (nl) | 1985-05-17 |
| FR2321459B1 (enExample) | 1979-06-22 |
| NL176662B (nl) | 1984-12-17 |
| NL7609083A (nl) | 1977-02-18 |
| FR2321459A1 (fr) | 1977-03-18 |
| USRE30883E (en) | 1982-03-16 |
| GB1492920A (en) | 1977-11-23 |
| DE2536457B2 (de) | 1977-06-08 |
| DE2536457A1 (de) | 1977-02-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |