CH579154A5 - - Google Patents

Info

Publication number
CH579154A5
CH579154A5 CH1165673A CH1165673A CH579154A5 CH 579154 A5 CH579154 A5 CH 579154A5 CH 1165673 A CH1165673 A CH 1165673A CH 1165673 A CH1165673 A CH 1165673A CH 579154 A5 CH579154 A5 CH 579154A5
Authority
CH
Switzerland
Application number
CH1165673A
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cit Alcatel filed Critical Cit Alcatel
Publication of CH579154A5 publication Critical patent/CH579154A5/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
CH1165673A 1972-08-31 1973-08-14 CH579154A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7230978A FR2198000B1 (en) 1972-08-31 1972-08-31

Publications (1)

Publication Number Publication Date
CH579154A5 true CH579154A5 (en) 1976-08-31

Family

ID=9103749

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1165673A CH579154A5 (en) 1972-08-31 1973-08-14

Country Status (6)

Country Link
JP (1) JPS4966577A (en)
CH (1) CH579154A5 (en)
DE (1) DE2342376A1 (en)
FR (1) FR2198000B1 (en)
GB (1) GB1383189A (en)
NL (1) NL7311976A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH633729A5 (en) * 1978-01-04 1982-12-31 Georgy Alexandrovich Kovalsky Device for coating products
JPS58195438U (en) * 1982-06-22 1983-12-26 日本電気株式会社 integrated circuit transport vehicle
ES2022946T5 (en) * 1987-08-26 1996-04-16 Balzers Hochvakuum PROCEDURE FOR THE CONTRIBUTION OF LAYERS ON SUBSTRATES.
GB8720415D0 (en) * 1987-08-28 1987-10-07 Vg Instr Group Vacuum evaporation & deposition
DE3832693A1 (en) * 1988-09-27 1990-03-29 Leybold Ag DEVICE FOR APPLYING DIELECTRIC OR METAL MATERIALS

Also Published As

Publication number Publication date
FR2198000A1 (en) 1974-03-29
GB1383189A (en) 1975-02-05
FR2198000B1 (en) 1975-01-03
DE2342376A1 (en) 1974-03-14
NL7311976A (en) 1974-03-04
JPS4966577A (en) 1974-06-27

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Legal Events

Date Code Title Description
PL Patent ceased