CH350720A - Verfahren zur Herstellung einer Halbleiteranordnung mit einem Silicium-Halbleiterkörper - Google Patents

Verfahren zur Herstellung einer Halbleiteranordnung mit einem Silicium-Halbleiterkörper

Info

Publication number
CH350720A
CH350720A CH350720DA CH350720A CH 350720 A CH350720 A CH 350720A CH 350720D A CH350720D A CH 350720DA CH 350720 A CH350720 A CH 350720A
Authority
CH
Switzerland
Prior art keywords
producing
semiconductor device
semiconductor body
silicon
silicon semiconductor
Prior art date
Application number
Other languages
English (en)
Inventor
V Frola Frank
W Slye Milton
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US507312A external-priority patent/US2763822A/en
Priority claimed from US525595A external-priority patent/US2801375A/en
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of CH350720A publication Critical patent/CH350720A/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • B23K35/262—Sn as the principal constituent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
    • B23K35/3006—Ag as the principal constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
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    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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    • H01L23/00—Details of semiconductor or other solid state devices
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    • H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/367—Cooling facilitated by shape of device
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    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/492—Bases or plates or solder therefor
    • H01L23/4924—Bases or plates or solder therefor characterised by the materials
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    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
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    • H01L2924/097—Glass-ceramics, e.g. devitrified glass
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    • H01L2924/10251—Elemental semiconductors, i.e. Group IV
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    • H01L2924/12036—PN diode
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    • H01L2924/30—Technical effects
    • H01L2924/301—Electrical effects
    • H01L2924/3011—Impedance

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Ceramic Products (AREA)
  • Die Bonding (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Contacts (AREA)
CH350720D 1955-05-10 1956-05-09 Verfahren zur Herstellung einer Halbleiteranordnung mit einem Silicium-Halbleiterkörper CH350720A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US507312A US2763822A (en) 1955-05-10 1955-05-10 Silicon semiconductor devices
US525595A US2801375A (en) 1955-08-01 1955-08-01 Silicon semiconductor devices and processes for making them

Publications (1)

Publication Number Publication Date
CH350720A true CH350720A (de) 1960-12-15

Family

ID=27055794

Family Applications (2)

Application Number Title Priority Date Filing Date
CH350720D CH350720A (de) 1955-05-10 1956-05-09 Verfahren zur Herstellung einer Halbleiteranordnung mit einem Silicium-Halbleiterkörper
CH3604156A CH367896A (de) 1955-05-10 1956-07-31 Verfahren zur Herstellung einer Halbleitervorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
CH3604156A CH367896A (de) 1955-05-10 1956-07-31 Verfahren zur Herstellung einer Halbleitervorrichtung

Country Status (6)

Country Link
BE (2) BE550001A (de)
CH (2) CH350720A (de)
DE (2) DE1050450B (de)
FR (2) FR1153475A (de)
GB (2) GB832067A (de)
NL (2) NL109558C (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1285068B (de) * 1957-01-11 1968-12-12 Siemens Ag Legierungskontakt auf mit einer Goldschicht versehenen Halbleiterkristallen
NL243222A (de) * 1958-09-10 1900-01-01
NL242265A (de) * 1958-09-30 1900-01-01
NL239127A (de) * 1959-05-12
DE1233949B (de) * 1959-07-13 1967-02-09 Siemens Ag Verfahren zur Herstellung einer Halbleiter-gleichrichteranordnung mit einem einkristallinen Halbleiterkoerper
NL249694A (de) * 1959-12-30
DE1113519B (de) * 1960-02-25 1961-09-07 Bosch Gmbh Robert Siliziumgleichrichter fuer hohe Stromstaerken
NL260951A (de) * 1960-03-07
DE1141029B (de) * 1960-06-23 1962-12-13 Siemens Ag Halbleiteranordnung und Verfahren zu ihrer Herstellung
DE1153461B (de) * 1960-06-23 1963-08-29 Siemens Ag Halbleiteranordnung
NL269346A (de) * 1960-09-20
DE1133834B (de) * 1960-09-21 1962-07-26 Siemens Ag Siliziumgleichrichter und Verfahren zu dessen Herstellung
NL270339A (de) * 1960-10-20
DE1229649B (de) * 1961-08-10 1966-12-01 Siemens Ag Verfahren zum Herstellen eines Halbleiter-elementes und Halbleiteranordnung mit einem nach diesem Verfahren hergestellten Halbleiterelement
DE1240187B (de) * 1961-08-10 1967-05-11 Siemens Ag Verfahren zur Herstellung eines sperrfreien Kontaktes durch Auflegieren von Aluminium
DE1246129B (de) * 1961-12-28 1967-08-03 Westinghouse Electric Corp Verfahren zum Herstellen eines Halbleiterbauelementes
DE1185731B (de) * 1962-03-28 1965-01-21 Siemens Ag Halbleiterelement mit pn-UEbergang
DE1295697B (de) * 1962-05-23 1969-05-22 Walter Brandt Gmbh Halbleiterbauelement und Verfahren zu seiner Herstellung
US3368120A (en) * 1965-03-22 1968-02-06 Gen Electric Multilayer contact system for semiconductor devices
DE1483298B1 (de) * 1965-06-11 1971-01-28 Siemens Ag Elektrische Kontaktanordnung zwischen einem Germanium-Silizium-Halbleiterkoerper und einem Kontaktstueck und Verfahren zur Herstellung derselben
FR2046593A5 (de) * 1970-04-30 1971-03-05 Silec Semi Conducteurs
GB2031223A (en) * 1978-09-22 1980-04-16 Gen Instrument Corp Method for bonding a refractory metal contact member to a semiconductor body
SE9203533L (sv) * 1992-11-24 1994-05-24 Asea Brown Boveri Anordning för kylning av skivformiga kraftelektronikelement jämte skivformigt kraftelektronikelement avsett att monteras i sådan kylanordning
JP6079375B2 (ja) * 2013-03-29 2017-02-15 三菱マテリアル株式会社 ハンダ粉末及びその製造方法並びにこの粉末を用いたハンダ用ペースト
DE102015108056A1 (de) 2015-05-21 2016-11-24 Osram Opto Semiconductors Gmbh Optoelektronisches Halbleiterbauteil, optoelektronische Anordnung und Verfahren zur Herstellung eines optoelektronischen Halbleiterbauteils

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2220961A (en) * 1937-11-06 1940-11-12 Bell Telephone Labor Inc Soldering alloy
US2555001A (en) * 1947-02-04 1951-05-29 Bell Telephone Labor Inc Bonded article and method of bonding
US2567970A (en) * 1947-12-24 1951-09-18 Bell Telephone Labor Inc Semiconductor comprising silicon and method of making it
DE872602C (de) * 1951-03-20 1953-04-02 Siemens Ag Verfahren zur Befestigung von Halbleitern
BE522837A (de) * 1952-09-16
NL104654C (de) * 1952-12-31 1900-01-01
GB8817261D0 (en) * 1988-07-20 1988-08-24 Sperry Sun Inc Down-hole bearing assemblies for maintaining survey instrument assembly & core barrel orientation

Also Published As

Publication number Publication date
DE1292260B (de) 1969-04-10
DE1050450B (de) 1959-02-12
GB832067A (en) 1960-04-06
BE550001A (fr) 1956-08-31
GB823559A (en) 1959-11-11
NL109558C (de) 1900-01-01
FR1157057A (fr) 1958-05-27
BE547698A (de) 1900-01-01
FR1153475A (fr) 1958-03-11
NL208617A (de) 1900-01-01
CH367896A (de) 1963-03-15

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