GB1383189A - Apparatus for the vacuum deposition of thin layers - Google Patents
Apparatus for the vacuum deposition of thin layersInfo
- Publication number
- GB1383189A GB1383189A GB4053673A GB4053673A GB1383189A GB 1383189 A GB1383189 A GB 1383189A GB 4053673 A GB4053673 A GB 4053673A GB 4053673 A GB4053673 A GB 4053673A GB 1383189 A GB1383189 A GB 1383189A
- Authority
- GB
- United Kingdom
- Prior art keywords
- generator
- target
- plasma
- vacuum deposition
- impinge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract 3
- 230000008020 evaporation Effects 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 230000001939 inductive effect Effects 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000013077 target material Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
1383189 Apparatus for vacuum deposition of thin layers COMPAGNIE INDUSTRIELLE DES TELECOMMUNICATIONS CIT-ALCATEL 28 Aug 1973 [31 Aug 1972] 40536/73 Heading C7F Vacuum deposition apparatus comprises at least one target supported in a crucible which is both cooled and maintained at a selectable A.C. or D.C. potential and includes at least one plasma generator arranged to direct at least one plasma beam on to the target(s). As shown, plasma from generator 1 leaves the generator at outlet 11 and the positive ions thereof impinge upon material 23 of a negatively charged target, causing sputtering thereof, whilst the electrons thereof impinge upon positively charged target material 13 and cause evaporation thereof. Generator 1 has a heated cathode filament 5, the electrons from which pass through anodic tube 8 which is surrounded by a magnet or field-inducing coil 9. Each crucible 14 or 25 respectively is internally water cooled and is surrounded by an earthed shield 15 or 25. The crucibles may plug into plate 4 in the wall of a vacuum chamber and are sealed by a series of O-rings Fig. 2 (not shown). In alternative arrangements Fig. 3 (not shown), there may be two plasma generators or two outlets from a single generator. A single target may be used, connected to an A.C. source. The apparatus may be used for simultaneous or sequential evaporation and sputtering.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7230978A FR2198000B1 (en) | 1972-08-31 | 1972-08-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1383189A true GB1383189A (en) | 1975-02-05 |
Family
ID=9103749
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4053673A Expired GB1383189A (en) | 1972-08-31 | 1973-08-28 | Apparatus for the vacuum deposition of thin layers |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS4966577A (en) |
| CH (1) | CH579154A5 (en) |
| DE (1) | DE2342376A1 (en) |
| FR (1) | FR2198000B1 (en) |
| GB (1) | GB1383189A (en) |
| NL (1) | NL7311976A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH633729A5 (en) * | 1978-01-04 | 1982-12-31 | Georgy Alexandrovich Kovalsky | Device for coating products |
| JPS58195438U (en) * | 1982-06-22 | 1983-12-26 | 日本電気株式会社 | integrated circuit transport vehicle |
| EP0306612B2 (en) * | 1987-08-26 | 1996-02-28 | Balzers Aktiengesellschaft | Process for depositing layers on substrates |
| GB8720415D0 (en) * | 1987-08-28 | 1987-10-07 | Vg Instr Group | Vacuum evaporation & deposition |
| DE3832693A1 (en) * | 1988-09-27 | 1990-03-29 | Leybold Ag | DEVICE FOR APPLYING DIELECTRIC OR METAL MATERIALS |
-
1972
- 1972-08-31 FR FR7230978A patent/FR2198000B1/fr not_active Expired
-
1973
- 1973-08-14 CH CH1165673A patent/CH579154A5/xx not_active IP Right Cessation
- 1973-08-22 DE DE19732342376 patent/DE2342376A1/en active Pending
- 1973-08-28 GB GB4053673A patent/GB1383189A/en not_active Expired
- 1973-08-30 NL NL7311976A patent/NL7311976A/xx unknown
- 1973-08-31 JP JP9745473A patent/JPS4966577A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2198000B1 (en) | 1975-01-03 |
| DE2342376A1 (en) | 1974-03-14 |
| FR2198000A1 (en) | 1974-03-29 |
| NL7311976A (en) | 1974-03-04 |
| CH579154A5 (en) | 1976-08-31 |
| JPS4966577A (en) | 1974-06-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |