JPS5751263A - Vacuum vapor depositing device - Google Patents

Vacuum vapor depositing device

Info

Publication number
JPS5751263A
JPS5751263A JP12744880A JP12744880A JPS5751263A JP S5751263 A JPS5751263 A JP S5751263A JP 12744880 A JP12744880 A JP 12744880A JP 12744880 A JP12744880 A JP 12744880A JP S5751263 A JPS5751263 A JP S5751263A
Authority
JP
Japan
Prior art keywords
case
substrate
vapor
electrode
evaporating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12744880A
Other languages
Japanese (ja)
Inventor
Takashi Fujita
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12744880A priority Critical patent/JPS5751263A/en
Publication of JPS5751263A publication Critical patent/JPS5751263A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To vapor deposit an evaporating material easily on a vapor deposition substrate in spite of the case when it is difficult to apply voltage to said substrate by applying voltage to a case for the evaporating material in a vacuum vapor depositing device. CONSTITUTION:A vapor deposition substrate 4 from an un-coiling section 1 contacts a cooling can 1, after which it goes toward a coiling section 3. A case 9 contg. an evaporating material 10 is insulated from the ground and is connected to an electric power source 11. An electrode 12 controlling electric field is provided around said case by being connected to an electric power source 13. The electrons scattering from a heater 6 are accelerated by an electrode 7 to electron rays 8 which enter the material 10 in the case 9. The material 10 ionized and charged positive by the positive voltage applied to the case 9 is accelerated to arrive at the surface of the cooling can 1, thereby forming an evaporating material 5 on the substrate 4. The electrode 12 is maintained at positive potential to improve the efficiency of vapor deposition. Thereby, the materal 10 is vapor-deposited easily on the substrate 4.
JP12744880A 1980-09-11 1980-09-11 Vacuum vapor depositing device Pending JPS5751263A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12744880A JPS5751263A (en) 1980-09-11 1980-09-11 Vacuum vapor depositing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12744880A JPS5751263A (en) 1980-09-11 1980-09-11 Vacuum vapor depositing device

Publications (1)

Publication Number Publication Date
JPS5751263A true JPS5751263A (en) 1982-03-26

Family

ID=14960169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12744880A Pending JPS5751263A (en) 1980-09-11 1980-09-11 Vacuum vapor depositing device

Country Status (1)

Country Link
JP (1) JPS5751263A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61117272A (en) * 1984-11-09 1986-06-04 Sharp Corp Electron impact type vapor deposition source

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61117272A (en) * 1984-11-09 1986-06-04 Sharp Corp Electron impact type vapor deposition source
JPS6354069B2 (en) * 1984-11-09 1988-10-26 Sharp Kk

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