WO2015147219A1 - プリント配線板用基板、プリント配線板及びプリント配線板用基板の製造方法 - Google Patents
プリント配線板用基板、プリント配線板及びプリント配線板用基板の製造方法 Download PDFInfo
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- WO2015147219A1 WO2015147219A1 PCT/JP2015/059498 JP2015059498W WO2015147219A1 WO 2015147219 A1 WO2015147219 A1 WO 2015147219A1 JP 2015059498 W JP2015059498 W JP 2015059498W WO 2015147219 A1 WO2015147219 A1 WO 2015147219A1
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- printed wiring
- base film
- conductive layer
- wiring board
- metal
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/097—Inks comprising nanoparticles and specially adapted for being sintered at low temperature
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques
- H05K3/246—Reinforcing conductive paste, ink or powder patterns by other methods, e.g. by plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4069—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/032—Materials
Definitions
- the present invention relates to a printed wiring board substrate, a printed wiring board, and a method for manufacturing a printed wiring board substrate.
- a printed wiring board substrate in which a copper thin layer is laminated on a heat resistant insulating base film without an adhesive layer has been proposed (see Japanese Patent No. 3570802).
- a copper thin film layer (first conductive layer) is formed on both surfaces of a heat-resistant insulating base film using a sputtering method, and a copper thick film layer (electroplating method is used thereon)
- a second conductive layer is formed.
- the conventional printed wiring board substrate can be said to be a substrate that meets the demand for high-density printed wiring in that the conductive layer can be made thin.
- the above conventional printed wiring board substrate has the first conductive layer formed on the surface of the base film by the sputtering method, only a conductive layer (copper foil layer) having a thickness of about 0.3 ⁇ m can be formed. Therefore, when the opening penetrating the base film is formed, the opening cannot be filled with the copper foil layer forming the first conductive layer. Therefore, the land on which the component can be mounted cannot be provided on the opening, and the area where the component of the printed wiring board can be mounted may be reduced.
- the present invention has been made based on the above circumstances, and a printed wiring board substrate, a printed wiring board, and a printed wiring in which a conductor is densely filled in an opening of a base film and excellent conductivity can be obtained. It aims at providing the manufacturing method of the board
- a printed wiring board substrate made to solve the above-described problems has an insulating property, a base film having one or a plurality of openings, application of conductive ink containing metal particles, and A printed wiring comprising a first conductive layer laminated on both sides of the base film by heat treatment and filled in the opening, and a second conductive layer laminated on at least one surface of the first conductive layer by plating A board substrate.
- a printed wiring board according to another aspect of the present invention made to solve the above problems is a printed wiring board on which a conductive pattern is formed, using the printed wiring board substrate, wherein the conductive pattern is It is a printed wiring board formed by a subtractive method or a semi-additive method.
- Another method for manufacturing a printed wiring board substrate according to an aspect of the present invention is a metal particle on both surfaces of a base film having insulating properties and one or more openings. Are laminated on both sides of the base film and filled in the openings by applying a conductive ink containing, and heating at 150 ° C. to 500 ° C. in an atmosphere having an oxygen concentration of 1 ppm to 10,000 ppm.
- a print comprising a step of forming a first conductive layer and a step of forming a second conductive layer on at least one surface of the first conductive layer by plating, wherein the average particle diameter of the metal particles is 1 nm or more and 500 nm or less It is a manufacturing method of the board
- the conductor is densely filled in the opening of the base film, and excellent conductivity is obtained.
- a printed wiring board substrate has an insulating property, and is laminated on both surfaces of the base film by applying and heat-treating a base film having one or a plurality of openings and a conductive ink containing metal particles.
- a printed wiring board substrate comprising: a first conductive layer filled in the opening; and a second conductive layer laminated on at least one surface of the first conductive layer by plating.
- the first conductive layer is laminated on both surfaces of the base film by application of conductive ink containing metal particles and heat treatment, and is filled in the opening.
- the particles are densely packed and have excellent conductivity.
- the printed circuit board substrate is filled with the first conductive layer in the opening, a land on which the component can be mounted can be provided in the upper part of the opening, and a printed wiring board having a large component mounting area is created. it can.
- the printed wiring board substrate has the second conductive layer formed by plating on at least one surface of the first conductive layer, the second conductive layer is formed in the gap between the metal particles forming the first conductive layer.
- the metal layer is filled, and the peeling of the conductive layer from the base film, which is likely to occur due to the voids as a starting point of destruction, is suppressed.
- the second conductive layer laminated by plating may be formed by electroless plating, for example, or may be formed by electroplating.
- the second conductive layer may be formed by electroless plating and further electroplated.
- the average particle diameter of the metal particles is preferably 1 nm or more and 500 nm or less.
- the “average particle diameter” means that represented by the center diameter D50 of the particle size distribution in the dispersion.
- the average particle size can be measured with a particle size distribution measuring device (for example, Microtrack particle size distribution meter “UPA-150EX” manufactured by Nikkiso Co., Ltd.).
- ⁇ Hydrophilic treatment should be applied to both sides of the base film.
- the hydrophilic treatment is performed on both surfaces of the base film, so that the surface tension of the conductive ink with respect to the base film is reduced, and the conductive ink is easily applied uniformly on both surfaces of the base film. It becomes easy to fill the opening. Thereby, it becomes easy to form the first conductive layer with a uniform thickness on both surfaces of the base film.
- the metal is copper.
- the electroconductivity of a 1st conductive layer becomes high and the printed wiring board excellent in electroconductivity can be created.
- the porosity of the region within 500 nm from the interface with one surface of the base film or the other surface of the first conductive layer and the region within the opening is preferably 1% or more and 50% or less.
- the base film and the first conductive can be obtained without damaging the strength of the first conductive layer or the base film due to excessive heat during heat treatment.
- the peel strength with the layer can be improved.
- a region within 500 nm from the interface with one surface of the base film or the other surface of the first conductive layer means that the first conductive layer has a thickness of less than 500 nm.
- the “void ratio” is a value calculated as an area ratio of voids on an electron microscope observation image of a cross section.
- the ratio of the maximum depth of the concave portion of the first conductive layer formed in the opening relative to one surface of the base film to the average thickness of the base film is preferably 50%.
- the via resistance can be reduced and the connection reliability can be improved.
- the possibility that a land portion can be formed on the opening can be increased.
- “via resistance” means resistance between both ends of the opening filled with the first conductive layer.
- the ratio of the average thickness of the base film to the larger diameter of the diameters of the opening on both sides of the base film is preferably 0.2 or more and 2.0 or less.
- the ratio of the other diameter to the other diameter is preferably 0.2 or more and less than 1.0.
- a metal oxide species based on the metal of the metal particles and a metal hydroxide species based on the metal may be present in the vicinity of the interface between the base film and the first conductive layer.
- the adhesion between the base film and the conductive layer increases as the amount of metal oxide in the vicinity of the interface between the base film and the conductive layer of the printed wiring board substrate increases. It has been found that the adhesion tends to decrease as the amount of metal hydroxide in the vicinity of the interface increases.
- the metal oxide species based on the metal of the metal particles and the metal hydroxide species based on the metal exist, so that there is a gap between the base film and the first conductive layer.
- a great adhesion can be obtained.
- Near the interface means a region within a predetermined range in the thickness direction from the interface between the base film and the first conductive layer, and this predetermined range is, for example, about half of the thickness of the first conductive layer.
- the distance is preferably 0.1 ⁇ m.
- the “metal oxide species” is a group derived from a metal oxide or a metal oxide thereof
- the “metal hydroxide species” is a group derived from a metal hydroxide or a metal hydroxide thereof.
- the “group derived from a metal oxide” means a compound or a group that binds to a metal and includes oxygen in which the other binding partner not on the metal side is not hydrogen.
- the metal is copper, for example, CuOC-R, CuON-R, CuOOC-R (where R is an alkyl group) and the like are “groups derived from a metal oxide”.
- the “group derived from a metal hydroxide” means a compound or group that binds to a metal and contains oxygen in which the other binding partner that is not on the metal side is hydrogen.
- a compound or a group that includes both an oxygen that is bonded to a metal and the other bonding partner that is not on the metal side is not hydrogen and an oxygen that is bonded to the metal and the other bonding partner that is not on the metal side is hydrogen is , "Metal hydroxide or group derived from metal hydroxide”.
- the metal is copper, for example, CuOH, Cu (OH) 2 , CuSO 4 .3Cu (OH) 2 , CuCO 3 .Cu (OH) 2 , CuCl 2 .Cu (OH) 2 , (Cu (OH) CH 3 COO) is such as 2 ⁇ 5H 2 O is a "metal hydroxide species".
- the mass per unit area of the metal oxide species is preferably 0.1 ⁇ g / cm 2 or more and 10 ⁇ g / cm 2 or less, and the mass ratio of the metal oxide species to the metal hydroxide species is preferably 0.1 or more. .
- the mass per unit area of the metal oxide species in the vicinity of the interface between the base film and the first conductive layer is within the above range, and the mass ratio of the metal oxide species to the metal hydroxide species is greater than or equal to the lower limit.
- the adhesion between the base film and the first conductive layer is further improved.
- the metal particles may be particles obtained by a liquid phase reduction method in which metal ions are reduced by the action of a reducing agent in an aqueous solution.
- the apparatus for obtaining the particles becomes relatively simple compared to the gas phase method, and the production cost can be reduced.
- mass production of the metal particles is easy, and the metal particles are easily available.
- the particle diameter of the metal particles can be made uniform easily by stirring in an aqueous solution.
- the liquid phase reduction method is preferably a titanium redox method.
- the metal particles are particles obtained by the titanium redox method, the particle diameter can be surely and easily adjusted to a desired nano-order size, and metal particles having a round shape and a uniform size can be obtained.
- Cheap As a result, the first conductive layer becomes a dense and uniform layer with fewer defects, and the opening is more densely and uniformly filled.
- the printed wiring board which concerns on 1 aspect of this invention is a printed wiring board which has a conductive pattern, Comprising:
- the said conductive pattern applies a subtractive method or a semiconductive to the 1st conductive layer and 2nd conductive layer of the said board
- the printed wiring board is manufactured using the printed wiring board substrate, it has excellent conductivity and can be provided with a land on which the component can be mounted on the upper opening of the base film.
- the mountable area can be increased.
- the conductive ink containing metal particles is applied to both surfaces of a base film having insulating properties and one or more openings, and the oxygen concentration is A step of forming a first conductive layer laminated on both surfaces of the base film and filled in the opening by heating at 150 ° C. or more and 500 ° C. or less in an atmosphere of 1 ppm or more and 10,000 ppm or less; and by plating And a step of forming a second conductive layer on at least one surface of the first conductive layer, wherein the average particle size of the metal particles is 1 nm or more and 500 nm or less.
- the printed wiring board substrate manufacturing method is performed by applying a conductive ink containing metal particles having the above particle diameter on both surfaces of a base film having one or a plurality of openings, and then laminating the both surfaces of the base film. And the 1st conductive layer with which it fills in the said opening is formed.
- the printed wiring board substrate manufacturing method can densely fill the first conductive layer into the opening even with a base film having a large thickness relative to the diameter of the opening, and the printed wiring board substrate having excellent conductivity. Can be manufactured.
- substrate for printed wiring boards forms a base film and a 1st conductive layer A printed wiring board substrate having a high adhesive strength between the two can be manufactured.
- the second conductive layer forming step for example, the second conductive layer may be formed by electroless plating, the second conductive layer may be formed by electroplating, or after electroless plating is performed. The second conductive layer may be formed by electroplating.
- the surface tension of the conductive ink is preferably 10 mN / m or more and 100 mN / m or less.
- the surface tension of the conductive ink can be measured with a surface tension meter (for example, “DY-300”, Kyowa Interface Science Co., Ltd.), and is measured according to JIS-K2241 (2000).
- PCB board The printed wiring board substrate of FIG. 1 is laminated on both surfaces of a base film 1 having an insulating property and a plurality of openings 4 by applying and heat-treating conductive ink containing metal particles, and The first conductive layer 2 filled in the opening 4 and the second conductive layer 3 laminated on the surface of the first conductive layer 2 by plating are mainly provided.
- the base film 1 shown in FIG. 1B constituting the printed wiring board substrate has an insulating property, and a plurality of openings 4 are formed.
- the material for the base film 1 include polyimide, liquid crystal polymer, Teflon (registered trademark), fluororesin, polyethylene terephthalate, polyethylene naphthalate, and other flexible resins, paper phenol, paper epoxy, glass composite, and glass epoxy. It is possible to use a rigid material such as a glass substrate, or a rigid flexible material in which a hard material and a soft material are combined. Among these, polyimide is particularly preferable because of its high bonding strength with metal oxide species.
- the thickness of the said base film 1 is set by the printed wiring board using the said board
- the base film 1 is preferably subjected to a hydrophilic treatment on the surface of the base film 1 and the inner wall of the opening 4 before applying the conductive ink.
- a hydrophilic treatment for example, plasma treatment for irradiating plasma to make the surface hydrophilic, or alkali treatment for making the surface hydrophilic with an alkaline solution can be employed.
- the opening 4 has a circular shape in plan view and penetrates vertically from one surface of the base film 1 to the other surface.
- the opening 4 can be formed from one surface side of the base film 1 by, for example, drilling or laser processing.
- the opening is formed so that the diameter is reduced from one surface side to the other surface side. 4 is formed. That is, in this case, among the diameters of the opening 4 on both surfaces of the base film 1, the diameter of the one surface is larger than the diameter of the other surface.
- the conductive ink can be easily filled from the one surface side.
- the lower limit of the larger diameter is preferably 10 ⁇ m, more preferably 20 ⁇ m.
- an upper limit of the larger diameter of the said opening 4 200 micrometers is preferable and 100 micrometers is more preferable. If the larger diameter of the opening 4 is less than the lower limit, sufficient conductivity may not be obtained even when the opening 4 is filled with the first conductive layer 2. On the other hand, when the larger diameter of the opening 4 exceeds the upper limit, the opening 4 may not be filled with the first conductive layer 2.
- the lower limit of the ratio of the average thickness of the base film 1 to the larger diameter of the diameters of the opening 4 on both sides of the base film 1 is preferably 0.2, and more preferably 0.3. Moreover, as an upper limit of the said ratio, 2.0 is preferable, 1.5 is more preferable, and 1.0 is further more preferable.
- the ratio is less than the lower limit, the first conductive layer 2 may not be filled up to the center in the radial direction of the opening 4.
- the ratio exceeds the upper limit there is a possibility that the first conductive layer 2 cannot be filled up to the central portion in the thickness direction of the opening 4 by applying conductive ink to both surfaces of the base film 1.
- the lower limit of the ratio of the other diameter to the other diameter is preferably 0.2, more preferably 0.5, and even more preferably 0.7.
- the ratio is preferably less than 1.0 and more preferably less than 0.96.
- the ratio is less than the lower limit, the diameter of the opening 4 on the surface of the base film 1 opposite to the side filled with the conductive ink may be too small to fill the opening 4 with the conductive ink, There is a possibility that the diameter of the opening 4 on the ink filling side becomes too large and it is difficult to form a land portion on the opening 4.
- the ratio exceeds the upper limit, it may be difficult to fill the opening 4 with conductive ink.
- the first conductive layer 2 is laminated on both surfaces of the base film 1 and filled in the openings 4 by application of conductive ink containing metal particles.
- the opening 4 is easily filled with the conductive ink and both surfaces of the base film 1 are covered with the conductive film. Can do.
- the first conductive layer 2 is subjected to a heat treatment after the application of the conductive ink in order to remove unnecessary organic substances in the conductive ink and to securely fix the metal particles in the opening 4 and both surfaces of the base film 1. It is preferable.
- the conductive ink for forming the first conductive layer 2 contains metal particles as a conductive substance that provides conductivity.
- the conductive ink includes metal particles, a dispersant that disperses the metal particles, and a dispersion medium.
- the first conductive layer 2 made of fine metal particles is laminated on both surfaces of the base film 1 and filled in the openings 4.
- the conductive ink forming the first conductive layer 2 does not contain a resin binder. Therefore, since this conductive ink does not shrink by drying after application, the dense filling state of the metal particles at the time of application is maintained, and the conductivity of the first conductive layer 2 does not decrease by drying after application.
- the metal constituting the metal particles contained in the conductive ink is based on the metal oxide species based on the metal and the metal in the vicinity of the interface of the printed wiring board substrate with the base film 1 of the first conductive layer 2.
- Any metal hydroxide species can be used, and copper (Cu), nickel (Ni), aluminum (Al), gold (Au), or silver (Ag) can be used.
- copper is preferably used as a metal having good conductivity and excellent adhesion to the base film 1.
- the lower limit of the average particle diameter of the metal particles contained in the conductive ink is 1 nm, and more preferably 30 nm.
- the upper limit of the average particle diameter of the metal particles is 500 nm, and more preferably 100 nm.
- the average particle diameter of the metal particles is less than the lower limit, the dispersibility and stability of the metal particles in the conductive ink may be reduced.
- the average particle diameter of the metal particles exceeds the upper limit, the metal particles may be easily precipitated, and the density of the metal particles is difficult to be uniform when the conductive ink is applied.
- the lower limit of the surface tension of the conductive ink relative to the surface of the base film 1 is preferably 10 mN / m, and more preferably 20 mN / m.
- the upper limit of the surface tension is preferably 160 mN / m, more preferably 140 mN / m. When the surface tension is less than the lower limit, the conductive ink does not stay in the opening 4 and the opening 4 may not be filled with the conductive ink.
- the conductive ink when the surface tension is increased, the conductive ink can be filled into the opening 4 of the base film 1 having a large thickness with respect to the diameter of the opening 4, but when the surface tension exceeds the upper limit, the base film There is a possibility that it is difficult to uniformly apply the conductive ink to the surface of 1.
- the surface tension of the conductive ink can be controlled by, for example, the type of solvent in which the metal particles are dispersed.
- the lower limit of the average thickness of the first conductive layer 2 is preferably 0.05 ⁇ m, more preferably 0.1 ⁇ m. Moreover, as an upper limit of the average thickness of the said 1st conductive layer 2, 2 micrometers is preferable and 1.5 micrometers is more preferable. When the average thickness of the said 1st conductive layer 2 is less than the said minimum, there exists a possibility that the part in which a metal particle does not exist in the thickness direction may increase, and electroconductivity may fall. On the other hand, when the average thickness of the first conductive layer 2 exceeds the upper limit, it may be difficult to reduce the thickness of the conductive layer.
- the lower limit of the porosity of the region within 500 nm from the interface with one surface of the base film 1 or the other surface of the first conductive layer 2 and the region within the opening 4 is preferably 1%, more preferably 2%. preferable.
- the upper limit of the porosity is preferably 50%, more preferably 30%, and still more preferably 20%.
- the porosity exceeds the upper limit, the adhesion area between the base film 1 and the first conductive layer 2 becomes low, and thus the peel strength between the base film 1 and the first conductive layer 2 may be insufficient.
- the printed wiring board substrate is subjected to mechanical stress by handling or conveyance, but in the process of forming the circuit by setting the porosity to be in the above range.
- the first conductive layer 2 can be prevented from dropping from the base film 1.
- the upper limit of the ratio of the maximum depth of the concave portion of the first conductive layer 2 formed in the opening 4 with respect to one surface of the base film 1 to the average thickness of the base film 1 is preferably 50%, 30% Is more preferable. When the ratio exceeds the upper limit, via resistance increases, connection reliability is lowered, and it is difficult to form a land portion on the opening 4.
- a metal oxide species based on the metal of the metal particles and a metal hydroxide species based on the metal are preferably present.
- These metal oxide species and metal hydroxide species are oxides and hydroxides generated based on the metal particles contained in the first conductive layer 2 during the heat treatment after the application of the conductive ink.
- a group derived from copper oxide (CuO) or copper oxide and copper hydroxide (Cu (OH) 2 ) are present in the vicinity of the interface between the base film 1 and the first conductive layer 2.
- groups derived from copper hydroxide are generated and present.
- the predetermined amount of the metal oxide species is present in the vicinity of the interface between the base film 1 and the first conductive layer 2 and the mass ratio of the metal oxide species to the metal hydroxide species is a predetermined value or more, the first conductive layer 2 and the base film 2 and the first conductive layer 2 is difficult to peel off from the base film 1.
- the mass of the lower limit per unit area of the base film 1 and metal oxide species in the vicinity of the interface between the first conductive layer 2 is preferably 0.1 ⁇ g / cm 2, 0.15 ⁇ g / cm 2 is more preferable.
- the upper limit of the mass per unit area of the metal oxide species is preferably 10 ⁇ g / cm 2, 5 ⁇ g / cm 2 is more preferable.
- the mass per unit area of the metal oxide species is less than the lower limit, the effect of improving the bonding strength between the first conductive layer 2 and the base film 1 due to the metal oxide is reduced, so that the base film 1 and the first conductive layer 2 are reduced. There is a risk that the adhesion between the two will be reduced.
- the mass per unit area of the metal oxide species exceeds the upper limit, it may be difficult to control the heat treatment after applying the conductive ink.
- the lower limit of the mass per unit area of the metal hydroxide species in the vicinity of the interface between the base film 1 and the first conductive layer 2 is preferably 1 ⁇ g / cm 2 and more preferably 1.5 ⁇ g / cm 2 .
- the upper limit of the mass per unit area of the metal hydroxide species preferably 100 ⁇ g / cm 2, 50 ⁇ g / cm 2 is more preferable.
- the mass per unit area of the metal hydroxide species is less than the lower limit, it may be difficult to control the heat treatment after applying the conductive ink to produce a large amount of the metal oxide species.
- the mass per unit area of the metal hydroxide species exceeds the upper limit, the metal oxide species is relatively reduced, and thus the effect of improving the bonding strength between the first conductive layer 2 and the base film 1 by the metal oxide. May decrease, and the adhesion between the base film 1 and the first conductive layer 2 may decrease.
- the lower limit of the mass ratio of the metal oxide species to the metal hydroxide species in the vicinity of the interface between the base film 1 and the first conductive layer 2 is 0.1, and more preferably 0.2. Moreover, as an upper limit of the said mass ratio, 5 are preferable and 3 is more preferable.
- the mass ratio is less than the lower limit, the amount of the metal hydroxide species is excessive with respect to the metal oxide species in the vicinity of the interface, so that the adhesion between the base film 1 and the first conductive layer 2 is reduced. There is a fear.
- the mass ratio exceeds the upper limit, it may be difficult to control the heat treatment after applying the conductive ink.
- the second conductive layer 3 is laminated on the surface of the first conductive layer 2 opposite to the base film 1 by electroless plating. Since the second conductive layer 3 is thus formed by electroless plating, the gap between the metal particles forming the first conductive layer 2 is filled with the metal of the second conductive layer 3. As described above, the gap between the metal particles is reduced by filling the gap between the metal particles with the electroless plating metal, so that the gap portion becomes a starting point of breakage and the first conductive layer 2 is peeled off from the base film 1. Can be suppressed.
- the metal used for the electroless plating copper, nickel, silver or the like having good conductivity can be used.
- the first conductive layer 2 is used. It is preferable to use copper or nickel in consideration of the adhesion to the substrate.
- the lower limit of the average thickness of the second conductive layer 3 formed by electroless plating is preferably 0.2 ⁇ m, and more preferably 0.3 ⁇ m. Moreover, as an upper limit of the average thickness of the 2nd conductive layer 3 formed by the said electroless plating, 1 micrometer is preferable and 0.5 micrometer is more preferable. If the average thickness of the second conductive layer 3 formed by the electroless plating is less than the lower limit, the second conductive layer 3 may not be sufficiently filled in the gap portion of the first conductive layer 2 and the conductivity may be lowered. is there. On the other hand, if the average thickness of the second conductive layer 3 formed by the electroless plating exceeds the upper limit, the time required for the electroless plating may be increased and the productivity may be reduced.
- the second conductive layer 3 thickly by performing electroplating after forming the thin layer by electroless plating.
- the thickness of the conductive layer can be adjusted easily and accurately, and a conductive layer having a thickness necessary for forming a printed wiring in a relatively short time can be formed.
- the metal used for the electroplating copper, nickel, silver or the like having good conductivity can be used.
- the thickness of the second conductive layer 3 after the electroplating is set according to what kind of printed circuit is produced and is not particularly limited.
- the lower limit of the average thickness of the second conductive layer 3 after the electroplating Is preferably 1 ⁇ m, and more preferably 2 ⁇ m.
- an upper limit of the average thickness of the 2nd conductive layer 3 after the said electroplating 100 micrometers is preferable and 50 micrometers is more preferable.
- the average thickness of the second conductive layer 3 after the electroplating is less than the lower limit, the conductive layer may be easily damaged.
- the average thickness of the second conductive layer 3 after the electroplating exceeds the above upper limit, it may be difficult to make the printed wiring board thinner.
- the printed wiring board substrate manufacturing method includes an opening forming step of forming an opening in an insulating base film, application of conductive ink containing metal particles on both sides of the base film in which the opening is formed, and a predetermined amount or more. Forming a first conductive layer by heating at a predetermined temperature or higher in an atmosphere having an oxygen concentration (first conductive layer forming step), and plating a second conductive layer on at least one surface of the first conductive layer by plating. (Step of forming a second conductive layer).
- a plurality of openings 4 are formed in the insulating base film 1 shown in FIG. 2A using drilling, laser processing, or the like (FIG. 2B).
- First conductive layer forming step In the first conductive layer forming step, as shown in FIG. 2C, a conductive ink containing metal particles is applied to both surfaces of the base film 1, dried, and then subjected to heat treatment. The conductive ink is applied to both surfaces of the base film 1 so that the conductive ink is filled in the openings 4.
- Metal particles a method for producing metal particles dispersed in the conductive ink
- the metal particles can be produced by a high temperature treatment method, a liquid phase reduction method, a gas phase method, or the like.
- the metal particles to be produced have a spherical or granular shape and can be made into fine particles.
- copper copper (II) nitrate (Cu (NO 3 ) 2 ), copper (II) sulfate pentahydrate (CuSO 4 .5H 2 ) as the water-soluble metal compound that is the basis of the metal ions.
- the reducing agent in the case of producing metal particles by the liquid phase reduction method, various reducing agents capable of reducing and precipitating metal ions in a liquid phase (aqueous solution) reaction system can be used.
- the reducing agent include sodium borohydride, sodium hypophosphite, hydrazine, transition metal ions such as trivalent titanium ions and divalent cobalt ions, reducing sugars such as ascorbic acid, glucose and fructose, ethylene
- the titanium redox method is a method in which metal ions are reduced by a redox action when trivalent titanium ions are oxidized to tetravalent and metal particles are precipitated.
- the metal particles obtained by the titanium redox method have small and uniform particle diameters, and the titanium redox method can make the shape of the metal particles spherical or granular. Therefore, by using the titanium redox method, the metal particles are filled with higher density, and the first conductive layer 2 can be formed in a denser layer.
- the pH of the reaction system is preferably 7 or more and 13 or less in order to obtain metal particles having a minute particle size as in this embodiment.
- the pH of the reaction system can be adjusted to the above range by using a pH adjuster.
- a general acid or alkali such as hydrochloric acid, sulfuric acid, sodium hydroxide, sodium carbonate or the like is used.
- alkali metal or alkaline earth metal Nitric acid and ammonia which do not contain halogen elements such as chlorine and impurity elements such as sulfur, phosphorus and boron are preferable.
- the dispersant contained in the conductive ink various dispersants having a molecular weight of 2,000 to 300,000 and capable of favorably dispersing metal particles precipitated in the dispersion medium can be used.
- the metal particles can be favorably dispersed in the dispersion medium, and the film quality of the obtained first conductive layer 2 can be made dense and defect-free. If the molecular weight of the dispersant is less than the lower limit, the effect of preventing the aggregation of the metal particles and maintaining the dispersion may not be sufficiently obtained.
- the first conductive layer laminated on the base film 1 may be There is a possibility that it cannot be made dense and has few defects.
- the molecular weight of the dispersant exceeds the above upper limit, the bulk of the dispersant is too large, and in the heat treatment performed after the application of the conductive ink, there is a risk of inhibiting the sintering of the metal particles and generating voids.
- the volume of a dispersing agent is too large, there exists a possibility that the denseness of the film quality of the 1st conductive layer 2 may fall, or the decomposition residue of a dispersing agent may reduce electroconductivity.
- the above dispersant is preferably free of sulfur, phosphorus, boron, halogen and alkali from the viewpoint of preventing deterioration of parts.
- Preferred dispersants are those having a molecular weight in the above range, amine-based polymer dispersants such as polyethyleneimine and polyvinylpyrrolidone, and hydrocarbon-based hydrocarbons having a carboxylic acid group in the molecule such as polyacrylic acid and carboxymethylcellulose.
- Polar groups such as polymer dispersants, poval (polyvinyl alcohol), styrene-maleic acid copolymers, olefin-maleic acid copolymers, or copolymers having a polyethyleneimine moiety and a polyethylene oxide moiety in one molecule
- the polymer dispersing agent which has can be mentioned.
- the above-mentioned dispersant can be added to the reaction system in the form of a solution dissolved in water or a water-soluble organic solvent.
- a content rate of a dispersing agent 1 to 60 mass parts is preferable per 100 mass parts of metal particles.
- the dispersing agent surrounds the metal particles to prevent aggregation and disperse the metal particles satisfactorily.
- the content of the dispersing agent is less than the lower limit, this aggregation preventing effect may be insufficient.
- the content ratio of the dispersant exceeds the upper limit, during the heat treatment after the coating of the conductive ink, there is a risk that an excessive dispersant inhibits firing including sintering of the metal particles, and voids are generated.
- the decomposition residue of the polymer dispersant may remain in the first conductive layer as an impurity, thereby reducing the conductivity.
- the content ratio of water serving as a dispersion medium in the conductive ink is preferably 20 parts by mass or more and 1900 parts by mass or less per 100 parts by mass of the metal particles.
- the water of the dispersion medium sufficiently swells the dispersing agent to favorably disperse the metal particles surrounded by the dispersing agent.
- the content ratio of the water is less than the lower limit, the swelling effect of the dispersing agent by water can be reduced. May be insufficient.
- the content ratio of the water exceeds the upper limit, the metal particle ratio in the conductive ink is decreased, and a good first conductive layer having the necessary thickness and density cannot be formed on the surface of the base film 1. There is.
- organic solvents that are water-soluble can be used as the organic solvent blended into the conductive ink as necessary.
- specific examples thereof include alcohols such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, isobutyl alcohol, sec-butyl alcohol and tert-butyl alcohol, ketones such as acetone and methyl ethyl ketone,
- Examples thereof include polyhydric alcohols such as ethylene glycol and glycerin and other esters, and glycol ethers such as ethylene glycol monoethyl ether and diethylene glycol monobutyl ether.
- the content ratio of the water-soluble organic solvent is preferably 30 parts by mass or more and 900 parts by mass or less per 100 parts by mass of the metal particles.
- the content rate of the said water-soluble organic solvent is less than the said minimum, there exists a possibility that the effect of the viscosity adjustment and vapor pressure adjustment of the dispersion liquid by the said organic solvent may not fully be acquired.
- the content ratio of the water-soluble organic solvent exceeds the above upper limit, the swelling effect of the dispersant due to water becomes insufficient, and the metal particles may aggregate in the conductive ink.
- the metal particles deposited in the liquid phase (aqueous solution) reaction system are once powdered through steps such as filtration, washing, drying, and crushing.
- the conductive ink can be adjusted by using one.
- a powdered metal particle, water as a dispersion medium, a dispersant, and, if necessary, a water-soluble organic solvent are blended in a predetermined ratio to obtain a conductive ink containing metal particles.
- the liquid phase (aqueous solution) containing the precipitated metal particles is subjected to treatment such as ultrafiltration, centrifugation, washing with water, and electrodialysis to remove impurities, and if necessary, concentrated to remove water.
- a conductive ink containing the metal particles is prepared by further blending a water-soluble organic solvent at a predetermined ratio as necessary. In this method, generation of coarse and irregular particles due to agglomeration of metal particles during drying can be prevented, and the dense and uniform first conductive layer 2 can be easily formed.
- a conventionally known application method such as a bar coating method, a spray coating method, or a dip coating method can be used.
- the bar coating method is preferable in that the conductive ink can be uniformly applied to both surfaces of the base film 1 and can be reliably filled into the openings 4.
- Heat treatment A conductive ink is applied to both sides of the base film 1 and dried, followed by heat treatment. After applying conductive ink to both surfaces of the base film 1, heat treatment is performed to obtain the first conductive layer 2 fixed to both surfaces of the base film 1 and the inner wall of the opening 4 as a baked coating layer. By heat treatment, the dispersing agent and other organic substances contained in the applied conductive ink are volatilized and decomposed and removed from the coating layer, so that the remaining metal particles are in the sintered state or in the previous stage before sintering. It will be in the state which closely_contact
- the metal particles are oxidized by the heat treatment, and the generation of metal hydroxide species based on the metal of the metal particles is suppressed, while the metal oxide species based on the metal is used. Is generated. Specifically, for example, when copper is used as the metal particles, copper oxide and copper hydroxide are generated in the vicinity of the interface between the first conductive layer 2 and the base film 1, but more copper oxide is generated. Since the copper oxide produced in the vicinity of the interface of the first conductive layer 2 is strongly bonded to the polyimide constituting the base film 1, the adhesion between the first conductive layer 2 and the base film 1 is increased.
- the above heat treatment is performed in an atmosphere containing a certain amount of oxygen.
- the lower limit of the oxygen concentration in the atmosphere during the heat treatment is 1 ppm, and 10 ppm is more preferable.
- an upper limit of the said oxygen concentration it is 10,000 ppm and 1,000 ppm is more preferable.
- the oxygen concentration is less than the lower limit, the amount of copper oxide generated in the vicinity of the interface of the first conductive layer 2 decreases, and there is a possibility that sufficient adhesion between the first conductive layer 2 and the base film 1 cannot be obtained.
- the oxygen concentration exceeds the upper limit the metal particles are excessively oxidized and the conductivity of the first conductive layer 2 may be lowered.
- the lower limit of the temperature of the heat treatment is 150 ° C., more preferably 200 ° C. Moreover, as an upper limit of the temperature of the said heat processing, it is 500 degreeC and 400 degreeC is more preferable.
- the temperature of the heat treatment is less than the lower limit, the amount of copper oxide generated in the vicinity of the interface of the first conductive layer 2 decreases, and sufficient adhesion between the first conductive layer 2 and the base film 1 cannot be obtained. There is a fear.
- the temperature of the heat treatment exceeds the upper limit, the base film 1 may be deformed when the base film 1 is an organic resin such as polyimide.
- the amount of metal oxide species generated in the vicinity of the interface between the base film 1 and the first conductive layer 2 can be controlled.
- the first conductive layer 2 And the adhesive force between the base films 1 can be controlled.
- ⁇ Second conductive layer forming step> In the second conductive layer forming step, as shown in FIG. 2D, the surface exposed to the outside of the first conductive layer 2 laminated on the base film 1 in the first conductive layer forming step is electrolessly plated. 2 Conductive layer 3 is formed.
- the electroless plating is performed, for example, together with processes such as a cleaner process, a water washing process, an acid treatment process, a water washing process, a pre-dip process, an activator process, a water washing process, a reduction process, and a water washing process.
- processes such as a cleaner process, a water washing process, an acid treatment process, a water washing process, a pre-dip process, an activator process, a water washing process, a reduction process, and a water washing process.
- electroplating is further performed until the required thickness of the conductive layer is reached.
- a known electroplating bath according to a metal to be plated such as copper, nickel, silver, etc. is used, and an appropriate condition is selected, so that a conductive layer having a predetermined thickness is quickly formed without defects.
- the second conductive layer 3 is formed by the second conductive layer forming step.
- heat treatment is performed after the formation of the second conductive layer 3
- the metal oxide species in the vicinity of the interface of the first conductive layer 2 with the base film 1 further increases, and the adhesion between the base film 1 and the first conductive layer 2 is increased. It gets bigger.
- the printed wiring board is manufactured by forming a conductive pattern on the printed wiring board substrate shown in FIG.
- the conductive pattern is formed on the first conductive layer 2 and the second conductive layer 3 of the printed wiring board substrate using a subtractive method or a semi-additive method.
- a photosensitive resist 5 is formed on both surfaces of the printed wiring board substrate adjusted to a predetermined size.
- patterning corresponding to the conductive pattern is performed on the resist 5 by exposure, development, or the like.
- the second conductive layer 3 and the first conductive layer 2 other than the conductive pattern are removed by etching using the resist 5 as a mask.
- FIG. 3D by removing the remaining resist 5, a printed wiring board having a conductive pattern formed on the base film 1 is obtained.
- the manufacturing method of the printed wiring board which forms a circuit by subtractive method was demonstrated, the said printed wiring board can be manufactured even if it forms a circuit using other well-known manufacturing methods, such as a semi-additive method. Since the printed wiring board is manufactured using the printed wiring board substrate, the printed wiring board has high conductivity, and the adhesion between the base film 1 and the first conductive layer 2 is large. Hard to peel.
- the printed wiring board substrate has high conductivity because the first conductive layer is densely filled in the opening of the base film by applying conductive ink containing metal particles and heat treatment.
- the printed wiring board substrate has a land on which an electronic component can be mounted on the opening filled with the first conductive layer by filling the opening of the base film with the first conductive layer.
- a printed wiring board having a large area on which components can be mounted can be realized.
- the first conductive layer is filled in the opening of the base film, a multilayer substrate having interstitial via holes can be easily formed using the printed wiring board substrate.
- the conductive ink containing metal particles is applied to both surfaces of the base film 1 as shown in FIG. 2C.
- hydrophilic treatment is applied to both surfaces of the base film 1. Also good. By subjecting the base film 1 to the hydrophilic treatment, the surface tension of the conductive ink with respect to the base film 1 is reduced, so that it becomes easy to uniformly apply the conductive ink to the base film 1.
- the method for controlling the amount of the metal oxide species in the vicinity of the interface between the base film and the first conductive layer in order to improve the adhesion between the first conductive layer and the base film has been described.
- An intervening layer may be provided.
- an intervening layer composed of one or more elements of nickel (Ni), chromium (Cr), titanium (Ti), and silicon (Si) is provided between the base film and the first conductive layer.
- intervening layers can be obtained by, for example, subjecting a resinous base film such as polyimide to an alkali treatment to expose a functional group on the surface of the base film and allowing a metal acid to act on the functional group.
- Silicon can be obtained by subjecting a resinous insulating base film to a silane coupling treatment.
- a polyimide film having an average thickness of 25 ⁇ m was used, and openings were formed with a laser. Openings with diameters of 20 ⁇ m, 30 ⁇ m, 40 ⁇ m, and 50 ⁇ m were formed in four polyimide films, respectively.
- the base film in which the opening was formed was subjected to plasma treatment, and the surface of the base film and the inner wall of the opening were hydrophilized.
- water was used as the solvent, and copper particles having an average particle diameter of 60 nm were dispersed in the solvent water to produce a conductive ink having a copper concentration of 26% by mass.
- this conductive ink was apply
- the surface tension of the conductive ink was 62 mN / m.
- heat treatment was further performed at 350 ° C. for 30 minutes in a nitrogen atmosphere having an oxygen concentration of 100 ppm.
- the initial via resistance resistance between both ends of the opening filled with conductive ink
- the via resistance after two reflows are performed.
- no change was observed in the via resistance of any printed wiring board substrate.
- the opening part with which the said conductive ink was filled is excellent in reflow resistance.
- Evaluation No. 1 printed circuit board substrate is manufactured by using a polyimide film having an average thickness of 25 ⁇ m (Kapton “EN-S” manufactured by Toray DuPont Co., Ltd.) as an insulating base film. An opening having a diameter of 80 ⁇ m on the laser irradiation side was formed. Next, the base film in which the opening was formed was subjected to plasma treatment, and the surface of the base film and the inner wall of the opening were hydrophilized. On the other hand, water was used as the solvent, and copper particles having an average particle diameter of 60 nm were dispersed in the solvent water to produce a conductive ink having a copper concentration of 26% by mass.
- a polyimide film having an average thickness of 25 ⁇ m Kerpton “EN-S” manufactured by Toray DuPont Co., Ltd.
- An opening having a diameter of 80 ⁇ m on the laser irradiation side was formed.
- the base film in which the opening was formed was subjected to plasma treatment, and the surface of
- this conductive ink was applied so as to fill both surfaces and the opening of the base film.
- the surface tension of the conductive ink was 62 mN / m.
- heat treatment was further performed at 350 ° C. for 30 minutes in a nitrogen atmosphere having an oxygen concentration of 100 ppm.
- the diameter of the opening in the surface of the base film opposite to the laser irradiation side when the opening was formed by the laser was 76 ⁇ m.
- the diameter of the opening on the laser irradiation side surface of the base film is referred to as “upper diameter”
- the diameter of the opening on the surface opposite to the laser irradiation side is referred to as “lower diameter”.
- the printed wiring board substrate of No. 2 uses a base film in which an opening having a lower diameter of 70 ⁇ m is formed with respect to an upper diameter of 80 ⁇ m, and copper particles having an average particle diameter of 52 nm in a mixed solvent of water and ethanol as a conductive ink.
- No. 1 was used except that the surface tension of 25 mN / m was used. 1 was produced by the same production method as in 1.
- the printed wiring board substrate of No. 3 uses a base film in which an opening having a lower diameter of 32 ⁇ m with respect to an upper diameter of 40 ⁇ m is used, and copper particles having an average particle diameter of 68 nm are dispersed in a water solvent as a conductive ink, Except for using a surface tension of 55 mN / m, No. 1 was produced by the same production method as in 1.
- the printed wiring board substrate of No. 4 was evaluated No. except that a base film having an opening having a lower diameter of 109 ⁇ m with respect to an upper diameter of 120 ⁇ m was used. 1 was produced by the same production method as in 1.
- the printed wiring board substrate of 5 uses a base film in which an opening having a lower diameter of 68 ⁇ m is formed with respect to an upper diameter of 80 ⁇ m, and as conductive ink, a solvent is ethanol and copper particles having an average particle diameter of 63 nm are dispersed, Except for using a surface tension of 15 mN / m, evaluation no. 1 was produced by the same production method as in 1.
- the printed wiring board substrate of No. 6 uses a base film in which an opening having a lower diameter of 89 ⁇ m is formed with respect to an upper diameter of 100 ⁇ m, and, as a conductive ink, copper particles having an average particle diameter of 75 nm are dispersed in a water solvent, Except for using a surface tension of 68 mN / m, No. 1 was produced by the same production method as in 1.
- Evaluation No. 7 is a polyimide film having an average thickness of 50 ⁇ m as a base film (Kapton “EN-S” manufactured by Toray DuPont Co., Ltd.) with an opening having a lower diameter of 95 ⁇ m and an upper diameter of 100 ⁇ m.
- the conductive ink used was evaluated No. except that copper particles having an average particle diameter of 82 nm were dispersed in a water solvent and the surface tension was 88 mN / m. 1 was produced by the same production method as in 1.
- the printed wiring board substrate of No. 9 uses a base film in which an opening having a lower diameter of 132 ⁇ m is formed with respect to an upper diameter of 150 ⁇ m, and, as a conductive ink, copper particles having an average particle diameter of 75 nm are dispersed in a water solvent, Except for using a surface tension of 68 mN / m, No. 1 was produced by the same production method as in 1.
- the printed wiring board substrate of No. 10 uses a polyimide film having an average thickness of 50 ⁇ m as a base film and an opening having a lower diameter of 28.8 ⁇ m with respect to an upper diameter of 30 ⁇ m.
- As a conductive ink water and ethanol are used. Except that copper particles having an average particle diameter of 55 nm were dispersed in a mixed solvent and a surface tension of 22 mN / m was used, evaluation No. 1 was produced by the same production method as in 1.
- the printed wiring board substrate No. 11 uses a base film in which an opening having a lower diameter of 15 ⁇ m is formed with respect to an upper diameter of 100 ⁇ m, and copper particles having an average particle diameter of 68 nm are dispersed in a water solvent as a conductive ink. Except for using a surface tension of 55 mN / m, No. 1 was produced by the same production method as in 1.
- the printed circuit board substrate of 12 uses a base film in which an opening having a lower diameter of 94 ⁇ m is formed with respect to an upper diameter of 100 ⁇ m, and as a conductive ink, copper particles having an average particle diameter of 541 nm are dispersed in a water solvent, Except for using a surface tension of 54 mN / m, No. 1 was produced by the same production method as in 1.
- the substrate for printed wiring board 13 uses a base film in which an opening having a lower diameter of 89 ⁇ m with respect to an upper diameter of 100 ⁇ m is used, and copper particles having an average particle diameter of 75 nm are dispersed in a water solvent as a conductive ink, Except for using a surface tension of 68 mN / m and performing the heat treatment at 500 ° C. for 8 hours in a nitrogen atmosphere with an oxygen concentration of 100 ppm, evaluation no. 1 was produced by the same production method as in 1.
- Evaluation No. 1-No. Circuits were formed on the printed wiring board substrate after heat treatment of 13 to produce a printed wiring board. Specifically, evaluation no. 1-No. After the second conductive layer was formed on the 13 printed wiring board substrates by electroless plating, a conductive pattern was formed by a subtractive method. In this series of circuit formation steps, the conductive layer formed in the opening by the conductive ink did not fall off, and the land portion molding retention was high, and the evaluation result was “A”. On the other hand, an evaluation result “B” was obtained in which the land portion molding retention was low when the conductive layer formed in the opening dropped in the series of circuit formation steps. These evaluation results are shown in Table 1.
- the “opening diameter ratio” in Table 1 indicates the ratio of the lower diameter to the upper diameter.
- the “dent ratio” is the ratio of the maximum depth of the concave portion of the conductive layer formed in the opening to the average thickness of the base film by applying the conductive ink based on the surface on which the upper diameter of the base film is formed. [%] Is shown.
- the “aspect ratio” indicates the ratio of the average thickness of the base film to the upper diameter of the opening.
- evaluation no. 4 and no. From the result of the printed wiring board substrate of No. 9, it can be seen that if the diameter of the opening is too large, it is difficult to fill the opening with the conductive ink even if the surface tension of the conductive ink is large.
- evaluation No. 1, no. 2 and no. When the results of the printed wiring board substrate of No. 5 are compared, it can be seen that even if the opening has the same upper diameter, it is difficult to fill the opening with the conductive ink if the surface tension of the conductive ink is small.
- evaluation No. 10 printed wiring board substrate has a relatively large aspect ratio and a relatively small surface tension, making it difficult to fill conductive ink in the center of the opening, increasing the dent ratio, and forming land. It is thought that the nature became low.
- the printed wiring board substrate, the printed wiring board, and the printed wiring board substrate manufacturing method of the present invention are densely filled with the conductor in the opening of the base film as described above, excellent conductivity is obtained. It is suitably used for printed wiring boards that require high-density printed wiring.
Abstract
Description
最初に本発明の実施態様を列記して説明する。
以下、本発明の実施形態に係るプリント配線板用基板、プリント配線板及びプリント配線板用基板の製造方法を図面を参照しつつ説明する。
図1の当該プリント配線板用基板は、絶縁性を有し、複数の開口4を有するベースフィルム1と、金属粒子を含む導電性インクの塗布及び熱処理によりベースフィルム1の両面に積層され、かつ開口4内に充填される第1導電層2と、メッキにより第1導電層2の表面に積層される第2導電層3とを主に備える。
当該プリント配線板用基板を構成する図1Bのベースフィルム1は絶縁性を有し、複数の開口4が形成されている。このベースフィルム1の材料としては、例えばポリイミド、液晶ポリマー、テフロン(登録商標)、フッ素樹脂、ポリエチレンテレフタレート、ポリエチレンナフタレート等の可撓性を有する樹脂、紙フェノール、紙エポキシ、ガラスコンポジット、ガラスエポキシ、ガラス基材等のリジッド材、硬質材料と軟質材料とを複合したリジッドフレキシブル材を用いることが可能である。これらの中でも、金属酸化物種との結合力が大きいことから、ポリイミドが特に好ましい。
上記開口4は、平面視円形状で、ベースフィルム1の一方の面から他方の面まで垂直に貫通している。ここで、開口4は、例えばドリル加工やレーザー加工等によりベースフィルム1の一方の面側から形成することができ、この場合、この一方の面側から他方の面側へ縮径するように開口4が形成される。つまり、この場合、開口4のベースフィルム1両面における直径のうち、上記一方の面の直径の方が他方の面の直径よりも大きい。このように、一方の面の直径の方が他方の面の直径よりも大きくなるように開口4を形成することで、上記一方の面側から導電性インクが充填し易くなる。
上記第1導電層2は、金属粒子を含む導電性インクの塗布により、ベースフィルム1の両面に積層され、かつ開口4内に充填されている。当該プリント配線板用基板では、導電性インクの塗布により第1導電層2を形成するので、容易に導電性インクで開口4内を充填すると共にベースフィルム1の両面を導電性の皮膜で覆うことができる。なお、導電性インク中の不要な有機物等を除去して金属粒子を確実に開口4内及びベースフィルム1の両面に固着させるため、第1導電層2は導電性インクの塗布後に熱処理が施されることが好ましい。
上記第1導電層2を形成する導電性インクは、導電性をもたらす導電性物質として金属粒子を含んでいる。本実施形態では、導電性インクとして、金属粒子と、その金属粒子を分散させる分散剤と、分散媒とを含むものを用いる。このような導電性インクを用いて塗布することで、微細な金属粒子による第1導電層2がベースフィルム1の両面に積層され、かつ開口4内に充填される。
上記第2導電層3は、無電解メッキにより第1導電層2のベースフィルム1とは反対側の面に積層されている。このように上記第2導電層3が無電解メッキにより形成されているので、第1導電層2を形成する金属粒子間の隙間には第2導電層3の金属が充填されている。このように、無電解メッキ金属が金属粒子間の隙間に充填されることによって金属粒子間の空隙を減少させることで、空隙部分が破壊起点となって第1導電層2がベースフィルム1から剥離することを抑制できる。
当該プリント配線板用基板の製造方法は、絶縁性を有するベースフィルムに開口を形成する開口形成工程と、開口を形成したベースフィルムの両面への金属粒子を含む導電性インクの塗布、及び所定以上の酸素濃度の雰囲気下での所定温度以上の加熱により第1導電層を形成する工程(第1導電層形成工程)と、メッキにより、上記第1導電層の少なくとも一方の面に第2導電層を形成する工程(第2導電層形成工程)とを備える。
上記開口形成工程では、図2Aに示す絶縁性のベースフィルム1に、ドリル加工やレーザー加工等を用いて複数の開口4を形成する(図2B)。
上記第1導電層形成工程では、図2Cに示すように、ベースフィルム1の両面へ金属粒子を含む導電性インクを塗布し、乾燥した後、熱処理を施す。導電性インクがベースフィルム1の両面へ塗布されることで、導電性インクは開口4内に充填される。
ここで、導電性インクに分散させる金属粒子の製造方法について説明する。上記金属粒子は、高温処理法、液相還元法、気相法等で製造することができる。
次に、上記導電性インクの調整方法について説明する。上記導電性インクに含まれる分散剤としては、分子量が2,000以上300,000以下で、分散媒中で析出した金属粒子を良好に分散させることができる種々の分散剤を用いることができる。分子量が上記範囲の分散剤を用いることで、金属粒子を分散媒中に良好に分散させることができ、得られる第1導電層2の膜質を緻密でかつ欠陥のないものにすることができる。上記分散剤の分子量が上記下限未満の場合、金属粒子の凝集を防止して分散を維持する効果が十分に得られないおそれがあり、その結果、ベースフィルム1に積層される第1導電層を緻密で欠陥の少ないものにできないおそれがある。一方、上記分散剤の分子量が上記上限を超える場合、分散剤の嵩が大きすぎ、導電性インクの塗布後に行う熱処理において、金属粒子同士の焼結を阻害してボイドを生じさせるおそれがある。また、分散剤の嵩が大きすぎると、第1導電層2の膜質の緻密さが低下したり、分散剤の分解残渣が導電性を低下させるおそれがある。
金属粒子を分散させた導電性インクをベースフィルム1の両面に塗布する方法としては、バーコート法、スプレーコート法、ディップコート法等の従来公知の塗布法を用いることができる。この中でも、バーコート法が、導電性インクをベースフィルム1の両面に均一に塗布でき、かつ開口4内へ確実に充填できる点で好ましい。
導電性インクをベースフィルム1の両面に塗布し、乾燥した後、熱処理を行う。ベースフィルム1の両面に導電性インクを塗布した後、熱処理をすることで、焼成された塗布層としてベースフィルム1の両面及び開口4の内壁に固着された第1導電層2が得られる。熱処理により、塗布された導電性インクに含まれる分散剤やその他の有機物を揮発及び分解させて塗布層から除去することにより、残る金属粒子が焼結状態又は焼結に至る前段階にあって相互に密着して固体接合したような状態となる。
上記第2導電層形成工程では、図2Dに示すように、上記第1導電層形成工程でベースフィルム1に積層した第1導電層2の外側に露出している面に、無電解メッキにより第2導電層3を形成する。
当該プリント配線板は、図1に示す上記プリント配線板用基板に導電パターンを形成することにより製造される。上記導電パターンは、上記プリント配線板用基板の第1導電層2及び第2導電層3にサブトラクティブ法又はセミアディティブ法を用いて形成される。
次に、上記プリント配線板用基板を用いる当該プリント配線板の製造方法の実施形態について説明する。ここでは、サブトラクティブ法により導電パターンを形成する場合について説明する。
当該プリント配線板用基板は、金属粒子を含む導電性インクの塗布及び熱処理により第1導電層がベースフィルムの開口内に緻密に充填されているので、高い導電性を有する。
今回開示された実施の形態はすべての点で例示であって制限的なものではないと考えられるべきである。本発明の範囲は、上記実施形態の構成に限定されるものではなく、特許請求の範囲によって示され、特許請求の範囲と均等の意味及び範囲内での全ての変更が含まれることが意図される。
開口の直径が異なるベースフィルムを用いて、4つの実施例のプリント配線板用基板を製造し、耐リフロー性の評価を行った。
参考として、開口の直径、導電性インクの表面張力等と、開口上へのランド部の形成可能性及びランド部保持性との関係を評価した。
評価No.1~No.13の熱処理後のプリント配線板用基板の断面を光学顕微鏡(株式会社ニコンの偏光顕微鏡「OPTIPHOT-2」)、電子顕微鏡(日本電子株式会社の分析走査電子顕微鏡「JSM-6390A」)等で観測し、開口内に導電性インクが充填されているか否かを確認した。開口内に導電性インクが充填されていたものは、開口上にランド部を形成できる可能性が高いとし評価結果「A」とした。一方、開口内に導電性インクが充填されていなかったものは、開口上にランド部を形成できる可能性が低いとし評価結果「B」とした。これらの評価結果を表1に示す。
評価No.1~No.13の熱処理後のプリント配線板用基板に回路を形成し、プリント配線板を作製した。具体的には、評価No.1~No.13のプリント配線板用基板に無電解メッキにより第2導電層を形成した後、サブトラクティブ法により導電パターンを形成した。この一連の回路形成の工程で上記導電性インクにより開口内に形成された導電層が脱落しなかったものをランド部成形保持性が高いとし評価結果「A」とした。一方、上記一連の回路形成の工程で上記開口内に形成された導電層が脱落したものをランド部成形保持性が低いとし評価結果「B」とした。これらの評価結果を表1に示す。
2 第1導電層
3 第2導電層
4 開口
5 レジスト
Claims (15)
- 絶縁性を有し、1又は複数の開口を有するベースフィルムと、
金属粒子を含む導電性インクの塗布及び熱処理により上記ベースフィルムの両面に積層され、かつ上記開口内に充填される第1導電層と、
メッキにより上記第1導電層の少なくとも一方の面に積層される第2導電層と
を備えるプリント配線板用基板。 - 上記金属粒子の平均粒子径が1nm以上500nm以下である請求項1に記載のプリント配線板用基板。
- 上記ベースフィルムの両面に親水化処理が施されている請求項1又は請求項2に記載のプリント配線板用基板。
- 上記金属が銅である請求項1、請求項2又は請求項3に記載のプリント配線板用基板。
- 上記第1導電層におけるベースフィルムの一方の面又は他方の面との界面から500nm以内の領域及び上記開口内の領域の空隙率が1%以上50%以下である請求項1から請求項4のいずれか1項に記載のプリント配線板用基板。
- 上記ベースフィルムの一方の面を基準とした上記開口内に形成される第1導電層の凹部の最大深さの上記ベースフィルムの平均厚みに対する比が50%以下である請求項1から請求項5のいずれか1項に記載のプリント配線板用基板。
- 上記開口のベースフィルム両面における直径のうち、大きい方の直径に対する上記ベースフィルムの平均厚みの比が0.2以上2.0以下である請求項1から請求項6のいずれか1項に記載のプリント配線板用基板。
- 上記開口のベースフィルム両面における直径のうち、一方の直径に対する他方の直径の比が0.2以上1.0未満である請求項1から請求項7のいずれか1項に記載のプリント配線板用基板。
- 上記ベースフィルム及び第1導電層の界面近傍に、上記金属粒子の金属に基づく金属酸化物又はその金属酸化物に由来する基並びに上記金属に基づく金属水酸化物又はその金属水酸化物に由来する基が存在する請求項1から請求項8のいずれか1項に記載のプリント配線板用基板。
- 上記金属酸化物又はその金属酸化物に由来する基の単位面積当たりの質量が0.1μg/cm2以上10μg/cm2以下、上記金属酸化物又はその金属酸化物に由来する基の上記金属水酸化物又はその金属水酸化物に由来する基に対する質量比が0.1以上である請求項9に記載のプリント配線板用基板。
- 上記金属粒子が、水溶液中で還元剤の働きにより金属イオンを還元する液相還元法によって得られた粒子である請求項1から請求項10のいずれか1項に記載のプリント配線板用基板。
- 上記液相還元法がチタンレドックス法である請求項11に記載のプリント配線板用基板。
- 導電パターンを有するプリント配線板であって、
上記導電パターンが、請求項1から請求項12のいずれか1項に記載のプリント配線板用基板の第1導電層及び第2導電層にサブトラクティブ法又はセミアディティブ法を用いることで形成されているプリント配線板。 - 絶縁性を有し、1又は複数の開口を有するベースフィルムの両面への金属粒子を含む導電性インクの塗布、及び酸素濃度が1ppm以上10,000ppm以下の雰囲気下での150℃以上500℃以下の加熱により、上記ベースフィルムの両面に積層され、かつ上記開口内に充填される第1導電層を形成する工程と、
メッキにより、上記第1導電層の少なくとも一方の面に第2導電層を形成する工程と
を備え、
上記金属粒子の平均粒子径が1nm以上500nm以下であるプリント配線板用基板の製造方法。 - 上記導電性インクの表面張力が10mN/m以上100mN/m以下である請求項14に記載のプリント配線板用基板の製造方法。
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Also Published As
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JPWO2015147219A1 (ja) | 2017-04-13 |
CN106134298B (zh) | 2019-02-22 |
US20170099732A1 (en) | 2017-04-06 |
CN106134298A (zh) | 2016-11-16 |
JP6585032B2 (ja) | 2019-10-02 |
US10237976B2 (en) | 2019-03-19 |
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