BR0005434A - Combinação de eletrodos - Google Patents
Combinação de eletrodosInfo
- Publication number
- BR0005434A BR0005434A BR0005434-8A BR0005434A BR0005434A BR 0005434 A BR0005434 A BR 0005434A BR 0005434 A BR0005434 A BR 0005434A BR 0005434 A BR0005434 A BR 0005434A
- Authority
- BR
- Brazil
- Prior art keywords
- combination
- material surface
- evaporation
- electrodes
- cathodic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32422—Arrangement for selecting ions or species in the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Plasma Technology (AREA)
- Wrappers (AREA)
- Laminated Bodies (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19955373 | 1999-11-17 | ||
DE10024827A DE10024827B4 (de) | 1999-11-17 | 2000-05-19 | Elektrodenanordnung und ihre Verwendung |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0005434A true BR0005434A (pt) | 2001-07-03 |
Family
ID=26005752
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0005434-8A BR0005434A (pt) | 1999-11-17 | 2000-11-17 | Combinação de eletrodos |
Country Status (10)
Country | Link |
---|---|
US (1) | US6881270B1 (pt) |
EP (1) | EP1103630B1 (pt) |
JP (1) | JP2001192815A (pt) |
AR (1) | AR026514A1 (pt) |
AT (1) | ATE256762T1 (pt) |
AU (1) | AU774818B2 (pt) |
BR (1) | BR0005434A (pt) |
CA (1) | CA2325901A1 (pt) |
ES (1) | ES2208203T3 (pt) |
MX (1) | MXPA00011145A (pt) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050136100A1 (en) * | 1999-05-27 | 2005-06-23 | Foss Manufacturing Co., Inc. | Hollow anti-microbial fibers and fibrous products |
ES2208203T3 (es) * | 1999-11-17 | 2004-06-16 | APPLIED FILMS GMBH & CO. KG | Disposicion de electrodos. |
GB0404436D0 (en) * | 2004-02-27 | 2004-03-31 | Nanofilm Technologies Int | Continuous arc deposition apparatus and method with multiple available targets |
JP4373252B2 (ja) | 2004-03-16 | 2009-11-25 | 浩史 滝川 | プラズマ生成装置 |
KR100852114B1 (ko) * | 2007-02-22 | 2008-08-13 | 삼성에스디아이 주식회사 | 플라즈마 건 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4868003A (en) * | 1986-11-26 | 1989-09-19 | Optical Coating Laboratory, Inc. | System and method for vacuum deposition of thin films |
DE3700633C2 (de) * | 1987-01-12 | 1997-02-20 | Reinar Dr Gruen | Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma |
US5009922A (en) * | 1989-03-02 | 1991-04-23 | Ashahi Glass Company, Ltd. | Method of forming a transparent conductive film |
DE4042337C1 (en) | 1990-08-22 | 1991-09-12 | Plasco Dr. Ehrich Plasma-Coating Gmbh, 6501 Heidesheim, De | Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them |
DE19724996C1 (de) * | 1997-06-13 | 1998-09-03 | Fraunhofer Ges Forschung | Verfahren zum plasmaaktivierten Elektronenstrahlverdampfen und Einrichtung zur Durchführung des Verfahrens |
JP3839930B2 (ja) * | 1997-09-29 | 2006-11-01 | スタンレー電気株式会社 | 薄膜作製装置及び薄膜作製方法 |
WO2000046418A1 (de) | 1999-02-05 | 2000-08-10 | Applied Films Gmbh & Co. Kg | Vorrichtung zum beschichten von substraten mit einem materialdampf im unterdruck oder vakuum mit einer materialdampfquelle |
ES2208203T3 (es) * | 1999-11-17 | 2004-06-16 | APPLIED FILMS GMBH & CO. KG | Disposicion de electrodos. |
-
2000
- 2000-11-09 ES ES00124558T patent/ES2208203T3/es not_active Expired - Lifetime
- 2000-11-09 AT AT00124558T patent/ATE256762T1/de not_active IP Right Cessation
- 2000-11-09 US US09/710,769 patent/US6881270B1/en not_active Expired - Fee Related
- 2000-11-09 EP EP00124558A patent/EP1103630B1/de not_active Expired - Lifetime
- 2000-11-13 MX MXPA00011145A patent/MXPA00011145A/es active IP Right Grant
- 2000-11-15 CA CA002325901A patent/CA2325901A1/en not_active Abandoned
- 2000-11-16 AU AU71649/00A patent/AU774818B2/en not_active Ceased
- 2000-11-16 JP JP2000349399A patent/JP2001192815A/ja active Pending
- 2000-11-17 AR ARP000106073A patent/AR026514A1/es active IP Right Grant
- 2000-11-17 BR BR0005434-8A patent/BR0005434A/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU774818B2 (en) | 2004-07-08 |
ES2208203T3 (es) | 2004-06-16 |
EP1103630B1 (de) | 2003-12-17 |
MXPA00011145A (es) | 2004-05-05 |
JP2001192815A (ja) | 2001-07-17 |
EP1103630A1 (de) | 2001-05-30 |
AU7164900A (en) | 2001-05-24 |
ATE256762T1 (de) | 2004-01-15 |
AR026514A1 (es) | 2003-02-12 |
US6881270B1 (en) | 2005-04-19 |
CA2325901A1 (en) | 2001-05-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2004010455A3 (en) | Ion beam source with coated electrode | |
ES556678A0 (es) | Un procedimiento de deposicion de vapor por un arco electrico | |
BR0016442A (pt) | Central de força de célula de combustìvel, e, processo de operação da mesma. | |
CA2395165A1 (en) | Treatment of hibernating myocardium and diabetic cardiomyopathy with a glp-1 peptide | |
ATE343660T1 (de) | Verfahren und anlage zum behandeln von substraten mittels ionen aus einer niedervoltbogenentladung | |
CA2280805A1 (en) | Gas discharge lamp with separately operating electrode groups | |
BR0005434A (pt) | Combinação de eletrodos | |
KR970063318A (ko) | 쇼트아크형 방전램프 | |
ES291668U (es) | Electrodo con posibilidad de inversion de polaridad para fines electroquimicos | |
BR0307112A (pt) | Placa de catodo e método para produção da mesma | |
FI915971A0 (fi) | Elektrolyscell foer gasutvecklande elektrolytiska processer. | |
WO1997040485A3 (en) | Hollow cathodes for plasma-containing display devices and method of producing same | |
EP0875605A3 (de) | Anordnung zur elektrogalvanischen Metallbeschichtung von Bändern | |
ES2094589T3 (es) | Electrodo negativo para acumuladores alcalinos estancos que tiene una capa consumidora de gas que contiene hollin. | |
ES2143875T3 (es) | Instalacion de revestimiento en vacio con una camara de revestimiento y al menos una camara de fuente. | |
BR0109887A (pt) | Processo de galvonoplastia direta de um substrato plástico, e, substrato plástico | |
Takikawa et al. | Carbon nanotubes in cathodic vacuum arc discharge | |
ES2133197T3 (es) | Celula de placas apiladas electrolitica. | |
KR860007715A (ko) | 전자 비임 장치 | |
KR910010577A (ko) | 디스펜서 음극 | |
US20080297026A1 (en) | Apparatus of field emission light source | |
ATE304065T1 (de) | Elektronenstrahlverdampfer für vacuum- beschichtungsanlagen | |
JPH01246104A (ja) | オゾン発生用放電体 | |
RU99122426A (ru) | Плазматрон для лазерно-плазменного нанесения покрытия | |
JPS57210551A (en) | Triple-pole type ion pump |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCP | Transfer pending | ||
PCR | Transfer refused | ||
PC | Transfer |
Owner name: BALZERS PROCESS SYSTEMS GMBH (DE) |
|
PC | Transfer |
Owner name: LEYBOLD COATING GMBH & CO KG (DE) |
|
PC | Transfer |
Owner name: LEYBOLD COATING GMBH & CO KG (DE) |
|
HKT | Transfer or change (deleted) | ||
B25D | Requested change of name of applicant approved | ||
B25F | Entry of change of name and/or headquarter and transfer of application, patent and certif. of addition of invention: change of name on requirement |
Owner name: APPLIED FILMS GMBH AND CO. KG (DE) Free format text: A FIM DE ATENDER O SOLICITADO NA PETICAO DE ALTERACAO DE NOME NO 020070023563/RJ DE 26/02/2007, QUEIRA APRESENTAR DOCUMENTO ONDE CONSTE QUE A REQUERENTE ALTEROU SUA DENOMINACAO SOCIAL. |
|
B25L | Entry of change of name and/or headquarter and transfer of application, patent and certificate of addition of invention: publication cancelled |
Owner name: APPLIED FILMS GMBH AND CO. KG (DE) Free format text: ANULADA A EXIGENCIA PUBLICADA NA RPI 1896 DE 08/05/2007, POR TER SIDO INDEVIDA. |
|
B25D | Requested change of name of applicant approved |
Owner name: APPLIED MATERIALS GMBH AND CO. KG (DE) Free format text: ALTERADO DE: APPLIED FILMS GMBH AND CO. KG |
|
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B07A | Application suspended after technical examination (opinion) [chapter 7.1 patent gazette] | ||
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 14A ANUIDADE. |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2280 DE 16/09/2014. |