WO2016051595A1 - リードフレーム、半導体装置の製造方法 - Google Patents

リードフレーム、半導体装置の製造方法 Download PDF

Info

Publication number
WO2016051595A1
WO2016051595A1 PCT/JP2014/076571 JP2014076571W WO2016051595A1 WO 2016051595 A1 WO2016051595 A1 WO 2016051595A1 JP 2014076571 W JP2014076571 W JP 2014076571W WO 2016051595 A1 WO2016051595 A1 WO 2016051595A1
Authority
WO
WIPO (PCT)
Prior art keywords
narrow
lead terminal
wide
lead frame
end side
Prior art date
Application number
PCT/JP2014/076571
Other languages
English (en)
French (fr)
Inventor
坂本 健
武敏 鹿野
裕史 川島
Original Assignee
三菱電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三菱電機株式会社 filed Critical 三菱電機株式会社
Priority to PCT/JP2014/076571 priority Critical patent/WO2016051595A1/ja
Priority to US15/322,191 priority patent/US10541193B2/en
Priority to DE112014007018.1T priority patent/DE112014007018B4/de
Priority to KR1020177008409A priority patent/KR101979519B1/ko
Priority to JP2016551455A priority patent/JP6237919B2/ja
Priority to CN201480082449.5A priority patent/CN106796931B/zh
Publication of WO2016051595A1 publication Critical patent/WO2016051595A1/ja
Priority to US16/686,971 priority patent/US11387173B2/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4821Flat leads, e.g. lead frames with or without insulating supports
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49517Additional leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4821Flat leads, e.g. lead frames with or without insulating supports
    • H01L21/4842Mechanical treatment, e.g. punching, cutting, deforming, cold welding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/565Moulds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49541Geometry of the lead-frame
    • H01L23/49565Side rails of the lead frame, e.g. with perforations, sprocket holes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/50Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor for integrated circuit devices, e.g. power bus, number of leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/0601Structure
    • H01L2224/0603Bonding areas having different sizes, e.g. different heights or widths
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • H01L2224/48139Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate with an intermediate bond, e.g. continuous wire daisy chain
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/4901Structure
    • H01L2224/4903Connectors having different sizes, e.g. different diameters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49113Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting different bonding areas on the semiconductor or solid-state body to a common bonding area outside the body, e.g. converging wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92247Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49541Geometry of the lead-frame
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Definitions

  • the present invention relates to a lead frame and a method of manufacturing a semiconductor device provided with the lead frame.
  • Patent Document 1 discloses that, after sealing a lead frame with a resin, the unnecessary resin is plunged with a break pin and removed.
  • the tie bar width be larger.
  • the tie bar is the part to be cut before the product is completed. Therefore, in order to cut the tie bar easily, it is preferable that the tie bar width be smaller. As described above, when the width of the tie bar is reduced, it is difficult to fix the tie bar with the holding jig, and when the width of the tie bar is increased, the tie bar can not be easily cut.
  • the present invention was made to solve the above-mentioned problems, and it is easy to hold down a tie bar with a holding jig, and a lead frame easy to cut the tie bar, and a semiconductor device using the lead frame. Intended to provide a method.
  • a lead frame according to the present invention comprises a first lead terminal, a second lead terminal provided in parallel to the first lead terminal, and a tie bar connecting the first lead terminal and the second lead terminal.
  • the tie bar includes a first narrow portion in contact with the first lead terminal, a second narrow portion in contact with the second lead terminal, a width smaller than the first narrow portion and the second narrow portion.
  • a wide width portion connecting the first narrow width portion and the second narrow width portion, and a portion of the wide width portion between the first narrow width portion and the second narrow width portion A hole is formed.
  • a semiconductor element is fixed to a lead frame including a first lead terminal, a second lead terminal, and a tie bar connecting the first lead terminal and the second lead terminal.
  • a transfer molding step of providing a runner flow path along the tie bar to form a resin covering the semiconductor element, a first narrow portion in contact with the first lead terminal, and a second width in contact with the second lead terminal The wide portion of the tie bar including a narrow portion, a wide portion that is wider than the first narrow portion and the second narrow portion, and connects the first narrow portion and the second narrow portion.
  • the tie bar is provided with a large width portion and a small width portion, it is possible to easily hold the tie bar by the holding jig and cut the tie bar.
  • FIG. 1 is a plan view of a lead frame according to a first embodiment. It is a top view which shows a lead frame and a semiconductor element. It is a top view of a semiconductor device after wire connection. It is a top view of resin etc. It is a top view of a lead frame etc. in a removal process.
  • FIG. 6 is a cross-sectional view taken along a broken line VI-VI in FIG. 5;
  • FIG. 7 is a cross-sectional view taken along a broken line VII-VII in FIG. 5;
  • FIG. 2 is a cross-sectional view of a semiconductor device manufactured by the method of manufacturing a semiconductor device according to the first embodiment.
  • FIG. 10 is a partial plan view of a lead frame according to a second embodiment.
  • FIG. 18 is a plan view of a portion of a lead frame or the like according to a third embodiment.
  • FIG. 21 is a plan view of a portion of a lead frame according to a fourth embodiment; It is sectional drawing of a holding jig etc. in a removal process.
  • FIG. 21 is a plan view of a portion of a lead frame according to a fifth embodiment; It is sectional drawing of a holding jig etc. in a removal process.
  • FIG. 1 is a plan view of a lead frame 10 according to a first embodiment of the present invention.
  • the lead frame 10 is provided with an outer frame 12.
  • a first lead terminal 14, a second lead terminal 16, a third lead terminal 18, and a fourth lead terminal 20 are connected to the outer frame 12. These lead terminals are provided in parallel.
  • the outer frame 12 and the first lead terminal 14, the first lead terminal 14 and the second lead terminal 16, the second lead terminal 16 and the third lead terminal 18, and the third lead terminal 18 and the fourth lead terminal 20 are tie bars 22 respectively.
  • the tie bar 22 includes a first narrow portion 22a, a second narrow portion 22b, and a wide portion 22c.
  • the first narrow portion 22 a is in contact with the first lead terminal 14.
  • the second narrow portion 22 b is in contact with the second lead terminal 16.
  • the wide portion 22 c connects the first narrow portion 22 a and the second narrow portion 22 b.
  • the wide portion 22c is wider than the first narrow portion 22a and the second narrow portion 22b. That is, the wide portion 22c extends longer in the upward direction (y positive direction) than the first narrow width portion 22a and the second narrow width portion 22b, and extends in the lower direction (y negative direction).
  • a through hole 22d is formed in a portion between the first narrow width portion 22a and the second narrow width portion 22b in the wide width portion 22c.
  • FIG. 2 is a plan view showing the lead frame and the semiconductor element.
  • the semiconductor devices 30 and 32 are IGBT (Insulated Gate Bipolar Transistor) chips having an emitter and a base on the front surface and a collector on the back surface.
  • the semiconductor elements 34 and 36 are diodes having an anode on the front surface and a cathode on the back surface.
  • the collectors of the semiconductor devices 30 and 32 and the cathodes of the semiconductor devices 34 and 36 are fixed to the die pad portion of the first lead terminal 14 by soldering.
  • the semiconductor element is fixed to the die pad portion of the third lead terminal 18.
  • FIG. 3 is a plan view of the semiconductor device after wire connection.
  • the wire 40 connects the emitter of the semiconductor device 30 and the anode of the semiconductor device 34 to the second lead terminal 16.
  • the wire 42 connects the emitter of the semiconductor element 32 and the anode of the semiconductor element 36 to the second lead terminal 16.
  • the wire 44 connects the gate of the semiconductor element 30 and the control terminal 24.
  • the wire 46 connects the gate of the semiconductor element 32 and the control terminal 24.
  • the semiconductor element and a part of the lead frame are connected by wire. If necessary, a heat spreader is soldered to the lead frame.
  • FIG. 4 is a plan view of a resin or the like formed by the transfer molding process.
  • the lead frame is set in the mold cavity and clamped.
  • the resin is filled in the cavity through the pot portion (where the cull 50 is present), the runner flow path on the tie bar 22, and the gate flow path.
  • the resin is cured and the mold is opened to take out a molded product in which the lead frame and the resin are integrated from the mold.
  • the resin comprises cull 50, runner 52, gate 54 and package 56.
  • the runners 52 are provided on the tie bars 22 along the tie bars 22.
  • the runner 52 fills the through hole 22d of the wide portion 22c but does not cover the upper end and the lower end of the wide portion 22c. That is, the upper end portion of the wide portion 22c is exposed in the y positive direction of the runner 52, and the lower end portion of the wide portion 22c is exposed in the y negative direction of the runner 52.
  • the package 56 is a portion that covers the semiconductor element and protects the semiconductor element.
  • the process then proceeds to the removal step.
  • the removal step is a step of striking down the runner 52 attached to the tie bar 22.
  • FIG. 5 is a plan view of a lead frame or the like in the removing step.
  • the removing step first, the upper end portion of the wide portion 22 c of the tie bar 22 is fixed by the pressing jig 60, and the lower end portion of the wide portion 22 c is fixed by the pressing jig 62.
  • the holding jig 60 has an upper portion 60a and a lower portion 60b.
  • the upper portion 60a is in contact with the upper surface of the upper end portion of the wide portion 22c
  • the lower portion 60b is in contact with the lower surface of the upper portion of the wide portion 22c. Then, the upper end of the wide portion 22c is fixed by reducing the distance between the upper portion 60a and the lower portion 60b.
  • the holding jig 62 has an upper portion 62a and a lower portion 62b.
  • the upper portion 62a is in contact with the upper surface of the lower end portion of the wide portion 22c, and the lower portion 62b is in contact with the lower surface of the lower end portion of the wide portion 22c. Then, the distance between the upper portion 62a and the lower portion 62b is reduced to fix the lower end portion of the wide portion 22c.
  • the runner 52 is knocked down in a state where the upper end and the lower end of the wide portion 22c are fixed by the holding jigs 60 and 62.
  • 7 is a cross-sectional view taken along a broken line VII-VII in FIG.
  • the runner push pin 70 is inserted into the through hole 22d provided in the wide portion 22c, and the runner 52 is knocked down. That is, the resin formed in the through hole 22 d is pushed by the runner push pin 70 to knock down the runner 52.
  • a resin of a part of the runner 52 must be formed in the through hole 22d.
  • the runner 52 is separated from the tie bar 22.
  • FIG. 8 is a cross-sectional view of a semiconductor device manufactured by the method of manufacturing a semiconductor device according to the first embodiment of the present invention. By performing each of the above steps, a plurality of semiconductor devices shown in FIG. 8 are formed.
  • the tie bar 22 of the lead frame 10 has a first narrow width portion 22a, a second narrow width portion 22b, and a wide width portion 22c.
  • the upper end portion and the lower end portion of the wide portion 22c are fixed by pressing jigs 60 and 62. Since the wide portion 22c is larger in width than the first narrow portion 22a and the second narrow portion 22b, the wide portions 22c can be easily fixed by the pressing jigs 60 and 62. By fixing the wide portion 22c, the force of the runner push pin 70 can be efficiently applied to the runner 52, and the runner 52 can be reliably removed.
  • the first narrow portion 22a and the second narrow portion 22b which are narrower than the wide portion 22c, are cut. Therefore, the clamping pressure at the time of tie bar cutting can be lowered or the number of times of clamping can be reduced. That is, the tie bar 22 can be easily cut.
  • the upper end and the lower end of the wide portion 22c are fixed by the holding jigs 60 and 62, but either one of the upper end and the lower end may be fixed. Further, either one of the upper end and the lower end of the wide portion may be omitted.
  • the y coordinate of the lower end of the wide portion is maintained at a position where the upper end of the wide portion extends in the y positive direction longer than the upper ends of the first narrow portion 22a and the second narrow portion 22b.
  • the y coordinates of the lower ends of the first narrow portion 22a and the second narrow portion 22b may be matched.
  • the upper end of the wide portion is fixed by a pressing jig.
  • An insulating sheet may be provided on the back side of the semiconductor element. Devices other than IGBTs and diodes may be used as semiconductor elements.
  • FIG. 9 is a partial plan view of the lead frame according to the second embodiment.
  • the wide portion 22e is provided with a trapezoidal portion 22f (upper end portion) which is upwardly convex in plan view, and a trapezoidal portion 22g (lower end portion) which is downwardly convex in plan view.
  • the lead frame is produced by punching and pressing a metal plate with a punching die.
  • the clamping pressure on the lead frame of the punching die should be small. Therefore, trapezoidal portions 22f and 22g are provided in the wide portion 22e. Thereby, the clamping pressure of the punching die can be made smaller than in the case of forming the wide portion having a rectangular shape.
  • FIG. 10 is a partial plan view of a lead frame according to a modification.
  • the upper end portion 22i and the lower end portion 22j of the wide portion 22h are formed in a semicircular shape in plan view.
  • the outer edge of the wide portion 22 h is curved.
  • FIG. 11 is a partial plan view of a lead frame or the like according to a third embodiment.
  • the area in which the runners are formed is indicated by a dot-and-dash line.
  • the width (y1) of the first narrow width portion 22a and the second narrow width portion 22b is smaller than the width (y2) of the runner. Therefore, the clamping pressure at the time of tie bar cutting can be lowered or the number of times of clamping can be reduced.
  • the runner flow path of sufficient width is securable by making the width
  • FIG. 12 is a partial plan view of the lead frame according to the fourth embodiment.
  • An upper end side through hole 22k is formed on the upper end side of the wide portion 22c, and a lower end side through hole 22m is formed on the lower end side of the wide portion 22c.
  • the through hole 22d is located between the upper end through hole 22k and the lower end through hole 22m.
  • FIG. 13 is a cross-sectional view of a holding jig or the like in the removing step.
  • the wide portion 22c of the tie bar shown in FIG. 13 is a wide portion at line XIII-XIII in FIG.
  • the holding jig 60 has a convex portion 60c integrally formed with the upper portion 60a
  • the holding jig 62 has a convex portion 62c integrally formed with the upper portion 62a.
  • the convex portion 60c is inserted into the upper end side through hole 22k
  • the convex portion 62c is inserted into the lower end side through hole 22m.
  • the position of the lead frame can be set to a predetermined position, so that the runner pin can be reliably passed through the through hole 22d.
  • the convex portions 60c and 62c inserted into the upper end side through hole 22k and the lower end side through hole 22m suppress the displacement of the lead frame in the left-right direction. Therefore, displacement and lifting of the lead frame due to molding shrinkage of the runner 52 can be prevented. Moreover, since the upper end side through hole 22 k and the lower end side through hole 22 m are provided in a part of the tie bar 22, the convex portions 60 c and 62 c inserted into these are close to the runner 52. Therefore, the displacement of the lead frame can be sufficiently suppressed. Only one of the upper end side through hole and the lower end side through hole may be provided.
  • FIG. 14 is a partial plan view of the lead frame according to the fifth embodiment.
  • An upper end side recess 22o is formed on the upper end side of the wide portion 22c, and a lower end side recess 22p is formed on the lower end side of the wide portion 22c.
  • the through hole 22d is located between the upper end recess 22o at the upper end of the wide portion 22c and the lower end recess 22p at the lower end of the wide portion 22c.
  • FIG. 15 is a cross-sectional view of a holding jig or the like in the removing step.
  • the holding jigs 60 and 62 have convex portions 60c and 62c, respectively.
  • the convex portion 60c is inserted into the upper end side concave portion 22o
  • the convex portion 62c is inserted into the lower end side concave portion 22p.
  • the lead frame can be positioned at a predetermined position.
  • the convex portions 60c and 62c are pressed against the wide portion 22c, the effect of preventing the lead frame from floating can be enhanced.

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

 第1リード端子と、該第1リード端子と平行に設けられた第2リード端子と、該第1リード端子と該第2リード端子を接続するタイバーと、を備え、該タイバーは、該第1リード端子に接する第1幅狭部と、該第2リード端子に接する第2幅狭部と、該第1幅狭部と該第2幅狭部よりも幅が広く、該第1幅狭部と該第2幅狭部をつなぐ幅広部と、を備え、該幅広部のうち該第1幅狭部と該第2幅狭部の間の部分には貫通孔が形成されたことを特徴とする。

Description

リードフレーム、半導体装置の製造方法
 この発明は、リードフレーム及びリードフレームを備えた半導体装置の製造方法に関する。
 特許文献1には、リードフレームを樹脂で封止した後に、不要樹脂をブレイクピンで突いて除去することが開示されている。
日本特開2007-128930号公報
 ランナー突きピンで不要樹脂の一部であるランナーを突いて、ランナーを打ち落とす。ランナーの打ち落としは、タイバーの一部を押さえジグで押さえた状態で行うことが好ましい。押さえジグでタイバーを固定するためには、タイバー幅が大きい方が好ましい。
 他方、タイバーは製品完成前に切断される部分である。よって、タイバーを容易に切断するためには、タイバー幅が小さい方が好ましい。このように、タイバー幅を小さくすれば押さえジグでタイバーを固定しづらくなり、タイバー幅を大きくすればタイバーを容易に切断できなくなる問題があった。
 本発明は上述の問題を解決するためになされたものであり、押さえジグでタイバーを押さえることが容易であり、かつタイバーの切断が容易なリードフレームと、そのリードフレームを用いた半導体装置の製造方法を提供することを目的とする。
 本願の発明にかかるリードフレームは、第1リード端子と、該第1リード端子と平行に設けられた第2リード端子と、該第1リード端子と該第2リード端子を接続するタイバーと、を備え、該タイバーは、該第1リード端子に接する第1幅狭部と、該第2リード端子に接する第2幅狭部と、該第1幅狭部と該第2幅狭部よりも幅が広く、該第1幅狭部と該第2幅狭部をつなぐ幅広部と、を備え、該幅広部のうち該第1幅狭部と該第2幅狭部の間の部分には貫通孔が形成されたことを特徴とする。
 本願の発明にかかる半導体装置の製造方法は、第1リード端子と、第2リード端子と、該第1リード端子と該第2リード端子を接続するタイバーを備えるリードフレームに半導体素子を固定する工程と、該タイバーに沿ったランナー流路を設け該半導体素子を覆う樹脂を形成するトランスファーモールド工程と、該第1リード端子に接する第1幅狭部と、該第2リード端子に接する第2幅狭部と、該第1幅狭部と該第2幅狭部よりも幅が広く、該第1幅狭部と該第2幅狭部をつなぐ幅広部と、を備える該タイバーの該幅広部の上端部又は下端部を押さえジグで固定しつつ、該幅広部のうち該第1幅狭部と該第2幅狭部の間の部分に設けられた貫通孔にランナー突きピンを挿入し、該タイバーに付着したランナーを打ち落とす除去工程と、該第1幅狭部と該第2幅狭部を切断する工程と、を備えたことを特徴とする。
 本発明のその他の特徴は以下に明らかにする。
 この発明によれば、タイバーに幅の大きい部分と幅の小さい部分を設けたので、押さえジグでタイバーを押さえることと、タイバーを切断することを容易に実施できる。
実施の形態1に係るリードフレームの平面図である。 リードフレームと半導体素子を示す平面図である。 ワイヤ接続後の半導体装置の平面図である。 樹脂等の平面図である。 除去工程におけるリードフレーム等の平面図である。 図5のVI-VI破線における断面図である。 図5のVII-VII破線における断面図である。 実施の形態1に係る半導体装置の製造方法で製造された半導体装置の断面図である。 実施の形態2に係るリードフレームの一部平面図である。 変形例に係るリードフレームの一部平面図である。 実施の形態3に係るリードフレーム等の一部平面図である。 実施の形態4に係るリードフレームの一部平面図である。 除去工程における押さえジグ等の断面図である。 実施の形態5に係るリードフレームの一部平面図である。 除去工程における押さえジグ等の断面図である。
 本発明の実施の形態に係るリードフレーム及び半導体装置の製造方法について図面を参照して説明する。同じ又は対応する構成要素には同じ符号を付し、説明の繰り返しを省略する場合がある。
実施の形態1.
 図1は、本発明の実施の形態1に係るリードフレーム10の平面図である。リードフレーム10は外枠12を備えている。外枠12には、第1リード端子14、第2リード端子16、第3リード端子18、及び第4リード端子20が接続されている。これらのリード端子は平行に設けられている。
 外枠12と第1リード端子14、第1リード端子14と第2リード端子16、第2リード端子16と第3リード端子18、第3リード端子18と第4リード端子20は、それぞれタイバー22で接続されている。タイバー22は、第1幅狭部22a、第2幅狭部22b及び幅広部22cを備えている。第1幅狭部22aは第1リード端子14に接する。第2幅狭部22bは第2リード端子16に接する。幅広部22cは第1幅狭部22aと第2幅狭部22bをつなぐ。
 幅広部22cは、第1幅狭部22aと第2幅狭部22bよりも幅が広い。つまり、幅広部22cは、第1幅狭部22aと第2幅狭部22bよりも上方向(y正方向)に長く伸び、かつ下方向(y負方向)に長く伸びている。幅広部22cのうち第1幅狭部22aと第2幅狭部22bの間の部分には貫通孔22dが形成されている。
 本発明の実施の形態1に係る半導体装置の製造方法を説明する。まず、リードフレームに半導体素子を固定する。図2は、リードフレームと半導体素子を示す平面図である。半導体素子30、32は表面にエミッタとベースを有し裏面にコレクタを有するIGBT(Insulated Gate Bipolar transistor)チップである。半導体素子34、36は表面にアノードを有し裏面にカソードを有するダイオードである。半導体素子30、32のコレクタと半導体素子34、36のカソードをはんだで第1リード端子14のダイパッド部分に固定する。同様に、半導体素子を第3リード端子18のダイパッド部分に固定する。
 次いで、必要なワイヤ接続を行う。図3は、ワイヤ接続後の半導体装置の平面図である。ワイヤ40は、半導体素子30のエミッタと半導体素子34のアノードを第2リード端子16に接続する。ワイヤ42は、半導体素子32のエミッタと半導体素子36のアノードを第2リード端子16に接続する。ワイヤ44は、半導体素子30のゲートと制御端子24を接続する。ワイヤ46は、半導体素子32のゲートと制御端子24を接続する。こうして、半導体素子とリードフレームの一部をワイヤ接続する。なお、必要に応じて、リードフレームにヒートスプレッダをはんだ接合する。
 次いで、トランスファーモールド工程に処理を進める。トランスファーモールド工程では、複数の成形品を1セットの金型で成形する。この成形方式は、サイドランナーゲート方式と呼ばれている。図4は、トランスファーモールド工程により形成された樹脂等の平面図である。トランスファーモールド工程では、リードフレームを金型のキャビティ内にセットし、型締めする。そして、ポット部(カル50のある場所)、タイバー22上のランナー流路、及びゲート流路を経由させた樹脂を、キャビティ内に充填する。その後、樹脂を硬化させ、型開きすることで、リードフレームと樹脂が一体化した成形品を金型から取り出す。樹脂は、カル50、ランナー52、ゲート54及びパッケージ56を含む。ランナー52はタイバー22に沿ってタイバー22の上に設けられる。ランナー52は幅広部22cの貫通孔22dを埋めるが、幅広部22cの上端部と下端部は覆わない。つまり、幅広部22cの上端部はランナー52のy正方向に露出し、幅広部22cの下端部はランナー52のy負方向に露出している。パッケージ56は、半導体素子を覆い、半導体素子を保護する部分である。
 次いで、除去工程に処理を進める。除去工程は、タイバー22に付着したランナー52を打ち落とす工程である。図5は、除去工程におけるリードフレーム等の平面図である。除去工程ではまず、タイバー22の幅広部22cの上端部を押さえジグ60で固定し、幅広部22cの下端部を押さえジグ62で固定する。
 図6は、図5のVI-VI破線における断面図である。押さえジグ60は上部60aと下部60bを備えている。上部60aが幅広部22cの上端部の上面に接し、下部60bが幅広部22cの上端部の下面に接する。そして、上部60aと下部60bの距離を小さくすることで、幅広部22cの上端部を固定する。押さえジグ62は上部62aと下部62bを備えている。上部62aが幅広部22cの下端部の上面に接し、下部62bが幅広部22cの下端部の下面に接する。そして、上部62aと下部62bの距離を小さくすることで、幅広部22cの下端部を固定する。
 このように、幅広部22cの上端部と下端部を押さえジグ60、62により固定した状態で、ランナー52を打ち落とす。図7は、図5のVII-VII破線における断面図である。幅広部22cに設けられた貫通孔22dにランナー突きピン70を挿入し、ランナー52を打ち落とす。つまり、貫通孔22dに形成された樹脂をランナー突きピン70で突いて、ランナー52を打ち落とす。ランナー突きピン70でランナー52を打ち落とすためには、貫通孔22dにランナー52の一部の樹脂が形成されていなければならない。こうして、ランナー52をタイバー22から分離させる。
 次いで、パッケージ56を完全硬化させるための加熱工程を実施する。次いで、タイバー22の第1幅狭部22aと第2幅狭部22bを切断する。さらに、例えば外枠12等のリードフレーム10の不要部分を切断する。その後、リード端子の成形、製品テスト等を経て、半導体装置が完成する。図8は、本発明の実施の形態1に係る半導体装置の製造方法で製造された半導体装置の断面図である。上記の各工程を実施することで、図8に示す半導体装置が複数個形成される。
 実施の形態1に係るリードフレーム10のタイバー22は、第1幅狭部22a、第2幅狭部22b及び幅広部22cを有している。除去工程では、幅広部22cの上端部と下端部を押さえジグ60、62で固定する。幅広部22cは、第1幅狭部22aと第2幅狭部22bよりも幅が大きいので、押さえジグ60、62により容易に幅広部22cを固定できる。幅広部22cを固定することで、ランナー突きピン70の力を効率よくランナー52にかけて確実にランナー52を除去できる。
 また、タイバー22を切断する際には、幅広部22cよりも幅の狭い第1幅狭部22aと第2幅狭部22bを切断する。したがって、タイバーカット時のクランプ圧を低くしたり、クランプ回数を少なくしたりすることができる。つまり、容易にタイバー22を切断できる。
 除去工程では押さえジグ60、62で幅広部22cの上端部と下端部を固定したが、上端部と下端部のずれか一方を固定してもよい。また、幅広部の上端部と下端部のいずれか一方を省略してもよい。例えば、図1において、幅広部の上端は第1幅狭部22aと第2幅狭部22bの上端よりもy正方向に長く伸びた状態を維持しつつ、幅広部の下端のy座標を第1幅狭部22aと第2幅狭部22bの下端のy座標と一致させてもよい。この場合、押さえジグで幅広部の上端部を固定する。半導体素子の裏面側に絶縁シートを設けてもよい。半導体素子としてIGBTとダイオード以外のデバイスを利用しても良い。
 これらの変形は以下の実施の形態に係るリードフレームと半導体装置の製造方法にも応用できる。なお、以下の実施の形態に係るリードフレーム及び半導体装置の製造方法は、実施の形態1との共通点が多いので実施の形態1との相違点を中心に説明する。
実施の形態2.
 図9は、実施の形態2に係るリードフレームの一部平面図である。幅広部22eは平面視で上に凸となる台形部分22f(上端部分)と、平面視で下に凸となる台形部分22g(下端部分)を備えている。リードフレームは、金属板をパンチング金型でパンチングプレスすることにより生産する。パンチング金型のリードフレームに対するクランプ圧力は小さい方がよい。そこで、幅広部22eに台形部分22f、22gを設けた。これにより、矩形形状の幅広部を形成する場合よりも、パンチング金型のクランプ圧力を小さくすることができる。
 図10は、変形例に係るリードフレームの一部平面図である。幅広部22hの上端部分22iと下端部分22jは平面視で半円状に形成されている。これにより、幅広部22hの外縁は曲線となっている。幅広部の外縁を曲線とすることで、パンチング金型のクランプ圧力を小さくすることができる。
実施の形態3.
 図11は、実施の形態3に係るリードフレーム等の一部平面図である。ランナーが形成される領域は一点鎖線で示されている。第1幅狭部22aと第2幅狭部22bの幅(y1)は、ランナーの幅(y2)より小さい。よって、タイバーカット時のクランプ圧を低くしたり、クランプ回数を少なくしたりすることができる。また、ランナーの幅(y2)を第1幅狭部22aと第2幅狭部22bの幅(y1)より大きくすることで、十分な幅のランナー流路を確保できる。
実施の形態4.
 図12は、実施の形態4に係るリードフレームの一部平面図である。幅広部22cの上端側には上端側貫通孔22kが形成され、幅広部22cの下端側には下端側貫通孔22mが形成されている。貫通孔22dは、上端側貫通孔22kと下端側貫通孔22mに挟まれた位置にある。
 図13は、除去工程における押さえジグ等の断面図である。図13に示されるタイバーの幅広部22cは、図12のXIII-XIII線における幅広部である。押さえジグ60は上部60aと一体形成された凸部60cを有し、押さえジグ62は上部62aと一体形成された凸部62cを有している。除去工程では、凸部60cを上端側貫通孔22kに挿入し、凸部62cを下端側貫通孔22mに挿入する。これにより、リードフレームの位置を予め定められた位置にすることができるので、確実にランナー突きピンを貫通孔22dに通すことができる。
 上端側貫通孔22kと下端側貫通孔22mに挿入された凸部60c、62cは、リードフレームの左右方向の変位を抑制する。したがって、ランナー52の成型収縮によるリードフレームの変位及び浮きを防ぐことができる。しかも、上端側貫通孔22kと下端側貫通孔22mがタイバー22の一部に設けられているので、これらに挿入される凸部60c、62cはランナー52に近接している。そのため、リードフレームの変位を十分に抑制することができる。なお、上端側貫通孔と下端側貫通孔のいずれか一方だけを設けてもよい。
実施の形態5.
 図14は、実施の形態5に係るリードフレームの一部平面図である。幅広部22cの上端側には上端側凹部22oが形成され、幅広部22cの下端側には下端側凹部22pが形成されている。貫通孔22dは、幅広部22cの上端部にある上端側凹部22oと幅広部22cの下端部にある下端側凹部22pに挟まれた位置にある。
 図15は、除去工程における押さえジグ等の断面図である。押さえジグ60、62はそれぞれ凸部60c、62cを有している。除去工程では、凸部60cを上端側凹部22oに挿入し、凸部62cを下端側凹部22pに挿入する。これにより、リードフレームを予め定められた場所に位置させることができる。しかも、凸部60c、62cが幅広部22cに押し付けられるので、リードフレームの浮きを防止する効果を高めることができる。
 なお、上記の各実施の形態に係るリードフレームと半導体装置の製造方法の特徴を適宜に組み合わせても良い。
 10 リードフレーム、 12 外枠、 14 第1リード端子、 16 第2リード端子、 18 第3リード端子、 20 第4リード端子、 22 タイバー、 22a 第1幅狭部、 22b 第2幅狭部、 22c 幅広部、 22d 貫通孔、 22k 上端側貫通孔、 22m 下端側貫通孔、 22o 上端側凹部、 22p 下端側凹部、 24 制御端子、 30,32,34,36 半導体素子、 50 カル、 52 ランナー、 54 ゲート、 56 パッケージ、 60,62 押さえジグ、 70 ランナー突きピン

Claims (9)

  1.  第1リード端子と、
     前記第1リード端子と平行に設けられた第2リード端子と、
     前記第1リード端子と前記第2リード端子を接続するタイバーと、を備え、
     前記タイバーは、
     前記第1リード端子に接する第1幅狭部と、
     前記第2リード端子に接する第2幅狭部と、
     前記第1幅狭部と前記第2幅狭部よりも幅が広く、前記第1幅狭部と前記第2幅狭部をつなぐ幅広部と、を備え、
     前記幅広部のうち前記第1幅狭部と前記第2幅狭部の間の部分には貫通孔が形成されたことを特徴とするリードフレーム。
  2.  前記幅広部は平面視で上に凸となる台形部分と、平面視で下に凸となる台形部分を備えたことを特徴とする請求項1に記載のリードフレーム。
  3.  前記幅広部の外縁は曲線であることを特徴とする請求項1に記載のリードフレーム。
  4.  前記幅広部の上端側には上端側貫通孔が形成され、前記幅広部の下端側には下端側貫通孔が形成されたことを特徴とする請求項1~3のいずれか1項に記載のリードフレーム。
  5.  前記幅広部の上端側には上端側凹部が形成され、前記幅広部の下端側には下端側凹部が形成されたことを特徴とする請求項1~3のいずれか1項に記載のリードフレーム。
  6.  第1リード端子と、第2リード端子と、前記第1リード端子と前記第2リード端子を接続するタイバーを備えるリードフレームに半導体素子を固定する工程と、
     前記タイバーに沿ったランナー流路を設け前記半導体素子を覆う樹脂を形成するトランスファーモールド工程と、
     前記第1リード端子に接する第1幅狭部と、前記第2リード端子に接する第2幅狭部と、前記第1幅狭部と前記第2幅狭部よりも幅が広く、前記第1幅狭部と前記第2幅狭部をつなぐ幅広部と、を備える前記タイバーの前記幅広部の上端部又は下端部を押さえジグで固定しつつ、前記幅広部のうち前記第1幅狭部と前記第2幅狭部の間の部分に設けられた貫通孔にランナー突きピンを挿入し、前記タイバーに付着したランナーを打ち落とす除去工程と、
     前記第1幅狭部と前記第2幅狭部を切断する工程と、を備えたことを特徴とする半導体装置の製造方法。
  7.  前記第1幅狭部と前記第2幅狭部の幅は、前記ランナーの幅より小さいことを特徴とする請求項6に記載の半導体装置の製造方法。
  8.  前記幅広部には、前記上端部に設けられた上端側貫通孔、又は前記下端部に設けられた下端側貫通孔が形成され、
     前記押さえジグは凸部を有し、前記除去工程では、前記凸部を前記上端側貫通孔又は前記下端側貫通孔に挿入し、前記リードフレームの位置を予め定められた位置にすることを特徴とする請求項6又は7に記載の半導体装置の製造方法。
  9.  前記幅広部には、前記上端部に設けられた上端側凹部、又は前記下端部に設けられた下端側凹部が形成され、
     前記押さえジグは凸部を有し、前記除去工程では、前記凸部を前記上端側凹部又は前記下端側凹部に挿入し、前記リードフレームの位置を予め定められた位置にすることを特徴とする請求項6又は7に記載の半導体装置の製造方法。
PCT/JP2014/076571 2014-10-03 2014-10-03 リードフレーム、半導体装置の製造方法 WO2016051595A1 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
PCT/JP2014/076571 WO2016051595A1 (ja) 2014-10-03 2014-10-03 リードフレーム、半導体装置の製造方法
US15/322,191 US10541193B2 (en) 2014-10-03 2014-10-03 Lead frame and method for manufacturing semiconductor device
DE112014007018.1T DE112014007018B4 (de) 2014-10-03 2014-10-03 Leiterrahmen und Verfahren für eine Fertigung einer Halbleitervorrichtung
KR1020177008409A KR101979519B1 (ko) 2014-10-03 2014-10-03 리드 프레임, 반도체 장치의 제조 방법
JP2016551455A JP6237919B2 (ja) 2014-10-03 2014-10-03 リードフレーム、半導体装置の製造方法
CN201480082449.5A CN106796931B (zh) 2014-10-03 2014-10-03 引线框、半导体装置的制造方法
US16/686,971 US11387173B2 (en) 2014-10-03 2019-11-18 Method for manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2014/076571 WO2016051595A1 (ja) 2014-10-03 2014-10-03 リードフレーム、半導体装置の製造方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US15/322,191 A-371-Of-International US10541193B2 (en) 2014-10-03 2014-10-03 Lead frame and method for manufacturing semiconductor device
US16/686,971 Division US11387173B2 (en) 2014-10-03 2019-11-18 Method for manufacturing semiconductor device

Publications (1)

Publication Number Publication Date
WO2016051595A1 true WO2016051595A1 (ja) 2016-04-07

Family

ID=55629680

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2014/076571 WO2016051595A1 (ja) 2014-10-03 2014-10-03 リードフレーム、半導体装置の製造方法

Country Status (6)

Country Link
US (2) US10541193B2 (ja)
JP (1) JP6237919B2 (ja)
KR (1) KR101979519B1 (ja)
CN (1) CN106796931B (ja)
DE (1) DE112014007018B4 (ja)
WO (1) WO2016051595A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019087686A (ja) * 2017-11-09 2019-06-06 トヨタ自動車株式会社 半導体装置の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117581362A (zh) * 2021-06-30 2024-02-20 艾迈斯-欧司朗国际有限责任公司 引线框架片和光电子半导体器件

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62200749A (ja) * 1986-02-28 1987-09-04 Nec Kyushu Ltd リ−ドフレ−ム
JPH09205698A (ja) * 1996-01-25 1997-08-05 Star Micronics Co Ltd 電気音響変換器
JPH11317484A (ja) * 1998-05-07 1999-11-16 Sony Corp リードフレーム及びそれを用いたパッケージ方法
JP2007129113A (ja) * 2005-11-05 2007-05-24 Towa Corp 成形済マトリクス型リードフレームのゲート切断方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5224832B2 (ja) * 1971-09-16 1977-07-04
JPS63170962U (ja) 1987-04-24 1988-11-07
JPH0555424A (ja) * 1991-08-22 1993-03-05 Nec Corp リードフレームにおけるタイバ除去方法
JPH088280A (ja) * 1994-06-22 1996-01-12 Omron Corp 電子部品及びその製造方法
JPH08264702A (ja) * 1995-03-28 1996-10-11 Rohm Co Ltd 半導体装置のリードフレーム及びこれを用いた半導体装置
JPH09134989A (ja) * 1995-11-10 1997-05-20 Hitachi Constr Mach Co Ltd ダムバー切断方法
JPH09200895A (ja) * 1996-01-16 1997-07-31 Star Micronics Co Ltd 電気音響変換器
JP4537620B2 (ja) 2000-06-16 2010-09-01 アピックヤマダ株式会社 ランナー突き貫通穴を有するリードフレーム
CN1337743A (zh) * 2000-08-04 2002-02-27 台湾通用器材股份有限公司 半导体装置的封装组装装置及其制造方法
DE102005043928B4 (de) * 2004-09-16 2011-08-18 Sharp Kk Optisches Halbleiterbauteil und Verfahren zu dessen Herstellung
US7525180B2 (en) * 2005-10-24 2009-04-28 Panasonic Corporation Semiconductor mount substrate, semiconductor device and method of manufacturing semiconductor package
JP2007128930A (ja) 2005-11-01 2007-05-24 Matsushita Electric Ind Co Ltd 不要樹脂の除去方法および装置ならびにモールド済みリードフレーム
JP2007324149A (ja) 2006-05-30 2007-12-13 Matsushita Electric Ind Co Ltd 半導体装置の樹脂封止用金型および樹脂封止方法
JP2008028189A (ja) * 2006-07-21 2008-02-07 Renesas Technology Corp 半導体装置の製造方法
JP2008066696A (ja) 2006-08-10 2008-03-21 Denso Corp 半導体製造装置および半導体製造方法
JP5271861B2 (ja) * 2009-10-07 2013-08-21 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
JP2012015202A (ja) * 2010-06-29 2012-01-19 On Semiconductor Trading Ltd 半導体装置およびその製造方法
CN201749848U (zh) * 2010-08-12 2011-02-16 苏州固锝电子股份有限公司 一种用于制造整流器的引线框架
US8674485B1 (en) * 2010-12-08 2014-03-18 Amkor Technology, Inc. Semiconductor device including leadframe with downsets
JP6100612B2 (ja) * 2013-05-27 2017-03-22 ルネサスエレクトロニクス株式会社 半導体装置の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62200749A (ja) * 1986-02-28 1987-09-04 Nec Kyushu Ltd リ−ドフレ−ム
JPH09205698A (ja) * 1996-01-25 1997-08-05 Star Micronics Co Ltd 電気音響変換器
JPH11317484A (ja) * 1998-05-07 1999-11-16 Sony Corp リードフレーム及びそれを用いたパッケージ方法
JP2007129113A (ja) * 2005-11-05 2007-05-24 Towa Corp 成形済マトリクス型リードフレームのゲート切断方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019087686A (ja) * 2017-11-09 2019-06-06 トヨタ自動車株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
CN106796931B (zh) 2019-06-04
US20200091047A1 (en) 2020-03-19
US20170148709A1 (en) 2017-05-25
US10541193B2 (en) 2020-01-21
JPWO2016051595A1 (ja) 2017-04-27
CN106796931A (zh) 2017-05-31
KR20170048466A (ko) 2017-05-08
DE112014007018B4 (de) 2021-04-29
US11387173B2 (en) 2022-07-12
DE112014007018T5 (de) 2017-07-13
KR101979519B1 (ko) 2019-05-16
JP6237919B2 (ja) 2017-11-29

Similar Documents

Publication Publication Date Title
JP5762078B2 (ja) リードフレーム
KR20070112095A (ko) 반도체 장치의 제조 방법
KR20190002931U (ko) 예비성형된 리드 프레임 및 이 리드 프레임으로부터 제조된 리드 프레임 패키지
US11387173B2 (en) Method for manufacturing semiconductor device
CN108538728B (zh) 制造半导体器件的方法
JP4039298B2 (ja) 樹脂封止型半導体装置およびその製造方法ならびに成形型
CN218867095U (zh) 半导体装置、半导体器件以及安装基板
JP5264677B2 (ja) 樹脂封止型半導体装置及びその製造方法
WO2017114411A1 (zh) 芯片封装方法
JP4652932B2 (ja) モールド型電子部品
CN110718471A (zh) 树脂密封模具和半导体装置的制造方法
JP6494465B2 (ja) 半導体装置の製造方法
JP6338406B2 (ja) 半導体装置の製造方法
JP4973033B2 (ja) パワーモジュールの製造方法
JP7178976B2 (ja) 半導体製造装置および半導体装置の製造方法
JP5534559B2 (ja) モールドパッケージの製造方法
KR200331876Y1 (ko) 반도체리드프레임의타이바와인너리드고정구조
JP2011159876A (ja) 半導体装置の製造方法
JP2010056371A (ja) 樹脂封止型半導体装置とその製造方法
JP3293105B2 (ja) 半導体中間構体及びその樹脂モールド装置
KR20090001103U (ko) 반도체 소자 패키징용 몰딩구조
JP2008251758A (ja) 半導体パッケージおよび射出成形用金型および半導体パッケージの製造方法
CN113594124A (zh) 用于半导体电路的装置
KR20230138980A (ko) 반도체 리드 프레임의 타이바와 인너리드 고정구조
JP3146207U (ja) リードフレームおよび半導体装置

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14903466

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2016551455

Country of ref document: JP

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 15322191

Country of ref document: US

ENP Entry into the national phase

Ref document number: 20177008409

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 112014007018

Country of ref document: DE

122 Ep: pct application non-entry in european phase

Ref document number: 14903466

Country of ref document: EP

Kind code of ref document: A1