ATE484840T1 - Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen - Google Patents

Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen

Info

Publication number
ATE484840T1
ATE484840T1 AT02016838T AT02016838T ATE484840T1 AT E484840 T1 ATE484840 T1 AT E484840T1 AT 02016838 T AT02016838 T AT 02016838T AT 02016838 T AT02016838 T AT 02016838T AT E484840 T1 ATE484840 T1 AT E484840T1
Authority
AT
Austria
Prior art keywords
aligning
column
charged particle
particle beams
aperture
Prior art date
Application number
AT02016838T
Other languages
English (en)
Inventor
Dror Shemesh
Original Assignee
Applied Materials Israel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Israel Ltd filed Critical Applied Materials Israel Ltd
Application granted granted Critical
Publication of ATE484840T1 publication Critical patent/ATE484840T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical or photographic arrangements associated with the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • H01J37/263Contrast, resolution or power of penetration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • H01J37/265Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/045Diaphragms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15Means for deflecting or directing discharge
    • H01J2237/1501Beam alignment means or procedures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153Correcting image defects, e.g. stigmators
    • H01J2237/1532Astigmatism
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21Focus adjustment
    • H01J2237/216Automatic focusing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22Treatment of data
    • H01J2237/221Image processing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Measurement Of Radiation (AREA)
AT02016838T 2001-10-10 2002-07-29 Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen ATE484840T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US32845201P 2001-10-10 2001-10-10

Publications (1)

Publication Number Publication Date
ATE484840T1 true ATE484840T1 (de) 2010-10-15

Family

ID=23281045

Family Applications (2)

Application Number Title Priority Date Filing Date
AT02016838T ATE484840T1 (de) 2001-10-10 2002-07-29 Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen
AT02016839T ATE453205T1 (de) 2001-10-10 2002-07-29 Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT02016839T ATE453205T1 (de) 2001-10-10 2002-07-29 Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule

Country Status (6)

Country Link
US (3) US7335893B2 (de)
EP (2) EP1306878B1 (de)
JP (1) JP4928506B2 (de)
CN (1) CN100397549C (de)
AT (2) ATE484840T1 (de)
DE (2) DE60237952D1 (de)

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EP1489641B1 (de) * 2003-06-18 2019-08-14 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ablenksystem für geladene Teilchen
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JP7040199B2 (ja) * 2018-03-26 2022-03-23 株式会社島津製作所 荷電粒子ビーム軸合わせ装置、荷電粒子ビーム照射装置および荷電粒子ビーム軸合わせ方法
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Also Published As

Publication number Publication date
CN100397549C (zh) 2008-06-25
EP1306878A3 (de) 2006-04-19
DE60234802D1 (de) 2010-02-04
JP4928506B2 (ja) 2012-05-09
ATE453205T1 (de) 2010-01-15
DE60237952D1 (de) 2010-11-25
CN1602537A (zh) 2005-03-30
EP1302971B1 (de) 2009-12-23
EP1302971A3 (de) 2006-04-19
EP1306878B1 (de) 2010-10-13
EP1306878A2 (de) 2003-05-02
US7385205B2 (en) 2008-06-10
US20070235659A1 (en) 2007-10-11
US20050012050A1 (en) 2005-01-20
US7271396B2 (en) 2007-09-18
JP2008300358A (ja) 2008-12-11
EP1302971A2 (de) 2003-04-16
US20050006598A1 (en) 2005-01-13
US7335893B2 (en) 2008-02-26

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