WO2003032359A3 - Method and device for aligning a charged particle beam column - Google Patents

Method and device for aligning a charged particle beam column Download PDF

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Publication number
WO2003032359A3
WO2003032359A3 PCT/IB2002/005119 IB0205119W WO03032359A3 WO 2003032359 A3 WO2003032359 A3 WO 2003032359A3 IB 0205119 W IB0205119 W IB 0205119W WO 03032359 A3 WO03032359 A3 WO 03032359A3
Authority
WO
WIPO (PCT)
Prior art keywords
aligning
charged particle
particle beam
beam column
aperture
Prior art date
Application number
PCT/IB2002/005119
Other languages
French (fr)
Other versions
WO2003032359A2 (en
Inventor
Dror Shemesh
Original Assignee
Applied Materials Isreal Ltd
Dror Shemesh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP02016838A external-priority patent/EP1306878B1/en
Application filed by Applied Materials Isreal Ltd, Dror Shemesh filed Critical Applied Materials Isreal Ltd
Priority to US10/492,574 priority Critical patent/US7271396B2/en
Priority to JP2003535230A priority patent/JP4108604B2/en
Priority to AU2002351104A priority patent/AU2002351104A1/en
Publication of WO2003032359A2 publication Critical patent/WO2003032359A2/en
Publication of WO2003032359A3 publication Critical patent/WO2003032359A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H01J2237/216—Automatic focusing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.
PCT/IB2002/005119 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column WO2003032359A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US10/492,574 US7271396B2 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column
JP2003535230A JP4108604B2 (en) 2001-10-10 2002-10-04 Alignment method and apparatus for charged particle beam column
AU2002351104A AU2002351104A1 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US32845201P 2001-10-10 2001-10-10
US60/328,452 2001-10-10
EP02016838A EP1306878B1 (en) 2001-10-10 2002-07-29 Method and device for aligning a charged particle beam column
EP02016838.1 2002-07-29

Publications (2)

Publication Number Publication Date
WO2003032359A2 WO2003032359A2 (en) 2003-04-17
WO2003032359A3 true WO2003032359A3 (en) 2005-01-20

Family

ID=26077581

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2002/005119 WO2003032359A2 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column

Country Status (4)

Country Link
JP (2) JP4108604B2 (en)
CN (1) CN100524601C (en)
AU (1) AU2002351104A1 (en)
WO (1) WO2003032359A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4286625B2 (en) * 2003-09-29 2009-07-01 株式会社日立ハイテクノロジーズ Sample observation method using electron microscope
JP2005276639A (en) * 2004-03-25 2005-10-06 Jeol Ltd Position adjusting method for objective lens diaphragm of scanning type electron beam device
DE102005041923A1 (en) * 2005-09-03 2007-03-08 Comet Gmbh Device for generating X-ray or XUV radiation
JP4789260B2 (en) * 2006-08-23 2011-10-12 エスアイアイ・ナノテクノロジー株式会社 Charged particle beam apparatus and aperture axis adjusting method
DE102006055510B4 (en) * 2006-11-24 2009-05-07 Ceos Corrected Electron Optical Systems Gmbh Phase plate, image forming method and electron microscope
EP2166557A1 (en) * 2008-09-22 2010-03-24 FEI Company Method for correcting distortions in a particle-optical apparatus
JP5826064B2 (en) * 2012-02-17 2015-12-02 株式会社日立ハイテクノロジーズ electronic microscope
US10573489B2 (en) 2016-01-29 2020-02-25 Hitachi High-Technologies Corporation Charged particle beam device and optical-axis adjusting method thereof
JP6821471B2 (en) * 2017-02-28 2021-01-27 株式会社荏原製作所 Optical axis adjustment method and electron beam inspection device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4451737A (en) * 1981-06-24 1984-05-29 Hitachi, Ltd. Electron beam control device for electron microscopes
EP1302971A2 (en) * 2001-10-10 2003-04-16 Applied Materials Israel Ltd. Method and device for aligning a charged particle beam column

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1018110B (en) * 1988-01-18 1992-09-02 电子扫描公司 Scanning electron microscope for visualization of wet samples
JP2877624B2 (en) * 1992-07-16 1999-03-31 株式会社東芝 Objective lens alignment control apparatus and control method for scanning electron microscope
US5627373A (en) * 1996-06-17 1997-05-06 Hewlett-Packard Company Automatic electron beam alignment and astigmatism correction in scanning electron microscope
US6067164A (en) * 1996-09-12 2000-05-23 Kabushiki Kaisha Toshiba Method and apparatus for automatic adjustment of electron optics system and astigmatism correction in electron optics device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4451737A (en) * 1981-06-24 1984-05-29 Hitachi, Ltd. Electron beam control device for electron microscopes
EP1302971A2 (en) * 2001-10-10 2003-04-16 Applied Materials Israel Ltd. Method and device for aligning a charged particle beam column

Also Published As

Publication number Publication date
WO2003032359A2 (en) 2003-04-17
CN1639830A (en) 2005-07-13
JP4108604B2 (en) 2008-06-25
AU2002351104A1 (en) 2003-04-22
JP2006253156A (en) 2006-09-21
CN100524601C (en) 2009-08-05
JP2005521990A (en) 2005-07-21

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