AT508318A3 - Verfahren für eine vorübergehende montage eines bausteinwafers auf einem trägersubstrat - Google Patents

Verfahren für eine vorübergehende montage eines bausteinwafers auf einem trägersubstrat Download PDF

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Publication number
AT508318A3
AT508318A3 ATA9035/2009A AT90352009A AT508318A3 AT 508318 A3 AT508318 A3 AT 508318A3 AT 90352009 A AT90352009 A AT 90352009A AT 508318 A3 AT508318 A3 AT 508318A3
Authority
AT
Austria
Prior art keywords
supporting substrate
building unit
package
methods
wafer
Prior art date
Application number
ATA9035/2009A
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English (en)
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AT508318A2 (de
AT508318B1 (de
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Brewer Science Inc
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Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Priority to ATGM514/2010U priority Critical patent/AT12755U1/de
Publication of AT508318A2 publication Critical patent/AT508318A2/de
Publication of AT508318A3 publication Critical patent/AT508318A3/de
Application granted granted Critical
Publication of AT508318B1 publication Critical patent/AT508318B1/de

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901—Structure
    • H01L2924/1904—Component type
    • H01L2924/19041—Component type being a capacitor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Micromachines (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

Es werden neue Verfahren für ein vorübergehendes Bonden und Gegenstände, die aus diesen Verfahren gebildet sind, zur Verfügung gestellt. Die Verfahren umfassen das Bonden eines Bausteinwafers an einen Trägerwafer oder ein Substrat nur an deren äußeren Umfangen, um beim Schutz des Bausteinwafers und der Bausteinorte während der nachfolgenden Bearbeitung und Handhabung zu helfen. Die mit Hilfe dieses Verfahrens gebildeten Randbonds sind chemisch und thermisch widerstandsfähig, können jedoch auch aufgeweicht, aufgelöst oder mechanisch zerbrochen werden, um es zu ermöglichen, die Wafer leicht mit Hilfe von sehr geringen Kräften und bei oder in der Nähe ihrer Raumtemperatur beim geeigneten Schritt des Herstellungsprozesses zu trennen.
ATA9035/2009A 2008-01-24 2009-01-23 Verfahren für eine vorübergehende montage eines bausteinwafers auf einem trägersubstrat AT508318B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ATGM514/2010U AT12755U1 (de) 2008-01-24 2009-01-23 Verfahren für eine vorübergehende montage eines bausteinwafers auf einem trägersubstrat

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2337908P 2008-01-24 2008-01-24
PCT/US2009/031862 WO2009094558A2 (en) 2008-01-24 2009-01-23 Method for reversibly mounting a device wafer to a carrier substrate

Publications (3)

Publication Number Publication Date
AT508318A2 AT508318A2 (de) 2010-12-15
AT508318A3 true AT508318A3 (de) 2015-12-15
AT508318B1 AT508318B1 (de) 2022-07-15

Family

ID=40901639

Family Applications (2)

Application Number Title Priority Date Filing Date
ATA9035/2009A AT508318B1 (de) 2008-01-24 2009-01-23 Verfahren für eine vorübergehende montage eines bausteinwafers auf einem trägersubstrat
ATGM514/2010U AT12755U1 (de) 2008-01-24 2009-01-23 Verfahren für eine vorübergehende montage eines bausteinwafers auf einem trägersubstrat

Family Applications After (1)

Application Number Title Priority Date Filing Date
ATGM514/2010U AT12755U1 (de) 2008-01-24 2009-01-23 Verfahren für eine vorübergehende montage eines bausteinwafers auf einem trägersubstrat

Country Status (13)

Country Link
US (2) US9111981B2 (de)
EP (1) EP2238618B1 (de)
JP (2) JP5111620B2 (de)
KR (1) KR101096142B1 (de)
CN (1) CN101925996B (de)
AT (2) AT508318B1 (de)
CA (1) CA2711266A1 (de)
DE (2) DE202009018064U1 (de)
IL (1) IL206872A (de)
PT (1) PT2238618E (de)
RU (1) RU2010129076A (de)
TW (1) TWI439526B (de)
WO (1) WO2009094558A2 (de)

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KR20100095021A (ko) 2010-08-27
CA2711266A1 (en) 2009-07-30
CN101925996A (zh) 2010-12-22
US20110069467A1 (en) 2011-03-24
US20090218560A1 (en) 2009-09-03
KR101096142B1 (ko) 2011-12-19
AT508318A2 (de) 2010-12-15
TWI439526B (zh) 2014-06-01
WO2009094558A3 (en) 2009-09-24
DE112009000140B4 (de) 2022-06-15
CN101925996B (zh) 2013-03-20
PT2238618E (pt) 2015-09-03
WO2009094558A2 (en) 2009-07-30
TW200946628A (en) 2009-11-16
RU2010129076A (ru) 2012-01-20
EP2238618A2 (de) 2010-10-13
DE202009018064U1 (de) 2010-12-02
IL206872A0 (en) 2010-12-30
IL206872A (en) 2015-07-30
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US9099512B2 (en) 2015-08-04
JP2011510518A (ja) 2011-03-31
AT12755U1 (de) 2012-11-15
US9111981B2 (en) 2015-08-18
JP2012253367A (ja) 2012-12-20
DE112009000140T5 (de) 2010-11-18
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JP5111620B2 (ja) 2013-01-09
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