BR9912722A - Sistema e processo para fundir e evaporar continuamente um material sólido, sistema de revestimento por deposição de vapor, eletrodo continuamente alimentado, aparelho de descarga de arco elétrico , processos para produzir uma descarga de arco elétrico, para revestir por deposição de vapor, para ionizar um vapor de revestimento, para medir o grau de ionização e a taxa de evaporação a partir de um evaporador em um sistema de revestimento por deposição de vapor e para remover material depositado em uma célula de vácuo por um vapor de revestimento - Google Patents
Sistema e processo para fundir e evaporar continuamente um material sólido, sistema de revestimento por deposição de vapor, eletrodo continuamente alimentado, aparelho de descarga de arco elétrico , processos para produzir uma descarga de arco elétrico, para revestir por deposição de vapor, para ionizar um vapor de revestimento, para medir o grau de ionização e a taxa de evaporação a partir de um evaporador em um sistema de revestimento por deposição de vapor e para remover material depositado em uma célula de vácuo por um vapor de revestimentoInfo
- Publication number
- BR9912722A BR9912722A BR9912722-9A BR9912722A BR9912722A BR 9912722 A BR9912722 A BR 9912722A BR 9912722 A BR9912722 A BR 9912722A BR 9912722 A BR9912722 A BR 9912722A
- Authority
- BR
- Brazil
- Prior art keywords
- coating
- vapor deposition
- arc discharge
- vapor
- electric arc
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
"SISTEMA E PROCESSO PARA FUNDIR E EVAPORAR CONTINUAMENTE UM MATERIAL SóLIDO, SISTEMA DE REVESTIMENTO POR DEPOSIçãO DE VAPOR, ELETRODO CONTINUAMENTE ALIMENTADO, APARELHO DE DESCARGA DE ARCO ELéTRICO, PROCESSOS PARA PRODUZIR UMA DESCARGA DE ARCO ELéTRICO, PARA REVESTIR POR DEPOSIçãO DE VAPOR, PARA IONIZAR UM VAPOR DE REVESTIMENTO, PARA MEDIR O GRAU DE IONIZAçãO E A TAXA DE EVAPORAçãO A PARTIR DE UM EVAPORADOR EM UM SISTEMA DE REVESTIMENTO POR DEPOSIçãO DE VAPOR E PARA REMOVER MATERIAL DE POSITADO EM UMA CéLULA DE VáCUO POR UM VAPOR DE REVESTIMENTO". Aparelhos e processo para uso em revestimento por deposição de vapor a vácuo asseguram operação mais simples, económica e contínua. Um sistema e processo para continuamente efetuar a fusão e evaporação de um material sólido para formar um vapor de revestimento inclui o uso de um cadinho de fusão em separado e cadinho de evaporação. Um sistema e processo para energizar os sólidos evaporáveis para formar um plasma que compreende primeiro e segundo eletrodos e um dispositivo para seletivamente comutar a polaridade entre os primeiro e segundo eletrodos para evitar a deposição de vapor de revestimento sobre os eletrodos. Outro sistema e processo para energizar os sólidos evaporáveis para formar um plasma que incluem um aparelho de descarga de arco elétrico com uma parte catódica e uma parte anódica. Um eletrodo continuamente alimentado é apresentado para contínua vaporização de membros de eletrodo em uma descarga de arco elétrico. Um aparelho e processo asseguram a medição da taxa de evaporação de um evaporador e o grau de ionização em um sistema de revestimento por deposição de vapor. Finalmente, um sistema é apresentado para limpeza in situ de depósitos vaporizáveis para limpeza do recinto do sistema de deposição de vapor a vácuo.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/128,456 US6251233B1 (en) | 1998-08-03 | 1998-08-03 | Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation |
PCT/US1999/015828 WO2000008226A2 (en) | 1998-08-03 | 1999-07-14 | Vapor deposition system |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9912722A true BR9912722A (pt) | 2001-05-02 |
Family
ID=22435473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9912722-9A BR9912722A (pt) | 1998-08-03 | 1999-07-14 | Sistema e processo para fundir e evaporar continuamente um material sólido, sistema de revestimento por deposição de vapor, eletrodo continuamente alimentado, aparelho de descarga de arco elétrico , processos para produzir uma descarga de arco elétrico, para revestir por deposição de vapor, para ionizar um vapor de revestimento, para medir o grau de ionização e a taxa de evaporação a partir de um evaporador em um sistema de revestimento por deposição de vapor e para remover material depositado em uma célula de vácuo por um vapor de revestimento |
Country Status (12)
Country | Link |
---|---|
US (3) | US6251233B1 (pt) |
EP (1) | EP1109944A2 (pt) |
JP (1) | JP2002522637A (pt) |
KR (1) | KR20010083127A (pt) |
CN (1) | CN1348509A (pt) |
AR (5) | AR016735A1 (pt) |
AU (1) | AU4990699A (pt) |
BR (1) | BR9912722A (pt) |
CA (1) | CA2338352A1 (pt) |
CO (2) | CO5111049A1 (pt) |
IL (1) | IL140811A0 (pt) |
WO (1) | WO2000008226A2 (pt) |
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-
1998
- 1998-08-03 US US09/128,456 patent/US6251233B1/en not_active Expired - Fee Related
-
1999
- 1999-07-14 WO PCT/US1999/015828 patent/WO2000008226A2/en not_active Application Discontinuation
- 1999-07-14 KR KR1020017000786A patent/KR20010083127A/ko not_active Application Discontinuation
- 1999-07-14 IL IL14081199A patent/IL140811A0/xx unknown
- 1999-07-14 CA CA002338352A patent/CA2338352A1/en not_active Abandoned
- 1999-07-14 JP JP2000563847A patent/JP2002522637A/ja active Pending
- 1999-07-14 BR BR9912722-9A patent/BR9912722A/pt not_active IP Right Cessation
- 1999-07-14 AU AU49906/99A patent/AU4990699A/en not_active Abandoned
- 1999-07-14 EP EP99933968A patent/EP1109944A2/en not_active Withdrawn
- 1999-07-14 CN CN99810350A patent/CN1348509A/zh active Pending
- 1999-07-22 AR ARP990103620A patent/AR016735A1/es unknown
- 1999-08-02 CO CO99048733A patent/CO5111049A1/es unknown
- 1999-08-02 CO CO99048733D patent/CO5111064A1/es unknown
-
2000
- 2000-08-07 AR ARP000104072A patent/AR025067A2/es unknown
- 2000-08-07 AR ARP000104071A patent/AR025066A2/es unknown
- 2000-08-07 AR ARP000104069A patent/AR025064A2/es unknown
- 2000-08-07 AR ARP000104070A patent/AR025065A2/es unknown
-
2001
- 2001-04-30 US US09/845,885 patent/US6447837B2/en not_active Expired - Fee Related
-
2002
- 2002-09-09 US US10/237,316 patent/US20030007786A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CA2338352A1 (en) | 2000-02-17 |
KR20010083127A (ko) | 2001-08-31 |
WO2000008226A3 (en) | 2000-12-07 |
CO5111064A1 (es) | 2001-12-26 |
US20010022272A1 (en) | 2001-09-20 |
IL140811A0 (en) | 2002-02-10 |
AR025067A2 (es) | 2002-11-06 |
AU4990699A (en) | 2000-02-28 |
US6251233B1 (en) | 2001-06-26 |
AR025066A2 (es) | 2002-11-06 |
EP1109944A2 (en) | 2001-06-27 |
AR016735A1 (es) | 2001-07-25 |
CO5111049A1 (es) | 2001-12-26 |
CN1348509A (zh) | 2002-05-08 |
AR025065A2 (es) | 2002-11-06 |
US20030007786A1 (en) | 2003-01-09 |
US6447837B2 (en) | 2002-09-10 |
WO2000008226A2 (en) | 2000-02-17 |
JP2002522637A (ja) | 2002-07-23 |
AR025064A2 (es) | 2002-11-06 |
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