WO2020208004A1 - Elektrolyt zur abscheidung von anthrazit/schwarzen rhodium/ruthenium legierungsschichten - Google Patents
Elektrolyt zur abscheidung von anthrazit/schwarzen rhodium/ruthenium legierungsschichten Download PDFInfo
- Publication number
- WO2020208004A1 WO2020208004A1 PCT/EP2020/059865 EP2020059865W WO2020208004A1 WO 2020208004 A1 WO2020208004 A1 WO 2020208004A1 EP 2020059865 W EP2020059865 W EP 2020059865W WO 2020208004 A1 WO2020208004 A1 WO 2020208004A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrolyte
- metal layer
- rhodium
- ruthenium
- metal
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Definitions
- the present invention is directed to an electrolyte which allows a black metal layer consisting of rhodium and ruthenium to be electrolytically produced.
- the present invention also relates to a method for producing a corresponding article and the use of the electrolyte.
- a particular challenge in the field of electroplating is the production of oxidation-resistant, electrically conductive and mechanically resilient metal layers in black color, which, in addition to decor and jewelry, can also be of interest for technical applications, for example in the field of solar technology or as a contact material.
- Only a few metals are available to produce oxidation-stable, black layers.
- ruthenium, rhodium, palladium, chromium and nickel are suitable.
- the use of the precious metal rhodium is limited to the jewelry sector because of the high raw material costs.
- the use of inexpensive nickel and nickel-containing alloys is only possible in exceptional cases and under strict conditions, especially in the jewelry and consumer goods sector, since nickel and nickel-containing metal layers are contact allergens.
- JPS57101686A describes an electrolyte with which metal layers made of rhodium and ruthenium can be obtained which, depending on the conditions, can be dark blue, gray or black.
- the layers produced with the electrolytes mentioned here do not have the blackness or abrasion resistance required by the market.
- Claim 3 focuses on a particular use.
- Claim 8 is directed to a method for the electrolytic deposition of a metal layer using the electrolyte according to the invention.
- Corresponding subclaims are directed to preferred embodiments of claims 1, 3 and 8.
- the electrolyte according to the invention presented here allows the electrolytic deposition of a metal layer on electrically conductive materials, the metal layer having an extremely high abrasion resistance with good electrical conductivity and is therefore predestined for use in contact materials.
- the attractive, dark and neutral color of the metal layer is also an advantage for use as a decorative element. That this can be achieved with the electrolyte presented here was not to be expected.
- the rhodium compound to be used in the electrolyte according to the invention can be selected as desired by the person skilled in the art. It will be based on the required solubility in acidic, aqueous electrolytes, the separability in connection with the ruthenium compound used and the cost of the rhodium compound.
- rhodium is present in dissolved form in the form of its ions. It is preferably introduced in the form of water-soluble salts, which are preferably selected from the group of pyrophosphates, carbonates, hydroxide carbonates, hydrogen carbonates, sulfites, sulfates, phosphates, nitrites, nitrates, halides, hydroxides, oxide-hydroxides, oxides or combinations from that. Particularly preferred is the embodiment in which the metals are used in the form of salts with ions, optionally from the group consisting of pyrophosphate, carbonate, sulfate, hydroxide carbonate, oxide-hydroxide, hydroxide and hydrogen carbonate.
- the electrolyte in the form of the salt of a mineral acid as rhodium sulfate or rhodium phosphate is extremely preferred.
- it can also be used as a salt of an organic acid, such as a rhodium alkanesulfonate, such as, for example, rhodium methanesulfonate, or as a rhodium sulfamate, or as a mixture of these compounds.
- the trivalent rhodium compounds to be used are furthermore particularly preferably selected from rhodium (III) fluoride, rhodium (III) chloride, rhodium (III) bromide, rhodium (III) iodide, rhodium (III) oxide hydrate and rhodium (III) sulfate.
- the ruthenium compounds to be used in the electrolyte are selected, for example, from ruthenium (III) fluoride, ruthenium (III) chloride, ruthenium (III) bromide, ruthenium (III) iodide, ruthenium (III) nitrosyl nitrate, ruthenium (III) acetate, ruthenium -Isonitrile- complexes, ruthenium-nitrido-hydroxo-complexes and Ru-nitrido-oxalato complexes.
- the source of ruthenium for the electrolyte of the present invention is more preferably made in situ. This then contains ruthenium in complexed form, preferably as a binuclear complex, which can be obtained in aqueous-acidic solution starting from ruthenium (III) compound, amidosulfuric acid and / or ammonium sulfamate. Electrolyte baths or make-up concentrates that contain 1-10 g / l amidosulfuric acid and / or ammonium sulfamate per 1 g / l ruthenium are common.
- Ruthenium is very particularly preferably used in the form of a binuclear, anionic nitridohalogenocomplex compound of the formula [Ru 2 N (H 2 O) 2 Xs] 3 , where X is a halide ion such as chlorine, bromine or iodine.
- the chloro complex [Ru2N (H20) 2Cl8] 3 is particularly preferred in this context.
- the metals to be deposited are, as indicated, for the application of decorative coatings on jewelry, consumer goods and technical objects in ionically dissolved form in the electrolyte.
- Rhodium is preferably present in the electrolyte in a concentration of 1 g / l - 10 g / l, more preferably 2 g / l - 7 g / l.
- the ruthenium concentration is preferably 1 g / l - 8 g / l, more preferably 2 g / l - 6 g / l. The amounts given are based on the amount of metal.
- the electrolyte according to the invention works particularly well in a very acidic pH range.
- the pH ranges are given below.
- Inorganic acids are preferably used to adjust the pH.
- organic acids such as sulfonic acids, can also be used for this purpose.
- the acids are very preferably selected from the group consisting of sulfuric acid, hydrochloric acid, methanesulfonic acid, toluenesulfonic acid, benzenesulfonic acid, sulfuric acid is very preferred.
- the black coloring of the electroplated rhodium-ruthenium layers is achieved by specifically inhibiting the deposition rate from the electroplating bath.
- One or more phosphonic acid derivatives are contained in the electrolyte according to the invention as an inhibitor and thus as a blackening additive for ruthenium in particular.
- the compounds aminophosphonic acid AP, 1-aminomethylphosphonic acid AMP, amino-tris (methylenephosphonic acid) ATMP, 1-aminoethylphosphonic acid AEP, 1-aminopropylphosphonic acid APP, (1-acetylamino-2,2,2-trichloroethyl) are preferably used.
- phosphonic acid (1-amino-1-phosphona-actyl) -phosphonic acid, (1-benzoylamino-2,2,2-trichloroethyl) -phosphonic acid, (1-benzoylamino-2,2-dichlorovinyl) -phosphonic acid , (4-chlorophenyl-hydroxymethyl) phosphonic acid, diethylenetriamine penta (methylenephosphonic acid) DTPMP, ethylenediamine tetra (methylenephosphonic acid) EDTMP, 1-hydroxyethane (1,1-di-phosphonic acid) HEDP, hydroxyethylamino-di (methy- lenphosphonic acid) HEM PA, hexamethylenediamine-tetra (methylphosphonic acid) HDTMP, ((hydroxymethyl-phosphonomethyl-amino) -methyl) -phasphonic acid, nitrilotris (methylenephosphonic acid) NTMP, 2,2,2-trichloro-1
- One or more compounds selected from the group consisting of amino-tris (methylenephosphonic acid) ATMP, diethylenetriamine-penta (methylenephosphonic acid) DTPMP, ethylenediamine-tetra (methylenephosphonic acid) EDTMP, 1-hydroxyethane (1, 1) are particularly preferably used -di-phosphonic acid) HEDP, hydroxyethyla- mino-di (methylenephosphonic acid) HEM PA, hexamethylenediamine-tetra (methylphosphonic acid) HDTMP, salts derived therefrom or condensates derived therefrom, or combinations thereof.
- Amino-tris (methylenephosphonic acid) ATMP, ethylenediamine-tetra (methylenephosphonic acid) EDTMP and 1-hydroxyethane (1,1-di-phosphonic acid) HEDP as well as salts derived therefrom are particularly well suited for the coating of decorative and consumer goods or condensates derived therefrom, or combinations thereof.
- the amount of phosphonic acids can be selected by the person skilled in the art. He will be based on the fact that the phosphonic acid (s) show a sufficient and proportional action within the meaning of the invention.
- the phosphonic acids are preferably used in an amount of 0.5-20 g / l in the electrolyte. 1-10 g / l are more preferred and 1-5 g / l are extremely preferred in this context.
- dicarboxylic acids which serve as a blackening additive for, in particular, rhodium deposits.
- Suitable dicarboxylic acids are all acids which are suitable to the person skilled in the art for the stated purpose, in particular those which are available inexpensively and dissolve to a sufficient extent in the aqueous, acidic electrolyte.
- These can be alkyl, alkenyldicarboxylic acids or aryldicarboxylic acids, the acid groups preferably being capable of forming an internal anhydride. It can be assumed that the two acid groups form a bidentate complex compound with the metal to be deposited, in particular rhodium, with a 5- or 6-ring being formed with the metal atom.
- aromatic dicarboxylic acids which can form a 5- or 6-membered ring with the complexed metal atom, and in particular those dicarboxylic acids selected from the group consisting of benzene, naphthol and indenedicarboxylic acids. These are extremely preferred phthalic acid and its salts
- the amount of dicarboxylic acids can be selected by the person skilled in the art. He will be guided by the fact that the dicarboxylic acid (s) show a sufficient and still proportionate effect within the meaning of the invention.
- the dicarboxylic acids are preferably used in an amount of 0.5-25 g / l in the electrolyte. 1-20 g / l are more preferred and 4-12 g / l are extremely preferred in this context.
- the present electrolyte is used in particular for the production of articles with an electrolytically deposited metal layer comprising the metals rhodium and ruthenium in a composition based on% by weight of 40:60 to 90:10 based on the sum of the weights of both metals, the metal layer an L * value of less than 65 and an a * value of -3 to +3 according to the Cielab color system (EN ISO 11664-4 - latest version on filing date) is used.
- the * value is advantageously from -7 to +7.
- the Cielab color system uses a three-dimensional color space in which the brightness value L * is perpendicular to the color plane (a *, b *).
- the most important properties of the L * a * b * color model include device independence and perception-relatedness, which means that colors are defined as they are perceived by a normal observer under standard lighting conditions, regardless of how they are generated or how they are reproduced will.
- the color model is standardized in EN ISO 11664-4 “Colorimetry - Part 4: CIE 1976 L * a * b * Color space”. Each color in the color space is defined by a color location with the Cartesian coordinates ⁇ L *, a *, b * ⁇ .
- the a * b * coordinate plane was constructed using the theory of opposite colors.
- the a * -axis describes the green or red part of a color, with negative values for green and positive values for red.
- the b * axis describes the blue or yellow component of a color, with negative values standing for blue and positive values for yellow.
- the composition of the electrolytically deposited metal layer can vary within the limits according to the claim. The person skilled in the art can control the amount, for example, through the content of the metals in the electrolyte. It will be based on the intended use of the deposited metal layer.
- the electrolytically deposited metal layer preferably has a composition of 55:45 to 90:10, very preferably 70:30 to 80:20 in relation to the metals Rh and Ru.
- the person skilled in the art can determine the thickness of the metal layer deposited with the electrolyte according to the invention on the basis of his particular requirement profile. As a rule, the thickness will be in the range of 0.5-1.5, preferably 0.25-0.75 and very preferably 0.1-0.5 ⁇ m. It should be mentioned that the electrolyte according to the invention can also be used to electrolytically deposit correspondingly thick layers without cracking in the metal deposit. This is very surprising, since in the case of anthracite / black layers, the brittle rhodium alone tends to form such cracks during electrolytic deposition.
- a thin cover layer of black rhodium is electrolytically applied to the metal layer deposited with the electrolyte according to the invention.
- a possibly thicker metal deposit, which is deposited with the electrolyte according to the invention, is therefore preferably used, subsequently as a sublayer for a further electrolytically deposited metal layer made of rhodium, the latter having a thickness of 0.005-1 ⁇ m, preferably 0.025-0.75 and completely preferably 0.05-0.5 pm.
- This final black rhodium layer can be carried out with known electrolytes (JP4154988A2, JP61104097A2, JP61084393A2, JP61084392A2; https: //ep.um- icore.com/de/ effort-3/ etcfinder/rhoduna-470-black-rhodium-elektrolyt-/ - Rho duna ® 470 Black). So it is possible to get articles with an even darker metal layer with a corresponding abrasion resistance and without cracking more cheaply, which was extremely surprising.
- the present invention therefore also relates to articles produced according to the invention with a sub-layer deposited according to the invention comprising the metals rhodium and ruthenium in a composition based on weight percent of 40:60 to 90:10 based on the sum of the weights of both metals and one Electrolytically deposited top layer made of before given exclusively black rhodium.
- the preferred L * value is below 50, more preferably below 47.
- the values for a * are from -2 to +3, very preferably between 0 to +2, extremely preferably 0-1.
- the Values for b * are from -1 to +6, very preferably from 1.5 to +4.
- the preferred characteristics given above for the lower layer also apply mutatis mutandis to the layer combination considered here.
- the metal deposits discussed here have a very high abrasion resistance, which is particularly advantageous for both jewelry and technical applications (e.g. as a contact material).
- Bosch-Weinmann test Bosch-Weinmann, AM Erichsen GmbH, publication 317 / D-V / 63, or Weinmann K., Park und Lack 65 (1959), pp 647-651
- the metal deposits are achieved with the electrolyte according to the invention Values below 2.0 pm / 1000 strokes. Even less than 1.0 pm / 1000 strokes and very advantageously less than 0.75 pm / 1000 strokes in the range of what is feasible are also advantageous.
- the composition of the rhodium-ruthenium layer is very preferably 50:50 to 80:20, extremely preferably 60:40 to 80:20.
- the present invention also relates to a method for the electrolytic deposition of a metal layer on a conductive material, in which: a) the conductive material as cathode is contacted with an aqueous, acidic electrolyte according to the invention; b) bringing an anode into contact with the electrolyte; and c) a sufficient current flow is established between the cathode and anode.
- the current density that is established between the cathode and the anode in the electrolyte during the deposition process can be selected by a person skilled in the art according to the degree of efficiency and quality of the deposition.
- the current density in the electrolyte is advantageously set to 0.1 to 50 A / dm 2 , depending on the application and the type of coating system. If necessary, the current densities can be increased or decreased by adjusting the system parameters such as the structure of the coating cell, flow rates, anode and cathode conditions, etc.
- the current density is extremely preferably 0.5-6 A / dm 2 .
- thin layer thicknesses in the range from 0.1 to 0.3 ⁇ m are produced in the rack operation.
- low current densities in the range from 0.25 to 5 A / dm 2 are used.
- Another application of low current densities is in drum or vibration technology, for example when coating contact pins.
- layers approx. 0.25 to 0.5 ⁇ m thick are applied in the current density range of 0.25 to 0.75 A / dm 2 .
- Layer thicknesses in the range from 0.1 to 1.0 ⁇ m are typically deposited in rack operation primarily for decorative applications with current densities in the range from 0.5 to 5 A / dm 2 .
- pulsed direct current can also be used.
- the current flow is interrupted for a certain period of time (pulse plating).
- pulse plating With reverse pulse plating, the polarity of the electrodes is changed so that the coating is partially anodically detached. In this way, the layer structure is controlled in constant alternation with cathodic pulses.
- simple pulse conditions such as 1 s current flow (ton) and 0.5 s pulse pause () at medium current densities leads to homogeneous coatings.
- Suitable substrate materials that are typically used here are copper base materials such as pure copper, brass or bronze, iron materials such as e.g. Iron or stainless steel, nickel, gold and silver.
- the substrate materials can also be multilayer systems that have been coated by electroplating or other coating technology. This concerns, for example, circuit board base material or ferrous materials that have been nickel-plated or copper-plated and then optionally gold-plated or coated with pre-silver.
- Another substrate material is e.g. a wax core that has been precoated with conductive silver lacquer (electroforming).
- the electrolyte according to the invention is of an acidic type.
- the pH value should be less than or equal to 2 and not fall below 0.2.
- the pH is preferably between 0.5 and 1.5.
- the pH of the electrolyte may fluctuate during electrolysis. In a preferred embodiment of the method in question, the specialist therefore proceeds in such a way that he controls the pH value during the electrolysis and, if necessary, adjusts it to the desired value.
- the acids used in the electrolyte are advantageously used.
- the temperature that prevails during the deposition of the Rhodium-ruthenium-metal layer can be selected as desired by the person skilled in the art.
- a temperature of 20 ° C to 65 ° C preferably 30 ° C to 60 ° C and particularly preferably 40 ° C to 55 ° C.
- insoluble anodes can preferably be used.
- the insoluble anodes used are preferably those made of a material selected from the group consisting of platinum-coated titanium, graphite, mixed metal oxides, glassy carbon anodes and special carbon material (“Diamond Like Carbon” DLC) or combinations of these anodes.
- Insoluble anodes made of platinum-coated titanium or titanium coated with mixed metal oxides are advantageous, the mixed metal oxides preferably being selected from iridium oxide, ruthenium oxide, tantalum oxide and mixtures thereof.
- Iridium transition metal oxide mixed oxide anodes particularly preferably mixed oxide anodes made of iridium-ruthenium mixed oxide, iridium-ruthenium-titanium mixed oxide or iridium-tantalum mixed oxide, are also advantageously used for carrying out the invention. More can be found at Cobley, A.J. et al. (The use uf insoluble anodes in Acid Sulphate Copper Electrodeposition Solutions, Trans IMF, 2001, 79 (3), pp. 1 13 and 114).
- This aftertreatment known to the person skilled in the art, can make the rhodium-ruthenium layer or the sequence of layers discussed here even more abrasion-resistant and blacker. A tendency to crack formation can also be counteracted in this way.
- the article manufactured according to the invention is introduced into the aftertreatment solution and connected anodically (stainless steel cathode).
- Example 1 The invention is described in the following examples.
- Example 1 Example 1 :
- an electrolyte according to the invention was used which, in addition to 1.5 g / l rhodium [dirhodium trisulfate], also 0.5 g / l ruthenium as [Ru 2 NCl 8 (H 2 0) 2 ] containing 3, 4 g / l ethylenediamine min-tetra (methylenephosphonic acid) EDTMP, and 11 g / l potassium hydrogen phthalate as an ink additive in water, and 10 g / l sulfuric acid.
- the temperature of the electrolyte was 45 ° C, the pH around 1.0.
- the color values can be seen on the attached diagrams (Fig. 1 - 3).
- the electrolyte according to the invention is referred to as RA Black.
- Ruthuna ® 490 and Ru 479 are black ruthenium electrolytes common on the market.
- Rhoduna ® 470 and 471 are black rhodium electrolytes commonly used on the market (https://ep.umicore.com/en/products/productfinder).
- an inventive electrolyte was used which, in addition to 1.0 g / l rhodium [dirhodium trisulphate], also 1.0 g / l ruthenium as [Ru 2 NCl 8 (H 2 0) 2 ] 3 , 5 g / l ethylenediamine tetra (methylenephosphonic acid) EDTMP and 7.5 g / l potassium hydrogen phthalate as blackening additive in water and 10 g / l sulfuric acid.
- the temperature of the electrolyte was 45 ° C, the electrolyte had a pH of 1.2.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17/433,215 US11421335B2 (en) | 2019-04-08 | 2020-04-07 | Electrolyte for the deposition of anthracite/black rhodium/ruthenium alloy layers |
EP20717644.7A EP3953502A1 (de) | 2019-04-08 | 2020-04-07 | Elektrolyt zur abscheidung von anthrazit/schwarzen rhodium/ruthenium legierungsschichten |
JP2021559599A JP2022528163A (ja) | 2019-04-08 | 2020-04-07 | 無煙炭/黒色ロジウム/ルテニウム合金層の析出のための電解質 |
KR1020217036505A KR20210150520A (ko) | 2019-04-08 | 2020-04-07 | 무연탄/흑색 로듐/루테늄 합금 층을 전착시키기 위한 전해질 |
CN202080018279.XA CN113508195A (zh) | 2019-04-08 | 2020-04-07 | 用于沉积深灰色/黑色铑/钌合金层的电解质 |
BR112021020229A BR112021020229A2 (pt) | 2019-04-08 | 2020-04-07 | Eletrólito para a deposição de camadas de liga de ródio/rutênio de antracito/negro |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102019109188.8 | 2019-04-08 | ||
DE102019109188.8A DE102019109188B4 (de) | 2019-04-08 | 2019-04-08 | Verwendung eines Elektrolyten zur Abscheidung von anthrazit/schwarzen Rhodium/Ruthenium Legierungsschichten |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2020208004A1 true WO2020208004A1 (de) | 2020-10-15 |
Family
ID=70224387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2020/059865 WO2020208004A1 (de) | 2019-04-08 | 2020-04-07 | Elektrolyt zur abscheidung von anthrazit/schwarzen rhodium/ruthenium legierungsschichten |
Country Status (9)
Country | Link |
---|---|
US (1) | US11421335B2 (de) |
EP (1) | EP3953502A1 (de) |
JP (1) | JP2022528163A (de) |
KR (1) | KR20210150520A (de) |
CN (1) | CN113508195A (de) |
BR (1) | BR112021020229A2 (de) |
DE (1) | DE102019109188B4 (de) |
TW (1) | TWI825262B (de) |
WO (1) | WO2020208004A1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102020131371B4 (de) * | 2020-11-26 | 2024-08-08 | Umicore Galvanotechnik Gmbh | Verwendung eines Elektrolyten zur Erzeugung einer Rutheniumlegierungsschicht |
Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1959907A1 (de) * | 1968-11-28 | 1970-06-18 | Johnson Matthey Co Ltd | Rutheniumkomplex und seine Verwendung bei der Elektroplattierung |
DE2429275A1 (de) | 1973-06-21 | 1975-01-16 | Oxy Metal Industries Corp | Elektrolyt fuer die abscheidung von rhodium-rtheniumlegierungen |
JPS57101686A (en) * | 1980-12-17 | 1982-06-24 | Seiko Instr & Electronics Ltd | Black alloy plating liquid |
US4402802A (en) * | 1981-01-03 | 1983-09-06 | Dequssa Aktiengesellschaft | Electrolytic bath for the deposition of rhodium coatings |
EP0171091A2 (de) | 1981-03-30 | 1986-02-12 | Nippon Mining Company Limited | Verfahren zur Herstellung eines mit Rhodium bekleideten Gegenstandes von schwarzer Farbe |
JPS6184392A (ja) | 1984-09-29 | 1986-04-28 | Iwasaki Mekki:Kk | 外装部品 |
JPS6184393A (ja) | 1984-09-29 | 1986-04-28 | Iwasaki Mekki:Kk | 表面処理法 |
JPS61104097A (ja) | 1984-10-23 | 1986-05-22 | Iwasaki Mekki:Kk | 外装部品 |
JPH04154988A (ja) | 1990-10-16 | 1992-05-27 | Seiko Epson Corp | 装飾部材の製造方法 |
US20080226545A1 (en) | 2007-02-27 | 2008-09-18 | Ivor Bull | Copper CHA Zeolinte Catalysts |
WO2008116545A1 (en) | 2007-03-28 | 2008-10-02 | Umicore Galvanotechnik Gmbh | Electrolyte and method for depositing decorative and technical layers of black ruthenium |
WO2010057573A1 (en) | 2008-11-21 | 2010-05-27 | Umicore Galvanotechnik Gmbh | Noble metal-containing layer sequence for decorative articles |
WO2012171856A2 (en) | 2011-06-17 | 2012-12-20 | Umicore Galvanotechnik Gmbh | Electrolyte and its use for the deposition of black ruthenium coatings and coatings obtained in this way |
DE102011115802A1 (de) | 2011-10-12 | 2013-04-18 | C. Hafner Gmbh + Co. Kg | Verfahren zur Korrosionsschutzbehandlung eines Werkstücks aus einem Aluminiumwerkstoff, insbesondere aus einer Aluminiumknetlegierung |
WO2015173186A1 (de) | 2014-05-12 | 2015-11-19 | Albert-Ludwigs-Universität Freiburg | Verfahren zur beschichtung von oberflächen mit nanostrukturen, nach dem verfahren hergestelltes bauteil und verwendung des bauteils |
WO2018142430A1 (en) * | 2017-01-31 | 2018-08-09 | Valmet Plating S.R.L. | A process of galvanic deposition for obtaining coloured ruthenium deposits and/or of its alloys |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH512590A (fr) * | 1970-03-20 | 1971-09-15 | Sel Rex Corp | Procédé pour le dépôt électrolytique d'alliages de ruthénium, bain aqueux pour la mise en oeuvre de ce procédé, et article revêtu d'un alliage de ruthénium obtenu par ce procédé |
US3890210A (en) | 1973-06-21 | 1975-06-17 | Oxy Metal Industries Corp | Method and electrolyte for electroplating rhodium-rhenium alloys |
US4477318A (en) * | 1980-11-10 | 1984-10-16 | Omi International Corporation | Trivalent chromium electrolyte and process employing metal ion reducing agents |
CN101113527B (zh) * | 2006-07-28 | 2011-01-12 | 比亚迪股份有限公司 | 一种电镀产品及其制备方法 |
TW201311709A (zh) * | 2011-05-31 | 2013-03-16 | Merck Patent Gmbh | 電解質配方 |
EP3128592B1 (de) * | 2014-03-31 | 2021-03-17 | Toray Industries, Inc. | Polymerelektrolytzuammensetzung, polymerelektrolytmembran damit, mit katalysatorschicht beschichtete elektrolytmembran, membranelektrodenanordnung und feststoffpolymerbrennstoffzelle |
CN105002496B (zh) * | 2015-07-28 | 2017-11-28 | 灵宝华鑫铜箔有限责任公司 | 一种电解铜箔黑色表面处理方法 |
-
2019
- 2019-04-08 DE DE102019109188.8A patent/DE102019109188B4/de active Active
-
2020
- 2020-01-22 TW TW109102463A patent/TWI825262B/zh active
- 2020-04-07 JP JP2021559599A patent/JP2022528163A/ja active Pending
- 2020-04-07 BR BR112021020229A patent/BR112021020229A2/pt unknown
- 2020-04-07 US US17/433,215 patent/US11421335B2/en active Active
- 2020-04-07 EP EP20717644.7A patent/EP3953502A1/de active Pending
- 2020-04-07 CN CN202080018279.XA patent/CN113508195A/zh active Pending
- 2020-04-07 WO PCT/EP2020/059865 patent/WO2020208004A1/de unknown
- 2020-04-07 KR KR1020217036505A patent/KR20210150520A/ko unknown
Patent Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1959907A1 (de) * | 1968-11-28 | 1970-06-18 | Johnson Matthey Co Ltd | Rutheniumkomplex und seine Verwendung bei der Elektroplattierung |
DE2429275A1 (de) | 1973-06-21 | 1975-01-16 | Oxy Metal Industries Corp | Elektrolyt fuer die abscheidung von rhodium-rtheniumlegierungen |
JPS57101686A (en) * | 1980-12-17 | 1982-06-24 | Seiko Instr & Electronics Ltd | Black alloy plating liquid |
US4402802A (en) * | 1981-01-03 | 1983-09-06 | Dequssa Aktiengesellschaft | Electrolytic bath for the deposition of rhodium coatings |
EP0171091B1 (de) | 1981-03-30 | 1989-12-06 | Nippon Mining Company Limited | Verfahren zur Herstellung eines mit Rhodium bekleideten Gegenstandes von schwarzer Farbe |
EP0171091A2 (de) | 1981-03-30 | 1986-02-12 | Nippon Mining Company Limited | Verfahren zur Herstellung eines mit Rhodium bekleideten Gegenstandes von schwarzer Farbe |
JPS6184392A (ja) | 1984-09-29 | 1986-04-28 | Iwasaki Mekki:Kk | 外装部品 |
JPS6184393A (ja) | 1984-09-29 | 1986-04-28 | Iwasaki Mekki:Kk | 表面処理法 |
JPS61104097A (ja) | 1984-10-23 | 1986-05-22 | Iwasaki Mekki:Kk | 外装部品 |
JPH04154988A (ja) | 1990-10-16 | 1992-05-27 | Seiko Epson Corp | 装飾部材の製造方法 |
US20080226545A1 (en) | 2007-02-27 | 2008-09-18 | Ivor Bull | Copper CHA Zeolinte Catalysts |
WO2008116545A1 (en) | 2007-03-28 | 2008-10-02 | Umicore Galvanotechnik Gmbh | Electrolyte and method for depositing decorative and technical layers of black ruthenium |
WO2010057573A1 (en) | 2008-11-21 | 2010-05-27 | Umicore Galvanotechnik Gmbh | Noble metal-containing layer sequence for decorative articles |
WO2012171856A2 (en) | 2011-06-17 | 2012-12-20 | Umicore Galvanotechnik Gmbh | Electrolyte and its use for the deposition of black ruthenium coatings and coatings obtained in this way |
DE102011115802A1 (de) | 2011-10-12 | 2013-04-18 | C. Hafner Gmbh + Co. Kg | Verfahren zur Korrosionsschutzbehandlung eines Werkstücks aus einem Aluminiumwerkstoff, insbesondere aus einer Aluminiumknetlegierung |
WO2015173186A1 (de) | 2014-05-12 | 2015-11-19 | Albert-Ludwigs-Universität Freiburg | Verfahren zur beschichtung von oberflächen mit nanostrukturen, nach dem verfahren hergestelltes bauteil und verwendung des bauteils |
WO2018142430A1 (en) * | 2017-01-31 | 2018-08-09 | Valmet Plating S.R.L. | A process of galvanic deposition for obtaining coloured ruthenium deposits and/or of its alloys |
Non-Patent Citations (2)
Title |
---|
COBLEY, A.J. ET AL., THE USE UF INSOLUBLE ANODES IN ACID SULPHATE COPPER ELECTRODEPOSITION SOLUTIONS, TRANS IMF, vol. 79, no. 3, 2001, pages 113 |
WEINMANN K., FARBE UND LACK, vol. 65, 1959, pages 647 - 651 |
Also Published As
Publication number | Publication date |
---|---|
CN113508195A (zh) | 2021-10-15 |
DE102019109188B4 (de) | 2022-08-11 |
US11421335B2 (en) | 2022-08-23 |
EP3953502A1 (de) | 2022-02-16 |
BR112021020229A2 (pt) | 2021-12-07 |
US20220136124A1 (en) | 2022-05-05 |
TW202037763A (zh) | 2020-10-16 |
DE102019109188A1 (de) | 2020-10-08 |
TWI825262B (zh) | 2023-12-11 |
KR20210150520A (ko) | 2021-12-10 |
JP2022528163A (ja) | 2022-06-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE102008050135B4 (de) | Verfahren zur Abscheidung von Platin-Rhodiumschichten mit verbesserter Helligkeit | |
EP2116634B1 (de) | Modifizierter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten | |
AT514818B1 (de) | Abscheidung von Cu, Sn, Zn-Beschichtungen auf metallischen Substraten | |
DE860300C (de) | Kupfer- und Zinnsalze enthaltender Elektrolyt zur Erzeugung von Kupfer-Zinn-Legierungsueberzuegen und Verfahren zum Erzeugen dieser UEberzuege | |
DE102019109188B4 (de) | Verwendung eines Elektrolyten zur Abscheidung von anthrazit/schwarzen Rhodium/Ruthenium Legierungsschichten | |
AT514427B1 (de) | Elektrolytbad sowie damit erhältliche Objekte bzw. Artikel | |
DE2114119A1 (de) | Verfahren zur elektrolytischen Abscheidung von Ruthenium und Elektrolysebad zur Durchfuehrung dieses Verfahrens | |
EP1975282B1 (de) | Elektolyt und Verfahren zur Abscheidung von dekorativen und technischen Schichten aus Schwarz-Ruthenium | |
EP3067444B1 (de) | Abscheidung von dekorativen palladium-eisen-legierungsbeschichtungen auf metallischen substanzen | |
DE2537065A1 (de) | Verfahren zur elektrolytischen abscheidung von legierungen von nickel, kobalt oder nickel und kobalt mit eisen | |
AT523922B1 (de) | Elektrolytbad für Palladium-Ruthenium-Beschichtungen | |
EP0126921B1 (de) | Bad für die galvanische Abscheidung von Goldlegierungen | |
WO2022122989A1 (de) | Silber-bismut-elektrolyt zur abscheidung von hartsilberschichten | |
DE2511119A1 (de) | Zusatzmittel fuer die elektroplattierung | |
DE102020131371B4 (de) | Verwendung eines Elektrolyten zur Erzeugung einer Rutheniumlegierungsschicht | |
WO2004027120A1 (de) | Dunkle schichten | |
EP0194432A1 (de) | Bad zur galvanischen Abscheidung von Gold/Zinn-Legierungsüberzügen | |
EP0698676B1 (de) | Bad zum galvanischen Abscheiden von Kupfer-Zinn-Legierungen | |
DE815882C (de) | Verfahren zur Erzeugung von Niederschlaegen auf Metallflaechen durch Elektrolyse | |
DE102021107826A1 (de) | Platinelektrolyt | |
DE3347594A1 (de) | Bad zur galvanischen abscheidung einer verschleissfesten goldlegierung und verfahren zur abscheidung einer verschleissfesten goldlegierung unter verwendung dieses bades | |
CN102732920A (zh) | 18开3n金合金的制备方法 | |
DE4040526A1 (de) | Bad zur galvanischen abscheidung von goldlegierungen | |
DE1793456B (de) | Spiro bi 1,1 3 methyl I selena 2 oxa tief Delta 3,4 cyclohexen 5 on sei ne Herstellung und ein dieses enthalten des Glanz Kupfer Galvanisierbad |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 20717644 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2021559599 Country of ref document: JP Kind code of ref document: A |
|
REG | Reference to national code |
Ref country code: BR Ref legal event code: B01A Ref document number: 112021020229 Country of ref document: BR |
|
ENP | Entry into the national phase |
Ref document number: 20217036505 Country of ref document: KR Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 2020717644 Country of ref document: EP Effective date: 20211108 |
|
ENP | Entry into the national phase |
Ref document number: 112021020229 Country of ref document: BR Kind code of ref document: A2 Effective date: 20211007 |