WO2020100381A1 - 基板処理装置及び基板搬送方法 - Google Patents
基板処理装置及び基板搬送方法 Download PDFInfo
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- WO2020100381A1 WO2020100381A1 PCT/JP2019/034577 JP2019034577W WO2020100381A1 WO 2020100381 A1 WO2020100381 A1 WO 2020100381A1 JP 2019034577 W JP2019034577 W JP 2019034577W WO 2020100381 A1 WO2020100381 A1 WO 2020100381A1
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- substrate
- wafer
- module
- transfer mechanism
- load lock
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Definitions
- the present disclosure relates to a substrate processing apparatus and a substrate transfer method.
- Patent Document 1 discloses a substrate transfer device having a substrate transfer unit for transferring a substrate to be processed therein. According to the technique described in Patent Document 1, the substrate transfer unit transfers the substrates to be processed one by one between the various modules connected to the substrate transfer device.
- the technology according to the present disclosure appropriately transfers and conveys substrates in the substrate conveyance device to improve throughput.
- One aspect of the present disclosure is to provide a load port configured to arrange a substrate housing container in which at least one substrate is housed in an atmospheric portion where a substrate is processed under atmospheric pressure, and a decompressed atmosphere with the atmospheric portion.
- a load lock chamber configured to transfer the substrate to and from a decompression unit for processing the substrate, a processing module that processes the substrate in the atmospheric portion, the load port, the load lock chamber, and the load module.
- a substrate transfer mechanism that transfers a substrate between the processing modules, and a control unit that controls the operation of the substrate transfer mechanism.
- the substrate transfer mechanism includes a plurality of substrate holding units, and each substrate holding unit.
- control unit controls the first substrate holding unit between the load port and the processing module.
- the second substrate holder controls the substrate transfer mechanism to transfer the substrate between the load lock chamber and the processing module, and the processing module simultaneously processes a plurality of substrates. Controls the substrate transfer mechanism such that the plurality of substrate holders simultaneously transfer the plurality of substrates among the load port, the load lock chamber, and the processing module.
- various processing is performed such that the inside of a processing module accommodating a semiconductor wafer (substrate; sometimes referred to as a “wafer” hereinafter) is depressurized and the wafer is subjected to predetermined processing.
- a treatment step is being performed.
- These processing steps are performed using a wafer processing apparatus equipped with a plurality of processing modules.
- the wafer processing apparatus has, for example, a configuration in which a decompression unit that processes and transfers wafers in a reduced pressure atmosphere and an atmospheric unit that processes and transfers wafers in an atmospheric atmosphere are connected via a load lock module. is doing.
- the decompression unit is provided with the plurality of processing modules described above. Further, a loader module or the like having a wafer transfer mechanism for transferring a wafer is provided in the atmospheric portion.
- a so-called two-wafer processing module that can process a plurality of wafers, for example, two wafers in a set, may be used. Since the two-wafer processing module can process two wafers at the same time, it is possible to reduce the time required for wafer processing and thereby improve the throughput.
- the wafer transfer mechanism conventionally transfers one wafer at a time.
- wafers are transferred one by one.
- the wafer transfer mechanism transfers one wafer at a time. Therefore, the wafer transfer mechanism needs to access the load lock module a plurality of times.
- the technology according to the present disclosure appropriately delivers and transfers the wafer in the wafer processing apparatus to improve the throughput.
- the wafer transfer mechanism is configured to be able to transfer a plurality of wafers at the same time, and the number of wafers simultaneously transferred by the wafer transfer mechanism is determined according to the situation to optimize the operation.
- FIG. 1 is a plan view showing the outline of the configuration of a wafer processing apparatus 1 as a substrate processing apparatus according to this embodiment.
- the wafer processing apparatus 1 includes various processing modules that perform COR processing, PHT processing, CST processing, and orientation processing on the wafer W will be described as an example.
- the module configuration of the wafer processing apparatus 1 is not limited to this, and can be arbitrarily selected.
- the wafer processing apparatus 1 has an atmosphere unit 10, a pressure reducing unit 11, and load lock modules 20a and 20b.
- the atmosphere unit 10 and the pressure reducing unit 11 are integrated via the load lock modules 20a and 20b. It is connected to the.
- the atmospheric portion 10 is configured to process the wafer W under atmospheric pressure.
- the atmospheric portion 10 includes an atmospheric pressure processing module, such as a CST module 32 and an orienter module 33, which performs some processing on the wafer W under an atmospheric pressure atmosphere.
- the decompression unit 11 is configured to process the wafer W under reduced pressure.
- the depressurization unit 11 includes a depressurized processing module that performs some processing on the wafer W under a depressurized atmosphere, such as a COR module 61 and a PHT module 62.
- the load lock module 20a as the load lock chamber transfers the wafer W transferred from the loader module 30 described later in the atmosphere section 10 to the transfer module 60 described below in the decompression section 11, so that the wafer W is transferred to the transfer module 60. Hold temporarily.
- the load lock module 20a has an upper stocker 21a and a lower stocker 22a as a substrate mounting portion that holds two wafers W in the vertical direction. Each stocker 21a, 22a is configured to mount one wafer W.
- the load lock module 20a is connected to the loader module 30 via a gate 24a provided with a gate valve 23a. Further, the load lock module 20a is connected to the transfer module 60 via a gate 26a provided with a gate valve 25a.
- the load lock module 20b has the same configuration as the load lock module 20a. That is, the load lock module 20b has an upper stocker 21b, a lower stocker 22b, a gate valve 23b and a gate 24b on the loader module 30 side, and a gate valve 25b and a gate 26b on the transfer module 60 side.
- load lock modules 20a and 20b are not limited to this embodiment, and can be set arbitrarily.
- a load port 31 having a mounting table, a CST module (atmospheric pressure processing module) 32 as a cooling module for cooling the wafer W, and an orienter module (atmospheric pressure processing module) for adjusting the horizontal direction of the wafer W And 33.
- the number and arrangement of the load port 31, the CST module 32, and the orienter module 33 are not limited to those in this embodiment, and can be arbitrarily designed.
- the orienter module 33 adjusts the horizontal direction of the wafer W from the reference position (for example, the notch position).
- FIG. 3 is a perspective view schematically showing the outline of the configuration of the wafer transfer mechanism 40.
- the wafer transfer mechanism 40 includes an arm portion 41, a pick portion 42 as a substrate holding portion having a wafer holding surface for holding the wafer W, which is connected to a tip of the arm portion 41, and an arm. It has a turntable 43 that rotatably supports the unit 41, and a turntable 44 that mounts the turntable 43. Further, the arm portion 41 is connected to the rotary table 43 via an elevating mechanism 45 capable of elevating the held wafer W in the height direction.
- the arm portion 41 has a first arm 41a whose one end is rotatably connected to the lifting mechanism 45, a second arm 41b whose one end is rotatably connected to the other end of the first arm 41a, and One end is rotatably connected to the other end of the 2 arm 41b, and one end is rotatably connected to the other end of the second arm 41b, and a third arm 41c that is connected to an upper pick 42a described later. It has the 4th arm 41d connected to the below-mentioned lower pick 42b. The third arm 41c and the fourth arm 41d are independently rotatably connected to the other end of the second arm 41b.
- the pick part 42 is rotatably connected to the other end of the third arm 41c, and is rotatably connected to the fork-shaped upper pick (substrate holding part) 42a and the other end of the fourth arm 41d.
- the pick unit 42 mounts one wafer W on the upper surface of the upper pick 42a and further mounts one wafer W on the upper surface of the lower pick 42b. That is, each of the picks 42a and 42b is configured to hold one wafer W, and the wafer transfer mechanism 40 is configured to hold the two wafers W in multiple stages by the pick unit 42.
- the wafer transfer mechanism 40 is expanded and contracted between the arm portion 41 and the rotation table 43 to rotate between the hoop 100, the load lock modules 20a and 20b, the CST module 32, and the orienter module 33 placed on the load port 31.
- the wafer W can be transferred.
- the decompression unit 11 includes a transfer module 60 that conveys the wafer W under a reduced pressure atmosphere, a COR module (decompression treatment module) 61 that performs a COR process on the wafer W conveyed from the transfer module 60 under a reduced pressure atmosphere, It has a PHT module (reduced pressure treatment module) 62 as a heating module for performing PHT treatment in a reduced pressure atmosphere.
- the transfer module 60 is provided with a plurality of COR modules 61 and a plurality of PHT modules 62, for example, three each.
- the transfer module 60 is connected to the load lock modules 20a and 20b via the gate valves 25a and 25b.
- the transfer module 60 is composed of a rectangular housing, and transfers the wafer W loaded into the load lock module 20a to one COR module 61, sequentially performs COR processing and PHT processing, and then transfers the wafer W through the load lock module 20b. And carry it out to the atmosphere section 10.
- the COR module 61 performs the COR processing by placing the wafers W side by side on the two stages 63a and 63b. Further, the COR module 61 is connected to the transfer module 60 via a gate 65 provided with a gate valve 64.
- the PHT module 62 carries the PHT process by placing the wafers W side by side on the two stages 66a and 66b. Further, the PHT module 62 is connected to the transfer module 60 via a gate 68 provided with a gate valve 67.
- a wafer transfer mechanism 70 that transfers the wafer W is provided inside the transfer module 60.
- the wafer transfer mechanism 70 includes arm portions 71a and 71b that move while holding two wafers W in multiple stages, pick portions 72a and 72b that hold the wafer W at the tips of the arm portions 71a and 71b, and arm portions 71a and 71b. It has a rotary table 73 for rotatably supporting the rotary table 73 and a rotary table 74 on which the rotary table 73 is mounted.
- a guide rail 75 extending in the longitudinal direction of the transfer module 60 is provided inside the transfer module 60.
- the rotary mounting table 74 is provided on the guide rail 75, and the wafer transfer mechanism 70 is movable along the guide rail 75.
- the pick parts 72a and 72b mount one wafer W on the upper surface of the upper pick and further mount one wafer W on the upper surface of the lower pick (between the upper pick and the lower pick). That is, each of the pick units 72a and 72b can hold two wafers W in multiple stages, and the wafer transfer mechanism 70 can simultaneously hold a total of four wafers W.
- the pick section 72a receives the wafer W held by the upper stocker 21a and the lower stocker 22a in the load lock module 20a, and transfers it to the COR module 61.
- the wafer W that has been subjected to the COR process is held by the pick unit 72 a and transferred to the PHT module 62.
- the wafer W that has been subjected to the PHT process is held by the pick unit 72b and is carried out to the load lock module 20b.
- the wafers W held in the respective modules are separated by the distance d2 (for example, 10 mm) in the atmosphere portion 10 and the distance d1 (for example, 12 mm) in the depressurizing portion 11. Is retained.
- the interval d1 of 12 mm and the interval d2 of 10 mm are examples, and any interval can be set.
- the distance d1 and the distance d2 are different from each other due to the restriction on the device configuration.
- the wafer processing apparatus 1 described above is provided with the control unit 80.
- the controller 80 conveys the wafer W between the load port 31 and the atmospheric pressure processing module, and the lower pick 42b. Is configured to control the wafer transfer mechanism 40 so as to transfer the wafer W between the load lock 20a and the atmospheric pressure processing module.
- the case where the wafers W are processed one by one includes, for example, that the atmospheric pressure processing module is designed to process the wafers one by one.
- the case of processing the wafers W one by one includes, for example, that the processing module under the atmospheric pressure can process a plurality of wafers at the same time, but the sequence is set to process one wafer at a time.
- the control unit 80 causes the pick unit 42 to simultaneously process the plurality of wafers W between the load port 31, the loader module 30, and the atmospheric pressure processing module.
- the wafer transfer mechanism 40 is controlled to transfer.
- the case of simultaneously processing a plurality of wafers W includes, for example, that the atmospheric pressure processing module has a specification capable of simultaneously processing a plurality of wafers.
- the controller 80 controls the wafer transfer mechanism 40 so that the wafer transfer mechanism 40 transfers the wafers W to and from the load lock modules 20a and 20b one by one.
- the controller 80 controls the wafer transfer mechanism 40 to receive the wafers W in the order of the lower pick 42b and the upper pick 42a.
- the controller 80 receives the wafers W from the lower pick 42b toward the upper pick 42a so that the identification numbers described below are in ascending order.
- the transport mechanism 40 is controlled. As will be described later, when the wafer transfer mechanism 40 receives the wafers W one by one, the control unit 80 sucks and holds the wafer W by one pick unit 42, and then starts sucking the wafer W by another pick unit 42.
- the wafer transfer mechanism 40 is controlled so as to do so.
- the control unit 80 is, for example, a computer and has a program storage unit (not shown).
- the program storage unit stores a program for controlling the processing of the wafer W in the wafer processing apparatus 1. Further, the program storage unit stores a control program for controlling various processes by the processor and a program for transferring the wafer W to each component of the wafer processing apparatus 1 according to the processing conditions, that is, a transfer recipe. Has been done.
- the program may be recorded in a computer-readable storage medium, and may be installed in the control unit 80 from the storage medium.
- the wafer processing apparatus 1 may be provided with a control unit (not shown) individually for each module. That is, for example, a transfer control unit that controls the operation of the wafer transfer mechanism 40 may be further provided.
- the orienter module 33, the COR module 61, the PHT module 62, the CST module 32, and the load lock modules 20a and 20b may be referred to as “processing modules”. Further, the wafer transfer mechanism 40 and the wafer transfer mechanism 70 may be referred to as a “transfer module”.
- FIG. 4 is an explanatory diagram showing an example of a processing route of wafer processing in the wafer processing apparatus 1.
- the hoop 100 containing a plurality of wafers W is loaded into the load port 31 (position P1 in FIG. 4).
- the controller 80 takes out the wafer W from the hoop 100 and controls the wafer processing apparatus 1 to perform a series of wafer processing steps.
- the wafer transfer mechanism 40 accesses the FOUP 100, and the wafer W is taken out from the FOUP 100.
- the wafer W carried out from the hoop 100 is first carried to the orienter module 33 by the wafer carrying mechanism 40 (position P2 in FIG. 4).
- the orientation of the wafer W from the reference position (for example, notch position) in the horizontal direction is adjusted (orientation process).
- the wafer W whose horizontal direction has been adjusted is loaded into the load lock module 20a by the wafer transfer mechanism 40 (position P3 in FIG. 4).
- the wafer W is taken out by the pick section 72a of the wafer transfer mechanism 70 and loaded into the transfer module 60 from the load lock module 20a.
- the gate valve 64 is opened, and the pick portion 72a holding the wafer W enters the COR module 61. Then, the wafer W is placed on the stages 63a and 63b from the pick portion 72a (position P4 in FIG. 4).
- the gate valve 64 is closed, and the COR processing is performed on the wafer W in the COR module 61.
- the wafer W is transferred from the stages 63a and 63b to the pick unit 72a, and the pick unit 72a holds the wafer W.
- the gate valve 67 is opened, and the pick portion 72a holding the wafer W enters the PHT module 62. Then, the wafer W is placed on the stages 66a and 66b from the pick section 72a (position P5 in FIG. 4). Then, the gate valve 67 is closed and the PHT process is performed on the wafer W.
- next wafer W is taken out from the hoop 100, carried into the load lock module 20a via the orienter module 33, and further carried to the COR module 61 via the transfer module 60. Then, the COR process is performed on the next wafer W.
- the wafer W is transferred from the stages 66a and 66b to the pick section 72b, and the pick section 72b holds the wafer W.
- the gate valve 25b is opened, and the wafer W is loaded into the load lock module 20b by the wafer transfer mechanism 70 (position P6 in FIG. 4).
- the inside of the load lock module 20b is sealed and opened to the atmosphere.
- the gate valve 23b is opened, the wafer W is stored in the CST module 32 by the wafer transfer mechanism 40 (position P7 in FIG. 4), and the CST process for one minute is performed, for example.
- next wafer W after the COR processing is transferred to the PHT module 62 by the wafer transfer mechanism 70, and the PHT processing is performed. Further, the next wafer W is taken out from the hoop 100, carried into the load lock module 20a via the orienter module 33, and further carried to the COR module 61 via the transfer module 60. Then, the COR process is further performed on the next wafer W.
- the wafer W is accommodated in the hoop 100 placed on the load port 31 by the wafer transfer mechanism 40 (position P1 in FIG. 4). Then, the wafer processing for all the wafers W accommodated in the FOUP 100 is completed and the wafers W are in a standby state until they are collected in the FOUP 100.
- the wafer processing apparatus 1 When the wafer processing apparatus 1 is provided with a plurality of COR modules 61 and PHT modules 62 as shown in FIG. 1, the plurality of COR modules 61 and PHT modules 62 can be operated in parallel. That is, for example, the wafer W, the next wafer W, and the next wafer W can be simultaneously subjected to the COR processing and the PHT processing.
- the wafer W can transfer and process two or more wafers W at the same time. That is, in the wafer transfer mechanism 40, the wafer transfer mechanism 70, the load lock modules 20a and 20b, the COR module 61, the PHT module 62, and the CST module 32 excluding the orienter module 33, a plurality of wafers W are simultaneously loaded into these modules. It can be housed and processed.
- (A) First transfer pattern When the atmospheric pressure processing module processes the wafers W one by one, the wafer W is transferred between the atmospheric pressure processing module, the load lock modules 20a and 20b, and the load port 31. Refers to the pattern.
- FIG. 5 is an explanatory diagram showing an example of the transfer pattern of the wafer W according to the present embodiment shown below.
- FIG. 5 a case where two wafers W1 and W2 are transferred and processed will be described as an example. Further, in FIG. 5, both the first transfer pattern ((A) in FIG. 5) and the second transfer pattern ((B) in FIG. 5) are performed by the loader module 30.
- the vertical axis “t” indicates the time axis in the wafer processing apparatus 1.
- "FOUP100” shown on the horizontal axis is the hoop 100
- "Pick42a” and “Pick42b” are the upper pick 42a and the lower pick 42b, respectively
- "ORT33” is the orienter module 33
- "UST21a” and “LST22a” are the load lock modules, respectively.
- the "COR61” is the COR module 61
- the "PHT62” is the PHT module 62
- the "CST32" Indicates the CST module 32.
- the post-decompression processing module eg, COR61 and PHT62
- the atmospheric processing module eg, ORT33
- the upper pick 42a and the lower pick 42b are controlled by the control unit 80 so as to share the wafer W transfer processing (for example, the transfer processing from the hoop 100 to the load lock module 20a) in the atmosphere portion 10. .. That is, for example, the upper pick 42a serving as the first substrate holding unit is controlled so as to carry the wafer W between the hoop 100 and the orienter module 33. Further, for example, the lower pick 42b serving as the second substrate holding unit is controlled so as to carry the wafer W between the orienter module 33 and the load lock module 20a.
- the upper pick 42a holds the wafer W1 in the hoop 100, and the wafer W1 Are loaded into the orienter module 33 (time t1 in FIG. 5). Then, while the orienter module 33 is performing the orienting process on the wafer W1, the upper pick 42a holds the wafer W2 in the hoop 100 and carries the wafer W2 toward the orienter module 33 (see FIG. 5). Time t2). The lower pick 42b does not participate in the transfer process of the wafers W1 and W2 until the orientation process of the wafer W1 is completed (for example, between times t0 and t2).
- the lower pick 42b holds the wafer W1 in the orienter module 33 and carries the wafer W1 out of the orienter module 33. Subsequently, the upper pick 42a carries the wafer W2 into the orienter module 33. Then, while the orienter module 33 is performing the orienting process on the wafer W2, the lower pick 42b carries the wafer W1 toward the load lock module 20a (time t3 in FIG. 5).
- the upper pick 42a and the lower pick 42b are in a so-called free state in which the wafer W is not held.
- the state in which both the upper pick 42a and the lower pick 42b are free continues from the end of loading the wafer W1 into the load lock module 20a to the completion of the orientation process for the wafer W2. Therefore, the upper pick 42a and the lower pick 42b can be used for another transfer process, for example, a process for transferring the depressurized wafer W from the load lock module 20a to the hoop 100 as long as it is in such a free state. It is possible to get involved.
- the lower pick 42b holds the wafer W2 in the orienter module 33, conveys the wafer W2 (time t4 in FIG. 5), and transfers the wafer W2 to the lower stocker of the load lock module 20a. It is carried in to 22a (time t5 in FIG. 5).
- the upper pick 42a does not participate in the transfer processing of the wafers W1 and W2 after the wafer W2 is loaded into the orienter module 33 (for example, after the time t3).
- the upper pick 42a transfers the wafer W between the hoop 100 and the orienter module 33
- the lower pick 42b transfers the wafer W between the orienter module 33 and the load lock module 20a.
- the transport pattern is not limited to this. That is, for example, the lower pick 42b may be controlled to transfer the wafer W between the hoop 100 and the orienter module 33, and the upper pick 42a may transfer the wafer W between the orienter module 33 and the load lock module 20a.
- the depressurized processing module included in the depressurizing unit 11 can simultaneously process the two wafers W1 and W2 as described above. In such a case, the two wafers W1 and W2 are simultaneously transferred to the reduced pressure processing module.
- FIG. 5B Second Transfer Pattern
- the post-decompression processing module for example, COR61 and PHT62
- the atmospheric pressure processing module for example, ORT33
- the control unit 80 controls the control unit 80 so as to simultaneously perform the transfer process of the two wafers W1 and W2 in the atmosphere unit 10 (for example, the transfer process from the load lock module 20a to the hoop 100). To be done.
- two wafers (wafers under reduced pressure processing) W1 and W2 that have been subjected to reduced pressure processing such as COR processing or PHT processing in the depressurization unit 11 are placed in the load lock module 20a.
- the upper pick 42a and the lower pick 42b simultaneously transfer the two wafers W1 and W2 that have been processed under reduced pressure to the CST module 32, and simultaneously transfer the two wafers W1 and W2 to the hoop 100 after the CST processing (FIG. 5).
- the two wafers W1 and W2 can be transferred at the same time, the two wafers W are transferred at the same time in the loader module 30 in which the conventional wafer W is transferred one by one. Therefore, it is possible to appropriately improve the throughput required to transfer the wafer W.
- the two wafers W1 and W2 are held in the decompression section 11 and the load lock modules 20a and 20b at the distance d1.
- the two wafers W1 and W2 are held with a distance d2 therebetween. That is, the distance d1 between the adjacent stockers 21a and 22a in each stocker in the load lock module 20a and the distance d2 between the adjacent picks 42a and 42b in each pick in the atmosphere portion 10 are different.
- the transfer module can access the processing module of the carry-in destination while maintaining the holding interval, so that the two wafers W can be delivered at the same time.
- the wafer W is transferred between the modules having different holding intervals, that is, when the wafer W is transferred between the load lock modules 20a and 20b and the wafer transfer mechanism 40, the two wafers W are simultaneously transferred. I can't deliver. For example, when the distance d1 is 12 mm and the distance d2 is 10 mm (that is, when d1> d2), the picks 42a and 42b are the wafers W1 placed on the stockers 21a and 22a in the load lock module 20a. , W2 cannot be held simultaneously. Therefore, even when the controller 80 performs the second transfer pattern, the two wafers W are transferred (held) one by one.
- the controller 80 controls the wafer transfer mechanism 40 such that the wafer transfer mechanism 40 transfers the wafers W to and from the load lock modules 20a and 20b one by one. That is, after the first pick of the wafer transfer mechanism 40 holds the first wafer W, the elevating mechanism 45 adjusts the height difference between the distance d1 and the distance d2, and the second pick moves the second wafer. Hold W.
- the lower pick 42b holds the wafer W2 placed on, for example, the lower stocker 22b (FIG. 5 time t9).
- the height of the upper pick 42a is adjusted to the height of the upper stocker 21b by the operation of the elevating mechanism 45, and the upper pick 42a holds the wafer W1 placed on the upper stocker 21b ( Time t10 in FIG. 5).
- the controller 80 sequentially receives (holds) the wafers W from the pick 42b located below to the pick 42a located above.
- the wafer transfer mechanism 40 is controlled as described above.
- the height difference between the distance d1 and the distance d2 can be corrected by the operation of the elevating mechanism 45, so that the wafer W can be appropriately adjusted according to the height difference. Can be handed over.
- the upper pick 42a and the lower pick 42b may be inserted into the load lock module 20b at the same time, and then the elevating mechanism 45 may be operated with the pick portion 42 inserted.
- the wafer W2 may be received, the lower pick 42b may be retracted, and then the elevating mechanism 45 may be operated. Then, only the upper pick 42a may be inserted.
- the upper pick 42a is controlled to receive the wafer W1 held in the upper stocker 21b.
- the control method of the wafer transfer mechanism 40 is not limited to this.
- the upper pick 42a may receive the wafer W2 and the lower pick 42b may receive the wafer W1. Further, the upper pick 42a may be controlled to access the load lock module 20b first.
- the transfer pattern controlled by the controller 80 in the wafer processing apparatus 1 is not limited to the above example.
- FIG. 6 is an explanatory diagram showing an example of a transfer pattern in the wafer processing apparatus 1 according to another embodiment.
- the case where the orienter module 33 can process two wafers W at the same time is shown.
- the two wafers W unloaded from the hoop 100 and loaded into the load lock module 20a via the orienter module 33 can be simultaneously transported and processed.
- the wafers W1 and W2 are housed in the hoop 100 and loaded into the wafer processing apparatus 1 (time t0 in FIG. 6), the wafers W1 and W2 are It is held by the upper pick 42a and the lower pick 42b and simultaneously conveyed toward the orienter module 33 (time t1 in FIG. 6).
- the holding interval of the wafer transfer mechanism 40 and the holding interval of the load lock module 20a are different. Therefore, the two wafers W1 and W2 held by the wafer transfer mechanism 40 are first separated by the upper pick 42a.
- the wafer W1 held by is transferred to the upper stocker 21a (time t4 in FIG. 6).
- the height of the lower pick 42b is adjusted to the height of the lower stocker 22a by the operation of the elevating mechanism 45, and the wafer W2 held by the lower pick 42b is transferred to the lower stocker 22a (FIG. 6). Time t5).
- the throughput for carrying the wafer W can be appropriately improved.
- each processing module since each processing module processes two wafers W at the same time, the wafers W are transferred at the same time. However, for example, the module may be defective or the wafer W may be lost during transfer. When it is necessary to carry the wafers W one by one, for example, the wafers W1 and W2 may be carried one by one.
- FIG. 6A for example, two wafers W1 and W2 housed in the load lock module 20b (time t8 in FIG. 6) are first held by the upper pick 42a. After that (time t9 in FIG. 6), the CST module 32 is loaded. Then, while the wafer W1 is being subjected to the CST process, the upper pick 42a that has loaded the wafer W1 into the CST module 32 and holds the wafer W2 carries the wafer W2 toward the CST module 32 (see FIG. Time t10 at 6).
- the wafer W1 is held by the lower pick 42b, and subsequently, the wafer W2 is carried into the CST module 32. Then, while the wafer W2 is subjected to the CST process, the wafer W1 is transported toward the FOUP 100 (time t11 in FIG. 6).
- the lower pick 42b carrying the wafer W1 into the hoop 100 and holding the wafer W2 holds the wafer W2 and carries the wafer W2 toward the hoop 100 (see FIG. Then, the wafer W2 is loaded into the hoop 100 (time t13 in FIG. 6).
- the transfer pattern of the wafer W performed in the wafer processing apparatus 1 can be arbitrarily selected. As a result, the transfer pattern of the wafer W can be appropriately selected according to the state of wafer processing, and thus the throughput of transferring the wafer W can be appropriately improved.
- the combination of the various transfer patterns described above is automatically determined by the control unit 80, and the wafer W is transferred.
- the control unit 80 automatically selects an appropriate transfer pattern of the wafer W according to the situation, and thus the throughput related to the transfer of the wafer W can be further appropriately improved. Further, the above determination of the transfer pattern may be performed for each processing module into which the wafer W is loaded and unloaded.
- the transfer pattern of the wafer W in the wafer processing apparatus 1 can be arbitrarily selected. That is, in FIGS. 5 and 6, each of the first transfer pattern and the second transfer pattern is performed once in the transfer path of the wafer W, but the selection example as the combination of transfer patterns is this. Not limited to.
- the first transport pattern may be selected.
- only the second transport pattern may be selected in both the first half of the transport path and the steel plate.
- the selection of the above-described transport pattern may be configured such that, for example, an operator can further manually make a determination in addition to the control by the control unit 80.
- the elevation mechanism 45 is configured to adjust the height difference of the pick section 42 of the wafer transfer mechanism 40, but the height difference adjustment method is not limited to this.
- a pick interval adjusting mechanism (not shown) may be provided so that the interval between the upper pick 42a and the lower pick 42b of the wafer transfer mechanism 40 can be adjusted. In such a case, by adjusting the pick interval, it is possible to perform the two transfer operations at the same time regardless of the holding interval of the wafer W of the processing module, and thus it is possible to further improve the throughput related to the wafer transfer. ..
- the wafer W is processed by two wafers
- the number of wafers W to be simultaneously processed is not limited to this.
- the height difference can be corrected by the operation of the elevating mechanism 45 to transfer the wafer W. Therefore, the wafer W can be transferred appropriately. it can.
- the identification number set for the wafer W held by the lower pick 42b is the same as that of the wafer W held by the upper pick 42a. It is preferable that the identification number is controlled to be smaller than the identification number. That is, when a plurality of wafers W are transferred by the same wafer transfer mechanism 40, it is preferable to hold the wafers W so that the identification numbers are in ascending order from the lower pick to the upper pick. . More preferably, it is desirable that the identification numbers are serial numbers from the bottom. That is, for example, in the example shown in FIG. 5, it is preferable that the identification number of the wafer W2 held by the lower pick 42b is larger than the identification number of the wafer W1 held by the upper pick W1.
- the plurality of wafers W accommodated in multiple stages inside the hoop 100 are generally accommodated such that the identification numbers are in ascending order from the bottom. Therefore, even when the wafer W is transferred, the identification numbers are held in ascending order from the lower side, so that the loading operation of the wafer W to the hoop 100 can be optimized. As a result, the throughput of delivering and transferring the wafer W can be improved.
- the identification numbers of the two wafers W held by the wafer transfer mechanism 40 are in ascending order from the bottom and the identification numbers are serial numbers. Control may be performed such that two pieces are simultaneously carried in (first conveyance pattern), and if they are not serial numbers, they are successively carried in one by one (second conveyance pattern). That is, when all the wafers W are loaded into the FOUP 100, the wafers W are loaded such that the identification numbers in the FOUP 100 are serial numbers in ascending order from the bottom.
- the wafers W that are loaded into the CST module 32 in multiple stages are loaded in the CST module 32 in ascending order from the bottom.
- the identification numbers can be sorted in the CST module 32, and the loading operation of the wafer W to the FOUP 100 can be optimized.
- the wafer W when the wafer W is loaded into the CST module 32, if the wafers W can be loaded inside the CST module 32 so that the wafers W are sequentially numbered in ascending order from below, the two wafers W are loaded at the same time. If the sequential numbers are not in ascending order, they may be controlled so that they are continuously loaded one by one. The same applies when the wafer W is unloaded from the CST module 32.
- the identification numbers of the wafers W are accommodated in the hoop 100 so that the identification numbers are in ascending order from above, the identification numbers of the wafers W located above are small. May be controlled to be
- the two wafers W are first transferred to the lower pick 42b. It is preferable to control it so that it is delivered. That is, when transferring a plurality of wafers W to the same wafer transfer mechanism one by one, as shown from time t8 to time t10 in FIG. First, it is preferable that the wafer W is placed. This makes it possible to appropriately perform the transfer operation of the wafer W with respect to the wafer transfer mechanism 40, and also to prevent the particles caused by the transfer operation of the wafer W from dropping downward.
- each of the picks 42a and 42b of the wafer transfer mechanism 40 has a suction holding portion, and each suction holding portion has a plurality of suction holes 140a and 140b.
- three suction holes 140a, 140a, 140a and three vacuum pads 141a, 141a, 141a are provided on the wafer mounting surface of the upper pick 42a.
- three suction holes 140b, 140b, 140b and three vacuum pads 141b, 141b, 141b are provided on the wafer mounting surface of the lower pick 42b. Then, the vacuum pad 141a, 141a, 141a, 141b, 141b, 141b can suck and hold the wafer W on the mounting surface.
- a common suction mechanism 143 is connected to each suction holding unit. That is, the suction mechanism 143 is connected to the suction holding portion of the upper pick 42a and the suction holding portion of the lower pick 42b.
- a vacuum line 142a is connected to the vacuum pad 141a formed on the upper pick portion 42a.
- a vacuum line 142b is connected to the vacuum pad 141b formed on the lower pick portion 42b.
- the vacuum lines 142 a and 142 b pass through the inside of the arm unit 41 and the elevating mechanism 45 and are connected to a suction mechanism 143 provided outside the wafer transfer mechanism 40.
- a vacuum pump is used for the suction mechanism 143.
- the wafer transfer mechanism 40 can suck the wafer W through the suction holes 140 of the vacuum pad 141 and hold the wafer W by suction.
- a valve V is provided on the vacuum lines 142 a and 142 b on the downstream side of the elevating mechanism 45. The valve V can be used to switch on / off the suction of the wafer W on the upper pick 42a and on / off the suction of the wafer W on the lower pick 42b.
- the sucked air gives a lift to the vacuum pad 141 holding the first wafer W. Due to this lift, the first wafer W is flipped up. Further, in particular, when the first wafer W is deformed (for example, upwardly convex shape) or when the deposition surface is attached to the suction surface of the wafer W, the lift force is easily affected.
- the wafer W When the lift force is applied to the wafer W and the wafer W is flipped up, the wafer W may be damaged or the wafer transfer mechanism 40 may not be able to detect the wafer W. is there. That is, the normal wafer transfer mechanism 40 grasps the holding state of the wafer W based on the holding pressure detected when holding the wafer W, but the holding pressure may not be detected due to the jumping of the wafer W. is there.
- (B) Method of controlling suction start timing in the pick unit 42 that holds the second wafer W Undetected wafer W as described above is detected from the suction hole 140 when sucking and holding the second wafer W. It is generated by inhaling the atmosphere. Therefore, for example, as shown in FIG. 9, the valves Va and Vb are provided in the vacuum lines 142a and 142b, respectively, so that the vacuuming can be performed at arbitrary timings. Then, the suction holding of the second wafer W is controlled so that suction is started after the wafer W is placed on the pick unit 42, that is, after the gap between the wafer W and the vacuum pad 141 is eliminated. To do. As a result, it is possible to prevent the atmospheric air from being sucked when starting the suction holding of the second wafer W, and to prevent the first wafer W from jumping up.
- suction mechanisms 143a and 143b are independently provided to the upper pick 42a and the lower pick 42b. As a result, even if the atmosphere is sucked from the suction hole 140 when sucking and holding the second wafer W as described above, the first wafer W can be prevented from jumping up.
- the non-detection prevention method for the three wafers W it is possible to appropriately prevent the jumping up of the first wafer W, which may be a concern when the second wafer W is sucked and held. Then, it is possible to improve the throughput of delivering the wafer W while preventing the non-detection of the wafer W due to the jumping of the wafer W. Furthermore, since it is possible to appropriately determine whether two wafers W are simultaneously transferred or one wafer W is transferred, it is possible to improve the throughput of the transfer.
- ⁇ Countermeasures against undetected second wafer W> As described above, when the wafer W is deformed (for example, upwardly convex), or when the deposition surface is attached to the suction surface of the wafer W, the wafer transfer mechanism 40 cannot detect the wafer W. There is. Normally, when an error is notified in the wafer processing apparatus 1, the series of wafer processings are interrupted, the cause of the error is confirmed and maintenance is performed, and then the wafer processing is initialized to start up the wafer processing apparatus 1. When such an initialization operation is performed, the operation is performed by checking the presence or absence of the wafer W on the wafer transfer mechanism 40. However, even if the wafer W is actually present on the wafer transfer mechanism 40, it is not detected. Therefore, the wafer processing apparatus 1 may operate as it is without the wafer W. When the wafer W is operated without the wafer W as described above, the wafer W may be damaged.
- the presence or absence of the wafer W on the wafer transfer mechanism 40 is not shown, for example, a beam sensor or the like. It is detected by the detection sensor of.
- the detection sensor corresponds to the substrate detection unit according to the present disclosure.
- the detection sensor can be installed at an arbitrary position in the wafer processing apparatus 1, but the wafer W can be detected regardless of the arm position of the wafer transfer mechanism 40 when the wafer processing apparatus 1 is initialized. It is desirable to be provided in a position. That is, for example, as shown in FIG. 11, the detection sensor 200 can be provided on the second arm 41b. In the following description, the case where the detection sensor 200 is provided on the second arm 41b will be described as an example.
- the third arm 41c and the fourth arm 41d are arranged so as to overlap each other.
- the third arm 41c is rotated, and the holding state of the wafer W on the third arm 41c is confirmed by the detection sensor 200.
- the holding pressure of the third arm 41c detected when the wafer W is held is detected.
- the third arm 41c and the fourth arm 41d are rotated, and the holding state of the wafer W on the fourth arm 41d is confirmed by the detection sensor 200.
- the holding pressure of the fourth arm 41d detected when holding the wafer W is detected. Then, when the confirmation of the holding state of the wafer W on the third arm 41c and the fourth arm 41d is completed, the third arm 41c and the fourth arm 41d are again arranged so as to overlap each other, as shown in FIG. The detection operation of the wafer W is completed.
- the initialization operation of the wafer processing apparatus 1 is continued.
- the initialization operation of the wafer processing apparatus 1 is interrupted and an error is notified. To do.
- the detection sensor in addition to the detection of the wafer W by the holding pressure, the detection sensor further detects the wafer W, and the operation is continued only when the results match. As a result, erroneous detection of the presence or absence of the wafer W on the arm is suppressed, and as a result, damage to the wafer W is suppressed.
- the detection of the wafer W by the holding pressure and the detection of the wafer W by the detection sensor are preferably controlled by the same controller.
- the undetected countermeasure of the second wafer W for example, by providing the detection sensor 200 on the second arm 41b, regardless of the arm position of the wafer transfer mechanism 40 at the time of initialization of the wafer processing apparatus 1, it is possible to appropriately perform the detection. The presence or absence of the wafer W can be detected.
- the detection sensor 200 on the second arm 41b, it is possible to easily rotate the wafer on each arm only by rotating the third arm 41c and the fourth arm 41d on the spot as shown in FIG. The presence or absence of W can be detected.
- the detection sensor 200 is provided on the second arm 41b has been described as an example, but the number of detection sensors and the installation positions are not limited to this.
- the detection sensor may be provided in each of the upper pick 42a and the lower pick 42b, or may be provided in the first arm 41a.
- the case where the detection sensor 200 is provided in the wafer transfer mechanism 40 has been described as an example, but the same detection sensor may be further provided in the wafer transfer mechanism 70.
- the detection sensor does not necessarily have to be provided in the wafer transfer mechanism, and can be provided in an arbitrary place inside the wafer processing apparatus 1.
- the non-detection countermeasure for the second wafer W is performed during the initialization operation of the wafer processing apparatus 1 has been described as an example, but the non-detection countermeasure for the second wafer W is performed at another timing. May be performed in.
- the maintenance operation of the wafer processing apparatus 1 or the returning operation after the inspection may be performed.
- the non-detection countermeasure for the second wafer W may be performed each time the wafer W is delivered to the wafer transfer mechanism. Specifically, for example, when carrying in / out the wafer W to / from the load lock modules 20a and 20b, it may be carried out to confirm that the delivery of the wafer W has been reliably carried out.
- the configuration of the wafer transfer mechanism 40 is not limited to the above-described embodiment, and any method capable of simultaneously transferring a plurality of wafers W may be used, and the holding method is not limited to suction holding.
- the case where the COR process, the PHT process, and the CST process are continuously performed on the wafer W inside the wafer processing apparatus 1 has been described as an example.
- the order of wafer processing is not limited to this.
- the processes performed inside the wafer processing apparatus 1 are not limited to these processes, and etching processes may be performed, for example.
- a load port configured to arrange a substrate storage container in which at least one substrate is stored in an atmospheric portion where a substrate is processed under atmospheric pressure; and the substrate is processed under reduced pressure with the atmospheric portion.
- the processing module that processes the substrate in the atmospheric portion, and the load port, the load lock chamber, and the processing module.
- a controller for controlling the operation of the substrate transfer mechanism.
- the substrate transfer mechanism has a plurality of substrate holders, and each substrate holder has one substrate holder.
- a second substrate holder controls the substrate transfer mechanism to transfer a substrate between the load lock chamber and the processing module, and when the processing module simultaneously processes a plurality of substrates,
- the substrate processing apparatus wherein the substrate holding unit controls the substrate transfer mechanism so as to transfer a plurality of substrates simultaneously between the load port, the load lock chamber, and the processing module.
- the plurality of substrate holders are provided along a vertical direction, the load lock chamber is provided with a plurality of substrate mounting portions provided along the vertical direction, and each substrate mounting portion is 1 It is configured such that two substrates can be placed, the distance between adjacent substrate holders in each substrate holder is different from the distance between adjacent substrate holders in each substrate holder, and the controller is The substrate processing apparatus according to (1), wherein the substrate transfer mechanism is controlled so that the substrate transfer mechanism transfers the substrates to and from the load lock chamber one by one. According to the above (1) and (2), it is possible to arbitrarily select the transfer pattern of the substrate according to the number of processed substrates and the holding interval in the substrate processing apparatus, and thus it is possible to improve the throughput of wafer transfer. it can.
- the control unit sequentially receives the substrates from the substrate holding unit located below to the substrate holding unit located above.
- the substrate processing apparatus according to (2) above which controls the substrate transfer mechanism.
- An identification number is set for each of the plurality of substrates, and the control unit is located above the substrate holding unit located below when the plurality of substrates are received from the load lock chamber by the substrate transport mechanism.
- each substrate holding unit has a suction holding unit for holding the substrate by suction
- the suction holding unit has a plurality of suction holes. Processing equipment.
- a common suction mechanism is connected to each suction holding unit.
- the control unit suctions and holds the substrates by one substrate holding unit and then starts sucking the substrates by the other substrate holding units.
- the substrate processing apparatus according to (6) above which controls the substrate transfer mechanism as described above.
- the processing module includes an atmospheric pressure processing module that performs processing under atmospheric pressure, and the atmospheric pressure processing module includes an orienter module that adjusts a horizontal direction of the substrate and a cooling processing for the substrate.
- the substrate processing apparatus according to any one of (1) to (8) above, which is at least one of cooling modules for performing the above.
- the decompression unit has a decompression treatment module that performs treatment under reduced pressure, and the decompression treatment module performs a COR module that performs COR treatment on the substrate and a heat treatment on the substrate.
- the substrate processing apparatus according to any one of (1) to (9), which is at least one of heating modules, and the COR module and the heating module are configured to simultaneously process a plurality of substrates. ..
- the substrate processing apparatus according to any one of (1) to (10), further including a substrate detection unit that detects the presence or absence of the substrate on the substrate holding unit.
- a substrate transfer method performed by a substrate processing apparatus wherein the substrate processing apparatus arranges a substrate storage container in which at least one substrate is stored in an atmosphere portion where the substrate is processed under atmospheric pressure. And a load lock chamber configured to transfer the substrate between the atmosphere portion and a decompression portion where the substrate is processed under reduced pressure, and the substrate is processed in the atmosphere portion. And a substrate transfer mechanism for transferring a substrate between the load port, the load lock chamber, and the processing module, the substrate transfer mechanism having a plurality of substrate holding units, and each substrate The holding unit is configured to hold one substrate, and in the substrate transfer method, when the processing module processes substrates one by one, the load port and the processing are performed using a first substrate holding unit.
- a step of transporting a substrate between the load-lock chamber and the processing module using a second substrate holding part wherein the substrate transport method comprises: When the processing module simultaneously processes a plurality of substrates, the method further includes the step of simultaneously transferring the plurality of substrates between the load port, the load lock chamber and the processing module by using the plurality of substrate holders.
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Abstract
Description
図1は、本実施形態にかかる基板処理装置としてのウェハ処理装置1の構成の概略を示す平面図である。本実施形態においては、ウェハ処理装置1が、ウェハWにCOR処理、PHT処理、CST処理、及びオリエント処理を行う、各種処理モジュールを備える場合を例に説明する。なお、ウェハ処理装置1のモジュール構成はこれに限られず、任意に選択され得る。
次に、本実施形態にかかるウェハ処理装置1におけるウェハ処理について説明する。図4は、ウェハ処理装置1におけるウェハ処理の処理経路の一例を示す説明図である。
続いて、本実施形態にかかる、ウェハ処理装置1におけるウェハWの受け渡し及び搬送方法の詳細について説明する。ウェハ処理装置1のローダーモジュール30におけるウェハWの受け渡し及び搬送方法は、例えば以下の(A)第1の搬送パターン及び(B)第2の搬送パターンを選択的に実行することができる。
(B)第2の搬送パターン:大気圧下処理モジュールが複数のウェハWを処理する場合において、当該大気圧下処理モジュール、ロードロックモジュール20a、20b、ロードポート31の間でウェハWを搬送するパターンをいう。
図5の(A)は、後段の減圧下処理モジュール(例えばCOR61及びPHT62)が2つのウェハWを同時に処理する一方で、大気圧下処理モジュール(例えばORT33)がウェハWを1つずつ処理する場合を示している。この場合、上部ピック42a及び下部ピック42bは、大気部10におけるウェハWの搬送処理(例えばフープ100からロードロックモジュール20aへの搬送処理)を分担して行うように、制御部80により制御される。すなわち、例えば第1の基板保持部としての上部ピック42aはフープ100とオリエンタモジュール33との間でウェハWの搬送を行うように制御される。また、例えば第2の基板保持部としての下部ピック42bはオリエンタモジュール33とロードロックモジュール20aとの間でウェハWの搬送を行うように制御される。
減圧部11が備える減圧下処理モジュールは、上述のように2つのウェハW1、W2を同時に処理することができる。かかる場合、2つのウェハW1、W2は、当該減圧下処理モジュールに対して同時に搬送が行われる。
図5の(B)は、後段の減圧下処理モジュール(例えばCOR61及びPHT62)が2つのウェハWを同時に処理し、かつ、大気圧下処理モジュール(例えばORT33)が2つのウェハWを同時に処理する場合を示している。この場合、上部ピック42a及び下部ピック42bは、大気部10における2つのウェハW1、W2の搬送処理(例えばロードロックモジュール20aからフープ100への搬送処理)を同時に行うように、制御部80により制御される。
なお、ウェハ処理装置1において制御部80により制御される搬送パターンは、上記の例には限定されない。
なお、ウェハ搬送機構40によるウェハWの保持形式は任意に選択することができる。例えば、図7に示すように、ウェハ搬送機構40の各ピック42a、42bは、吸引保持部を有し、各吸引保持部は、複数の吸引孔140a、140bを有する。図7に示す例では、上部ピック42aのウェハ載置面には、3つの吸引孔140a、140a、140a及び3つのバキュームパッド141a、141a、141aが設けられている。また、下部ピック42bのウェハ載置面には、3つの吸引孔140b、140b、140b及び3つのバキュームパッド141b、141b、141bが設けられている。そしてこれらバキュームパッド141a、141a、141a、141b、141b、141bにより、ウェハWを載置面上に吸着保持することができる。
以上の構成のウェハ搬送機構40を用いて第2の搬送パターンを行う場合、すなわち2つのウェハWの受け渡しを1つずつ行う場合、1つ目のウェハWの保持後、2つ目のウェハWを保持する際に、1つ目のウェハWがピック部42から跳ね上げられてしまうおそれがある。本発明者らはこのウェハWの跳ね上げの原因を解明した。すなわち、2つ目のウェハWを吸着しようとする際、当該2つ目のウェハWの載置前に、1つ目のウェハWに対して吸引機構143による吸引が行われていると、吸引孔140から少量の大気を吸引してしまう。そうすると、吸引された大気が1つ目のウェハWを保持しているバキュームパッド141に対して揚力を与える。この揚力により、1つ目のウェハWが跳ね上げられる。また、特に1つ目のウェハWが変形(例えば上に凸形状)していた場合や、ウェハWの吸着面にデポが付着していた場合、当該揚力の影響を受けやすくなってしまう。
上記したようなウェハWの未検知は、例えばウェハ搬送機構40において2つのウェハWを1つずつ連続的に受け渡しする場合に懸念されるものである。そこで、このようなウェハWの跳ね上がりによる未検知が懸念される場合であって、例えばウェハWの変形が既知である場合には、ウェハ搬送機構40による2つ搬送を中止する。そして、跳ね上がりが懸念されるウェハWを1つで受け渡し、搬送を行うように制御する。これにより、2つ目のウェハWの保持を行うことが無いため、1つ目のウェハWの跳ね上がりを防止することができる。
上述したようなウェハWの未検知は、2つ目のウェハWを吸着保持するに際して吸引孔140から大気を吸引してしまうことにより発生する。そこで、例えば図9に示すように真空ライン142a、142bのそれぞれにバルブVa、Vbを設けることにより、真空引きをそれぞれ任意のタイミングで行うことができるように構成する。そして、2つ目のウェハWの吸引保持は、当該ウェハWをピック部42上に載置した後、すなわちウェハWとバキュームパッド141との間に隙間がなくなった後に吸引を開始するように制御する。これにより2つ目のウェハWの吸引保持を開始する際に大気が吸引されることを防止することができ、1つ目のウェハWの跳ね上がりを防止することができる。
図10に示すように、上部ピック42a及び下部ピック42bに対してそれぞれ吸引機構143a、143bを独立して設ける。これより、上述のように2つ目のウェハWを吸着保持するに際して吸引孔140から大気を吸引してしまった場合であっても、1つ目のウェハWの跳ね上がりを防止することができる。
上述のように、ウェハWに変形(例えば上に凸形状)が生じていた場合や、ウェハWの吸着面にデポが付着していた場合、当該ウェハWをウェハ搬送機構40が検知できなくなる場合がある。通常、ウェハ処理装置1においてエラーが通知された場合、一連のウェハ処理を中断してエラー要因の確認及びメンテナンスを行った後、ウェハ処理を初期化してウェハ処理装置1の立ち上げが行われる。そしてかかる初期化動作が行われる場合、ウェハ搬送機構40上におけるウェハWの有無を確認して動作を行うが、実際にはウェハ搬送機構40上にウェハWが存在していたとしても、未検知によりウェハWがないものとして、そのままウェハ処理装置1が動作してしまう場合がある。そして、このようにウェハWがいないものとして動作した場合、当該ウェハWに損傷を与えてしまうおそれがある。
次に、図12(b)に示すように第3アーム41cを回転させ、検知センサ200により第3アーム41cのウェハWの保持状況を確認する。なおこの際、検知センサ200によるウェハWの検知に加え、ウェハWを保持した際に検知される第3アーム41cの保持圧力を検知する。
続いて図12(c)に示すように第3アーム41c及び第4アーム41dを回転させ、検知センサ200により第4アーム41dのウェハWの保持状況を確認する。なおこの際、検知センサ200によるウェハWの検知に加え、ウェハWを保持した際に検知される第4アーム41dの保持圧力を検知する。
そして、第3アーム41c及び第4アーム41dにおけるウェハWの保持状況の確認が完了すると、再度、図12(d)に示すように第3アーム41cと第4アーム41dを重なるように配置し、ウェハWの検知動作を終了する。
(1)大気圧下で基板が処理される大気部において、少なくとも1つの基板が収容された基板収容容器を配置するように構成されたロードポートと、前記大気部と減圧下で基板が処理される減圧部との間で基板を受け渡すように構成されたロードロック室と、前記大気部において基板に対して処理を行う処理モジュールと、前記ロードポート、前記ロードロック室及び前記処理モジュールの間で基板を搬送する基板搬送機構と、前記基板搬送機構の動作を制御する制御部と、を有し、前記基板搬送機構は、複数の基板保持部を有し、各基板保持部は、1つの基板を保持するように構成され、前記制御部は、前記処理モジュールが基板を1つずつ処理する場合は、第1の基板保持部は前記ロードポートと前記処理モジュールとの間で基板を搬送し、第2の基板保持部は前記ロードロック室及び前記処理モジュールとの間で基板を搬送するように前記基板搬送機構を制御し、前記処理モジュールが複数の基板を同時に処理する場合は、前記複数の基板保持部が前記ロードポート、前記ロードロック室及び前記処理モジュールの間で複数の基板を同時に搬送するように前記基板搬送機構を制御する、基板処理装置。
(2)前記複数の基板保持部は、鉛直方向に沿って設けられ、前記ロードロック室は、鉛直方向に沿って設けられた複数の基板載置部を備え、各基板載置部は、1つの基板を載置可能に構成され、各基板載置部における隣接する基板載置部の間の距離と各基板保持部における隣接する基板保持部の間の距離は異なり、前記制御部は、前記基板搬送機構による前記ロードロック室に対する基板の受け渡しを1つずつ行うように当該基板搬送機構を制御する、前記(1)記載の基板処理装置。
前記(1)~(2)によれば、基板処理装置における基板の処理枚数及び保持間隔に応じて基板の搬送パターンを任意に選択することができるため、ウェハ搬送にかかるスループットを向上させることができる。
(4)複数の基板にはそれぞれ識別番号が設定され、前記制御部は、前記基板搬送機構により前記ロードロック室から複数の基板を受け取る際、下方に位置する前記基板保持部から上方に位置する前記基板保持部に向けて前記識別番号が昇順となるように基板を受け取るように当該基板搬送機構を制御する、前記(2)又は前記(3)に記載の基板処理装置。
前記(3)~(4)によれば、基板搬送機構で保持する基板の順序を適切に制御することができ、これにより基板収容容器に対する基板の受け渡しを効率的に行うことができる。その結果、基板の受け渡しにかかるスループットを向上させることができる。
(6)各吸引保持部には共通の吸引機構が接続される、前記(5)に記載の基板処理装置。
(7)前記制御部は、前記基板搬送機構により前記処理モジュールから基板を1つずつ受け取る際、一の基板保持部で基板を吸引保持した後、他の基板保持部における基板の吸引を開始するように当該基板搬送機構を制御する、前記(6)に記載の基板処理装置。
(8)前記複数の基板保持部にはそれぞれ別の吸引機構が接続され、当該複数の基板保持部による基板の吸引保持を独立して行う、前記(5)に記載の基板処理装置。
前記(5)~(8)によれば、基板の吸着保持に起因する、先の基板の跳ね上がりを適切に防止することができる。その結果、基板の受け渡しを適切に行うことができる。
(10)前記減圧部は、減圧下で処理を行う減圧下処理モジュールを有し、前記減圧下処理モジュールは、基板に対してCOR処理を行うCORモジュール、及び、基板に対して加熱処理を行う加熱モジュールのうち少なくとも1つであり、前記CORモジュール及び前記加熱モジュールは、複数の基板を同時に処理するように構成される、前記(1)~前記(9)のいずれかに記載の基板処理装置。
10 大気部
11 減圧部
20 ロードロックモジュール
30 ローダーモジュール
31 ロードポート
32 CSTモジュール
33 オリエンタモジュール
40 ウェハ搬送機構
42 ピック部
42a 上部ピック
42b 下部ピック
80 制御部
100 フープ
W ウェハ
Claims (14)
- 大気圧下で基板が処理される大気部において、少なくとも1つの基板が収容された基板収容容器を配置するように構成されたロードポートと、
前記大気部と減圧下で基板が処理される減圧部との間で基板を受け渡すように構成されたロードロック室と、
前記大気部において基板に対して処理を行う処理モジュールと、
前記ロードポート、前記ロードロック室及び前記処理モジュールの間で基板を搬送する基板搬送機構と、
前記基板搬送機構の動作を制御する制御部と、を有し、
前記基板搬送機構は、複数の基板保持部を有し、各基板保持部は、1つの基板を保持するように構成され、
前記制御部は、
前記処理モジュールが基板を1つずつ処理する場合は、第1の基板保持部は前記ロードポートと前記処理モジュールとの間で基板を搬送し、第2の基板保持部は前記ロードロック室及び前記処理モジュールとの間で基板を搬送するように前記基板搬送機構を制御し、
前記処理モジュールが複数の基板を同時に処理する場合は、前記複数の基板保持部が前記ロードポート、前記ロードロック室及び前記処理モジュールの間で複数の基板を同時に搬送するように前記基板搬送機構を制御する、基板処理装置。 - 前記複数の基板保持部は、鉛直方向に沿って設けられ、
前記ロードロック室は、鉛直方向に沿って設けられた複数の基板載置部を備え、各基板載置部は、1つの基板を載置可能に構成され、
各基板載置部における隣接する基板載置部の間の距離と各基板保持部における隣接する基板保持部の間の距離は異なり、
前記制御部は、前記基板搬送機構による前記ロードロック室に対する基板の受け渡しを1つずつ行うように当該基板搬送機構を制御する、請求項1に記載の基板処理装置。 - 前記制御部は、前記基板搬送機構により前記ロードロック室から複数の基板を受け取る際、下方に位置する前記基板保持部から上方に位置する前記基板保持部に向けて順次基板を受け取るように当該基板搬送機構を制御する、請求項2に記載の基板処理装置。
- 複数の基板にはそれぞれ識別番号が設定され、
前記制御部は、前記基板搬送機構により前記ロードロック室から複数の基板を受け取る際、下方に位置する前記基板保持部から上方に位置する前記基板保持部に向けて前記識別番号が昇順となるように基板を受け取るように当該基板搬送機構を制御する、請求項2又は3に記載の基板処理装置。 - 各基板保持部は基板を吸引保持するため吸引保持部を有し、前記吸引保持部は、複数の吸引孔を有する、請求項1~4のいずれか一項に記載の基板処理装置。
- 各吸引保持部には共通の吸引機構が接続される、請求項5に記載の基板処理装置。
- 前記制御部は、前記基板搬送機構により前記処理モジュールから基板を1つずつ受け取る際、一の基板保持部で基板を吸引保持した後、他の基板保持部における基板の吸引を開始するように当該基板搬送機構を制御する、請求項6に記載の基板処理装置。
- 前記複数の基板保持部にはそれぞれ別の吸引機構が接続され、当該複数の基板保持部による基板の吸引保持を独立して行う、請求項5に記載の基板処理装置。
- 前記処理モジュールは、大気圧下で処理を行う大気圧下処理モジュールを有し、
前記大気圧下処理モジュールは、基板の水平方向の向きを調節するオリエンタモジュール、及び、基板に冷却処理を行う冷却モジュールのうち少なくとも1つである、請求項1~8のいずれか一項に記載の基板処理装置。 - 前記減圧部は、減圧下で処理を行う減圧下処理モジュールを有し、
前記減圧下処理モジュールは、基板に対してCOR処理を行うCORモジュール、及び、基板に対して加熱処理を行う加熱モジュールのうち少なくとも1つであり、
前記CORモジュール及び前記加熱モジュールは、複数の基板を同時に処理するように構成される、請求項1~9のいずれか一項に記載の基板処理装置。 - 基板保持部上における前記基板の有無を検知する基板検知部をさらに有する、請求項1~10のいずれか一項に記載の基板処理装置。
- 前記基板検知部は前記基板搬送機構に設けられる、請求項11に記載の基板処理装置。
- 基板処理装置で行われる基板搬送方法であって、
前記基板処理装置は、
大気圧下で基板が処理される大気部において、少なくとも1つの基板が収容された基板収容容器を配置するように構成されたロードポートと、
前記大気部と減圧下で基板が処理される減圧部との間で基板を受け渡すように構成されたロードロック室と、
前記大気部において基板に対して処理を行う処理モジュールと、
前記ロードポート、前記ロードロック室及び前記処理モジュールの間で基板を搬送する基板搬送機構と、を有し、
前記基板搬送機構は、複数の基板保持部を有し、各基板保持部は、1つの基板を保持するように構成され、
前記基板搬送方法は、
前記処理モジュールが基板を1つずつ処理する場合は、
第1の基板保持部を用いて前記ロードポートと前記処理モジュールとの間で基板を搬送するステップと、
第2の基板保持部を用いて前記ロードロック室と前記処理モジュールとの間で基板を搬送するステップとを有し、
前記基板搬送方法は、
前記処理モジュールが複数の基板を同時に処理する場合は、
前記複数の基板保持部を用いて前記ロードポート、前記ロードロック室及び前記処理モジュールの間で複数の基板を同時に搬送するステップを有する、基板搬送方法。 - 基板保持部に保持された前記基板の有無を検知するステップをさらに有する、請求項13に記載の基板搬送方法。
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