UA75613C2 - Method for plasma treatment of current-conducting materials - Google Patents
Method for plasma treatment of current-conducting materials Download PDFInfo
- Publication number
- UA75613C2 UA75613C2 UA2003054134A UA2003054134A UA75613C2 UA 75613 C2 UA75613 C2 UA 75613C2 UA 2003054134 A UA2003054134 A UA 2003054134A UA 2003054134 A UA2003054134 A UA 2003054134A UA 75613 C2 UA75613 C2 UA 75613C2
- Authority
- UA
- Ukraine
- Prior art keywords
- plasma
- fact
- foil
- processed
- jets
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 64
- 239000004020 conductor Substances 0.000 title claims abstract description 8
- 238000009832 plasma treatment Methods 0.000 title claims description 9
- 238000006073 displacement reaction Methods 0.000 claims abstract description 5
- 239000011888 foil Substances 0.000 claims description 143
- 238000012545 processing Methods 0.000 claims description 106
- 239000007789 gas Substances 0.000 claims description 49
- 230000008569 process Effects 0.000 claims description 27
- 238000004140 cleaning Methods 0.000 claims description 24
- 238000011282 treatment Methods 0.000 claims description 23
- 230000000087 stabilizing effect Effects 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 9
- 230000009471 action Effects 0.000 claims description 8
- 230000001154 acute effect Effects 0.000 claims description 8
- 230000010355 oscillation Effects 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 6
- 230000006641 stabilisation Effects 0.000 claims description 5
- 238000011105 stabilization Methods 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 238000013459 approach Methods 0.000 claims description 2
- 230000001276 controlling effect Effects 0.000 claims 1
- 230000005611 electricity Effects 0.000 abstract description 3
- 238000009434 installation Methods 0.000 description 17
- 229910052782 aluminium Inorganic materials 0.000 description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- 238000000137 annealing Methods 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 238000004659 sterilization and disinfection Methods 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 230000001954 sterilising effect Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000005096 rolling process Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 238000001994 activation Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000001493 electron microscopy Methods 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- 239000007888 film coating Substances 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 238000004157 plasmatron Methods 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 244000005700 microbiome Species 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000008439 repair process Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 238000009928 pasteurization Methods 0.000 description 1
- 238000005381 potential energy Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010734 process oil Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/44—Plasma torches using an arc using more than one torch
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Treatment Of Fiber Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Chemical Vapour Deposition (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Discharge Heating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00811065 | 2000-11-10 | ||
| PCT/IB2001/002121 WO2002039791A1 (fr) | 2000-11-10 | 2001-11-12 | Procede de traitement par plasma atmospherique de materiaux conducteurs d'electricite et dispositif pour sa mise en oeuvre |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| UA75613C2 true UA75613C2 (en) | 2006-05-15 |
Family
ID=8175021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| UA2003054134A UA75613C2 (en) | 2000-11-10 | 2001-12-11 | Method for plasma treatment of current-conducting materials |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6949716B2 (de) |
| EP (2) | EP1613133B1 (de) |
| JP (1) | JP2004514054A (de) |
| CN (1) | CN1265684C (de) |
| AT (1) | ATE315326T1 (de) |
| AU (1) | AU2002212616A1 (de) |
| BR (1) | BR0115035A (de) |
| CA (1) | CA2424891A1 (de) |
| DE (1) | DE60116522T2 (de) |
| EA (1) | EA004439B1 (de) |
| UA (1) | UA75613C2 (de) |
| WO (1) | WO2002039791A1 (de) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10157191A1 (de) * | 2001-11-23 | 2003-06-05 | Fritzmeier Georg Gmbh & Co | Mikrobiologische Energiequelle zum Antrieb eines Verbrauchers |
| KR100464856B1 (ko) * | 2002-11-07 | 2005-01-05 | 삼성전자주식회사 | 표면 식각 방법 및 실리콘 기판 이면 식각 방법. |
| FR2856079B1 (fr) * | 2003-06-11 | 2006-07-14 | Pechiney Rhenalu | Procede de traitement de surface pour toles et bandes en alliage d'aluminium |
| CN1716557A (zh) * | 2004-02-25 | 2006-01-04 | 库力索法投资公司 | 用于引线焊接机的激光清洁系统 |
| JP2005285520A (ja) * | 2004-03-29 | 2005-10-13 | Hiroshi Takigawa | プラズマ発生用電極、プラズマ発生装置及びプラズマ処理装置 |
| JP2005293945A (ja) * | 2004-03-31 | 2005-10-20 | Tama Tlo Kk | プラズマ加熱装置およびノズル付き電極 |
| JP4658506B2 (ja) | 2004-03-31 | 2011-03-23 | 浩史 滝川 | パルスアークプラズマ生成用電源回路及びパルスアークプラズマ処理装置 |
| DE102004033728B4 (de) * | 2004-07-13 | 2009-07-23 | Plasmatreat Gmbh | Verfahren zum Bearbeiten und Verkleben von Werkstücken aus einem Metall oder einer Metalllegierung mit einer hydratisierten Oxid- und/oder Hydroxidschicht |
| BRPI0514309B1 (pt) | 2004-08-13 | 2016-03-29 | Force Technology | método para melhoria de um processo envolvendo um objeto sólido e um gás |
| PL1877351T3 (pl) * | 2004-11-19 | 2009-06-30 | Vetrotech Saint Gobain Int Ag | Sposób i urządzenie do pasmowej i powierzchniowej obróbki powierzchni górnej tafli szklanych |
| DE102005012296A1 (de) * | 2005-03-17 | 2006-09-21 | Sms Demag Ag | Verfahren und Vorrichtung zum Entzundern eines Metallbandes |
| US20060219754A1 (en) * | 2005-03-31 | 2006-10-05 | Horst Clauberg | Bonding wire cleaning unit and method of wire bonding using same |
| SK51082006A3 (sk) * | 2006-12-05 | 2008-07-07 | Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho | Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov |
| US8399795B2 (en) * | 2007-05-11 | 2013-03-19 | Force Technology | Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves |
| EP2420582A2 (de) * | 2009-04-14 | 2012-02-22 | Dawonsys Co., Ltd. | Oberflächenbehandlungsvorrichtung und -verfahren anhand von plasma |
| DE102012104224A1 (de) * | 2012-05-15 | 2013-11-21 | Plasmatreat Gmbh | Vorrichtung und Verfahren zur Behandlung eines Drahts aus leitfähigem Material |
| JP6482014B2 (ja) * | 2014-07-30 | 2019-03-13 | 株式会社イーツーラボ | プラズマ表面処理装置およびプラズマ表面処理システム |
| NL2014022B1 (en) * | 2014-12-19 | 2016-10-12 | Ihc Holland Ie Bv | Device and method for crushing rock by means of pulsed electric energy. |
| JP6224139B2 (ja) * | 2016-01-22 | 2017-11-01 | 沖野 晃俊 | プラズマ処理装置 |
| DE102020114016A1 (de) | 2020-05-26 | 2021-12-02 | Einhell Germany Ag | Plasmabehandlung einer Trägerfolie für eine Elektrode eines Lithium-Ionen-Akkumulators |
| KR102451424B1 (ko) * | 2020-07-14 | 2022-10-05 | 이창훈 | 롤투롤 플라즈마 생성 장치를 이용한 기재의 표면 세정 시스템 및 방법 |
| DE102021118156A1 (de) | 2021-07-14 | 2023-01-19 | Rolls-Royce Deutschland Ltd & Co Kg | Verfahren zur Oberflächenbehandlung eines Drahtes, eine supraleitende Vorrichtung, eine elektrische Maschine, ein Luftfahrzeug und eine Oberflächenbehandlungsvorrichtung |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3050616A (en) * | 1957-09-09 | 1962-08-21 | Union Carbide Corp | Arc process and apparatus |
| FR2039566A5 (de) * | 1969-03-31 | 1971-01-15 | Soudure Autogene Elect | |
| US3940641A (en) * | 1974-04-05 | 1976-02-24 | Reynolds Metals Company | Plasma jet electrode for magnetohydrodynamic generators |
| GB1493394A (en) * | 1974-06-07 | 1977-11-30 | Nat Res Dev | Plasma heater assembly |
| US5548611A (en) * | 1993-05-19 | 1996-08-20 | Schuller International, Inc. | Method for the melting, combustion or incineration of materials and apparatus therefor |
| JP3204801B2 (ja) * | 1993-06-18 | 2001-09-04 | 富士写真フイルム株式会社 | 真空グロー放電処理装置及び処理方法 |
| WO1997018692A1 (fr) * | 1995-11-13 | 1997-05-22 | Ist Instant Surface Technology S.A. | Generateur de plasma a quatre buses pour la formation d'un jet active |
| US6050215A (en) | 1995-11-13 | 2000-04-18 | Ist Instant Surface Technology S.A. | Plasma stream generator with a closed configuration arc |
| WO1997018694A1 (fr) * | 1995-11-13 | 1997-05-22 | Ist Instant Surface Technology S.A. | Reacteur a jet de plasma |
| JPH11106947A (ja) * | 1997-09-29 | 1999-04-20 | Nkk Corp | 金属板の表面改質方法 |
| JPH11222530A (ja) * | 1998-02-06 | 1999-08-17 | Nitto Denko Corp | フッ素樹脂被覆金属線の製造方法 |
-
2001
- 2001-11-12 EP EP05021750A patent/EP1613133B1/de not_active Expired - Lifetime
- 2001-11-12 EA EA200300416A patent/EA004439B1/ru not_active IP Right Cessation
- 2001-11-12 EP EP01980831A patent/EP1332650B1/de not_active Expired - Lifetime
- 2001-11-12 US US10/399,414 patent/US6949716B2/en not_active Expired - Fee Related
- 2001-11-12 WO PCT/IB2001/002121 patent/WO2002039791A1/fr active IP Right Grant
- 2001-11-12 BR BR0115035-9A patent/BR0115035A/pt not_active IP Right Cessation
- 2001-11-12 AT AT01980831T patent/ATE315326T1/de not_active IP Right Cessation
- 2001-11-12 CN CNB018182291A patent/CN1265684C/zh not_active Expired - Fee Related
- 2001-11-12 AU AU2002212616A patent/AU2002212616A1/en not_active Abandoned
- 2001-11-12 CA CA002424891A patent/CA2424891A1/fr not_active Abandoned
- 2001-11-12 JP JP2002542180A patent/JP2004514054A/ja active Pending
- 2001-11-12 DE DE60116522T patent/DE60116522T2/de not_active Expired - Lifetime
- 2001-12-11 UA UA2003054134A patent/UA75613C2/uk unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP1332650B1 (de) | 2006-01-04 |
| JP2004514054A (ja) | 2004-05-13 |
| BR0115035A (pt) | 2004-02-03 |
| EP1613133B1 (de) | 2013-01-16 |
| DE60116522T2 (de) | 2006-08-03 |
| US20040026385A1 (en) | 2004-02-12 |
| AU2002212616A1 (en) | 2002-05-21 |
| CN1471800A (zh) | 2004-01-28 |
| ATE315326T1 (de) | 2006-02-15 |
| WO2002039791A1 (fr) | 2002-05-16 |
| DE60116522D1 (de) | 2006-03-30 |
| CA2424891A1 (fr) | 2002-05-16 |
| EP1332650A1 (de) | 2003-08-06 |
| EP1613133A3 (de) | 2011-04-27 |
| CN1265684C (zh) | 2006-07-19 |
| US6949716B2 (en) | 2005-09-27 |
| EA200300416A1 (ru) | 2003-10-30 |
| EA004439B1 (ru) | 2004-04-29 |
| EP1613133A2 (de) | 2006-01-04 |
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