KR100548976B1 - 비휘발성 페닐글리옥살산 에스테르 - Google Patents

비휘발성 페닐글리옥살산 에스테르

Info

Publication number
KR100548976B1
KR100548976B1 KR1019997006856A KR19997006856A KR100548976B1 KR 100548976 B1 KR100548976 B1 KR 100548976B1 KR 1019997006856 A KR1019997006856 A KR 1019997006856A KR 19997006856 A KR19997006856 A KR 19997006856A KR 100548976 B1 KR100548976 B1 KR 100548976B1
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KR
South Korea
Prior art keywords
formula
alkyl
phenyl
alkoxy
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019997006856A
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English (en)
Korean (ko)
Other versions
KR20000070608A (ko
Inventor
레파르트다비드게오르게
쾰러만프레드
Original Assignee
시바 스페셜티 케미칼스 홀딩 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 시바 스페셜티 케미칼스 홀딩 인크.
Publication of KR20000070608A publication Critical patent/KR20000070608A/ko
Application granted granted Critical
Publication of KR100548976B1 publication Critical patent/KR100548976B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76—Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Holo Graphy (AREA)
  • Cosmetics (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Fats And Perfumes (AREA)
KR1019997006856A 1997-01-30 1998-01-23 비휘발성 페닐글리옥살산 에스테르 Expired - Fee Related KR100548976B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH195/97 1997-01-30
CH19597 1997-01-30
PCT/EP1998/000351 WO1998033761A1 (en) 1997-01-30 1998-01-23 Non-volatile phenylglyoxalic esters

Publications (2)

Publication Number Publication Date
KR20000070608A KR20000070608A (ko) 2000-11-25
KR100548976B1 true KR100548976B1 (ko) 2006-02-03

Family

ID=4181427

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019997006856A Expired - Fee Related KR100548976B1 (ko) 1997-01-30 1998-01-23 비휘발성 페닐글리옥살산 에스테르

Country Status (14)

Country Link
US (1) US6048660A (enExample)
EP (1) EP0956280B1 (enExample)
JP (1) JP4171073B2 (enExample)
KR (1) KR100548976B1 (enExample)
CN (1) CN1157359C (enExample)
AU (1) AU718619B2 (enExample)
BR (1) BR9806940B1 (enExample)
CA (1) CA2275667A1 (enExample)
DE (1) DE69809029T2 (enExample)
DK (1) DK0956280T3 (enExample)
ES (1) ES2184233T3 (enExample)
TW (1) TW460450B (enExample)
WO (1) WO1998033761A1 (enExample)
ZA (1) ZA98724B (enExample)

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KR20000070608A (ko) 2000-11-25
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DE69809029D1 (de) 2002-12-05
AU718619B2 (en) 2000-04-20
BR9806940B1 (pt) 2010-12-14
CA2275667A1 (en) 1998-08-06
DE69809029T2 (de) 2003-06-05
AU6096398A (en) 1998-08-25
CN1244190A (zh) 2000-02-09
JP4171073B2 (ja) 2008-10-22
US6048660A (en) 2000-04-11
TW460450B (en) 2001-10-21
EP0956280A1 (en) 1999-11-17
ES2184233T3 (es) 2003-04-01
JP2001511137A (ja) 2001-08-07
CN1157359C (zh) 2004-07-14
WO1998033761A1 (en) 1998-08-06

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