CH368240A - Verfahren zur Herstellung einer Halbleiteranordnung - Google Patents

Verfahren zur Herstellung einer Halbleiteranordnung

Info

Publication number
CH368240A
CH368240A CH6098358A CH6098358A CH368240A CH 368240 A CH368240 A CH 368240A CH 6098358 A CH6098358 A CH 6098358A CH 6098358 A CH6098358 A CH 6098358A CH 368240 A CH368240 A CH 368240A
Authority
CH
Switzerland
Prior art keywords
manufacturing
semiconductor device
semiconductor
Prior art date
Application number
CH6098358A
Other languages
English (en)
Inventor
William Mueller Charles
Margaret Printon Jane
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of CH368240A publication Critical patent/CH368240A/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/02—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the solid state
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
    • H01L29/167—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table further characterised by the doping material

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Electrodes Of Semiconductors (AREA)
CH6098358A 1957-06-25 1958-06-24 Verfahren zur Herstellung einer Halbleiteranordnung CH368240A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US667916A US2870050A (en) 1957-06-25 1957-06-25 Semiconductor devices and methods of making same

Publications (1)

Publication Number Publication Date
CH368240A true CH368240A (de) 1963-03-31

Family

ID=24680195

Family Applications (1)

Application Number Title Priority Date Filing Date
CH6098358A CH368240A (de) 1957-06-25 1958-06-24 Verfahren zur Herstellung einer Halbleiteranordnung

Country Status (7)

Country Link
US (1) US2870050A (de)
BE (1) BE568830A (de)
CH (1) CH368240A (de)
DE (1) DE1113034B (de)
FR (1) FR1208571A (de)
GB (1) GB832740A (de)
NL (2) NL113470C (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB945740A (de) * 1959-02-06 Texas Instruments Inc
US3066053A (en) * 1960-02-01 1962-11-27 Sylvania Electric Prod Method for producing semiconductor devices
US3174112A (en) * 1960-07-29 1965-03-16 Westinghouse Electric Corp Semiconductor devices providing the functions of a plurality of conventional components
US3183130A (en) * 1962-01-22 1965-05-11 Motorola Inc Diffusion process and apparatus
US3658606A (en) * 1969-04-01 1972-04-25 Ibm Diffusion source and method of producing same

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2071533A (en) * 1935-02-28 1937-02-23 Globe Steel Tubes Co Process of cementation
US2536774A (en) * 1946-03-07 1951-01-02 Diffusion Alloys Corp Process of coating ferrous metal and heat pack mixture therefor
US2629672A (en) * 1949-07-07 1953-02-24 Bell Telephone Labor Inc Method of making semiconductive translating devices
US2622043A (en) * 1949-09-30 1952-12-16 Thompson Prod Inc Chromizing pack and method
US2727839A (en) * 1950-06-15 1955-12-20 Bell Telephone Labor Inc Method of producing semiconductive bodies
FR1077509A (fr) * 1951-04-20 1954-11-09 France Etat Procédé d'homogénéisation et d'activation de cristaux semi-conducteurs et de couches semi-conductrices
US2695852A (en) * 1952-02-15 1954-11-30 Bell Telephone Labor Inc Fabrication of semiconductors for signal translating devices
US2742383A (en) * 1952-08-09 1956-04-17 Hughes Aircraft Co Germanium junction-type semiconductor devices
US2765245A (en) * 1952-08-22 1956-10-02 Gen Electric Method of making p-n junction semiconductor units
US2762705A (en) * 1953-01-23 1956-09-11 Int Nickel Co Addition agent and process for producing magnesium-containing cast iron
NL89732C (de) * 1953-11-02
NL95386C (de) * 1954-02-24
DE1215649B (de) * 1954-06-30 1966-05-05 Siemens Ag Verfahren zum Herstellen eines extrem reinen, stabfoermigen Halbleiterkristalls
US2759861A (en) * 1954-09-22 1956-08-21 Bell Telephone Labor Inc Process of making photoconductive compounds
BE552316A (de) * 1955-11-05
NL210216A (de) * 1955-12-02

Also Published As

Publication number Publication date
NL113470C (de)
BE568830A (de)
GB832740A (en) 1960-04-13
US2870050A (en) 1959-01-20
FR1208571A (fr) 1960-02-24
DE1113034B (de) 1961-08-24
NL228981A (de)

Similar Documents

Publication Publication Date Title
AT261004B (de) Verfahren zur Herstellung einer Halbleiteranordnung
CH367896A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH380247A (de) Verfahren zur Herstellung einer Halbleiteranordnung aus Silizium
CH347268A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH338906A (de) Verfahren zur Herstellung einer Halbleitervorrichtung und gemäss diesem Verfahren hergestellte Halbleitervorrichtung
CH432656A (de) Verfahren zum Herstellen einer Halbleiteranordnung
CH370842A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH381329A (de) Verfahren zur Herstellung einer Halbleiteranordnung
CH391111A (de) Verfahren zur Herstellung einer Halbleiteranordnung
CH403991A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
AT299311B (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH395349A (de) Verfahren zur Herstellung einer Halbleiteranordnung
CH423999A (de) Verfahren zur Herstellung einer Halbleiteranordnung
CH411799A (de) Verfahren zur Herstellung einer Halbleitervorrichtung und nach diesem Verfahren hergestellte Halbleitervorrichtung
CH368240A (de) Verfahren zur Herstellung einer Halbleiteranordnung
CH418466A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH399598A (de) Verfahren zur Herstellung einer Halbleiteranordnung
AT261676B (de) Verfahren zur Herstellung eines Bodens für eine Hülle einer Halbleitervorrichtung
CH350722A (de) Verfahren zur Herstellung einer Halbleiter-Vorrichtung
CH362751A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH429672A (de) Verfahren zur Herstellung einer Halbleiteranordnung
CH350723A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH468081A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH372385A (de) Verfahren zur Herstellung einer Halbleiteranordnung aus Silizium
CH474158A (de) Verfahren zur Herstellung einer Halbleitervorrichtung