AR016735A1 - Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor - Google Patents

Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor

Info

Publication number
AR016735A1
AR016735A1 ARP990103620A ARP990103620A AR016735A1 AR 016735 A1 AR016735 A1 AR 016735A1 AR P990103620 A ARP990103620 A AR P990103620A AR P990103620 A ARP990103620 A AR P990103620A AR 016735 A1 AR016735 A1 AR 016735A1
Authority
AR
Argentina
Prior art keywords
arc discharge
electrode
electric arc
covering
producing
Prior art date
Application number
ARP990103620A
Other languages
English (en)
Original Assignee
Coca Cola Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coca Cola Co filed Critical Coca Cola Co
Publication of AR016735A1 publication Critical patent/AR016735A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Abstract

Un método para producir una descarga de arco eléctrico, un método para revestir por deposicion de vapor en vacío, un electrodo alimentado continuamente, unaparato y un dispositivo de descarga de arco eléctrico y una disposicion de revestimiento por deposicion de vapor. El método para producir una descarga de arcoeléctrico cargando un componente de electrodo con una carga catodica y un ánodo con una carga anodica, que comprende las etapas de: alimentar continuamente unapluralidad de componentes de electrodo, en serie, a través de un alojamiento de electrodos a una posicion de descarga de arco eléctrico de modo que uno de lapluralidad de componentes de electrodo esté en la posicion de descarga de arco eléctrico por vez; y suministrar energíaeléctrica a un componente de electrodoa medida que un componente de electrodo es alimentado a la posicion de descarga de arco eléctrico y a un segundo electrodo proximo al un componente deelectrodo, de modo que el un componente de electrodo y el ánodo queden cargados con carga opuesta, teniendo el un electrodo una carga catodica y teniendo elánodo una carga anodica, y creen una descarga de arco eléctrico entre el un componente de electrodo y el ánodo, de modo que la pluralidad de componentes deelectrodo sean vaporizados, en serie, en la posicion de descarga de arco eléctrico.
ARP990103620A 1998-08-03 1999-07-22 Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor AR016735A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/128,456 US6251233B1 (en) 1998-08-03 1998-08-03 Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation

Publications (1)

Publication Number Publication Date
AR016735A1 true AR016735A1 (es) 2001-07-25

Family

ID=22435473

Family Applications (5)

Application Number Title Priority Date Filing Date
ARP990103620A AR016735A1 (es) 1998-08-03 1999-07-22 Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor
ARP000104072A AR025067A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo
ARP000104070A AR025065A2 (es) 1998-08-03 2000-08-07 Metodo y disposicion para fusionar y evaporar un material solido, disposicion de revestimiento por deposicion de vapor con vacio, y disposicion parafusionar y evaporar continuamente un material solido
ARP000104071A AR025066A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica
ARP000104069A AR025064A2 (es) 1998-08-03 2000-08-07 Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor

Family Applications After (4)

Application Number Title Priority Date Filing Date
ARP000104072A AR025067A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo
ARP000104070A AR025065A2 (es) 1998-08-03 2000-08-07 Metodo y disposicion para fusionar y evaporar un material solido, disposicion de revestimiento por deposicion de vapor con vacio, y disposicion parafusionar y evaporar continuamente un material solido
ARP000104071A AR025066A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica
ARP000104069A AR025064A2 (es) 1998-08-03 2000-08-07 Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor

Country Status (12)

Country Link
US (3) US6251233B1 (es)
EP (1) EP1109944A2 (es)
JP (1) JP2002522637A (es)
KR (1) KR20010083127A (es)
CN (1) CN1348509A (es)
AR (5) AR016735A1 (es)
AU (1) AU4990699A (es)
BR (1) BR9912722A (es)
CA (1) CA2338352A1 (es)
CO (2) CO5111064A1 (es)
IL (1) IL140811A0 (es)
WO (1) WO2000008226A2 (es)

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US20030007786A1 (en) 2003-01-09
KR20010083127A (ko) 2001-08-31
CN1348509A (zh) 2002-05-08
US6251233B1 (en) 2001-06-26
AU4990699A (en) 2000-02-28
AR025066A2 (es) 2002-11-06
JP2002522637A (ja) 2002-07-23
EP1109944A2 (en) 2001-06-27
AR025067A2 (es) 2002-11-06
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CO5111064A1 (es) 2001-12-26
US20010022272A1 (en) 2001-09-20
CA2338352A1 (en) 2000-02-17
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AR025065A2 (es) 2002-11-06
AR025064A2 (es) 2002-11-06

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