AR025066A2 - Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica - Google Patents

Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica

Info

Publication number
AR025066A2
AR025066A2 ARP000104071A ARP000104071A AR025066A2 AR 025066 A2 AR025066 A2 AR 025066A2 AR P000104071 A ARP000104071 A AR P000104071A AR P000104071 A ARP000104071 A AR P000104071A AR 025066 A2 AR025066 A2 AR 025066A2
Authority
AR
Argentina
Prior art keywords
cathode
coating
anodic
bell
deposition
Prior art date
Application number
ARP000104071A
Other languages
English (en)
Original Assignee
Coca Cola Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coca Cola Co filed Critical Coca Cola Co
Publication of AR025066A2 publication Critical patent/AR025066A2/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Un método para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor que usa un cátodo con una campana anodica. Elmétodo comprende las etapas de formar un vacío dentro de una celda de vacío; suministrar unvapo r de revestimiento a la celda de vacío; hacer pasar el vapor derevestimiento adyacentemente a un aparato de descarga de arco eléctrico dispuesto en la celda de vacío, comprendiendo el aparato de descarga de arco eléctricoun cátodo, una campanaanodic a que cubre por lo menos parcialmente el cátodo, y un material aislante eléctrico que conecta el cátodo a la campana anodica,estando el cátodo y la campana anodica dispuestos para formar una cámara de ionizacion, y teniendo la campana anodicauna abe rtura de descarga de plasma; ysuministrar energía eléctrica al aparato de descarga de arco eléctrico de modo que el cátodo quede cargado con carga negativa y la campana anodica quedecargada con carga positiva de modo que: a) una descarga dearco eléc trico sea creada entre el cátodo y la campana anodica en la cámara de ionizacion, b) elcátodo emita electrones e ionice el vapor de revestimiento en la celda de vacío por la fuente de vapor de revestimiento, c) el cátodo vaporice y formeun vaporde c átodo ionizado dentro de la cámara de ionizacion, y d) el vapor de cátodo ionizado sea emitido de la descarga de ánodo de la campana anodica y mezcle conel vapor de revestimiento. En la figura se observa una disposicion de evaporador,en la que el va por es energizado a un estado de plasma por medio de ladescarga proveniente de una combinacion de cátodo/ánodo.
ARP000104071A 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica AR025066A2 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/128,456 US6251233B1 (en) 1998-08-03 1998-08-03 Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation

Publications (1)

Publication Number Publication Date
AR025066A2 true AR025066A2 (es) 2002-11-06

Family

ID=22435473

Family Applications (5)

Application Number Title Priority Date Filing Date
ARP990103620A AR016735A1 (es) 1998-08-03 1999-07-22 Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor
ARP000104069A AR025064A2 (es) 1998-08-03 2000-08-07 Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor
ARP000104072A AR025067A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo
ARP000104070A AR025065A2 (es) 1998-08-03 2000-08-07 Metodo y disposicion para fusionar y evaporar un material solido, disposicion de revestimiento por deposicion de vapor con vacio, y disposicion parafusionar y evaporar continuamente un material solido
ARP000104071A AR025066A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica

Family Applications Before (4)

Application Number Title Priority Date Filing Date
ARP990103620A AR016735A1 (es) 1998-08-03 1999-07-22 Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor
ARP000104069A AR025064A2 (es) 1998-08-03 2000-08-07 Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor
ARP000104072A AR025067A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo
ARP000104070A AR025065A2 (es) 1998-08-03 2000-08-07 Metodo y disposicion para fusionar y evaporar un material solido, disposicion de revestimiento por deposicion de vapor con vacio, y disposicion parafusionar y evaporar continuamente un material solido

Country Status (12)

Country Link
US (3) US6251233B1 (es)
EP (1) EP1109944A2 (es)
JP (1) JP2002522637A (es)
KR (1) KR20010083127A (es)
CN (1) CN1348509A (es)
AR (5) AR016735A1 (es)
AU (1) AU4990699A (es)
BR (1) BR9912722A (es)
CA (1) CA2338352A1 (es)
CO (2) CO5111049A1 (es)
IL (1) IL140811A0 (es)
WO (1) WO2000008226A2 (es)

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US20030007786A1 (en) 2003-01-09
EP1109944A2 (en) 2001-06-27
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AR025067A2 (es) 2002-11-06
CN1348509A (zh) 2002-05-08
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AR025064A2 (es) 2002-11-06
AR025065A2 (es) 2002-11-06
AU4990699A (en) 2000-02-28
CO5111064A1 (es) 2001-12-26
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