ZA98724B - Non-volatile phenylglyoxalic esters - Google Patents

Non-volatile phenylglyoxalic esters

Info

Publication number
ZA98724B
ZA98724B ZA98724A ZA98724A ZA98724B ZA 98724 B ZA98724 B ZA 98724B ZA 98724 A ZA98724 A ZA 98724A ZA 98724 A ZA98724 A ZA 98724A ZA 98724 B ZA98724 B ZA 98724B
Authority
ZA
South Africa
Prior art keywords
volatile
phenylglyoxalic esters
phenylglyoxalic
esters
volatile phenylglyoxalic
Prior art date
Application number
ZA98724A
Other languages
English (en)
Inventor
David George Leppard
Manfred Kohler
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of ZA98724B publication Critical patent/ZA98724B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Holo Graphy (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Cosmetics (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Fats And Perfumes (AREA)
ZA98724A 1997-01-30 1998-01-29 Non-volatile phenylglyoxalic esters ZA98724B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH19597 1997-01-30

Publications (1)

Publication Number Publication Date
ZA98724B true ZA98724B (en) 1998-07-30

Family

ID=4181427

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA98724A ZA98724B (en) 1997-01-30 1998-01-29 Non-volatile phenylglyoxalic esters

Country Status (14)

Country Link
US (1) US6048660A (enExample)
EP (1) EP0956280B1 (enExample)
JP (1) JP4171073B2 (enExample)
KR (1) KR100548976B1 (enExample)
CN (1) CN1157359C (enExample)
AU (1) AU718619B2 (enExample)
BR (1) BR9806940B1 (enExample)
CA (1) CA2275667A1 (enExample)
DE (1) DE69809029T2 (enExample)
DK (1) DK0956280T3 (enExample)
ES (1) ES2184233T3 (enExample)
TW (1) TW460450B (enExample)
WO (1) WO1998033761A1 (enExample)
ZA (1) ZA98724B (enExample)

Families Citing this family (134)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1085971B1 (en) * 1999-03-09 2004-06-02 Lee Eisinger Application of textured or patterned surfaces to a prototype
DE19913353A1 (de) * 1999-03-24 2000-09-28 Basf Ag Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings
TWI244495B (en) * 2000-08-14 2005-12-01 Ciba Sc Holding Ag Process for producing coatings siloxane photoinitiators
US6470128B1 (en) 2001-03-30 2002-10-22 Alcatel UV-curable coating composition for optical fiber for a fast cure and with improved adhesion to glass
US7105582B2 (en) * 2002-02-04 2006-09-12 Ciba Specialty Chemicals Corp. Surface-active siloxane photoinitiators
JP2005517057A (ja) * 2002-02-04 2005-06-09 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 高度にフッ素化されたモノマーにおけるフッ素化光開始剤
WO2003066687A2 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Surface-active photoinitiators
CA2483004A1 (en) * 2002-04-26 2003-11-06 Ciba Specialty Chemicals Holding Inc. Incorporable photoinitiator
DE10241299A1 (de) 2002-09-04 2004-03-25 Basf Ag Strahlungshärtbare Polyurethane mit verkappten Aminogrupppen
US7285363B2 (en) * 2002-11-08 2007-10-23 The University Of Connecticut Photoactivators, methods of use, and the articles derived therefrom
JP4116890B2 (ja) * 2003-01-31 2008-07-09 富士フイルム株式会社 インクジェット記録用インクおよび画像形成方法
JP2004231863A (ja) * 2003-01-31 2004-08-19 Fuji Photo Film Co Ltd インクジェット記録用インクおよび画像形成方法
DE10316890A1 (de) * 2003-04-12 2004-11-04 Basf Coatings Ag Mit aktinischer Strahlung aktivierbare Initiatoren enthaltende Mischungen sowie Zwei- und Mehrkomponentensysteme, Verfahren zu ihrer Herstellung und ihre Verwendung
DE10348463A1 (de) 2003-10-14 2005-05-25 Basf Ag Hyperverzweigte Polyester mit ethylenisch ungesättigten Gruppen
DE102004030674A1 (de) 2004-06-24 2006-01-19 Basf Ag Vorrichtung und Verfahren zum Härten mit energiereicher Strahlung unter Inertgasatmosphäre
US7309550B2 (en) * 2004-09-20 2007-12-18 Chemence, Inc. Photosensitive composition with low yellowing under UV-light and sunlight exposure
US8414982B2 (en) * 2004-12-22 2013-04-09 Basf Se Process for the production of strongly adherent coatings
DE102004063102A1 (de) 2004-12-22 2006-07-13 Basf Ag Strahlungshärtbare Verbindungen
KR101251244B1 (ko) 2005-02-24 2013-04-08 바스프 에스이 방사선 경화성 수성 폴리우레탄 분산액
DE102005010109A1 (de) 2005-03-02 2006-09-07 Basf Ag Modifizierte Polyolefinwachse
ITVA20050032A1 (it) * 2005-05-13 2006-11-14 Lamberti Spa Esteri fenilgliossilici generanti residui a bassa migrabilita' e odore
ITVA20050049A1 (it) * 2005-08-05 2007-02-06 Lamberti Spa Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'
CA2632187C (en) * 2005-11-09 2017-06-27 Klox Technologies Inc. Teeth whitening compositions and methods
DE102005057683A1 (de) 2005-12-01 2007-06-06 Basf Ag Strahlungshärtbare wasserelmulgierbare Polyisocyanate
WO2007111003A1 (ja) * 2006-03-28 2007-10-04 Fujifilm Corporation 感光性組成物、及び感光性フィルム、並びに永久パターン形成方法及びプリント基板
JP2010505977A (ja) * 2006-10-03 2010-02-25 チバ ホールディング インコーポレーテッド フェニルグリオキシレート型の光開始剤を含む光硬化性組成物
US20100266989A1 (en) 2006-11-09 2010-10-21 Klox Technologies Inc. Teeth whitening compositions and methods
CN101616946B (zh) 2007-02-15 2012-07-18 巴斯夫欧洲公司 聚氨酯分散体及其制备和用途
DE102008002008A1 (de) 2007-06-04 2008-12-11 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
DE102007026196A1 (de) 2007-06-04 2008-12-11 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
US8193279B2 (en) 2007-06-21 2012-06-05 Basf Se Flexible, radiation-curable coating compositions
WO2008155354A1 (de) 2007-06-21 2008-12-24 Basf Se Strahlungshärtbare beschichtungsmassen mit hoher haftung
DE102008041654A1 (de) 2007-08-31 2009-03-05 Basf Se Neue Beschichtungsmittel
DE102008043202A1 (de) 2007-10-29 2009-04-30 Basf Se Verfahren zur Kantenleimung von Textilien
EP2182410A4 (en) * 2007-11-20 2011-04-13 Hitachi Chemical Co Ltd PHOTOSENSITIVE RESIN COMPOSITION, CURED PHOTOSENSITIVE RESIN PRODUCT, PHOTOSENSITIVE RESIN FILM, CURED PHOTOSENSITIVE RESIN FILM PRODUCT, AND OPTICAL WAVEGUIDE PRODUCED BY USING THE SAME
JP5606325B2 (ja) * 2008-01-17 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 修飾オレフィンポリマー
US20100255326A1 (en) * 2008-10-07 2010-10-07 Ciba Corporation Printable gas barriers
DE102008052586A1 (de) * 2008-10-21 2010-04-22 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Zusammensetzung zur Herstellung optischer Elemente mit Gradientenstruktur
US8507726B2 (en) 2008-11-03 2013-08-13 Basf Se Photoinitiator mixtures
EP2365829B1 (en) 2008-11-07 2017-05-24 KLOX Technologies, Inc. Combination of an oxidant and a photoactivator for the healing of wounds
DE102009046713A1 (de) 2008-11-27 2010-06-02 Basf Se Strahlungshärtbare Beschichtungsmassen
DE102010001956A1 (de) 2009-02-17 2010-08-19 Basf Se Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate
WO2010108863A1 (de) 2009-03-24 2010-09-30 Basf Se Strahlungshärtbare hochfunktionelle polyurethan(meth)acrylate
DE102010003308A1 (de) 2009-03-31 2011-01-13 Basf Se Strahlungshärtbare wasseremulgierbare Polyurethan(meth)acrylate
WO2010121978A1 (de) 2009-04-22 2010-10-28 Basf Se Strahlungshärtbare beschichtungsmassen
BR112012001016A2 (pt) 2009-07-17 2020-10-27 Klox Technologies Inc. composição oral antibacteriana
WO2011015539A1 (de) 2009-08-05 2011-02-10 Basf Se (meth)acrylierte melamin-formaldehyd-harze
WO2011015540A1 (de) 2009-08-06 2011-02-10 Basf Se Strahlungshärtbare wasserdispergierbare polyurethane und polyurethandispersionen
DE102010044206A1 (de) 2009-11-25 2011-05-26 Basf Se Verfahren zur Herstellung von strahlungshärtbaren (Meth)Acrylaten
DE102010044204A1 (de) 2009-11-25 2011-05-26 Basf Se Verfahren zur Herstellung von strahlungshärtbaren (Meth)Acrylaten
CN102442909B (zh) * 2010-06-25 2013-10-30 北京英力科技发展有限公司 低挥发低迁移性苯甲酰基甲酸酯
WO2011160262A1 (zh) * 2010-06-25 2011-12-29 北京英力科技发展有限公司 低挥发性苯甲酰基甲酸酯
DE102010026490A1 (de) 2010-07-07 2012-01-12 Basf Se Verfahren zur Herstellung von feinstrukturierten Oberflächen
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
KR20140006959A (ko) 2011-02-22 2014-01-16 바스프 에스이 방사선-경화성 코팅 물질용 레올로지 작용제
US9090736B2 (en) 2011-02-22 2015-07-28 Basf Se Rheological agent for radiation-curable coating compositions
EP2721085A1 (de) 2011-06-14 2014-04-23 Basf Se Strahlungshärtbare wässrige polyurethandispersionen
WO2013110504A1 (en) 2012-01-27 2013-08-01 Basf Se Radiation-curable antimicrobial coatings
US8728455B2 (en) 2012-01-27 2014-05-20 Basf Se Radiation-curable antimicrobial coatings
WO2013110566A1 (de) 2012-01-27 2013-08-01 Basf Se Strahlungshärtbare antimikrobielle beschichtungsmasse
US9193888B2 (en) 2012-03-19 2015-11-24 Basf Se Radiation-curable aqueous dispersions
WO2013139565A1 (en) 2012-03-19 2013-09-26 Basf Se Radiation-curable coating compositions
CN104204021B (zh) 2012-03-19 2018-04-20 巴斯夫欧洲公司 可辐射固化的含水分散体
US20130281913A1 (en) 2012-04-20 2013-10-24 Klox Technologies Inc. Biophotonic compositions and methods for providing biophotonic treatment
US11116841B2 (en) 2012-04-20 2021-09-14 Klox Technologies Inc. Biophotonic compositions, kits and methods
US9296907B2 (en) 2012-05-30 2016-03-29 Basf Se Radiation-curable compounds
ES2626506T3 (es) 2012-05-30 2017-07-25 Igm Malta Limited Compuestos curables por radiación
ES2738010T3 (es) * 2012-06-04 2020-01-17 Oreal Composiciones cosméticas de curado rápido para fotocurado superficial exento de pegajosidad de resinas polimerizables radicalariamente con LED UV
JP6010352B2 (ja) 2012-06-07 2016-10-19 株式会社オートネットワーク技術研究所 硬化性増感剤、光硬化材料、硬化物及びワイヤーハーネス材料
KR20150036655A (ko) 2012-07-20 2015-04-07 바스프 에스이 급속-건조, 방사선-경화성 코팅 화합물
ES2611966T3 (es) 2012-08-09 2017-05-11 Basf Se Formulaciones endurecibles por radiación con alta adhesión
CA2884349C (en) 2012-09-14 2019-03-26 Valeant Pharmaceuticals International, Inc. Compositions and methods for teeth whitening
CN104736513B (zh) * 2012-10-19 2018-04-03 Igm集团公司 混合光引发剂
ES2619106T3 (es) 2012-10-24 2017-06-23 Basf Se (Met)acrilatos de poliuretano dispersables en agua, curables por radiación
PL2920222T3 (pl) 2012-11-16 2017-09-29 Basf Se Poliuretany, ich dyspersje, ich wytwarzanie i zastosowanie
EP2931811A2 (en) 2012-12-14 2015-10-21 Basf Se (meth)acrylated amino resins
US20140276354A1 (en) 2013-03-14 2014-09-18 Klox Technologies Inc. Biophotonic materials and uses thereof
WO2014161817A1 (de) 2013-04-03 2014-10-09 Basf Se Verfahren zur reduzierung der restmonomerenmenge in einer wässrigen polymerisatdispersion
MX366292B (es) 2013-07-03 2019-07-04 Klox Tech Inc Composiciones biofotónicas que comprenden un cromóforo y un agente gelificante para el tratamiento de heridas.
RU2673466C2 (ru) 2013-08-26 2018-11-27 Басф Се Радиационно-отверждаемые диспергируемые в воде полиуретан(met)акрилаты
US10294392B2 (en) 2013-10-16 2019-05-21 Basf Se Process for preparing water-emulsifiable polyurethane acrylates
US9676921B2 (en) * 2013-10-30 2017-06-13 Xerox Corporation Curable latex inks comprising an unsaturated polyester for indirect printing
WO2015067478A1 (de) 2013-11-05 2015-05-14 Construction Research & Technology Gmbh Neue bindemittelsysteme
CN103709036B (zh) * 2013-12-03 2015-07-29 天津久日化学股份有限公司 双官能团苯甲酰基甲酸羟基酮酯类化合物及含该类化合物的光引发剂
UA117159C2 (uk) 2014-01-14 2018-06-25 Кроноплюс Текнікал Аг Багатошарова будівельна плита для внутрішнього та зовнішнього застосування
JP2017509433A (ja) 2014-04-01 2017-04-06 クロックス テクノロジーズ インコーポレイテッドＫｌｏｘ Ｔｅｃｈｎｏｌｏｇｉｅｓ Ｉｎｃ． 組織充填剤組成物および使用方法
EP2942361A1 (en) 2014-05-06 2015-11-11 Basf Se Grain enhancement with surfactants in water-based uv-radiation curable polyurethane dispersions
US10577471B2 (en) 2014-10-01 2020-03-03 Basf Se Method for curing curable compositions
JP2018500468A (ja) 2014-10-31 2018-01-11 クロックス テクノロジーズ インコーポレイテッドＫｌｏｘ Ｔｅｃｈｎｏｌｏｇｉｅｓ Ｉｎｃ． 光活性性の繊維および織物媒体
RU2017125258A (ru) 2014-12-17 2019-01-17 Басф Се Радиационно-отверждаемая композиция покрытия на основе сшитых полиуретанов с удлиненной цепью
US10003053B2 (en) 2015-02-04 2018-06-19 Global Web Horizons, Llc Systems, structures and materials for electrochemical device thermal management
US20160223269A1 (en) 2015-02-04 2016-08-04 Outlast Technologies, LLC Thermal management films containing phase change materials
US10431858B2 (en) 2015-02-04 2019-10-01 Global Web Horizons, Llc Systems, structures and materials for electrochemical device thermal management
US10703929B2 (en) 2015-08-17 2020-07-07 Basf Se Aqueous polymer compositions comprising polyurethane (meth)acrylates
EP3173449A1 (de) 2015-11-27 2017-05-31 BASF Coatings GmbH Verbund aus zwei festkörpern
RU2712992C1 (ru) 2016-08-19 2020-02-03 Ксило Текнолоджиз АГ Панель с покрытием и способ изготовления панели с покрытием
JP1609255S (enExample) 2017-04-03 2018-07-17
US10884182B2 (en) 2017-06-02 2021-01-05 Dsm Ip Assets B.V. Thermally resistant radiation curable coatings for optical fiber
US11319246B2 (en) 2017-11-03 2022-05-03 Covestro (Netherlands) B.V. Water-blocking systems including fibers coated with liquid radiation curable SAP compositions
CN112437761B (zh) 2018-06-01 2023-01-20 科思创(荷兰)有限公司 用于涂覆光纤的辐射可固化组合物及由其生产的涂层
ES2989485T3 (es) 2018-07-13 2024-11-26 Miwon Austria Forschung Und Entw Gmbh Poli((met)acrilatos de uretano) dispersables en agua para revestimientos curables por radiación actínica
EP3597669A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
EP3597668A1 (en) 2018-07-20 2020-01-22 Clariant International Ltd Photo-curable resin composition for 3d printing
EP3867207A1 (en) 2018-12-03 2021-08-25 Ms Holding B.V. Filled radiation curable compositions for coating optical fiber and the coatings produced therefrom
JP7618588B2 (ja) 2019-05-24 2025-01-21 コベストロ （ネザーランズ） ビー．ヴィー． 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物
EP3976544A1 (en) 2019-05-24 2022-04-06 Covestro (Netherlands) B.V. Radiaton curable compositions for coating optical fiber with enhanced high-speed processability
WO2021021971A1 (en) 2019-07-31 2021-02-04 Dsm Ip Assets B.V. Radiation curable compositions with multi-functional long-armed oligomers for coating optical fibers
WO2021069295A1 (de) 2019-10-08 2021-04-15 Basf Se Thermisch härtbare zweikomponentige beschichtungsmassen
CN115427853A (zh) 2020-04-03 2022-12-02 科思创(荷兰)有限公司 自我修复光纤和用于制造其的组合物
US12473395B2 (en) 2020-04-03 2025-11-18 Covestro (Netherlands) B.V. Self-healing oligomers and the use thereof
WO2021202638A1 (en) 2020-04-03 2021-10-07 Dsm Ip Assets B.V. Multi-layered optical devices
WO2022002909A1 (en) 2020-06-30 2022-01-06 Covestro (Netherlands) B.V. Viscosity index improvers in optical fiber coatings
DE102020132126A1 (de) 2020-12-03 2022-06-09 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Strukturiertes Material
US20240052196A1 (en) 2021-02-22 2024-02-15 Covestro (Netherlands) B.V. Process for providing low gloss coatings
WO2023025554A1 (en) 2021-08-26 2023-03-02 Basf Se Curable composition and 3d-printed object formed therefrom and process for forming the same
PL4423155T3 (pl) 2021-10-29 2025-12-08 Covestro (Netherlands) B.V. Kompozycja utwardzalna rodnikowo
CN118715260A (zh) 2022-02-17 2024-09-27 巴斯夫涂料有限公司 可uv固化的涂料组合物
CN118973799A (zh) 2022-04-06 2024-11-15 巴斯夫欧洲公司 用于3d打印方法的可固化组合物和由其形成的3d打印物体以及使用其的3d打印方法
JP2025514927A (ja) 2022-04-21 2025-05-13 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバを被覆するための低揮発性放射線硬化性組成物
US20250360534A1 (en) 2022-05-25 2025-11-27 Covestro (Netherlands) B.V. Process for providing low gloss coatings
EP4577607A1 (en) 2022-08-24 2025-07-02 Covestro (Netherlands) B.V. Process for providing low gloss coatings
EP4633831A1 (en) 2022-12-15 2025-10-22 Covestro LLC Process for producing low gloss coating surface by radiation curing
WO2024141320A1 (en) 2022-12-29 2024-07-04 Basf Se Radiation curable liquid composition, process of forming 3d-printed object and 3d-printed object
WO2024160696A2 (en) 2023-01-31 2024-08-08 Basf Se Curable composition, 3d-printed object formed therefrom and process of forming the same
WO2025068119A1 (en) * 2023-09-25 2025-04-03 Covestro (Netherlands) B.V. Photoinitiators for photocurable compositions
WO2025147337A1 (en) 2024-01-02 2025-07-10 Covestro Llc Polysilanes, methods for their preparation, and the use thereof in coating compositions
WO2025147343A1 (en) 2024-01-02 2025-07-10 Covestro Llc Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions
US12428514B2 (en) 2024-01-02 2025-09-30 Covestro Llc Ethylenically unsaturated compounds, methods for their preparation, and the use thereof in coating compositions
US12187852B1 (en) 2024-01-02 2025-01-07 Covestro Llc Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions
US20250215139A1 (en) 2024-01-02 2025-07-03 Covestro Llc Ethylenically unsaturated oligomers, methods for their preparation, and the use thereof in coating compositions

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3532737A (en) * 1967-02-02 1970-10-06 Sterling Drug Inc Esters of arylglyoxylic acids
US3754006A (en) * 1967-02-02 1973-08-21 Sterling Drug Inc Esters and amides of substituted glyoxylic acids
US3704313A (en) * 1968-10-10 1972-11-28 Rorer Inc William H P-cyclohexylphenylglycolic acid and derivatives thereof
US3657325A (en) * 1969-12-03 1972-04-18 Sterling Drug Inc Esters of substituted glyoxylic acids
US3930868A (en) * 1973-05-23 1976-01-06 The Richardson Company Light sensitive arylglyoxyacrylate compositions
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US3991416A (en) * 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
DE2825955A1 (de) * 1978-06-14 1980-01-03 Bayer Ag Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln
US4475999A (en) * 1983-06-06 1984-10-09 Stauffer Chemical Company Sensitization of glyoxylate photoinitiators
AU569084B2 (en) * 1983-06-27 1988-01-21 Stauffer Chemical Company Photopolymerizable composition
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
US4987159A (en) * 1990-04-11 1991-01-22 Fratelli Lamberti S.P.A. Carbonyl derivatives of 1-phenylindan suitable for use as polymerization photoinitiators, their preparation and use
US5795581A (en) * 1995-03-31 1998-08-18 Sandia Corporation Controlled release of molecular components of dendrimer/bioactive complexes

Also Published As

Publication number Publication date
JP2001511137A (ja) 2001-08-07
KR100548976B1 (ko) 2006-02-03
CN1157359C (zh) 2004-07-14
US6048660A (en) 2000-04-11
CN1244190A (zh) 2000-02-09
AU6096398A (en) 1998-08-25
DK0956280T3 (da) 2003-02-24
ES2184233T3 (es) 2003-04-01
CA2275667A1 (en) 1998-08-06
WO1998033761A1 (en) 1998-08-06
BR9806940B1 (pt) 2010-12-14
BR9806940A (pt) 2000-03-28
DE69809029D1 (de) 2002-12-05
DE69809029T2 (de) 2003-06-05
JP4171073B2 (ja) 2008-10-22
EP0956280A1 (en) 1999-11-17
AU718619B2 (en) 2000-04-20
EP0956280B1 (en) 2002-10-30
TW460450B (en) 2001-10-21
KR20000070608A (ko) 2000-11-25

Similar Documents

Publication Publication Date Title
ZA98724B (en) Non-volatile phenylglyoxalic esters
HU9801045D0 (en) Substituted diamino-carboxylic acids
EP1069105A4 (en) CAPSAICINOIDAL COMPOUNDS WITH ESTER BINDING
ZA989558B (en) Beta-keto ester
EG21992A (en) Ester synthesis
GB9706281D0 (en) Ester co-production
PL332553A1 (en) 3-alkooxyisooxazol-4-yl-substituted 2-aminocarboxylic acids
ID21536A (id) Pembuatan ester
AU5431098A (en) Sparc-deficient transgenic mice
PL340541A1 (en) Pyridipyrrole derivative
GB2332352B (en) Horticulture
IL155070A (en) Benzyl esters
HU9901927D0 (en) Ester compounds
GB9815117D0 (en) Ester synthesis
GB2328787B (en) Optical pulse amplifier
GB9621383D0 (en) Transgene expression
GB9727032D0 (en) Ester synthesis
ZA976582B (en) Methyl esters.
GB9812079D0 (en) Acrylic esters
AU2003200730A1 (en) Transgenic lemnaceae
AU2003200734A1 (en) Transgenic Lemnaceae
AU2003200732A1 (en) Transgenic lemnaceae
GB9723961D0 (en) Pickup weeder
GB9525417D0 (en) Esters
GB9525077D0 (en) Esters