BR0115035A - Processo de tratamento por meio de plasma atmosférico de um objeto a tratar em um material condutor de eletricidade e dispositivo para a execução do processo - Google Patents

Processo de tratamento por meio de plasma atmosférico de um objeto a tratar em um material condutor de eletricidade e dispositivo para a execução do processo

Info

Publication number
BR0115035A
BR0115035A BR0115035-9A BR0115035A BR0115035A BR 0115035 A BR0115035 A BR 0115035A BR 0115035 A BR0115035 A BR 0115035A BR 0115035 A BR0115035 A BR 0115035A
Authority
BR
Brazil
Prior art keywords
treated
jet
jets
plasma
plasma treatment
Prior art date
Application number
BR0115035-9A
Other languages
English (en)
Inventor
Pavel Koulik
Anatolii Saitchenko
Na L Musin
Original Assignee
Apit Corp S A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Apit Corp S A filed Critical Apit Corp S A
Publication of BR0115035A publication Critical patent/BR0115035A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/44—Plasma torches using an arc using more than one torch

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Discharge Heating (AREA)

Abstract

"PROCESSO DE TRATAMENTO POR MEIO DE PLASMA ATMOSFéRICO DE UM OBJETO A TRATAR EM UM MATERIAL CONDUTOR DE ELETRICIDADE E DISPOSITIVO PARA A EXECUçãO DO PROCESSO". A invenção refere-se a um método de plasma atmosférico para tratar um objeto a ser tratado constituído de um material condutor de eletricidade, compreendendo gerar jatos de plasma com geradores de plasma sobre uma superfície a ser tratada do objeto tratado, e o deslocamento relativo do objeto tratado relativo aos geradores de plasma. Pelo menos um dos jatos de plasma é um jato catódico e pelo menos um dos jatos de plasma é um j ato anódico, sendo que o jato anódico é aplicado numa zona de tratamento sobre a superfície a ser tratada próxima do jato catódico.
BR0115035-9A 2000-11-10 2001-11-12 Processo de tratamento por meio de plasma atmosférico de um objeto a tratar em um material condutor de eletricidade e dispositivo para a execução do processo BR0115035A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00811065 2000-11-10
PCT/IB2001/002121 WO2002039791A1 (fr) 2000-11-10 2001-11-12 Procede de traitement par plasma atmospherique de materiaux conducteurs d'electricite et dispositif pour sa mise en oeuvre

Publications (1)

Publication Number Publication Date
BR0115035A true BR0115035A (pt) 2004-02-03

Family

ID=8175021

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0115035-9A BR0115035A (pt) 2000-11-10 2001-11-12 Processo de tratamento por meio de plasma atmosférico de um objeto a tratar em um material condutor de eletricidade e dispositivo para a execução do processo

Country Status (12)

Country Link
US (1) US6949716B2 (pt)
EP (2) EP1613133B1 (pt)
JP (1) JP2004514054A (pt)
CN (1) CN1265684C (pt)
AT (1) ATE315326T1 (pt)
AU (1) AU2002212616A1 (pt)
BR (1) BR0115035A (pt)
CA (1) CA2424891A1 (pt)
DE (1) DE60116522T2 (pt)
EA (1) EA004439B1 (pt)
UA (1) UA75613C2 (pt)
WO (1) WO2002039791A1 (pt)

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DE10157191A1 (de) * 2001-11-23 2003-06-05 Fritzmeier Georg Gmbh & Co Mikrobiologische Energiequelle zum Antrieb eines Verbrauchers
KR100464856B1 (ko) * 2002-11-07 2005-01-05 삼성전자주식회사 표면 식각 방법 및 실리콘 기판 이면 식각 방법.
FR2856079B1 (fr) * 2003-06-11 2006-07-14 Pechiney Rhenalu Procede de traitement de surface pour toles et bandes en alliage d'aluminium
CN1716557A (zh) * 2004-02-25 2006-01-04 库力索法投资公司 用于引线焊接机的激光清洁系统
JP2005285520A (ja) * 2004-03-29 2005-10-13 Hiroshi Takigawa プラズマ発生用電極、プラズマ発生装置及びプラズマ処理装置
JP2005293945A (ja) * 2004-03-31 2005-10-20 Tama Tlo Kk プラズマ加熱装置およびノズル付き電極
JP4658506B2 (ja) 2004-03-31 2011-03-23 浩史 滝川 パルスアークプラズマ生成用電源回路及びパルスアークプラズマ処理装置
DE102004033728B4 (de) * 2004-07-13 2009-07-23 Plasmatreat Gmbh Verfahren zum Bearbeiten und Verkleben von Werkstücken aus einem Metall oder einer Metalllegierung mit einer hydratisierten Oxid- und/oder Hydroxidschicht
BRPI0514309B1 (pt) 2004-08-13 2016-03-29 Force Technology método para melhoria de um processo envolvendo um objeto sólido e um gás
PL1877351T3 (pl) * 2004-11-19 2009-06-30 Vetrotech Saint Gobain Int Ag Sposób i urządzenie do pasmowej i powierzchniowej obróbki powierzchni górnej tafli szklanych
DE102005012296A1 (de) * 2005-03-17 2006-09-21 Sms Demag Ag Verfahren und Vorrichtung zum Entzundern eines Metallbandes
US20060219754A1 (en) * 2005-03-31 2006-10-05 Horst Clauberg Bonding wire cleaning unit and method of wire bonding using same
SK51082006A3 (sk) * 2006-12-05 2008-07-07 Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov
US8399795B2 (en) * 2007-05-11 2013-03-19 Force Technology Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves
EP2420582A2 (en) * 2009-04-14 2012-02-22 Dawonsys Co., Ltd. Surface treatment apparatus and method using plasma
DE102012104224A1 (de) * 2012-05-15 2013-11-21 Plasmatreat Gmbh Vorrichtung und Verfahren zur Behandlung eines Drahts aus leitfähigem Material
JP6482014B2 (ja) * 2014-07-30 2019-03-13 株式会社イーツーラボ プラズマ表面処理装置およびプラズマ表面処理システム
NL2014022B1 (en) * 2014-12-19 2016-10-12 Ihc Holland Ie Bv Device and method for crushing rock by means of pulsed electric energy.
JP6224139B2 (ja) * 2016-01-22 2017-11-01 沖野　晃俊 プラズマ処理装置
DE102020114016A1 (de) 2020-05-26 2021-12-02 Einhell Germany Ag Plasmabehandlung einer Trägerfolie für eine Elektrode eines Lithium-Ionen-Akkumulators
KR102451424B1 (ko) * 2020-07-14 2022-10-05 이창훈 롤투롤 플라즈마 생성 장치를 이용한 기재의 표면 세정 시스템 및 방법
DE102021118156A1 (de) 2021-07-14 2023-01-19 Rolls-Royce Deutschland Ltd & Co Kg Verfahren zur Oberflächenbehandlung eines Drahtes, eine supraleitende Vorrichtung, eine elektrische Maschine, ein Luftfahrzeug und eine Oberflächenbehandlungsvorrichtung

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Also Published As

Publication number Publication date
EP1332650B1 (fr) 2006-01-04
JP2004514054A (ja) 2004-05-13
EP1613133B1 (fr) 2013-01-16
DE60116522T2 (de) 2006-08-03
US20040026385A1 (en) 2004-02-12
AU2002212616A1 (en) 2002-05-21
CN1471800A (zh) 2004-01-28
ATE315326T1 (de) 2006-02-15
WO2002039791A1 (fr) 2002-05-16
DE60116522D1 (de) 2006-03-30
CA2424891A1 (fr) 2002-05-16
EP1332650A1 (fr) 2003-08-06
EP1613133A3 (fr) 2011-04-27
CN1265684C (zh) 2006-07-19
US6949716B2 (en) 2005-09-27
UA75613C2 (en) 2006-05-15
EA200300416A1 (ru) 2003-10-30
EA004439B1 (ru) 2004-04-29
EP1613133A2 (fr) 2006-01-04

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Legal Events

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B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

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B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 1964 DE 26/08/2008 E CONSIDERANDO A AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS.