DE60116522D1 - Verfahren zur behandlung von elektrisch leitfähigen materialien durch atmosphärisches plasma und vorrichtung dazu - Google Patents

Verfahren zur behandlung von elektrisch leitfähigen materialien durch atmosphärisches plasma und vorrichtung dazu

Info

Publication number
DE60116522D1
DE60116522D1 DE60116522T DE60116522T DE60116522D1 DE 60116522 D1 DE60116522 D1 DE 60116522D1 DE 60116522 T DE60116522 T DE 60116522T DE 60116522 T DE60116522 T DE 60116522T DE 60116522 D1 DE60116522 D1 DE 60116522D1
Authority
DE
Germany
Prior art keywords
treated
jet
jets
plasma
cathodic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60116522T
Other languages
English (en)
Other versions
DE60116522T2 (de
Inventor
Pavel Koulik
Anatolii Saitchenko
Nail Musin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Apit Corp SA Sion
Original Assignee
Apit Corp SA Sion
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Apit Corp SA Sion filed Critical Apit Corp SA Sion
Application granted granted Critical
Publication of DE60116522D1 publication Critical patent/DE60116522D1/de
Publication of DE60116522T2 publication Critical patent/DE60116522T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/44—Plasma torches using an arc using more than one torch

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Discharge Heating (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
DE60116522T 2000-11-10 2001-11-12 Verfahren zur behandlung von elektrisch leitfähigen materialien durch atmosphärisches plasma und vorrichtung dazu Expired - Lifetime DE60116522T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00811065 2000-11-10
EP00811065 2000-11-10
PCT/IB2001/002121 WO2002039791A1 (fr) 2000-11-10 2001-11-12 Procede de traitement par plasma atmospherique de materiaux conducteurs d'electricite et dispositif pour sa mise en oeuvre

Publications (2)

Publication Number Publication Date
DE60116522D1 true DE60116522D1 (de) 2006-03-30
DE60116522T2 DE60116522T2 (de) 2006-08-03

Family

ID=8175021

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60116522T Expired - Lifetime DE60116522T2 (de) 2000-11-10 2001-11-12 Verfahren zur behandlung von elektrisch leitfähigen materialien durch atmosphärisches plasma und vorrichtung dazu

Country Status (12)

Country Link
US (1) US6949716B2 (de)
EP (2) EP1332650B1 (de)
JP (1) JP2004514054A (de)
CN (1) CN1265684C (de)
AT (1) ATE315326T1 (de)
AU (1) AU2002212616A1 (de)
BR (1) BR0115035A (de)
CA (1) CA2424891A1 (de)
DE (1) DE60116522T2 (de)
EA (1) EA004439B1 (de)
UA (1) UA75613C2 (de)
WO (1) WO2002039791A1 (de)

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DE10157191A1 (de) * 2001-11-23 2003-06-05 Fritzmeier Georg Gmbh & Co Mikrobiologische Energiequelle zum Antrieb eines Verbrauchers
KR100464856B1 (ko) * 2002-11-07 2005-01-05 삼성전자주식회사 표면 식각 방법 및 실리콘 기판 이면 식각 방법.
FR2856079B1 (fr) * 2003-06-11 2006-07-14 Pechiney Rhenalu Procede de traitement de surface pour toles et bandes en alliage d'aluminium
CN1716557A (zh) * 2004-02-25 2006-01-04 库力索法投资公司 用于引线焊接机的激光清洁系统
JP2005285520A (ja) * 2004-03-29 2005-10-13 Hiroshi Takigawa プラズマ発生用電極、プラズマ発生装置及びプラズマ処理装置
JP2005293945A (ja) * 2004-03-31 2005-10-20 Tama Tlo Kk プラズマ加熱装置およびノズル付き電極
JP4658506B2 (ja) 2004-03-31 2011-03-23 浩史 滝川 パルスアークプラズマ生成用電源回路及びパルスアークプラズマ処理装置
DE102004033728B4 (de) * 2004-07-13 2009-07-23 Plasmatreat Gmbh Verfahren zum Bearbeiten und Verkleben von Werkstücken aus einem Metall oder einer Metalllegierung mit einer hydratisierten Oxid- und/oder Hydroxidschicht
KR101234411B1 (ko) 2004-08-13 2013-02-18 포스 테크놀로지 고체 물질 및 가스를 포함하며 프로세스를 강화하는 방법및 장치
DE212005000055U1 (de) * 2004-11-19 2007-08-23 Vetrotech Saint-Gobain (International) Ag Vorrichtung zum streifen- und flächenförmigen Bearbeiten von Oberflächen von Glasscheiben
DE102005012296A1 (de) * 2005-03-17 2006-09-21 Sms Demag Ag Verfahren und Vorrichtung zum Entzundern eines Metallbandes
US20060219754A1 (en) * 2005-03-31 2006-10-05 Horst Clauberg Bonding wire cleaning unit and method of wire bonding using same
SK51082006A3 (sk) * 2006-12-05 2008-07-07 Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov
CN101743785B (zh) * 2007-05-11 2012-11-14 力技术公司 使用高强度和高功率超声波增强等离子体表面改性
WO2010120079A2 (ko) * 2009-04-14 2010-10-21 주식회사 다원시스 플라스마 표면 처리 장치 및 방법
DE102012104224A1 (de) * 2012-05-15 2013-11-21 Plasmatreat Gmbh Vorrichtung und Verfahren zur Behandlung eines Drahts aus leitfähigem Material
JP6482014B2 (ja) * 2014-07-30 2019-03-13 株式会社イーツーラボ プラズマ表面処理装置およびプラズマ表面処理システム
NL2014022B1 (en) * 2014-12-19 2016-10-12 Ihc Holland Ie Bv Device and method for crushing rock by means of pulsed electric energy.
JP6224139B2 (ja) * 2016-01-22 2017-11-01 沖野　晃俊 プラズマ処理装置
DE102020114016A1 (de) 2020-05-26 2021-12-02 Einhell Germany Ag Plasmabehandlung einer Trägerfolie für eine Elektrode eines Lithium-Ionen-Akkumulators
KR102451424B1 (ko) * 2020-07-14 2022-10-05 이창훈 롤투롤 플라즈마 생성 장치를 이용한 기재의 표면 세정 시스템 및 방법
DE102021118156A1 (de) 2021-07-14 2023-01-19 Rolls-Royce Deutschland Ltd & Co Kg Verfahren zur Oberflächenbehandlung eines Drahtes, eine supraleitende Vorrichtung, eine elektrische Maschine, ein Luftfahrzeug und eine Oberflächenbehandlungsvorrichtung

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US3050616A (en) 1957-09-09 1962-08-21 Union Carbide Corp Arc process and apparatus
FR2039566A5 (de) * 1969-03-31 1971-01-15 Soudure Autogene Elect
US3940641A (en) * 1974-04-05 1976-02-24 Reynolds Metals Company Plasma jet electrode for magnetohydrodynamic generators
GB1493394A (en) * 1974-06-07 1977-11-30 Nat Res Dev Plasma heater assembly
US5548611A (en) * 1993-05-19 1996-08-20 Schuller International, Inc. Method for the melting, combustion or incineration of materials and apparatus therefor
JP3204801B2 (ja) * 1993-06-18 2001-09-04 富士写真フイルム株式会社 真空グロー放電処理装置及び処理方法
JP2000500273A (ja) 1995-11-13 2000-01-11 イエステ インスタント サーフェイス テクノロジー ソシエテ アノニム 閉じた構成のプラズマアークストリーム発生器
WO1997018694A1 (fr) * 1995-11-13 1997-05-22 Ist Instant Surface Technology S.A. Reacteur a jet de plasma
EP0861575B1 (de) * 1995-11-13 2000-07-05 IST Instant Surface Technology S.A. Vierdüsen-plasmaerzeugungsvorrichtung zur erzeugung eines aktivierter strahles
JPH11106947A (ja) * 1997-09-29 1999-04-20 Nkk Corp 金属板の表面改質方法
JPH11222530A (ja) * 1998-02-06 1999-08-17 Nitto Denko Corp フッ素樹脂被覆金属線の製造方法

Also Published As

Publication number Publication date
UA75613C2 (en) 2006-05-15
AU2002212616A1 (en) 2002-05-21
US20040026385A1 (en) 2004-02-12
EP1332650A1 (de) 2003-08-06
CN1265684C (zh) 2006-07-19
EP1613133A2 (de) 2006-01-04
US6949716B2 (en) 2005-09-27
EP1332650B1 (de) 2006-01-04
WO2002039791A1 (fr) 2002-05-16
EA004439B1 (ru) 2004-04-29
BR0115035A (pt) 2004-02-03
EP1613133B1 (de) 2013-01-16
CN1471800A (zh) 2004-01-28
CA2424891A1 (fr) 2002-05-16
JP2004514054A (ja) 2004-05-13
ATE315326T1 (de) 2006-02-15
DE60116522T2 (de) 2006-08-03
EP1613133A3 (de) 2011-04-27
EA200300416A1 (ru) 2003-10-30

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