AU2002351104A1 - Method and device for aligning a charged particle beam column - Google Patents

Method and device for aligning a charged particle beam column

Info

Publication number
AU2002351104A1
AU2002351104A1 AU2002351104A AU2002351104A AU2002351104A1 AU 2002351104 A1 AU2002351104 A1 AU 2002351104A1 AU 2002351104 A AU2002351104 A AU 2002351104A AU 2002351104 A AU2002351104 A AU 2002351104A AU 2002351104 A1 AU2002351104 A1 AU 2002351104A1
Authority
AU
Australia
Prior art keywords
aligning
charged particle
particle beam
beam column
column
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002351104A
Inventor
Dror Shemesh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Israel Ltd
Original Assignee
Applied Materials Israel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP02016838A external-priority patent/EP1306878B1/en
Application filed by Applied Materials Israel Ltd filed Critical Applied Materials Israel Ltd
Publication of AU2002351104A1 publication Critical patent/AU2002351104A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • H01J37/263Contrast, resolution or power of penetration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/045Diaphragms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15Means for deflecting or directing discharge
    • H01J2237/1501Beam alignment means or procedures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153Correcting image defects, e.g. stigmators
    • H01J2237/1532Astigmatism
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21Focus adjustment
    • H01J2237/216Automatic focusing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22Treatment of data
    • H01J2237/221Image processing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
AU2002351104A 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column Abandoned AU2002351104A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US32845201P 2001-10-10 2001-10-10
US60/328,452 2001-10-10
EP02016838.1 2002-07-29
EP02016838A EP1306878B1 (en) 2001-10-10 2002-07-29 Method and device for aligning a charged particle beam column
PCT/IB2002/005119 WO2003032359A2 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column

Publications (1)

Publication Number Publication Date
AU2002351104A1 true AU2002351104A1 (en) 2003-04-22

Family

ID=26077581

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002351104A Abandoned AU2002351104A1 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column

Country Status (4)

Country Link
JP (2) JP4108604B2 (en)
CN (1) CN100524601C (en)
AU (1) AU2002351104A1 (en)
WO (1) WO2003032359A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4286625B2 (en) * 2003-09-29 2009-07-01 株式会社日立ハイテクノロジーズ Sample observation method using electron microscope
JP2005276639A (en) * 2004-03-25 2005-10-06 Jeol Ltd Position adjusting method for objective lens diaphragm of scanning type electron beam device
DE102005041923A1 (en) * 2005-09-03 2007-03-08 Comet Gmbh Device for generating X-ray or XUV radiation
JP4789260B2 (en) * 2006-08-23 2011-10-12 エスアイアイ・ナノテクノロジー株式会社 Charged particle beam apparatus and aperture axis adjusting method
DE102006055510B4 (en) * 2006-11-24 2009-05-07 Ceos Corrected Electron Optical Systems Gmbh Phase plate, image forming method and electron microscope
EP2166557A1 (en) * 2008-09-22 2010-03-24 FEI Company Method for correcting distortions in a particle-optical apparatus
JP5826064B2 (en) * 2012-02-17 2015-12-02 株式会社日立ハイテクノロジーズ electronic microscope
WO2017130363A1 (en) 2016-01-29 2017-08-03 株式会社 日立ハイテクノロジーズ Charged particle beam device and optical axis adjustment method therefor
JP6821471B2 (en) * 2017-02-28 2021-01-27 株式会社荏原製作所 Optical axis adjustment method and electron beam inspection device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57212754A (en) * 1981-06-24 1982-12-27 Hitachi Ltd Electron-beam controller for electron microscope
CN1018110B (en) * 1988-01-18 1992-09-02 电子扫描公司 Scanning electron microscope for visualization of wet samples
JP2877624B2 (en) * 1992-07-16 1999-03-31 株式会社東芝 Objective lens alignment control apparatus and control method for scanning electron microscope
US5627373A (en) * 1996-06-17 1997-05-06 Hewlett-Packard Company Automatic electron beam alignment and astigmatism correction in scanning electron microscope
US6067164A (en) * 1996-09-12 2000-05-23 Kabushiki Kaisha Toshiba Method and apparatus for automatic adjustment of electron optics system and astigmatism correction in electron optics device
ATE453205T1 (en) * 2001-10-10 2010-01-15 Applied Materials Israel Ltd METHOD AND DEVICE FOR AUTOMATIC IMAGE GENERATION SUITABLE FOR ALIGNMENT OF A CHARGED PARTICLE BEAM COLUMN

Also Published As

Publication number Publication date
WO2003032359A2 (en) 2003-04-17
CN1639830A (en) 2005-07-13
CN100524601C (en) 2009-08-05
JP2006253156A (en) 2006-09-21
JP2005521990A (en) 2005-07-21
JP4108604B2 (en) 2008-06-25
WO2003032359A3 (en) 2005-01-20

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase