AR025064A2 - Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor - Google Patents

Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor

Info

Publication number
AR025064A2
AR025064A2 ARP000104069A ARP000104069A AR025064A2 AR 025064 A2 AR025064 A2 AR 025064A2 AR P000104069 A ARP000104069 A AR P000104069A AR P000104069 A ARP000104069 A AR P000104069A AR 025064 A2 AR025064 A2 AR 025064A2
Authority
AR
Argentina
Prior art keywords
electrical
conductive element
measuring
ionization
vapor
Prior art date
Application number
ARP000104069A
Other languages
English (en)
Original Assignee
Coca Cola Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coca Cola Co filed Critical Coca Cola Co
Publication of AR025064A2 publication Critical patent/AR025064A2/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Abstract

Una disposicion de revestimiento por deposicion de vapor, un método para medir el grado de ionizacion y un método para medir la velocidad de evaporacion enla disposicion que comprende un recipiente de vapor ionizado; un evaporador para producirvapor de revestimiento en el recipiente de vapor ionizado a unavelocidad de evaporacion; una fuente de ionizacion para ionizar el vapor de revestimiento a un grado de ionizacion; y un aparato para medir la velocidad deevaporacion del evaporador y elgrado de ionizacion del vapor de revestimiento, que comprende un elemento conductor eléctrico; un amperímetro conectado alelemento conductor eléctrico para medir la intensidad de la corriente eléctrica que circula a través del elemento conductoreléctrico ; un suministro de energíaeléctrica para suministrar corriente eléctrica al elemento conductor eléctrico a través del amperímetro; y un interruptor para conectar selectivamente elsuministro de energía eléctrica al elemento conductoreléctrico, cerran do el circuito eléctrico, y hacer que el suministro de energía eléctrica caliente elelemento conductor eléctrico, y, alternativamente, desconectar el suministro de energía eléctrica del elemento conductor eléctrico, abriendo elcircuitoeléctrico, y p ermitiendo que enfríe el elemento conductor eléctrico, en el que, cuando el interruptor es abierto y la energía eléctrica es suministrada alelemento conductor eléctrico, un primer circuito es formado y la corriente eléctricacircula de la fuente de e nergía eléctrica, a través del elemento conductoreléctrico, el amperímetro, y el vapor ionizante a una tierra, y cuando el interruptor es cerrado y la energía eléctrica es suministrada al elemento conductoreléctrico, unsegundo circuito es formado y la corriente eléctrica circula del suministro de energía eléctrica, a través del elemento conductor eléctrico, elamperímetro, y el interruptor.
ARP000104069A 1998-08-03 2000-08-07 Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor AR025064A2 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/128,456 US6251233B1 (en) 1998-08-03 1998-08-03 Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation

Publications (1)

Publication Number Publication Date
AR025064A2 true AR025064A2 (es) 2002-11-06

Family

ID=22435473

Family Applications (5)

Application Number Title Priority Date Filing Date
ARP990103620A AR016735A1 (es) 1998-08-03 1999-07-22 Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor
ARP000104072A AR025067A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo
ARP000104070A AR025065A2 (es) 1998-08-03 2000-08-07 Metodo y disposicion para fusionar y evaporar un material solido, disposicion de revestimiento por deposicion de vapor con vacio, y disposicion parafusionar y evaporar continuamente un material solido
ARP000104071A AR025066A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica
ARP000104069A AR025064A2 (es) 1998-08-03 2000-08-07 Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor

Family Applications Before (4)

Application Number Title Priority Date Filing Date
ARP990103620A AR016735A1 (es) 1998-08-03 1999-07-22 Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor
ARP000104072A AR025067A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo
ARP000104070A AR025065A2 (es) 1998-08-03 2000-08-07 Metodo y disposicion para fusionar y evaporar un material solido, disposicion de revestimiento por deposicion de vapor con vacio, y disposicion parafusionar y evaporar continuamente un material solido
ARP000104071A AR025066A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica

Country Status (12)

Country Link
US (3) US6251233B1 (es)
EP (1) EP1109944A2 (es)
JP (1) JP2002522637A (es)
KR (1) KR20010083127A (es)
CN (1) CN1348509A (es)
AR (5) AR016735A1 (es)
AU (1) AU4990699A (es)
BR (1) BR9912722A (es)
CA (1) CA2338352A1 (es)
CO (2) CO5111064A1 (es)
IL (1) IL140811A0 (es)
WO (1) WO2000008226A2 (es)

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US20030007786A1 (en) 2003-01-09
KR20010083127A (ko) 2001-08-31
CN1348509A (zh) 2002-05-08
AR016735A1 (es) 2001-07-25
US6251233B1 (en) 2001-06-26
AU4990699A (en) 2000-02-28
AR025066A2 (es) 2002-11-06
JP2002522637A (ja) 2002-07-23
EP1109944A2 (en) 2001-06-27
AR025067A2 (es) 2002-11-06
IL140811A0 (en) 2002-02-10
CO5111064A1 (es) 2001-12-26
US20010022272A1 (en) 2001-09-20
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BR9912722A (pt) 2001-05-02
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