WO2016017383A1 - Esd素子を有する半導体装置 - Google Patents
Esd素子を有する半導体装置 Download PDFInfo
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- WO2016017383A1 WO2016017383A1 PCT/JP2015/069643 JP2015069643W WO2016017383A1 WO 2016017383 A1 WO2016017383 A1 WO 2016017383A1 JP 2015069643 W JP2015069643 W JP 2015069643W WO 2016017383 A1 WO2016017383 A1 WO 2016017383A1
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- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
- H01L27/027—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements specially adapted to provide an electrical current path other than the field effect induced current path
- H01L27/0274—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements specially adapted to provide an electrical current path other than the field effect induced current path involving a parasitic bipolar transistor triggered by the electrical biasing of the gate electrode of the field effect transistor, e.g. gate coupled transistors
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823418—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the source or drain structures, e.g. specific source or drain implants or silicided source or drain structures or raised source or drain structures
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/4824—Pads with extended contours, e.g. grid structure, branch structure, finger structure
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- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Geometry or layout of the interconnection structure
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
- H01L27/027—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements specially adapted to provide an electrical current path other than the field effect induced current path
- H01L27/0277—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements specially adapted to provide an electrical current path other than the field effect induced current path involving a parasitic bipolar transistor triggered by the local electrical biasing of the layer acting as base of said parasitic bipolar transistor
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
Definitions
- the present invention relates to a semiconductor device having an ESD element made of a transistor.
- the ESD element is essential for reliability. This is an electrostatic discharge element that discharges static electricity so that the IC is not destroyed by static electricity.
- the ESD element itself is not thermally destroyed by static electricity, and that the internal circuit can be protected by quickly extracting charges before static electricity enters the internal circuit.
- the ESD element characteristics are required to suppress local heat generation and to have high driving ability.
- NMOS transistors as shown in FIGS. 8A to 8C can be mentioned.
- (A) is a plan view
- (B) is a cross-sectional view taken along line A-A ′
- (C) is an equivalent circuit.
- the gate electrodes 1 to 6 and the N + source 11 of the NMOS transistor are connected to the Vss terminal having the lower power supply potential via the wiring 17, and the N + drain 12 is connected to the pad via the wiring 18.
- the NMOS transistor is in the P-well 14.
- the P well 14 has a P well potential fixing P + region 13 for fixing the potential, and is connected to a wiring 17 having a Vss potential through a contact 16.
- N + or P + indicates that the impurity concentration is higher than the region represented by N or P by the symbol of + together with the conductivity type of the semiconductor, and that the metal wiring and the ohmic contact can be formed substantially. Represents. It is assumed that the N + drain has the same meaning even when written as a high concentration N-type drain.
- the transistors farthest from the P well potential fixing P + region 13 are the transistors of the gate electrodes 3 and 4, and the closest transistors are the transistors of the gate electrodes 1 and 6.
- the distance is the gate electrode 2 and 5 transistor.
- a LOCOS oxide film 10 is provided between the transistors on both sides and the well potential fixing P + region 13, and a gate insulating film 15 is disposed under each gate electrode.
- the transistors of the gate electrodes 1 and 6 are Rpw1
- the transistors of the gate electrodes 2 and 5 are Rpw2
- the transistors of the gate electrodes 3 and 4 are Rpw3
- the P-well parasitic resistance is directly below each transistor.
- P0 well 14 to Vss Since the parasitic resistance corresponds to the distance from each transistor to the P + region 13 for fixing the P well potential, the following relationship is established.
- Rpw1 ⁇ Rpw2 ⁇ Rpw3 Therefore, it is the transistor of the gate electrodes 3 and 4 having the parasitic resistance of Rpw3 that is most likely to cause the parasitic bipolar operation, and its current-voltage characteristic is the IV characteristic 52 of FIG. Concentration occurs.
- the transistors of the gate electrodes 2 and 5 and the transistors of the gate electrodes 1 and 6 exhibit IV characteristics 51 and 50, respectively.
- FIG. 9A to 9C are conceptual diagrams of the present invention, in which FIG. 9A is a plan view, FIG. 9B is a cross-sectional view taken along line B-B ′, and FIG. 9C is an equivalent circuit.
- FIG. 9A it is assumed that the pad electrode 18 is not in a floating state but is connected to the pad via an upper layer electrode.
- FIGS. 9A to 9C show that the gate electrodes 1 to 6 are connected to the first P + region 23 for fixing the P well.
- the electrode 20 connecting the second P + region 24 for fixing the P well and the gate electrode without connecting directly to the Vss electrode 17 that is formed, A parasitic resistance Rpw9 of the P well 14 is added between the gate electrodes 1 to 6 and Vss.
- Rpw4 to 9 are parasitic resistances of the P well, and the following relationship is established.
- the transistors of the gate electrode 1 and the gate electrode 6 when comparing the transistors of the gate electrode 1 and the gate electrode 6, the transistors of the gate electrode 1 and the gate Since the P-well potential of the channel portion of the transistor of the electrode 6 is more likely to rise in the gate electrode 1, the Vth of the transistor of the gate electrode 1 is lower than that of the gate electrode 6 due to the back gate effect, and the channel current at the same gate potential is The transistor of electrode 1 is larger. Further, the parasitic bipolar current is limited to the transistor of the gate electrode 1. In other words, the following relationship is obtained.
- FIG. 9D schematically shows this current-voltage characteristic.
- a curve 53 represents a current flowing through the transistor of the gate electrode 1
- a curve 54 represents a current flowing through the transistor of the gate electrode 6.
- Rpw9 since Rpw9 is large in the structure of FIG. 9, it easily enters the parasitic bipolar operation more than necessary, and the hold voltage Vhold in FIG. 9 (D) may be extremely lowered to be lower than the power supply voltage of the IC.
- the pad electrode 18 is a power supply voltage pad and the relationship of power supply voltage> Vhold is established, if any noise exceeding the trigger voltage Vtrig is injected from the power supply voltage pad when the power supply voltage is supplied, the power supply voltage pad and the Vss pad Latch-up will occur between the two.
- the P-well fixing first is shaped so as to surround the transistor so that the circuit inside the IC does not latch up due to noise injected from the PAD.
- a P + region 23 is laid out.
- the current-concentrated transistor in this case is the transistor of the gate electrode 1 as in FIG. 9, but among them, both ends and the center of the gate electrode 1 with respect to the gate width direction (the direction perpendicular to the direction connecting the N + source and N + drain). Then, since the distance to the P + guard ring 14 is farther in the center, the current concentrates in the channel near the center of the gate electrode 1 in the transistor of the gate electrode 1, and the ESD resistance is further reduced. Therefore, current concentration occurs in the single-finger type ESD element having only one transistor instead of the multi-finger type in which a plurality of transistors are arranged as shown in FIGS. 8 to 10, and the performance of the ESD element cannot be extracted. .
- FIG. 9, which is the invention of Patent Document 1, has an effect of improving the ESD tolerance as compared with the conventional method of FIG. 8, but current tends to concentrate on the transistor of the gate electrode 1 and is used for the power supply voltage pad. If so, there is a high probability of inducing latch-up. Further, when the structure for increasing the latch-up strength is used, the current is more likely to be concentrated, and the capability of the ESD element cannot be fully extracted.
- FIGS. (A) is a plan view
- (B) is a cross-sectional view of C-C ′
- (C) is an equivalent circuit. This is a technique in which a P-well fixing second P + region 24 is provided adjacent to the N + source 11 of the transistor and connected to the Vss electrode 17, up to the P-well fixing second P + region 24 for all transistors and all channels.
- FIG. 11D shows the current-voltage characteristics of FIGS. 11A to 11C. In order to facilitate comparison, the characteristics are overlaid on the characteristics shown in FIG. As shown in FIGS.
- a semiconductor device having an ESD element is A semiconductor substrate; A P-well having a higher impurity concentration than the semiconductor substrate provided on the surface of the semiconductor substrate; An N-type source and an N-type drain provided on the surface of the semiconductor substrate in the P-well and having an impurity concentration higher than that of the semiconductor substrate; A P-type region provided on the surface of the semiconductor substrate in contact with the N-type source and having a higher impurity concentration than the semiconductor substrate; A gate insulating film provided on the surface of the semiconductor substrate between the N-type source and the N-type drain; A gate electrode provided on the gate insulating film; Have The N-type drain is connected to a pad electrode; The N-type source is connected to the lower power supply potential; A semiconductor device having an ESD element, wherein the N-type source and the P-type region are not connected by an electrode.
- the semiconductor device having the ESD element includes a plurality of the P-type regions, and the plurality of P-type regions are electrically made of a substance having a resistivity equal to or smaller than the plurality of the P-type regions.
- a semiconductor device having a connected ESD element is used.
- the semiconductor device having the ESD element is a semiconductor device having an ESD element in which the gate electrode is electrically connected to the N-type source. In another aspect, the semiconductor device having the ESD element is a semiconductor device having an ESD element in which the gate electrode is electrically connected to the P-type region.
- the ESD element When the ESD element is operated, a uniform current flows in the channels of the plurality of transistors constituting the ESD element, and the ESD element can be sufficiently extracted while suppressing heat generation. As a result, the ESD element The area can be reduced. Furthermore, the withstand voltage can be easily adjusted depending on the structure.
- Example 1 It is a figure of Example 1 of this invention, (A) is a top view, (B) is sectional drawing of line segment DD ', (C) is an equivalent circuit. It is a figure of Example 2 of this invention, (A) is a top view, (B) is sectional drawing of line segment EE ', (C) is an equivalent circuit. It is a figure of Example 3 of this invention, (A) is a top view, (B) is sectional drawing of line segment FF ', (C) is sectional drawing of line segment GG'.
- Example 4 (A) is a top view, (B) is sectional drawing of line segment HH ', (C) is sectional drawing of line segment II'. It is a figure of Example 5 of this invention, (A) is a top view, (B) is sectional drawing of line segment JJ ', (C) is sectional drawing of line segment KK'. It is a figure of Example 6 of this invention, (A) is a top view, (B) is sectional drawing of line segment LL '. It is a figure of Example 7 of this invention, (A) is a top view, (B) is sectional drawing of line segment MM ', (C) is an equivalent circuit. FIG.
- FIG. 2 is a diagram of a conventional ESD element, where (A) is a plan view, (B) is a cross-sectional view of a line segment A-A ′, (C) is an equivalent circuit, and (D) is a current-voltage characteristic.
- FIG. 3 is a diagram of a conventional ESD element disclosed in Patent Document 1, wherein (A) is a plan view, (B) is a cross-sectional view of a line segment BB ′, (C) is an equivalent circuit, and (D) is a current-voltage characteristic. . It is a top view when arrange
- FIGS. 2A and 2B are diagrams of a conventional ESD element for making currents flowing through all transistors and all channels uniform
- (A) is a plan view
- (B) is a cross-sectional view taken along line CC ′
- (C) Is an equivalent circuit
- (D) is a current-voltage characteristic.
- (A) is a top view
- (B) is sectional drawing of line segment NN '
- (C) is sectional drawing of line segment OO'.
- FIG. 9 of this invention (A) is a top view, (B) is sectional drawing of line segment PP ', (C) is sectional drawing of line segment QQ'.
- FIG. 1A and 1B are diagrams showing Example 1 of an ESD element of the present invention, in which FIG. 1A is a plan view and FIG. 1B is a cross-sectional view of a line segment DD ′.
- FIG. 1A it is assumed that the pad electrode (or the drain electrode connected to the pad electrode) 18 is not in a floating state but is connected to the pad via the upper layer electrode.
- the NMOS transistor is in a P well 14 provided in the semiconductor substrate 9.
- a P well fixing first P + region 23 for fixing a potential is provided on the surface of the P well 14 around the NMOS transistor, and is connected to a wiring 17 having a Vss potential through a contact 16.
- the gate electrodes 1 to 6 of the NMOS transistor and the N + source 11 are connected to a Vss terminal having a lower power supply potential via a wiring 17, and the N + drain 12 is connected to a pad electrode via a wiring 18.
- Each N + source 11 is provided with a P-well fixing second P + region 24 adjacently.
- a LOCOS oxide film 10 is disposed between the P well fixing second P + region 24 and the P well fixing first P + region 23 located on the outermost side.
- a gate insulating film 15 is disposed under each gate electrode.
- the indication of N + or P + indicates that the impurity concentration is higher than the region represented by N or P by the symbol of + together with the conductivity type of the semiconductor, and that the metal wiring and the ohmic contact can be formed substantially. Represents. It is assumed that the N + drain has the same meaning even when written as a high concentration N-type drain.
- FIG. 1 is similar in that the conventional ESD element shown in FIG. 10 and all P well fixing second P + regions 24 are connected by P well fixing second P + electrodes 21, but the P well fixing first P + region 24 is connected.
- the feature of this embodiment is that the two P + electrodes 21 are not connected to the Vss electrode 17 having the lower power supply potential by a low resistance metal electrode.
- FIG. 1C the parasitic resistances of all the transistors and the P well 14 immediately below the channel become the same Rpw11, and a uniform current flows in all the transistors and channels. Since this effect is the same as that of the prior art shown in FIG. 10, the problems shown in FIGS. 8 and 9 can be avoided.
- the second P + electrode 21 for fixing the P well must be connected by a material having a resistivity lower than that of the second P + region 24 for fixing the P well, such as a metal. This is because if the P-well fixing second P + regions 24 are connected to each other with a high resistance, the potentials of the respective P-well fixing second P + regions 24 may be different and current concentration may occur. It is.
- Rpw11 is determined by the distance from the first P + region 23 for fixing the P well to the transistors of the gate electrodes 1 and 6, the relationship of Rpw10 ⁇ Rpw11 is established, and the prior art of FIG. This makes it difficult to cause destruction due to heat generation.
- FIG. 2A and 2B are diagrams showing Example 2 of the present invention, in which FIG. 2A is a plan view and FIG. 2B is a cross-sectional view of a line segment EE ′.
- FIG. 2A it is assumed that the pad electrode (or the drain electrode connected to the pad electrode) 18 is not in a floating state but connected to the pad via the upper layer electrode.
- FIG. 2 shows that the gate electrodes 1 to 6 are not connected to the Vss electrode 17 in the first embodiment of FIG. 1 but are connected to the P well fixing second P + region 24 by the electrode 20 connecting the P well fixing P + and the gate electrode. This is an example.
- FIGS. 3A and 3B are diagrams showing Embodiment 3 of the present invention, in which FIG. 3A is a plan view, FIG. 3B is a sectional view of a line segment FF ′, and FIG. 3C is a sectional view of a line segment GG ′. It is.
- the function of fixing the potential of the region immediately below the channel of the second P + region 24 for fixing the P well adjacent to the N + source 11 in FIGS. 1 and 2 is in contact with the region immediately below the N + source 11 and the N + drain 12.
- the embedded P + region 22 which is a high-concentration P-type region embedded in. As shown in FIGS.
- the second P + region 24 for fixing the P well adjacent to the N + source 11 in the first embodiment is embedded in the semiconductor substrate by the embedded P + region 22, the area can be reduced as compared with the first embodiment.
- Vhold and Vtrig can be easily adjusted by adjusting the impurity concentration and depth of the buried P + region 22 immediately below the N + drain 12, so that the Vtrig of the ESD element does not fall below the breakdown voltage of the IC. Fine adjustment is facilitated.
- wirings and contacts on the N + drain 12 are omitted.
- FIG. 4A and 4B are diagrams showing Embodiment 4 of the present invention, in which FIG. 4A is a plan view, FIG. 4B is a cross-sectional view of a line segment HH ′, and FIG. 4C is a cross-sectional view of a line segment II ′.
- FIG. 4A it is assumed that the pad electrode (or the drain electrode connected to the pad electrode) 18 is not in a floating state but connected to the pad via the upper layer electrode.
- FIG. 4 shows that the gate electrodes 1 to 6 are not connected to the Vss electrode 17 in the third embodiment of FIG. 3 but connected to the P well fixing second P + region 24 by the electrode 20 connecting the P well fixing second P + and the gate electrode. This is an example.
- the electrode 20 connecting the second P + for fixing the P well and the gate electrode must be connected by a material having a resistivity equal to or lower than that of the second P + region 24 for fixing the P well, such as a metal. This is because if the P well fixing second P + 24s are connected to each other with a high resistance, the potentials of the respective P well fixing second P + regions 24 may be different, and current concentration may occur. .
- the same effect can be obtained when the buried P + region 22 directly under the N + source 11 and the N + drain 12 in the third and fourth embodiments is directly under the N + source 11 or the N + drain 12.
- the voltages of Vhold and Vtrig cannot be adjusted using the impurity concentration and depth of the buried P + region 22.
- FIGS. 5A and 5B are diagrams showing Embodiment 5 of the present invention, in which FIG. 5A is a plan view, FIG. 5B is a sectional view of a line segment JJ ′, and FIG. 5C is a sectional view of a line segment KK ′.
- FIG. 5A which is a plan view, has almost the same structure as that of FIG. 8 of the prior art, but there is an embedded P + region 22 as can be seen from the cross-sectional views of FIGS. 5B and 5C.
- the buried P + region 22 immediately below the N + source 11 and the N + drain 12 in the third embodiment in FIG. 3 and the fourth embodiment in FIG.
- the buried P + region in contact with the N + source 11 and the N + drain 12 directly under the transistor. 22 is a feature of the fifth embodiment.
- This structure can obtain the same effect as FIG. 3, but since the buried P + region 22 is not independent, it is necessary to connect the buried P + regions 22 in different regions as shown in the third and fourth embodiments. Therefore, the area can be further reduced as compared with FIG. In this embodiment, since the buried P + region 22 is not provided with an extraction port or the like, the buried P + region 22 is not connected to the Vss electrode 17 having the lower power supply potential by a low resistance metal electrode.
- FIG. 6 is a view showing Example 6 of the present invention, where (A) is a plan view and (B) is a cross-sectional view of a line segment LL ′.
- the pad electrode (or the drain electrode connected to the pad electrode) 18 is not in a floating state but connected to the pad via the upper layer electrode.
- FIG. 6 shows a structure in which the second P + region 24 for fixing the P well lying on the upper side of FIG. 6A and the buried P + region 22 immediately below the P + region 22 are added in the fifth embodiment of FIG.
- the gate electrodes 1 to 6 were injected from the pad electrode by connecting the P well fixing second P + and the P electrode fixing second P + region 24 with the electrode 20 connecting the gate electrode without connecting the gate electrodes 1 to 6 to the Vss electrode 17. Since the potential is applied to the gate electrodes 1 to 6 when the static electricity is released and not only the parasitic bipolar current but also the channel current flows, the same effect as the fifth embodiment can be obtained, but the second P + region 24 for fixing the P well is added. As a result, the area is larger than that of the fifth embodiment.
- the electrode 20 connecting the second P + region 24 for fixing the P well and the gate electrode must be connected by a substance having a resistivity equal to or lower than that of the second P + region 24 for fixing the P well, such as a metal. This is because if the P-well fixing second P + regions 24 are connected to each other with a high resistance, the potentials of the respective P-well fixing second P + regions 24 may be different and current concentration may occur. It is.
- FIG. 7A and 7B are diagrams showing Example 7 of the ESD element of the present invention, in which FIG. 7A is a plan view and FIG. 7B is a cross-sectional view of a line segment MM ′.
- the pad electrode (or the drain electrode connected to the pad electrode) 18 is not in a floating state but connected to the pad via the upper layer electrode.
- the MOS transistor of the first embodiment is a bipolar transistor, and the same effect as that of the first embodiment can be obtained.
- the N + source 11 and the N + drain 12 in FIG. 1 are converted from a MOS transistor to a bipolar transistor, and thus become an N + collector 25 and an N + emitter 26 in FIG.
- the P well fixing second P + region 24 in FIG. 1 corresponds to the base in FIG. 7, but the term “base” is not used here in order to unify the terms.
- the P-well fixing second P + electrode 21 is not connected to the Vss electrode 17 having the lower power supply potential by a low-resistance metal electrode.
- the conversion from the MOS transistor to the bipolar transistor can also be applied to the third and fifth embodiments.
- the second, fourth, and sixth embodiments are the same as the first, third, and fifth embodiments, except that the connection destination of each gate electrode is changed, so that the MOS transistor is a bipolar transistor that does not have a gate electrode.
- the same structure is applied when applied to Example 1, Example 3, and Example 5 and when applied to Example 2, Example 4, and Example 6.
- FIG. 12 shows an ESD protection element obtained by converting the MOS transistor in the third embodiment described above into a bipolar transistor.
- A is a plan view
- B is a cross-sectional view of line segment NN ′
- C is a cross-sectional view of line segment O—O ′.
- an N + collector 25 and an N + emitter 26 are provided.
- buried P + regions 22 are provided independently so as to be in contact with each other.
- the buried P + regions 22 are electrically connected to each other by the P well fixing second P + region 24 and the buried P + region 22 existing immediately below.
- the second P + region 24 for fixing the P well is not connected to the Vss electrode 17 having the lower power supply potential by a low resistance metal electrode.
- the ESD protection element performs a protection operation by a bipolar operation.
- FIG. 13 shows an ESD protection element obtained by converting the MOS transistor in the fifth embodiment into a bipolar transistor, as in the eighth embodiment.
- (A) is a plan view
- (B) is a cross-sectional view of line segment PP ′
- (C) is a cross-sectional view of line segment Q-Q ′.
- an N + collector 25 and an N + emitter 26 are provided.
- Under the N + collector 25 and the N + emitter 26 an integrated buried P + region 22 is continuously provided so as to be in contact with each other. Yes.
- FIG. 13 shows an ESD protection element obtained by converting the MOS transistor in the fifth embodiment into a bipolar transistor, as in the eighth embodiment.
- (B) is a cross-sectional view of line segment PP ′
- (C) is a cross-sectional view of line segment Q-Q ′.
- an N + collector 25 and an N + emitter 26 are provided under the N + collector 25 and the N + emitter 26, an integrated buried P +
- the buried P + region 22 since the buried P + region 22 is not provided with an extraction port or the like, the buried P + region 22 has a low resistance to the Vss electrode 17 having the lower power supply potential. It is not connected by the metal electrode.
- the ESD protection element performs a protection operation by a bipolar operation.
- the common basis in the present invention is that various substrate potentials existing in each transistor and each channel of the ESD element are electrically connected by a low-resistance material and further separated from the Vss potential. It is to improve the ESD tolerance by suppressing heat generation by uniforming and low voltage operation.
- This concept can be applied not only to the above-mentioned MOS type ESD element with a gate electrode but also to a bipolar type ESD element without a gate electrode.
- the multi-finger type ESD element has been described so far, it can also be developed in a single finger type ESD element, and the same effect can be obtained.
- the present invention is implemented on a semiconductor substrate.
- the N + source 11, the N + drain, the P + region for fixing the P well, the buried P + region, and the P well fixing are the impurity concentration of the first P + region for P and the second P + region for fixing the P well.
- the impurity concentration of the first P + region for P and the second P + region for fixing the P well is higher than that of the P well 14, and the impurity concentration of the P well 14 is higher than that of the semiconductor substrate.
- Gate electrode 9 Semiconductor substrate 10 LOCOS oxide film 11 N + source 12 N + drain 13 P well region P + region 14 P well 15 Gate oxide film 16 Contact 17 Vss electrode 18 Pad electrode 20 P well second P + region 8 connecting the gate electrode and the second P + electrode 22 for fixing the P well Embedded P + region 23 First P + region for fixing the P well 24 Second P + region for fixing the P well 25 N + collector 26 N + emitter 50 Gate electrode 1 in FIG. IV characteristics 51 of the transistors 6 and 6 IV characteristics 52 of the gate electrodes 2 and 5 of FIG. 8 IV characteristics 53 of the transistors of the gate electrodes 3 and 4 of FIG. 8 IV characteristics 54 of the transistor of the gate electrode 1 of FIG. IV characteristics 55 of the transistor of the gate electrode 6 of FIG. IV characteristics of transistors
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Abstract
Description
したがって、最も寄生バイポーラ動作を起こし易いのはRpw3の寄生抵抗を持つゲート電極3、4のトランジスタであり、その電流電圧特性は図8(D)のIV特性52にしめされるものとなり、電流の集中が生じる。ゲート電極2、5のトランジスタ、ゲート電極1、6のトランジスタはそれぞれIV特性51および50を示す。
これによってESD電流がPADに流れ込んだときに最も電位が上昇するPウェル固定用第二P+領域24付近のPウェル14の電位がゲート電極1~6に伝わり、全てのトランジスタのN+ドレイン12とN+ソース11間にチャネル電流が流れ、電流集中を防ぐ効果が得られる。
ゲート電極6のトランジスタ電流=小さいチャネル電流のみ
この電流電圧特性を模式図で示したのが図9(D)である。曲線53はゲート電極1のトランジスタに流れる電流であり、曲線54はゲート電極6のトランジスタに流れる電流を示している。ゲート電極1のトランジスタに寄生バイポーラ動作が発生した時点でゲート電極6のトランジスタにチャネル電流が流れ始めるが、ゲート電極1のトランジスタ電流に比べると小さい。
ある態様ではESD素子を有する半導体装置であって、
前記ESD素子は、
半導体基板と、
前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いPウェルと、
前記Pウェル内の前記半導体基板表面に設けられた、前記半導体基板よりも不純物濃度が高いN型ソースおよびN型ドレインと、
前記N型ソースに接触して前記半導体基板表面に設けられた、前記半導体基板よりも不純物濃度が高いP型領域と、
前記N型ソースと前記N型ドレインの間となる前記半導体基板表面に設けられたゲート絶縁膜と、
前記ゲート絶縁膜上に設けられたゲート電極と、
を有し、
前記N型ドレインはパッド電極に接続され、
前記N型ソースは低い方の電源電位に接続され、
前記N型ソースと前記P型領域とが電極によって接続されていないことを特徴とするESD素子を有する半導体装置とする。
また別の態様では、上記ESD素子を有する半導体装置は、前記ゲート電極が前記P型領域と電気的に接続されているESD素子を有する半導体装置とする。
さらに、構造によっては耐圧調整も容易となる。
9 半導体基板
10 LOCOS酸化膜
11 N+ソース
12 N+ドレイン
13 Pウェル電位固定用P+領域
14 Pウェル
15 ゲート酸化膜
16 コンタクト
17 Vss電極
18 パッド電極
20 Pウェル固定用第二P+領域とゲート電極をつなぐ電極
21 Pウェル固定用第二P+電極
22 埋め込みP+領域
23 Pウェル固定用第一P+領域
24 Pウェル固定用第二P+領域
25 N+コレクタ
26 N+エミッタ
50 図8のゲート電極1と6のトランジスタのIV特性
51 図8のゲート電極2と5のトランジスタのIV特性
52 図8のゲート電極3と4のトランジスタのIV特性
53 図9のゲート電極1のトランジスタのIV特性
54 図9のゲート電極6のトランジスタのIV特性
55 図10のゲート電極1~6のトランジスタのIV特性
Claims (18)
- ESD素子を有する半導体装置であって、
前記ESD素子は、
半導体基板と、
前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いPウェルと、
前記Pウェル内の前記半導体基板表面に設けられた、前記半導体基板よりも不純物濃度が高いN型ソースおよびN型ドレインと、
前記N型ソースに接触して前記半導体基板表面に設けられた、前記半導体基板よりも不純物濃度が高いP型領域と、
前記N型ソースと前記N型ドレインの間となる前記半導体基板表面に設けられたゲート絶縁膜と、
前記ゲート絶縁膜上に設けられたゲート電極と、
を有し、
前記N型ドレインはパッド電極に接続され、
前記N型ソースは低い方の電源電位に接続され、
前記N型ソースと前記P型領域とが電極によって接続されていないことを特徴とするESD素子を有する半導体装置。 - 前記P型領域を複数有し、複数の前記P型領域同士が複数の前記P型領域と同等もしくは小さい抵抗率の物質で電気的に接続されている請求項1記載のESD素子を有する半導体装置。
- 前記ゲート電極が前記N型ソースと電気的に接続されている請求項1または2に記載のESD素子を有する半導体装置。
- 前記ゲート電極が前記P型領域と電気的に接続されている請求項1または2に記載のESD素子を有する半導体装置。
- ESD素子を有する半導体装置であって、
前記ESD素子は、
半導体基板と、
前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いPウェルと、
前記Pウェル内の前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いN型ソースおよびN型ドレインと、
前記N型ソースおよび前記N型ドレインのそれぞれの直下に前記N型ソースおよび前記N型ドレインのそれぞれに接触して設けられた前記半導体基板よりも不純物濃度が高い埋め込みP型領域と、
前記N型ソースと前記N型ドレインとの間の前記半導体基板表面に設けられたゲート絶縁膜と、
前記ゲート絶縁膜上に設けられたゲート電極と、
を有し、
前記N型ドレインはパッド電極に接続され、
前記N型ソースは低い方の電源電位に接続され
前記N型ソースと前記埋め込みP型領域とが電極によって接続されていないことを特徴とするESD素子を有する半導体装置。 - 前記埋め込みP型領域が前記N型ドレインの直下にのみ設けられた請求項5記載のESD素子を有する半導体装置。
- 前記埋め込みP型領域が前記N型ソースの直下にのみ設けられた請求項5記載のESD素子を有する半導体装置。
- 前記埋め込みP型領域を複数有し、前記埋め込みP型領域同士が前記半導体基板の抵抗値よりも小さい抵抗率の物質で電気的に接続されている請求項5乃至7のいずれか1項に記載のESD素子を有する半導体装置。
- ESD素子を有する半導体装置であって、
前記ESD素子は、
半導体基板と、
前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いPウェルと、
前記Pウェル内の前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いN型ソースおよびN型ドレインと、
前記N型ソースと前記N型ドレインとの間の前記半導体基板表面に設けられたゲート絶縁膜と、
前記N型ソースおよび前記N型ドレインの直下に前記N型ソースおよび前記N型ドレインと接触するように連続して設けられた一体からなる前記半導体基板よりも不純物濃度が高い埋め込みP型領域と、
前記ゲート絶縁膜上に設けられたゲート電極と、
を有し、
前記N型ドレインはパッド電極に接続され、
前記N型ソースは低い方の電源電位に接続され
前記N型ソースと前記埋め込みP型領域とが電極によって接続されていないことを特徴とするESD素子を有する半導体装置。 - 前記ゲート電極が前記N型ソースと電気的に接続されている請求項5乃至9のいずれか1項に記載のESD素子を有する半導体装置。
- 前記ゲート電極が前記埋め込みP型領域と電気的に接続されている請求項5乃至9のいずれか1項に記載のESD素子を有する半導体装置。
- ESD素子を有する半導体装置であって、
前記ESD素子は、
半導体基板と、
前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いPウェルと、
前記Pウェル内の前記半導体基板表面に設けられた、前記半導体基板よりも不純物濃度が高いN型ソースおよびN型ドレインと、
前記N型ソースに接触して前記半導体基板表面に設けられた、前記半導体基板よりも不純物濃度が高いP型領域と、
を有し、
前記N型ドレインはパッド電極に接続され、
前記N型ソースは低い方の電源電位に接続され、
前記N型ソースと前記P型領域とが電極によって接続されていないことを特徴とするESD素子を有する半導体装置。 - 前記P型領域が複数あり、複数の前記P型領域同士が複数の前記P型領域と同等もしくは小さい抵抗率の物質で電気的に接続されている請求項12記載のESD素子を有する半導体装置。
- ESD素子を有する半導体装置であって、
前記ESD素子は、
半導体基板と、
前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いPウェルと、
前記Pウェル内の前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いN型ソースおよびN型ドレインと、
前記N型ソースおよび前記N型ドレインのそれぞれの直下に前記N型ソースおよび前記N型ドレインのそれぞれに接触して設けられた前記半導体基板よりも不純物濃度が高い埋め込みP型領域と、
を有し、
前記N型ドレインはパッド電極に接続され、
前記N型ソースは低い方の電源電位に接続され、
前記N型ソースと前記埋め込みP型領域とが電極によって接続されていないことを特徴とするESD素子を有する半導体装置。 - 前記埋め込みP型領域が前記N型ドレインの直下にのみ設けられた請求項14記載のESD素子を有する半導体装置。
- 前記埋め込みP型領域が前記N型ソースの直下にのみ設けられた請求項14記載のESD素子を有する半導体装置。
- 前記埋め込みP型領域が複数あり、複数の前記埋め込みP型領域同士が前記半導体基板の抵抗値よりも小さい抵抗率の物質で電気的に接続されている請求項14乃至16のいずれか1項に記載のESD素子を有する半導体装置。
- ESD素子を有する半導体装置であって、
前記ESD素子は、
半導体基板と、
前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いPウェルと、
前記Pウェル内の前記半導体基板表面に設けられた前記半導体基板よりも不純物濃度が高いN型ソースおよびN型ドレインと、
前記N型ソースおよび前記N型ドレインの直下に前記N型ソースおよび前記N型ドレインと接触するように連続して設けられた一体からなる前記半導体基板よりも不純物濃度が高い埋め込みP型領域と、
を有し、
前記N型ドレインはパッド電極に接続され、
前記N型ソースは低い方の電源電位に接続され、
前記N型ソースと前記埋め込みP型領域とが電極によって接続されていないことを特徴とするESD素子を有する半導体装置。
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- 2015-07-07 TW TW104122041A patent/TWI678785B/zh not_active IP Right Cessation
- 2015-07-08 US US15/328,724 patent/US10438944B2/en not_active Expired - Fee Related
- 2015-07-08 WO PCT/JP2015/069643 patent/WO2016017383A1/ja active Application Filing
- 2015-07-08 KR KR1020177005387A patent/KR20170038020A/ko unknown
- 2015-07-08 CN CN201580040741.5A patent/CN106575653B/zh not_active Expired - Fee Related
- 2015-07-08 EP EP15828226.9A patent/EP3176823B1/en active Active
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Publication number | Priority date | Publication date | Assignee | Title |
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CN109417033A (zh) * | 2016-06-28 | 2019-03-01 | 株式会社索思未来 | 半导体装置以及半导体集成电路 |
CN109417033B (zh) * | 2016-06-28 | 2022-03-18 | 株式会社索思未来 | 半导体装置以及半导体集成电路 |
CN106773410A (zh) * | 2016-12-30 | 2017-05-31 | 武汉华星光电技术有限公司 | 显示面板及其静电释放电路 |
CN106773410B (zh) * | 2016-12-30 | 2020-01-17 | 武汉华星光电技术有限公司 | 显示面板及其静电释放电路 |
Also Published As
Publication number | Publication date |
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CN106575653B (zh) | 2020-03-27 |
EP3176823B1 (en) | 2021-02-24 |
US10438944B2 (en) | 2019-10-08 |
US20170221878A1 (en) | 2017-08-03 |
TW201618273A (zh) | 2016-05-16 |
JP6600491B2 (ja) | 2019-10-30 |
EP3176823A4 (en) | 2018-03-28 |
KR20170038020A (ko) | 2017-04-05 |
CN106575653A (zh) | 2017-04-19 |
EP3176823A1 (en) | 2017-06-07 |
TWI678785B (zh) | 2019-12-01 |
JP2016036014A (ja) | 2016-03-17 |
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