NL176662B - Werkwijze voor het bereiden van synthetisch, van oh-ionen vrij, met fluor gedoteerd kwartsglas en hiermee vervaardigde vezels. - Google Patents

Werkwijze voor het bereiden van synthetisch, van oh-ionen vrij, met fluor gedoteerd kwartsglas en hiermee vervaardigde vezels.

Info

Publication number
NL176662B
NL176662B NLAANVRAGE7609083,A NL7609083A NL176662B NL 176662 B NL176662 B NL 176662B NL 7609083 A NL7609083 A NL 7609083A NL 176662 B NL176662 B NL 176662B
Authority
NL
Netherlands
Prior art keywords
ion
quartz glass
fibers made
doped quartz
preparing synthetic
Prior art date
Application number
NLAANVRAGE7609083,A
Other languages
English (en)
Other versions
NL7609083A (nl
NL176662C (nl
Original Assignee
Heraeus Schott Quarzschmelze
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19752536457 external-priority patent/DE2536457C3/de
Application filed by Heraeus Schott Quarzschmelze filed Critical Heraeus Schott Quarzschmelze
Publication of NL7609083A publication Critical patent/NL7609083A/nl
Publication of NL176662B publication Critical patent/NL176662B/nl
Application granted granted Critical
Publication of NL176662C publication Critical patent/NL176662C/nl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/06Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • C03B37/0142Reactant deposition burners
    • C03B37/01426Plasma deposition burners or torches
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815Reactant deposition burners or deposition heating means
    • C03B37/01823Plasma deposition burners or heating means
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/07Impurity concentration specified
    • C03B2201/075Hydroxyl ion (OH)
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/08Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/80Feeding the burner or the burner-heated deposition site
    • C03B2207/85Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/06Doped silica-based glasses
    • C03C2201/08Doped silica-based glasses containing boron or halide
    • C03C2201/12Doped silica-based glasses containing boron or halide containing fluorine
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00Production processes
    • C03C2203/40Gas-phase processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
NLAANVRAGE7609083,A 1975-08-16 1976-08-16 Werkwijze voor het bereiden van synthetisch, van oh-ionen vrij, met fluor gedoteerd kwartsglas en hiermee vervaardigde vezels. NL176662C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752536457 DE2536457C3 (de) 1975-08-16 Verfahren zur Herstellung von synthetischem, OH-Ionen-freiem Quarzglas, Vorrichtung zur Durchführung des Verfahrens und Verwendung des synthetischen Quarzglases

Publications (3)

Publication Number Publication Date
NL7609083A NL7609083A (nl) 1977-02-18
NL176662B true NL176662B (nl) 1984-12-17
NL176662C NL176662C (nl) 1985-05-17

Family

ID=5954072

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7609083,A NL176662C (nl) 1975-08-16 1976-08-16 Werkwijze voor het bereiden van synthetisch, van oh-ionen vrij, met fluor gedoteerd kwartsglas en hiermee vervaardigde vezels.

Country Status (6)

Country Link
US (1) USRE30883E (nl)
JP (1) JPS5224217A (nl)
CH (1) CH620181A5 (nl)
FR (1) FR2321459A1 (nl)
GB (1) GB1492920A (nl)
NL (1) NL176662C (nl)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1029993A (en) * 1975-09-11 1978-04-25 Frederick D. King Optical fibre transmission line
IT1091498B (it) * 1977-11-25 1985-07-06 Cselt Centro Studi Lab Telecom Procedimento ed apparecchiatura per la produzione continua di fibre ottiche
FR2428618A1 (fr) * 1978-06-16 1980-01-11 Telecommunications Sa Procede de fabrication d'une ebauche en vue de la realisation d'un guide de lumiere et ebauche obtenue selon le procede
FR2432478B1 (nl) * 1978-07-31 1982-03-12 Quartz & Silice
JPS5537465A (en) * 1978-09-09 1980-03-15 Nippon Telegr & Teleph Corp <Ntt> Production of glass fiber base material
JPS5852935B2 (ja) * 1978-11-20 1983-11-26 三菱マテリアル株式会社 光伝送用素材の製造方法
FR2447890B1 (fr) * 1979-02-05 1985-06-28 Lyonnaise Transmiss Optiques Procede de fabrication de preformes de fibres optiques a gradient d'indice, et dispositif de mise en oeuvre de ce procede
DE3036915A1 (de) * 1979-10-09 1981-04-23 Nippon Telegraph & Telephone Public Corp., Tokyo Verfahren zur herstellung von rohlingen fuer lichtleitfasern
FR2476058A1 (fr) * 1980-02-15 1981-08-21 Quartz Silice Sa Semi-produit pour la production de fibres optiques, procede de preparation du semi-produit et fibres optiques obtenues a partir du semi-produit
JPS57100928A (en) * 1980-12-12 1982-06-23 Nippon Telegr & Teleph Corp <Ntt> Burner for preparing base material for optical fiber
DE3206177A1 (de) * 1982-02-20 1983-08-25 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung einer vorform, aus der optische fasern ziehbar sind
US4440558A (en) * 1982-06-14 1984-04-03 International Telephone And Telegraph Corporation Fabrication of optical preforms by axial chemical vapor deposition
DE3304721A1 (de) * 1983-02-11 1984-08-16 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung einer vorform fuer lichtwellenleiter
FR2540997B1 (fr) * 1983-02-14 1987-02-27 Western Electric Co Procede de fabrication de fibres optiques
JPS60260430A (ja) 1984-06-04 1985-12-23 Sumitomo Electric Ind Ltd フツ素をクラツド部に含有する光フアイバ用母材の製造方法
JPS6117435A (ja) * 1984-07-05 1986-01-25 Hitachi Cable Ltd 光フアイバ母材の製造方法
GB2162168B (en) * 1984-07-25 1988-06-29 Stc Plc Optical fibre manufacture
US4733939A (en) * 1984-08-18 1988-03-29 Mitsubishi Metal Co., Radiation-resistant optical conductor
DE3446286A1 (de) 1984-12-19 1986-06-19 Sigri GmbH, 8901 Meitingen Verfahren zum beschichten von kohlenstoff- und graphitkoerpern
JP3206916B2 (ja) * 1990-11-28 2001-09-10 住友電気工業株式会社 欠陥濃度低減方法、紫外線透過用光学ガラスの製造方法及び紫外線透過用光学ガラス
FR2714371B1 (fr) * 1993-12-24 1996-02-16 Cabloptic Sa Procédé de recharge d'une préforme de fibre optique, dispositif pour la mise en Óoeuvre de ce procédé et fibre optique par ce procédé.
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
JP4763877B2 (ja) 2000-05-29 2011-08-31 信越石英株式会社 F2エキシマレーザー用合成石英ガラス光学材料及び光学部材
US7797966B2 (en) * 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US20020117625A1 (en) * 2001-02-26 2002-08-29 Pandelisev Kiril A. Fiber optic enhanced scintillator detector
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
DE10125152A1 (de) * 2001-05-22 2002-12-12 Schott Glas Lichtwellenleiter
JP4093553B2 (ja) * 2002-08-07 2008-06-04 信越化学工業株式会社 光ファイバプリフォームとその製造方法、及びこれを線引きして得られる光ファイバ
US20040187525A1 (en) * 2003-03-31 2004-09-30 Coffey Calvin T. Method and apparatus for making soot
US20210246036A1 (en) 2018-06-15 2021-08-12 Solar Silicon Gmbh Method for producing elemental silicon
CN111320177B (zh) * 2020-04-13 2023-09-15 黄冈师范学院 一种去除石英砂粉中羟基的方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1380371A (fr) * 1963-01-29 1964-11-27 Thermal Syndicate Ltd Procédé de fabrication de silice vitreuse pure
NL128054C (nl) * 1963-01-29
US3659915A (en) * 1970-05-11 1972-05-02 Corning Glass Works Fused silica optical waveguide
GB1368868A (en) * 1971-11-25 1974-10-02 Siemens Ag Optical wave guides
DE2247307C3 (de) * 1972-09-27 1982-01-21 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung eines Ausgangsstabes zum Ziehen einer aus einem dotierten Kern und einem undotierten Mantel bestehenden Lichtleitfaser
US3778132A (en) * 1972-10-06 1973-12-11 Bell Telephone Labor Inc Optical transmission line
GB1368093A (en) * 1972-10-17 1974-09-25 Post Office Silica-based vitreous material
JPS5515682B2 (nl) * 1972-11-25 1980-04-25
NL182310C (nl) * 1972-11-25 1988-02-16 Sumitomo Electric Industries Glasvezel voor optische transmissie.
GB1450123A (en) * 1973-11-27 1976-09-22 Post Office Doped vitreous silica
FR2253723A1 (en) * 1973-12-07 1975-07-04 Passaret Michel Preform for optical waveguide mfr. - by plasma arc spraying a lower RI glass around or inside a higher RI glass
JPS50102610A (nl) * 1974-01-17 1975-08-14
JPS5156641A (ja) * 1974-11-13 1976-05-18 Sumitomo Electric Industries Hikaridensoyofuaibaano seizohoho
US3981707A (en) * 1975-04-23 1976-09-21 Corning Glass Works Method of making fluorine out-diffused optical device

Also Published As

Publication number Publication date
FR2321459A1 (fr) 1977-03-18
GB1492920A (en) 1977-11-23
DE2536457B2 (de) 1977-06-08
NL7609083A (nl) 1977-02-18
JPS5224217A (en) 1977-02-23
USRE30883E (en) 1982-03-16
CH620181A5 (en) 1980-11-14
FR2321459B1 (nl) 1979-06-22
DE2536457A1 (de) 1977-02-17
NL176662C (nl) 1985-05-17

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Legal Events

Date Code Title Description
BC A request for examination has been filed
A85 Still pending on 85-01-01
BK Erratum

Free format text: CORRECTION TO EARLIER ENTRY IN HEADING P,SECTION 2 OF PAT.BUL.10/85

V1 Lapsed because of non-payment of the annual fee