JPS5224217A - Process and apparatus for preparing synthetic silica glass - Google Patents

Process and apparatus for preparing synthetic silica glass

Info

Publication number
JPS5224217A
JPS5224217A JP51072842A JP7284276A JPS5224217A JP S5224217 A JPS5224217 A JP S5224217A JP 51072842 A JP51072842 A JP 51072842A JP 7284276 A JP7284276 A JP 7284276A JP S5224217 A JPS5224217 A JP S5224217A
Authority
JP
Japan
Prior art keywords
silica glass
synthetic silica
preparing synthetic
preparing
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP51072842A
Other languages
English (en)
Japanese (ja)
Inventor
Rau Kaaruhaintsu
Miyuuritsuhi Arubaato
Jinmaato Furitsutsu
Toreeberu Norubaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzschmelze GmbH
Original Assignee
Heraeus Quarzschmelze GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19752536457 external-priority patent/DE2536457C3/de
Application filed by Heraeus Quarzschmelze GmbH filed Critical Heraeus Quarzschmelze GmbH
Publication of JPS5224217A publication Critical patent/JPS5224217A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C03B37/01426—Plasma deposition burners or torches
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
JP51072842A 1975-08-16 1976-06-22 Process and apparatus for preparing synthetic silica glass Pending JPS5224217A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752536457 DE2536457C3 (de) 1975-08-16 Verfahren zur Herstellung von synthetischem, OH-Ionen-freiem Quarzglas, Vorrichtung zur Durchführung des Verfahrens und Verwendung des synthetischen Quarzglases

Publications (1)

Publication Number Publication Date
JPS5224217A true JPS5224217A (en) 1977-02-23

Family

ID=5954072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51072842A Pending JPS5224217A (en) 1975-08-16 1976-06-22 Process and apparatus for preparing synthetic silica glass

Country Status (6)

Country Link
US (1) USRE30883E (enExample)
JP (1) JPS5224217A (enExample)
CH (1) CH620181A5 (enExample)
FR (1) FR2321459A1 (enExample)
GB (1) GB1492920A (enExample)
NL (1) NL176662C (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5235654A (en) * 1975-09-11 1977-03-18 Northern Telecom Ltd Optical fiber transmission line
JPS5537465A (en) * 1978-09-09 1980-03-15 Nippon Telegr & Teleph Corp <Ntt> Production of glass fiber base material
JPS6117435A (ja) * 1984-07-05 1986-01-25 Hitachi Cable Ltd 光フアイバ母材の製造方法

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1091498B (it) * 1977-11-25 1985-07-06 Cselt Centro Studi Lab Telecom Procedimento ed apparecchiatura per la produzione continua di fibre ottiche
FR2428618A1 (fr) * 1978-06-16 1980-01-11 Telecommunications Sa Procede de fabrication d'une ebauche en vue de la realisation d'un guide de lumiere et ebauche obtenue selon le procede
FR2432478B1 (enExample) * 1978-07-31 1982-03-12 Quartz & Silice
JPS5852935B2 (ja) * 1978-11-20 1983-11-26 三菱マテリアル株式会社 光伝送用素材の製造方法
FR2447890B1 (fr) * 1979-02-05 1985-06-28 Lyonnaise Transmiss Optiques Procede de fabrication de preformes de fibres optiques a gradient d'indice, et dispositif de mise en oeuvre de ce procede
DE3036915C2 (de) * 1979-10-09 1987-01-22 Nippon Telegraph And Telephone Corp., Tokio/Tokyo Verfahren und Vorrichtung zur Herstellung von Lichtleitfaserausgangsformen sowie deren Verwendung zum Ziehen von Lichtleitfasern
FR2476058A1 (fr) 1980-02-15 1981-08-21 Quartz Silice Sa Semi-produit pour la production de fibres optiques, procede de preparation du semi-produit et fibres optiques obtenues a partir du semi-produit
DE3031147A1 (de) 1980-08-18 1982-03-18 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von glas mit einem vorbestimmten brechzahlprofil und alkalifreies glas aus einem oxis eines grundstoffes, das mit einem oder mehreren weiteren stoffen dotiert ist
JPS57100928A (en) * 1980-12-12 1982-06-23 Nippon Telegr & Teleph Corp <Ntt> Burner for preparing base material for optical fiber
DE3206177A1 (de) * 1982-02-20 1983-08-25 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung einer vorform, aus der optische fasern ziehbar sind
US4440558A (en) * 1982-06-14 1984-04-03 International Telephone And Telegraph Corporation Fabrication of optical preforms by axial chemical vapor deposition
US4440556A (en) 1982-06-23 1984-04-03 International Telephone And Telegraph Corporation Optical fiber drawing using plasma torch
DE3304721A1 (de) * 1983-02-11 1984-08-16 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung einer vorform fuer lichtwellenleiter
FR2540997B1 (fr) * 1983-02-14 1987-02-27 Western Electric Co Procede de fabrication de fibres optiques
JPS60260430A (ja) 1984-06-04 1985-12-23 Sumitomo Electric Ind Ltd フツ素をクラツド部に含有する光フアイバ用母材の製造方法
GB2162168B (en) 1984-07-25 1988-06-29 Stc Plc Optical fibre manufacture
US4733939A (en) * 1984-08-18 1988-03-29 Mitsubishi Metal Co., Radiation-resistant optical conductor
DE3446286A1 (de) 1984-12-19 1986-06-19 Sigri GmbH, 8901 Meitingen Verfahren zum beschichten von kohlenstoff- und graphitkoerpern
US4689212A (en) 1986-05-14 1987-08-25 Polaroid Corporation Method for forming doped optical preforms
JP3206916B2 (ja) * 1990-11-28 2001-09-10 住友電気工業株式会社 欠陥濃度低減方法、紫外線透過用光学ガラスの製造方法及び紫外線透過用光学ガラス
FR2714371B1 (fr) * 1993-12-24 1996-02-16 Cabloptic Sa Procédé de recharge d'une préforme de fibre optique, dispositif pour la mise en Óoeuvre de ce procédé et fibre optique par ce procédé.
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
JP4763877B2 (ja) * 2000-05-29 2011-08-31 信越石英株式会社 Ｆ２エキシマレーザー用合成石英ガラス光学材料及び光学部材
US7797966B2 (en) * 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US20020117625A1 (en) * 2001-02-26 2002-08-29 Pandelisev Kiril A. Fiber optic enhanced scintillator detector
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
DE10125152A1 (de) * 2001-05-22 2002-12-12 Schott Glas Lichtwellenleiter
JP4093553B2 (ja) * 2002-08-07 2008-06-04 信越化学工業株式会社 光ファイバプリフォームとその製造方法、及びこれを線引きして得られる光ファイバ
US20040187525A1 (en) * 2003-03-31 2004-09-30 Coffey Calvin T. Method and apparatus for making soot
EP3807215A1 (de) 2018-06-15 2021-04-21 Solar Silicon GmbH Verfahren zur herstellung von elementarem silizium
CN111320177B (zh) * 2020-04-13 2023-09-15 黄冈师范学院 一种去除石英砂粉中羟基的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4976538A (enExample) * 1972-11-25 1974-07-24
JPS50102610A (enExample) * 1974-01-17 1975-08-14

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1380371A (fr) * 1963-01-29 1964-11-27 Thermal Syndicate Ltd Procédé de fabrication de silice vitreuse pure
NL128054C (enExample) * 1963-01-29
US3659915A (en) * 1970-05-11 1972-05-02 Corning Glass Works Fused silica optical waveguide
GB1368868A (en) * 1971-11-25 1974-10-02 Siemens Ag Optical wave guides
DE2247307C3 (de) * 1972-09-27 1982-01-21 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung eines Ausgangsstabes zum Ziehen einer aus einem dotierten Kern und einem undotierten Mantel bestehenden Lichtleitfaser
US3778132A (en) * 1972-10-06 1973-12-11 Bell Telephone Labor Inc Optical transmission line
GB1368093A (en) * 1972-10-17 1974-09-25 Post Office Silica-based vitreous material
FR2208127B1 (enExample) * 1972-11-25 1976-11-19 Sumitomo Electric Industries
GB1450123A (en) * 1973-11-27 1976-09-22 Post Office Doped vitreous silica
FR2253723A1 (en) * 1973-12-07 1975-07-04 Passaret Michel Preform for optical waveguide mfr. - by plasma arc spraying a lower RI glass around or inside a higher RI glass
JPS5156641A (ja) * 1974-11-13 1976-05-18 Sumitomo Electric Industries Hikaridensoyofuaibaano seizohoho
US3981707A (en) * 1975-04-23 1976-09-21 Corning Glass Works Method of making fluorine out-diffused optical device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4976538A (enExample) * 1972-11-25 1974-07-24
JPS50102610A (enExample) * 1974-01-17 1975-08-14

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5235654A (en) * 1975-09-11 1977-03-18 Northern Telecom Ltd Optical fiber transmission line
JPS5537465A (en) * 1978-09-09 1980-03-15 Nippon Telegr & Teleph Corp <Ntt> Production of glass fiber base material
JPS6117435A (ja) * 1984-07-05 1986-01-25 Hitachi Cable Ltd 光フアイバ母材の製造方法

Also Published As

Publication number Publication date
NL176662C (nl) 1985-05-17
FR2321459B1 (enExample) 1979-06-22
NL176662B (nl) 1984-12-17
NL7609083A (nl) 1977-02-18
FR2321459A1 (fr) 1977-03-18
USRE30883E (en) 1982-03-16
CH620181A5 (en) 1980-11-14
GB1492920A (en) 1977-11-23
DE2536457B2 (de) 1977-06-08
DE2536457A1 (de) 1977-02-17

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