CH373641A - Lichtempfindliches Kopiermaterial zur Herstellung von Flachdruckformen hoher mechanischer Widerstandsfähigkeit - Google Patents
Lichtempfindliches Kopiermaterial zur Herstellung von Flachdruckformen hoher mechanischer WiderstandsfähigkeitInfo
- Publication number
- CH373641A CH373641A CH6364358A CH6364358A CH373641A CH 373641 A CH373641 A CH 373641A CH 6364358 A CH6364358 A CH 6364358A CH 6364358 A CH6364358 A CH 6364358A CH 373641 A CH373641 A CH 373641A
- Authority
- CH
- Switzerland
- Prior art keywords
- water
- parts
- photosensitive
- planographic printing
- production
- Prior art date
Links
- 238000007639 printing Methods 0.000 title claims description 22
- 239000000463 material Substances 0.000 title claims description 7
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 229920002125 Sokalan® Polymers 0.000 claims description 7
- 239000004584 polyacrylic acid Substances 0.000 claims description 7
- 239000012954 diazonium Substances 0.000 claims description 5
- LRSYZHFYNDZXMU-UHFFFAOYSA-N 9h-carbazol-3-amine Chemical class C1=CC=C2C3=CC(N)=CC=C3NC2=C1 LRSYZHFYNDZXMU-UHFFFAOYSA-N 0.000 claims description 3
- 229920002845 Poly(methacrylic acid) Polymers 0.000 claims description 3
- MUZDXNQOSGWMJJ-UHFFFAOYSA-N 2-methylprop-2-enoic acid;prop-2-enoic acid Chemical compound OC(=O)C=C.CC(=C)C(O)=O MUZDXNQOSGWMJJ-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 229920003145 methacrylic acid copolymer Polymers 0.000 claims description 2
- 229940117841 methacrylic acid copolymer Drugs 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- -1 diazonium chlorides Chemical class 0.000 claims 2
- 239000000243 solution Substances 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 150000008049 diazo compounds Chemical class 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000000084 colloidal system Substances 0.000 description 8
- 239000011888 foil Substances 0.000 description 8
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 6
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000006193 diazotization reaction Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- JHBZNDZZBKDEGG-UHFFFAOYSA-N 2-methoxy-9H-carbazol-3-amine Chemical compound COC1=CC=2NC3=CC=CC=C3C2C=C1N JHBZNDZZBKDEGG-UHFFFAOYSA-N 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical class [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 238000005185 salting out Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- MDKVPSJRUXOFFV-UHFFFAOYSA-N 2-methoxy-9h-carbazole Chemical compound C1=CC=C2C3=CC=C(OC)C=C3NC2=C1 MDKVPSJRUXOFFV-UHFFFAOYSA-N 0.000 description 1
- SQZBIKQHFWVGKO-UHFFFAOYSA-N 6-methyl-9h-carbazol-3-amine Chemical compound C1=C(N)C=C2C3=CC(C)=CC=C3NC2=C1 SQZBIKQHFWVGKO-UHFFFAOYSA-N 0.000 description 1
- SSQGALTZSSYGSV-UHFFFAOYSA-M 9h-carbazole-3-diazonium;chloride Chemical compound [Cl-].C1=CC=C2C3=CC([N+]#N)=CC=C3NC2=C1 SSQGALTZSSYGSV-UHFFFAOYSA-M 0.000 description 1
- IRNVUSRODLIMSY-UHFFFAOYSA-N COC1=CC=2N(C3=CC=CC=C3C2C=C1[N+](=O)[O-])C(C)=O Chemical compound COC1=CC=2N(C3=CC=CC=C3C2C=C1[N+](=O)[O-])C(C)=O IRNVUSRODLIMSY-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000005684 Liebig rearrangement reaction Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- MDKRKLIRTIJXSN-UHFFFAOYSA-N [N+](=[N-])=C1C(=CC2=NC3=CC=CC=C3C2=C1)OC Chemical compound [N+](=[N-])=C1C(=CC2=NC3=CC=CC=C3C2=C1)OC MDKRKLIRTIJXSN-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 230000021736 acetylation Effects 0.000 description 1
- 238000006640 acetylation reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Chemical class O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK30699A DE1055957B (de) | 1956-12-28 | 1956-12-28 | Lichtempfindliche Kopierschichten zur Herstellung von Flachdruckformen von hoher mechanischer Widerstandsfaehigkeit |
| DEK32553A DE1059766B (de) | 1956-12-28 | 1957-07-27 | Lichtempfindliches Kopiermaterial zur Herstellung von Flachdruckformen von hoher mechanischer Widerstandsfaehigkeit |
| DEK0033078 | 1957-10-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH373641A true CH373641A (de) | 1963-11-30 |
Family
ID=27211138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH6364358A CH373641A (de) | 1956-12-28 | 1958-09-05 | Lichtempfindliches Kopiermaterial zur Herstellung von Flachdruckformen hoher mechanischer Widerstandsfähigkeit |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US3061429A (en, 2012) |
| BE (2) | BE565433A (en, 2012) |
| CH (1) | CH373641A (en, 2012) |
| DE (3) | DE1055957B (en, 2012) |
| FR (1) | FR1245548A (en, 2012) |
| GB (1) | GB824148A (en, 2012) |
| NL (2) | NL102798C (en, 2012) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1114704B (de) * | 1959-02-26 | 1961-10-05 | Kalle Ag | Lichtempfindliches Material |
| NL270001A (en, 2012) * | 1960-10-07 | |||
| NL132291C (en, 2012) * | 1961-01-25 | |||
| NL289167A (en, 2012) * | 1961-10-13 | |||
| US3284198A (en) * | 1963-09-11 | 1966-11-08 | Martin Marietta Corp | Method for making photolithographic plate |
| DE1447955C3 (de) * | 1965-01-02 | 1978-10-05 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung einer vorsensibilisierten Druckplatte |
| GB1170495A (en) * | 1967-03-31 | 1969-11-12 | Agfa Gevaert Nv | Radiation-Sensitive Recording Material |
| US4407862A (en) | 1978-03-31 | 1983-10-04 | W. R. Grace & Co. | Method of making letterpress printing plates |
| US4387469A (en) * | 1980-06-03 | 1983-06-07 | Clarion Co., Ltd. | Tuner control system |
| US4539285A (en) * | 1984-03-14 | 1985-09-03 | American Hoechst Corporation | Photosensitive negative diazo composition with two acrylic polymers for photolithography |
| JPH0782236B2 (ja) * | 1984-10-12 | 1995-09-06 | 三菱化学株式会社 | 感光性組成物 |
| US5002856A (en) * | 1989-08-02 | 1991-03-26 | E. I. Du Pont De Nemours And Company | Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid |
| US4985332A (en) * | 1990-04-10 | 1991-01-15 | E. I. Du Pont De Nemours And Company | Resist material with carbazole diazonium salt acid generator and process for use |
| US5219711A (en) * | 1990-04-10 | 1993-06-15 | E. I. Du Pont De Nemours And Company | Positive image formation utilizing resist material with carbazole diazonium salt acid generator |
| EP0737894B1 (en) * | 1995-02-15 | 2000-06-07 | Agfa-Gevaert N.V. | A diazo based imaging element having improved storage stability |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE596731C (de) * | 1932-05-23 | 1934-05-09 | Kalle & Co Akt Ges | Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen |
| US2531485A (en) * | 1947-04-02 | 1950-11-28 | Gen Aniline & Film Corp | Diazotypes comprising amine salts of sulfonic acid containing azo components |
| US2593928A (en) * | 1947-10-09 | 1952-04-22 | Gen Aniline & Film Corp | Dimensionally stable diazotype photographic film and process for making it |
| NL70798C (en, 2012) * | 1948-10-15 | |||
| US2649373A (en) * | 1948-10-18 | 1953-08-18 | Warren S D Co | Paper printing foils for lithographic purposes and a process of preparing them |
| NL150528B (nl) * | 1949-05-14 | Hollandse Signaalapparaten Bv | Werkwijze voor het vervaardigen van twistloos of nagenoeg twistloos garen en het door toepassing van deze werkwijze verkregen garen. | |
| DE838699C (de) * | 1949-10-10 | 1952-05-12 | Kalle & Co Ag | Verfahren zur Herstellung von Gerbbildern von hoher mechanischer Widerstandsfaehigkeit |
| GB702294A (en) * | 1951-09-11 | 1954-01-13 | Ozalid Co Ltd | Photographic diazotype layers |
| BE557236A (en, 2012) * | 1952-06-19 | |||
| US2937085A (en) * | 1954-01-11 | 1960-05-17 | Ditto Inc | Composite photosensitive plate, and method of making printing plate therefrom |
| NL188976B (nl) * | 1954-02-10 | Van Der Lely Nv C | Maaimachine. | |
| NL186623B (nl) * | 1954-02-10 | Landis & Gyr Ag | Fraudebestendig document met een waarborgmerkteken en werkwijze voor het onderzoeken van de echtheid van het document. |
-
0
- NL NL231268D patent/NL231268A/xx unknown
- DE DENDAT1067307D patent/DE1067307B/de active Pending
- BE BE571292D patent/BE571292A/xx unknown
- NL NL102798D patent/NL102798C/xx active
- BE BE565433D patent/BE565433A/xx unknown
-
1956
- 1956-12-28 DE DEK30699A patent/DE1055957B/de active Pending
-
1957
- 1957-07-27 DE DEK32553A patent/DE1059766B/de active Pending
- 1957-12-20 GB GB39608/57A patent/GB824148A/en not_active Expired
- 1957-12-27 FR FR754716A patent/FR1245548A/fr not_active Expired
-
1958
- 1958-01-16 US US709185A patent/US3061429A/en not_active Expired - Lifetime
- 1958-09-05 CH CH6364358A patent/CH373641A/de unknown
- 1958-09-26 US US763427A patent/US3062644A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE1055957B (de) | 1959-04-23 |
| GB824148A (en) | 1959-11-25 |
| FR1245548A (fr) | 1960-11-10 |
| NL102798C (en, 2012) | |
| NL231268A (en, 2012) | |
| DE1059766B (de) | 1959-06-18 |
| US3062644A (en) | 1962-11-06 |
| BE565433A (en, 2012) | |
| BE571292A (en, 2012) | |
| DE1067307B (en, 2012) | |
| US3061429A (en) | 1962-10-30 |
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