CA1255669A - Light-sensitive bis-trichloromethyl-s-triazine compounds, a process for their production and light-sensitive mixtures containing such compounds - Google Patents

Light-sensitive bis-trichloromethyl-s-triazine compounds, a process for their production and light-sensitive mixtures containing such compounds

Info

Publication number
CA1255669A
CA1255669A CA000464814A CA464814A CA1255669A CA 1255669 A CA1255669 A CA 1255669A CA 000464814 A CA000464814 A CA 000464814A CA 464814 A CA464814 A CA 464814A CA 1255669 A CA1255669 A CA 1255669A
Authority
CA
Canada
Prior art keywords
group
compound
light
denotes
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000464814A
Other languages
English (en)
French (fr)
Inventor
Gerhard Buhr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Application granted granted Critical
Publication of CA1255669A publication Critical patent/CA1255669A/en
Expired legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/10—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L59/00—Compositions of polyacetals; Compositions of derivatives of polyacetals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
CA000464814A 1983-10-12 1984-10-05 Light-sensitive bis-trichloromethyl-s-triazine compounds, a process for their production and light-sensitive mixtures containing such compounds Expired CA1255669A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19833337024 DE3337024A1 (de) 1983-10-12 1983-10-12 Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
DEP3337024.9 1983-10-12

Publications (1)

Publication Number Publication Date
CA1255669A true CA1255669A (en) 1989-06-13

Family

ID=6211578

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000464814A Expired CA1255669A (en) 1983-10-12 1984-10-05 Light-sensitive bis-trichloromethyl-s-triazine compounds, a process for their production and light-sensitive mixtures containing such compounds

Country Status (17)

Country Link
US (2) US4619998A (enEXAMPLES)
EP (1) EP0137452B1 (enEXAMPLES)
JP (2) JPS60105667A (enEXAMPLES)
KR (1) KR910007221B1 (enEXAMPLES)
AT (1) ATE46333T1 (enEXAMPLES)
AU (1) AU571589B2 (enEXAMPLES)
BR (1) BR8405160A (enEXAMPLES)
CA (1) CA1255669A (enEXAMPLES)
CS (1) CS249527B2 (enEXAMPLES)
DE (2) DE3337024A1 (enEXAMPLES)
ES (1) ES536668A0 (enEXAMPLES)
FI (1) FI843978L (enEXAMPLES)
HK (1) HK78590A (enEXAMPLES)
HU (1) HUT37409A (enEXAMPLES)
IL (1) IL73112A (enEXAMPLES)
SG (1) SG63290G (enEXAMPLES)
ZA (1) ZA847940B (enEXAMPLES)

Families Citing this family (175)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
DE3337024A1 (de) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
JPH0766186B2 (ja) * 1985-07-02 1995-07-19 富士写真フイルム株式会社 感光性組成物
JPH0766185B2 (ja) * 1985-09-09 1995-07-19 富士写真フイルム株式会社 感光性組成物
US4837128A (en) * 1986-08-08 1989-06-06 Fuji Photo Film Co., Ltd. Light-sensitive composition
JPS6358440A (ja) * 1986-08-29 1988-03-14 Fuji Photo Film Co Ltd 感光性組成物
DE3716848A1 (de) * 1987-05-20 1988-12-01 Hoechst Ag Verfahren zur bebilderung lichtempfindlichen materials
DE3717933A1 (de) * 1987-05-27 1988-12-08 Hoechst Ag Photopolymerisierbares gemisch, dieses enthaltendes aufzeichnungsmaterial und verfahren zur herstellung von hochwaermebestaendigen reliefstrukturen
JPH07120036B2 (ja) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
DE3725949A1 (de) * 1987-08-05 1989-02-16 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien
DE3742275A1 (de) * 1987-12-12 1989-06-22 Hoechst Ag Verfahren zur nachbehandlung von entwickelten reliefdruckformen fuer den flexodruck
DE3807378A1 (de) * 1988-03-07 1989-09-21 Hoechst Ag Durch 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen substituierte aromatische verbindungen, verfahren zu ihrer herstellung und ihre verwendung in lichtempfindlichen gemischen
DE3807380A1 (de) * 1988-03-07 1989-09-21 Hoechst Ag 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen enthaltende oxadiazolverbindungen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
US5216158A (en) * 1988-03-07 1993-06-01 Hoechst Aktiengesellschaft Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation
DE3807381A1 (de) * 1988-03-07 1989-09-21 Hoechst Ag 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen enthaltende heterocyclische verbindungen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindung enthaelt
US5114827A (en) * 1988-06-28 1992-05-19 Microelectronics Center Of N.C. Photoresists resistant to oxygen plasmas
US4968582A (en) * 1988-06-28 1990-11-06 Mcnc And University Of Nc At Charlotte Photoresists resistant to oxygen plasmas
GB8819307D0 (en) * 1988-08-13 1988-09-14 Pfizer Ltd Antiarrhythmic agents
US5153323A (en) * 1988-09-07 1992-10-06 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a photoinitiator moiety
DE3901799A1 (de) * 1989-01-21 1990-08-02 Hoechst Ag Vorsensibilisierte druckplatte fuer den wasserlosen flachdruck
DE3912652A1 (de) * 1989-04-18 1990-10-25 Hoechst Ag Lichtempfindliche bis-trichlormethyl-s-triazine, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
EP0412570B1 (en) * 1989-08-11 1996-07-10 Fuji Photo Film Co., Ltd. Light- and heat-sensitive recording material
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4003025A1 (de) * 1990-02-02 1991-08-08 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4006190A1 (de) * 1990-02-28 1991-08-29 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
IT1245370B (it) * 1991-03-28 1994-09-20 Plurimetal Srl Composizione fotosensibile per lastre da stampa offset
DE4112967A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Substituierte 1-sulfonyloxy-2-pyridone, verfahren zu ihrer herstellung und ihre verwendung
DE4112968A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Saeurespaltbare verbindungen, diese enthaltendes positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4120174A1 (de) * 1991-06-19 1992-12-24 Hoechst Ag Strahlungsempfindliche sulfonsaeureester und deren verwendung
US5298361A (en) * 1991-08-30 1994-03-29 Minnesota Mining And Manufacturing Company Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator
JP3016952B2 (ja) * 1992-04-28 2000-03-06 クラリアント インターナショナル リミテッド ネガ型フォトレジスト組成物
PT1093760E (pt) 1993-06-10 2005-02-28 Karlin Technology Inc Elemento de distraccao espinal
DE4328676A1 (de) * 1993-08-26 1995-03-02 Hoechst Ag Lichtempfindliches Material und Verfahren zur Herstellung eines farbigen Bilds
EP0672954B1 (en) * 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
US5631307A (en) 1994-06-28 1997-05-20 Toyo Ink Manufacturing Co., Ltd. Photopolymerization initiator composition and photopolymerizable composition
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
US5561029A (en) * 1995-04-28 1996-10-01 Polaroid Corporation Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
US5772920A (en) * 1995-07-12 1998-06-30 Clariant Finance (Bvi) Limited U.V. absorber compositions
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
US5837586A (en) * 1997-02-14 1998-11-17 Kodak Polychrome Graphics Company, Ltd. 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition
US5847133A (en) * 1997-05-23 1998-12-08 Minnesota Mining And Manufacturing Company Ionic halomethyl-1,3,5-triazine photoinitiators
US6010821A (en) 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
US6258510B1 (en) * 1998-05-21 2001-07-10 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate precursor
ES2263291T3 (es) * 1998-09-28 2006-12-01 Kimberly-Clark Worldwide, Inc. Quelatos que comprenden grupos quinoides como fotoiniciadores.
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
DE50204080D1 (de) 2002-04-29 2005-10-06 Agfa Gevaert Nv Strahlungsempfindliches Gemisch, damit hergestelltes Aufzeichnungsmaterial, und Verfahren zur Herstellung einer Druckplatte
US20050090936A1 (en) * 2003-10-24 2005-04-28 Hitt Dale K. Two-wire control of sprinkler system
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
US7639330B2 (en) 2003-11-21 2009-12-29 Zeon Corporation Liquid crystal display device
TWI370925B (en) 2003-11-21 2012-08-21 Zeon Corp Liquid crystal display apparatus(ii)
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
US7241557B2 (en) * 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP2006335826A (ja) 2005-05-31 2006-12-14 Fujifilm Holdings Corp インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
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JP2008163081A (ja) 2006-12-27 2008-07-17 Fujifilm Corp レーザー分解性樹脂組成物およびそれを用いるパターン形成材料ならびにレーザー彫刻型フレキソ印刷版原版
EP1952998B1 (en) 2007-02-01 2011-04-06 FUJIFILM Corporation Ink-jet recording device
EP1955858B1 (en) 2007-02-06 2014-06-18 FUJIFILM Corporation Ink-jet recording method and device
DE602008006279D1 (de) 2007-02-07 2011-06-01 Fujifilm Corp Tintenstrahlaufzeichnungsvorrichtung mit Wartungsvorrichtung für Tintenstrahldruckkopf und Wartungsverfahren für einen Tintenstrahldruckkopf
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JP5243072B2 (ja) 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
JP5306681B2 (ja) 2007-03-30 2013-10-02 富士フイルム株式会社 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法
JP2008250234A (ja) 2007-03-30 2008-10-16 Fujifilm Corp 液晶表示装置
US20080259268A1 (en) 2007-04-12 2008-10-23 Fujifilm Corporation Process of producing substrate for liquid crystal display device
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
JP5227560B2 (ja) 2007-09-28 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
US8361702B2 (en) 2007-11-08 2013-01-29 Fujifilm Corporation Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate
JP5500831B2 (ja) 2008-01-25 2014-05-21 富士フイルム株式会社 レリーフ印刷版の作製方法及びレーザー彫刻用印刷版原版
JP5241252B2 (ja) 2008-01-29 2013-07-17 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
JP2009223304A (ja) 2008-02-19 2009-10-01 Fujifilm Corp 液晶表示装置用基板および液晶表示装置
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5137618B2 (ja) 2008-02-28 2013-02-06 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
EP2095970A1 (en) 2008-02-29 2009-09-02 Fujifilm Corporation Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
JP4914862B2 (ja) 2008-03-26 2012-04-11 富士フイルム株式会社 インクジェット記録方法、及び、インクジェット記録装置
JP5322575B2 (ja) 2008-03-28 2013-10-23 富士フイルム株式会社 レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
JP5305793B2 (ja) 2008-03-31 2013-10-02 富士フイルム株式会社 レリーフ印刷版及びレリーフ印刷版の製造方法
JP2009271121A (ja) 2008-04-30 2009-11-19 Fujifilm Corp 着色光学異方性層を含む光学材料
EP2124076B1 (en) 2008-05-21 2018-09-26 FUJIFILM Corporation Birefringent pattern builder and laminated structure material for preventing forgery
JP5414367B2 (ja) 2008-06-02 2014-02-12 富士フイルム株式会社 顔料分散物及びそれを用いたインク組成物
JP5380007B2 (ja) 2008-06-16 2014-01-08 富士フイルム株式会社 偽造防止媒体
JP2010181852A (ja) 2008-07-14 2010-08-19 Fujifilm Corp 光学異方性膜、光学異方性膜の製造方法、液晶セル用基板、及び液晶表示装置
JP5383133B2 (ja) 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
JP2010077228A (ja) 2008-09-25 2010-04-08 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP5543097B2 (ja) 2008-11-07 2014-07-09 富士フイルム株式会社 偽造防止箔
JP2010180330A (ja) 2009-02-05 2010-08-19 Fujifilm Corp 非水系インク、インクセット、画像記録方法、画像記録装置、および記録物
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP2010197921A (ja) 2009-02-27 2010-09-09 Fujifilm Corp 液晶表示装置用基板および液晶表示装置
JP5349095B2 (ja) 2009-03-17 2013-11-20 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349097B2 (ja) 2009-03-19 2013-11-20 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5383289B2 (ja) 2009-03-31 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物
JP5020289B2 (ja) 2009-06-11 2012-09-05 富士フイルム株式会社 赤外光反射板、及び赤外光反射性合わせガラス
EP2442160A4 (en) 2009-06-11 2012-11-07 Fujifilm Corp METHOD FOR PRODUCING REFLECTIVE FILM
JP5259501B2 (ja) 2009-06-11 2013-08-07 富士フイルム株式会社 赤外光反射板、赤外光反射性合わせガラス、並びにコレステリック液晶層を有する積層体及び合わせガラス
JP5451235B2 (ja) 2009-07-31 2014-03-26 富士フイルム株式会社 複屈折パターンを有する物品の製造方法及び複屈折パターン作製材料
JP5657243B2 (ja) 2009-09-14 2015-01-21 ユー・ディー・シー アイルランド リミテッド カラーフィルタ及び発光表示素子
JP5572026B2 (ja) 2009-09-18 2014-08-13 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5530141B2 (ja) 2009-09-29 2014-06-25 富士フイルム株式会社 インク組成物及びインクジェット記録方法
US9200201B2 (en) 2009-10-22 2015-12-01 Zeon Corporation Heat-insulating particulate pigment and infrared-reflective coating solution
JP5701576B2 (ja) 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
JP2011154215A (ja) 2010-01-27 2011-08-11 Fujifilm Corp 赤外光反射板、合わせガラス用積層中間膜シート及びその製造方法、並びに合わせガラス
JP5803903B2 (ja) 2010-03-09 2015-11-04 日本ゼオン株式会社 断熱部材、断熱合わせガラス及び断熱合わせガラス物品
JP5412350B2 (ja) 2010-03-26 2014-02-12 富士フイルム株式会社 複屈折パターンを有する物品
JP5566160B2 (ja) 2010-03-31 2014-08-06 富士フイルム株式会社 液晶性化合物、液晶性組成物、光吸収異方性膜、及び液晶表示装置
US9601705B2 (en) 2010-03-31 2017-03-21 Udc Ireland Limited Material for organic electroluminescence element and organic electroluminescence element using the same, and method for manufacturing organic electroluminescence element
JP2012031388A (ja) 2010-05-19 2012-02-16 Fujifilm Corp 印刷方法、オーバープリントの作製方法、ラミネート加工方法、発光ダイオード硬化性コーティング組成物、及び、発光ダイオード硬化性インク組成物
JP5638285B2 (ja) 2010-05-31 2014-12-10 富士フイルム株式会社 重合性組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、および固体撮像素子
JP5882566B2 (ja) 2010-07-09 2016-03-09 富士フイルム株式会社 印刷および複屈折パターンを有する偽造防止媒体
JP5729933B2 (ja) 2010-07-28 2015-06-03 富士フイルム株式会社 複屈折パターン作製材料
JP2012113000A (ja) 2010-11-19 2012-06-14 Fujifilm Corp 複屈折パターン転写箔
EP2472330B1 (en) 2010-12-28 2017-01-25 Fujifilm Corporation Black radiation-sensitive composition, black cured film, solid-state imaging element, and method of producing black cured film
JP5671365B2 (ja) 2011-02-18 2015-02-18 富士フイルム株式会社 赤外光反射板並びに合わせガラス用積層中間膜シート及び合わせガラスとそれらの製造方法
JP5723641B2 (ja) 2011-03-16 2015-05-27 富士フイルム株式会社 重合性化合物、重合性液晶組成物、高分子化合物およびフィルム
JP5750069B2 (ja) 2011-03-24 2015-07-15 富士フイルム株式会社 液晶配向促進剤、液晶組成物、高分子材料およびフィルム
JP5774518B2 (ja) 2011-07-27 2015-09-09 富士フイルム株式会社 化合物、ヘイズ低下剤、液晶組成物、高分子材料およびフィルム
JP5718260B2 (ja) 2011-09-08 2015-05-13 富士フイルム株式会社 重合性液晶化合物、重合性組成物、高分子材料、及びフィルム
KR101622990B1 (ko) 2011-09-14 2016-05-20 후지필름 가부시키가이샤 컬러필터용 착색 감방사선성 조성물, 패턴 형성 방법, 컬러필터, 그 제조 방법, 및 고체 촬상 소자
US8846981B2 (en) 2012-01-30 2014-09-30 Southern Lithoplate, Inc. 1,1-di[(alkylphenoxy)ethoxy]cyclohexanes
US8632943B2 (en) 2012-01-30 2014-01-21 Southern Lithoplate, Inc. Near-infrared sensitive, positive-working, image forming composition and photographic element containing a 1,1-di[(alkylphenoxy)ethoxy]cyclohexane
JP5775479B2 (ja) 2012-03-21 2015-09-09 富士フイルム株式会社 着色感放射線性組成物、着色硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置
JP2013200515A (ja) 2012-03-26 2013-10-03 Fujifilm Corp 光反射層、光反射板並びに合わせガラス用積層中間膜シート及び合わせガラスとそれらの製造方法
JP5827161B2 (ja) 2012-03-28 2015-12-02 富士フイルム株式会社 コレステリック液晶性混合物、フィルム、赤外反射板、積層体および合わせガラス
EP2644664B1 (en) 2012-03-29 2015-07-29 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
JP5909468B2 (ja) 2012-08-31 2016-04-26 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、及び固体撮像素子
JP5934682B2 (ja) 2012-08-31 2016-06-15 富士フイルム株式会社 マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法
JP5894943B2 (ja) 2012-08-31 2016-03-30 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、マイクロレンズの製造方法、及び固体撮像素子
KR20140031737A (ko) * 2012-09-05 2014-03-13 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 블랙 매트릭스의 형성 방법
JP5961498B2 (ja) 2012-09-18 2016-08-02 富士フイルム株式会社 熱線カットフィルムおよびその製造方法、合わせガラス並びに熱線カット部材
JP6170673B2 (ja) 2012-12-27 2017-07-26 富士フイルム株式会社 カラーフィルタ用組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー
JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット
JP6162084B2 (ja) 2013-09-06 2017-07-12 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、ポリマー、キサンテン色素
WO2015050203A1 (ja) 2013-10-03 2015-04-09 富士フイルム株式会社 投映像表示用ハーフミラーおよびその製造方法、ならびに投映像表示システム
JP2015072410A (ja) 2013-10-04 2015-04-16 富士フイルム株式会社 コレステリック液晶層を含む熱圧着貼合用フィルムおよびその応用
JP6520953B2 (ja) 2014-09-26 2019-05-29 日本ゼオン株式会社 円偏光板及びその製造方法、有機エレクトロルミネッセンス表示装置、並びに液晶表示装置
JPWO2016129645A1 (ja) 2015-02-10 2017-10-26 富士フイルム株式会社 光学部材、光学素子、液晶表示装置および近接眼光学部材
KR102638926B1 (ko) 2015-05-28 2024-02-20 니폰 제온 가부시키가이샤 원편광 분리 필름 및 그 제조 방법
WO2017078271A1 (en) * 2015-11-04 2017-05-11 Rohm And Haas Electronic Materials Korea Ltd. Colored photosensitive resin composition and light shielding spacer prepared therefrom
TWI634135B (zh) 2015-12-25 2018-09-01 日商富士軟片股份有限公司 樹脂、組成物、硬化膜、硬化膜的製造方法及半導體元件
JP6572146B2 (ja) 2016-01-29 2019-09-04 富士フイルム株式会社 ハーフミラーおよび画像表示機能付きミラー
WO2017183428A1 (ja) 2016-04-21 2017-10-26 富士フイルム株式会社 画像表示機能付きミラーおよびハーフミラー
WO2018084076A1 (ja) 2016-11-04 2018-05-11 富士フイルム株式会社 ウインドシールドガラス、ヘッドアップディスプレイシステム、およびハーフミラーフィルム
WO2018146958A1 (ja) 2017-02-09 2018-08-16 富士フイルム株式会社 ハーフミラー、ハーフミラーの製造方法、および画像表示機能付きミラー
WO2018198559A1 (ja) 2017-04-28 2018-11-01 富士フイルム株式会社 画像表示機能付き防眩ミラー
EP3650894B1 (en) 2017-07-04 2024-10-16 FUJIFILM Corporation Half mirror
WO2019050019A1 (ja) 2017-09-07 2019-03-14 富士フイルム株式会社 投映像表示用ハーフミラーフィルム、投映像表示用の合わせガラス、および、画像表示システム
JP6934101B2 (ja) 2018-02-23 2021-09-08 富士フイルム株式会社 画像表示用合わせガラスの製造方法、画像表示用合わせガラス、および、画像表示システム
CN115079329B (zh) 2018-03-23 2024-04-19 富士胶片株式会社 胆甾醇型液晶层、光学各向异性体及反射层
EP3770657A4 (en) 2018-03-23 2021-06-02 FUJIFILM Corporation LAYER OF LIQUID CHOLESTERIC CRYSTALS, LAMINATE BODY, OPTICALLY ANISOTROPIC BODY, REFLECTIVE FILM, PROCESS FOR MAKING A LAYER OF LIQUID CHOLESTERIC CRYSTALS; MEANS OF PREVENTING FALSIFICATION AND DETERMINATION PROCESS
EP3778248A4 (en) 2018-03-29 2021-06-02 FUJIFILM Corporation IMAGE GENERATION PROCESS
EP3869245A4 (en) 2018-10-17 2021-12-15 FUJIFILM Corporation PROJECTION IMAGE DISPLAY ELEMENT, WINDSHIELD GLASS, AND HEAD-UP DISPLAY SYSTEM
JP7299920B2 (ja) 2018-12-10 2023-06-28 富士フイルム株式会社 投映像表示用部材、ウインドシールドガラスおよびヘッドアップディスプレイシステム
JP7066042B2 (ja) 2019-02-27 2022-05-12 富士フイルム株式会社 積層体
EP3936924B1 (en) 2019-03-06 2025-01-15 FUJIFILM Corporation Laminated film for displaying projection image, laminated glass for displaying projection image, and image display system
JP7317113B2 (ja) 2019-06-27 2023-07-28 富士フイルム株式会社 成型用加飾フィルム、成型物、及びディスプレイ
TWI851818B (zh) 2019-09-26 2024-08-11 日商富士軟片股份有限公司 導熱層的製造方法、積層體的製造方法及半導體器件的製造方法
JP7313457B2 (ja) 2019-09-27 2023-07-24 富士フイルム株式会社 ヘッドアップディスプレイ用プロジェクター
WO2021131792A1 (ja) 2019-12-26 2021-07-01 富士フイルム株式会社 光吸収異方性層、積層体、光学フィルム、画像表示装置、バックライトモジュール
WO2021200655A1 (ja) 2020-03-30 2021-10-07 富士フイルム株式会社 反射フィルム、ウインドシールドガラスおよびヘッドアップディスプレイシステム
CN115461320B (zh) 2020-04-28 2024-09-13 富士胶片株式会社 化合物、液晶组合物、固化物及薄膜
EP4163262A4 (en) 2020-06-03 2023-12-13 FUJIFILM Corporation REFLECTIVE FILM, COMPOSITE GLASS PRODUCTION PROCESS AND LAMINATED GLASS
EP4261575A4 (en) 2020-12-09 2024-06-19 FUJIFILM Corporation Reflection film, windshield glass, and head-up display system
EP4411452A4 (en) 2021-09-30 2025-02-05 FUJIFILM Corporation Head-up display system and transport
EP4428599A4 (en) 2021-11-05 2025-03-05 FUJIFILM Corporation VIRTUAL IMAGE DISPLAY DEVICE, HEAD-UP DISPLAY SYSTEM, AND TRANSPORTATION VEHICLE
WO2023200018A1 (ja) 2022-04-15 2023-10-19 富士フイルム株式会社 反射フィルム、積層体、ウインドシールドガラス、画像表示システム
WO2023248719A1 (ja) 2022-06-21 2023-12-28 富士フイルム株式会社 画像記録物及び画像記録物の製造方法、並びに、加飾成形体
CN115352177B (zh) * 2022-08-31 2023-12-08 浙江康尔达新材料股份有限公司 一种具有显色功能的紫外光敏感平版印刷版前体及其制版方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH484918A (de) * 1965-10-28 1970-01-31 Ciba Geigy Verfahren zur Herstellung heterocyclischer, Aethylendoppelbindungen enthaltender Verbindungen
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
DE2712686C2 (de) * 1977-03-23 1986-09-04 Bayer Ag, 5090 Leverkusen 4-Triazinyl-4'-benzoxazolyl- bzw. 4'-phenyl-stilben-derivate
DE2718259C2 (de) * 1977-04-25 1982-11-25 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliches Gemisch
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
US4294909A (en) * 1979-12-26 1981-10-13 E. I. Du Pont De Nemours And Company Photosensitive negative-working toning process
US4329384A (en) * 1980-02-14 1982-05-11 Minnesota Mining And Manufacturing Company Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
DE3337024A1 (de) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition

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KR910007221B1 (ko) 1991-09-20
US4696888A (en) 1987-09-29
FI843978A7 (fi) 1985-04-13
ATE46333T1 (de) 1989-09-15
SG63290G (en) 1990-09-07
KR850003453A (ko) 1985-06-17
FI843978L (fi) 1985-04-13
ES8603435A1 (es) 1985-12-16
ZA847940B (en) 1985-05-29
EP0137452B1 (de) 1989-09-13
US4619998A (en) 1986-10-28
JPH0544459B2 (enEXAMPLES) 1993-07-06
HUT37409A (en) 1985-12-28
FI843978A0 (fi) 1984-10-10
CS249527B2 (en) 1987-03-12
ES536668A0 (es) 1985-12-16

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