JPS5591970A - Ion plating device - Google Patents

Ion plating device

Info

Publication number
JPS5591970A
JPS5591970A JP16176278A JP16176278A JPS5591970A JP S5591970 A JPS5591970 A JP S5591970A JP 16176278 A JP16176278 A JP 16176278A JP 16176278 A JP16176278 A JP 16176278A JP S5591970 A JPS5591970 A JP S5591970A
Authority
JP
Japan
Prior art keywords
substrate
holder
charge
coil
ionized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16176278A
Other languages
Japanese (ja)
Inventor
Kikuo Koga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP16176278A priority Critical patent/JPS5591970A/en
Publication of JPS5591970A publication Critical patent/JPS5591970A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Abstract

PURPOSE:To enable evaporation while preventing charge-up of electrical charge in the title device even in case a substrate is an insulator by electrically connecting the tip of a coil forming a discharge region between an evaporation source and a substrate holder to the holder. CONSTITUTION:Substrate 9 is set on substrate holder 7, and high-frequency waves are supplied to coil 10 from high frequency oscillator 11, thereby alternatingly changing the positive or negative electric potential of holder 7 connected to one end of coil 10. A heating current is then supplied to heating element 4 from heating power source 6 to heat evaporation source 3, and the resulting evaporated substance is ionized with the above high-frequency electric field. When substrate 9 becomes of negative potential, the ionized substance is attracted and deposited on substrate 9. When holder 7 is of positive potential, electrons existing in the discharge space collide against substrate 9. Accordingly, even in case substrate 9 is an insulator, electrons and the charge of the ionized substance deposited on substrate 9 are neutralized to prevent charge-up of substrate 9.
JP16176278A 1978-12-28 1978-12-28 Ion plating device Pending JPS5591970A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16176278A JPS5591970A (en) 1978-12-28 1978-12-28 Ion plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16176278A JPS5591970A (en) 1978-12-28 1978-12-28 Ion plating device

Publications (1)

Publication Number Publication Date
JPS5591970A true JPS5591970A (en) 1980-07-11

Family

ID=15741403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16176278A Pending JPS5591970A (en) 1978-12-28 1978-12-28 Ion plating device

Country Status (1)

Country Link
JP (1) JPS5591970A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4961031A (en) * 1972-10-17 1974-06-13
JPS49113733A (en) * 1973-03-05 1974-10-30
JPS5169488A (en) * 1974-12-12 1976-06-16 Ulvac Corp HIMAKUKEISEISOCHI

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4961031A (en) * 1972-10-17 1974-06-13
JPS49113733A (en) * 1973-03-05 1974-10-30
JPS5169488A (en) * 1974-12-12 1976-06-16 Ulvac Corp HIMAKUKEISEISOCHI

Similar Documents

Publication Publication Date Title
US4179351A (en) Cylindrical magnetron sputtering source
WO2001039560A1 (en) Device for hybrid plasma processing
KR940010868A (en) Plasma Generator Using Cathodic Sputtering
JPS60135573A (en) Method and device for sputtering
US20210050181A1 (en) Method of low-temperature plasma generation, method of an electrically conductive or ferromagnetic tube coating using pulsed plasma and corresponding devices
JPS55161341A (en) Microwave ion source
JPS5687670A (en) Dry etching apparatus
JPS5591970A (en) Ion plating device
JPS6187869A (en) Sputter device
SU1482246A1 (en) Device for application of coating by electric foil explosion
US5993678A (en) Device and method for processing a plasma to alter the surface of a substrate
US2419903A (en) Electrode construction for highfrequency electronic devices
JPS57157511A (en) Opposite target type sputtering device
US2236016A (en) Oscillation generator
JPS5562503A (en) Static electricity removing unit
JPS6324068A (en) Continuous vacuum deposition plating device
US4419380A (en) Method for ion-aided coating on electrically insulating substrates
JPS6432631A (en) Etching device
GB1313757A (en) Ion source
JPS5741375A (en) Ion treating device
JP2000001770A (en) Vapor deposition apparatus for generating trigger discharge by using transformer
JPS5681671A (en) Ion plating apparatus
SU436406A1 (en) SOURCE OF IONS
JPS5751263A (en) Vacuum vapor depositing device
JPH10241591A (en) Ion source device